JP2009545146A5 - - Google Patents

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Publication number
JP2009545146A5
JP2009545146A5 JP2009521149A JP2009521149A JP2009545146A5 JP 2009545146 A5 JP2009545146 A5 JP 2009545146A5 JP 2009521149 A JP2009521149 A JP 2009521149A JP 2009521149 A JP2009521149 A JP 2009521149A JP 2009545146 A5 JP2009545146 A5 JP 2009545146A5
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Japan
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optical
optical element
optical device
vibration
light source
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JP2009521149A
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Japanese (ja)
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JP4978816B2 (ja
JP2009545146A (ja
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Priority claimed from DE102006034755A external-priority patent/DE102006034755A1/de
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JP2009521149A 2006-07-24 2007-07-19 光学装置及び光学装置の結像挙動を補正又は改善する方法 Expired - Fee Related JP4978816B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102006034755A DE102006034755A1 (de) 2006-07-24 2006-07-24 Optische Vorrichtung sowie Verfahren zur Korrektur bzw. Verbesserung des Abbildungsverhaltens einer optischen Vorrichtung
DE102006034755.2 2006-07-24
PCT/EP2007/006407 WO2008012022A1 (de) 2006-07-24 2007-07-19 Optische vorrichtung und verfahren zur korrektur bzw. verbesserung des abbildungsverhaltens einer solchen vorrichtung

Publications (3)

Publication Number Publication Date
JP2009545146A JP2009545146A (ja) 2009-12-17
JP2009545146A5 true JP2009545146A5 (https=) 2010-08-05
JP4978816B2 JP4978816B2 (ja) 2012-07-18

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JP2009521149A Expired - Fee Related JP4978816B2 (ja) 2006-07-24 2007-07-19 光学装置及び光学装置の結像挙動を補正又は改善する方法

Country Status (5)

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US (1) US8169595B2 (https=)
EP (1) EP2044487B1 (https=)
JP (1) JP4978816B2 (https=)
DE (2) DE102006034755A1 (https=)
WO (1) WO2008012022A1 (https=)

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DE102017205548A1 (de) 2017-03-31 2018-10-04 Carl Zeiss Smt Gmbh Optische Baugruppe zum Führen eines Ausgabestrahls eines Freie-Elektronen-Lasers
WO2019099925A1 (en) 2017-11-17 2019-05-23 Advanced Energy Industries, Inc. Spatial and temporal control of ion bias voltage for plasma processing
US12230476B2 (en) 2017-11-17 2025-02-18 Advanced Energy Industries, Inc. Integrated control of a plasma processing system
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CN111788654B (zh) * 2017-11-17 2023-04-14 先进工程解决方案全球控股私人有限公司 等离子体处理系统中的调制电源的改进应用
WO2021011450A1 (en) 2019-07-12 2021-01-21 Advanced Energy Industries, Inc. Bias supply with a single controlled switch
US12125674B2 (en) 2020-05-11 2024-10-22 Advanced Energy Industries, Inc. Surface charge and power feedback and control using a switch mode bias system
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