JP2009541935A5 - - Google Patents

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Publication number
JP2009541935A5
JP2009541935A5 JP2009516520A JP2009516520A JP2009541935A5 JP 2009541935 A5 JP2009541935 A5 JP 2009541935A5 JP 2009516520 A JP2009516520 A JP 2009516520A JP 2009516520 A JP2009516520 A JP 2009516520A JP 2009541935 A5 JP2009541935 A5 JP 2009541935A5
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JP
Japan
Prior art keywords
ion beam
workpiece
ion
vibration
frequency
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2009516520A
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English (en)
Japanese (ja)
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JP2009541935A (ja
JP5109209B2 (ja
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Publication date
Priority claimed from US11/473,860 external-priority patent/US7498590B2/en
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Publication of JP2009541935A publication Critical patent/JP2009541935A/ja
Publication of JP2009541935A5 publication Critical patent/JP2009541935A5/ja
Application granted granted Critical
Publication of JP5109209B2 publication Critical patent/JP5109209B2/ja
Active legal-status Critical Current
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JP2009516520A 2006-06-23 2007-06-14 イオン注入装置およびその方法 Active JP5109209B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/473,860 2006-06-23
US11/473,860 US7498590B2 (en) 2006-06-23 2006-06-23 Scan pattern for an ion implanter
PCT/US2007/014008 WO2008002403A2 (en) 2006-06-23 2007-06-14 Scan pattern for an ion implanter

Publications (3)

Publication Number Publication Date
JP2009541935A JP2009541935A (ja) 2009-11-26
JP2009541935A5 true JP2009541935A5 (enExample) 2010-07-08
JP5109209B2 JP5109209B2 (ja) 2012-12-26

Family

ID=38846168

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009516520A Active JP5109209B2 (ja) 2006-06-23 2007-06-14 イオン注入装置およびその方法

Country Status (6)

Country Link
US (1) US7498590B2 (enExample)
JP (1) JP5109209B2 (enExample)
KR (1) KR101365103B1 (enExample)
CN (1) CN101461028B (enExample)
TW (1) TWI397097B (enExample)
WO (1) WO2008002403A2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008003526A2 (en) * 2006-07-06 2008-01-10 Ion Beam Applications S.A. Method and software for irradiating a target volume with a particle beam and device implementing same
EP2228817B1 (en) * 2009-03-09 2012-07-18 IMS Nanofabrication AG Global point spreading function in multi-beam patterning
US9147554B2 (en) * 2009-07-02 2015-09-29 Axcelis Technologies, Inc. Use of beam scanning to improve uniformity and productivity of a 2D mechanical scan implantation system
CH701762A2 (de) * 2009-09-14 2011-03-15 Markus R Mueller Verfahren und Vorrichtung zum Herstellen von beliebigen Produkten mit gewünschten Eigenschaften durch computergesteuertes Zusammensetzen von Atomen und/oder Molekülen.
US8378313B2 (en) * 2011-03-31 2013-02-19 Axcelis Technologies, Inc. Uniformity of a scanned ion beam
US8421039B2 (en) 2011-03-31 2013-04-16 Axcelis Technologies, Inc. Method and apparatus for improved uniformity control with dynamic beam shaping
US9340870B2 (en) 2013-01-25 2016-05-17 Advanced Ion Beam Technology, Inc. Magnetic field fluctuation for beam smoothing
US9190248B2 (en) * 2013-09-07 2015-11-17 Varian Semiconductor Equipment Associates, Inc. Dynamic electrode plasma system
US9612534B2 (en) 2015-03-31 2017-04-04 Tokyo Electron Limited Exposure dose homogenization through rotation, translation, and variable processing conditions
WO2016160301A1 (en) * 2015-03-31 2016-10-06 Tokyo Electron Limited Exposure dose homogenization through rotation, translation, and variable processing conditions
US10657737B2 (en) 2017-10-23 2020-05-19 Toyota Motor Engineering & Manufacturing North America, Inc. Vehicle error identification system

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4449051A (en) * 1982-02-16 1984-05-15 Varian Associates, Inc. Dose compensation by differential pattern scanning
US4980562A (en) 1986-04-09 1990-12-25 Varian Associates, Inc. Method and apparatus for high efficiency scanning in an ion implanter
US4736107A (en) * 1986-09-24 1988-04-05 Eaton Corporation Ion beam implanter scan control system
US5132544A (en) * 1990-08-29 1992-07-21 Nissin Electric Company Ltd. System for irradiating a surface with atomic and molecular ions using two dimensional magnetic scanning
JP3341749B2 (ja) * 1999-12-28 2002-11-05 日新電機株式会社 イオン注入方法およびイオン注入装置
EP1285456A2 (en) * 2000-05-15 2003-02-26 Varian Semiconductor Equipment Associates Inc. High efficiency scanning in ion implanters
JP3692999B2 (ja) 2001-10-26 2005-09-07 日新イオン機器株式会社 イオン注入方法およびその装置
US6903350B1 (en) * 2004-06-10 2005-06-07 Axcelis Technologies, Inc. Ion beam scanning systems and methods for improved ion implantation uniformity
US7442944B2 (en) * 2004-10-07 2008-10-28 Varian Semiconductor Equipment Associates, Inc. Ion beam implant current, spot width and position tuning
US20060113489A1 (en) * 2004-11-30 2006-06-01 Axcelis Technologies, Inc. Optimization of beam utilization
US7589333B2 (en) * 2006-09-29 2009-09-15 Axcelis Technologies, Inc. Methods for rapidly switching off an ion beam

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