JP2009540104A - 電子用途用の疎水性組成物 - Google Patents
電子用途用の疎水性組成物Info
- Publication number
- JP2009540104A JP2009540104A JP2009515491A JP2009515491A JP2009540104A JP 2009540104 A JP2009540104 A JP 2009540104A JP 2009515491 A JP2009515491 A JP 2009515491A JP 2009515491 A JP2009515491 A JP 2009515491A JP 2009540104 A JP2009540104 A JP 2009540104A
- Authority
- JP
- Japan
- Prior art keywords
- composition
- bis
- encapsulant
- dianhydride
- diamine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1039—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors comprising halogen-containing substituents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1057—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
- C08G73/1064—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D179/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
- C09D179/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C09D179/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/224—Housing; Encapsulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/08—Housing; Encapsulation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/16—Printed circuits incorporating printed electric components, e.g. printed resistors, capacitors or inductors
- H05K1/162—Printed circuits incorporating printed electric components, e.g. printed resistors, capacitors or inductors incorporating printed capacitors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
- H05K2201/0154—Polyimide
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0183—Dielectric layers
- H05K2201/0187—Dielectric layers with regions of different dielectrics in the same layer, e.g. in a printed capacitor for locally changing the dielectric properties
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0355—Metal foils
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09209—Shape and layout details of conductors
- H05K2201/09654—Shape and layout details of conductors covering at least two types of conductors provided for in H05K2201/09218 - H05K2201/095
- H05K2201/09763—Printed component having superposed conductors, but integrated in one circuit layer
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/453,388 US20070290379A1 (en) | 2006-06-15 | 2006-06-15 | Hydrophobic compositions for electronic applications |
| PCT/US2007/013965 WO2007146382A2 (en) | 2006-06-15 | 2007-06-13 | Hydrophobic compositions for electronic applications |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009540104A true JP2009540104A (ja) | 2009-11-19 |
| JP2009540104A5 JP2009540104A5 (https=) | 2010-07-29 |
Family
ID=38729007
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009515491A Pending JP2009540104A (ja) | 2006-06-15 | 2007-06-13 | 電子用途用の疎水性組成物 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20070290379A1 (https=) |
| EP (1) | EP2027184A2 (https=) |
| JP (1) | JP2009540104A (https=) |
| KR (1) | KR20090028769A (https=) |
| CN (1) | CN101466773A (https=) |
| TW (1) | TW200806744A (https=) |
| WO (1) | WO2007146382A2 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20180080904A (ko) | 2017-01-05 | 2018-07-13 | 주식회사 엘지화학 | 소수성 표면처리를 이용한 배터리 모듈 및 제작방법 |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU2003292790A1 (en) * | 2002-12-27 | 2004-07-29 | I.S.T Corporation | Polyimide precursor liquid composition and polyimide coating film |
| JP2010512449A (ja) * | 2006-12-12 | 2010-04-22 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | 結晶性封入剤 |
| US8357753B2 (en) | 2007-07-18 | 2013-01-22 | Cda Processing Limited Liability Company | Screen-printable encapsulants based on polyhydroxyamides that thermally convert to polybenzoxazoles |
| US8270145B2 (en) * | 2007-12-04 | 2012-09-18 | Cda Processing Limited Liability Company | Screen-printable encapsulants based on soluble polybenzoxazoles |
| US8829676B2 (en) * | 2011-06-28 | 2014-09-09 | Taiwan Semiconductor Manufacturing Company, Ltd. | Interconnect structure for wafer level package |
| CN104245845B (zh) * | 2012-04-27 | 2017-06-06 | 宇部兴产株式会社 | 聚酰胺酸溶液组合物及聚酰亚胺 |
| US9368460B2 (en) | 2013-03-15 | 2016-06-14 | Taiwan Semiconductor Manufacturing Company, Ltd. | Fan-out interconnect structure and method for forming same |
| EP3078964B1 (en) * | 2015-04-09 | 2017-05-24 | Honeywell International Inc. | Relative humidity sensor and method |
| CN105001778B (zh) * | 2015-07-10 | 2018-01-02 | 东华大学 | 一种含氟聚酰亚胺湿敏电容及其制备方法 |
| CN105111439B (zh) * | 2015-07-10 | 2018-05-15 | 东华大学 | 一种联苯型聚酰亚胺湿敏电容及其制备方法 |
| TWI653715B (zh) * | 2016-05-13 | 2019-03-11 | Murata Manufacturing Co., Ltd. | 晶圓級封裝及電容器 |
| KR102648696B1 (ko) * | 2018-12-21 | 2024-03-15 | 주식회사 엘지화학 | 폴리이미드 전구체 조성물, 이를 이용한 폴리이미드 제조 방법 및 폴리이미드 필름 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005154502A (ja) * | 2003-11-21 | 2005-06-16 | Hitachi Chem Co Ltd | ポリイミド樹脂ペースト及び被膜形成材料 |
| WO2005080505A1 (ja) * | 2004-02-20 | 2005-09-01 | Ube Industries, Ltd. | ポリイミドシロキサン溶液組成物 |
| JP2005325332A (ja) * | 2004-01-09 | 2005-11-24 | E I Du Pont De Nemours & Co | 水分収着耐性を有するポリイミド組成物およびそれに関連する方法 |
| JP2006077172A (ja) * | 2004-09-10 | 2006-03-23 | Sumitomo Bakelite Co Ltd | 絶縁性樹脂組成物、その製造方法及び電子部品 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3668193A (en) * | 1971-01-27 | 1972-06-06 | Pennwalt Corp | Vinylidene fluoride coating compositions containing polyimides |
| US4985377A (en) * | 1987-12-14 | 1991-01-15 | Matsushita Electric Industrial Co., Ltd. | Glaze resistor |
| US5071997A (en) * | 1989-07-20 | 1991-12-10 | University Of Akron | Polyimides comprising substituted benzidines |
| US5183534A (en) * | 1990-03-09 | 1993-02-02 | Amoco Corporation | Wet-etch process and composition |
| US5750958A (en) * | 1993-09-20 | 1998-05-12 | Kyocera Corporation | Ceramic glow plug |
| DE4335323A1 (de) * | 1993-10-18 | 1995-04-20 | Basf Lacke & Farben | Lösungen von polyimidbildenden Substanzen und deren Verwendung |
| US5980785A (en) * | 1997-10-02 | 1999-11-09 | Ormet Corporation | Metal-containing compositions and uses thereof, including preparation of resistor and thermistor elements |
| DE60016217T2 (de) * | 1999-04-09 | 2005-04-07 | Kaneka Corp. | Polyimidharzzusammensetzung mit verbesserter feuchtigkeitsbeständigkeit, leimlösung, mehrlagiger klebefilm und verfahren zu deren herstellung |
| DE10126363B4 (de) * | 2000-06-02 | 2011-08-11 | Basf Se, 67063 | Verfahren und Vorrichtung zur Herstellung von Aldehyden und/oder Alkoholen mit 6 bis 30 C-Atomen |
| WO2002082473A2 (en) * | 2001-04-09 | 2002-10-17 | Morgan Chemical Products, Inc. | Thick film paste systems for circuits on diamonds substrates |
| US6860000B2 (en) | 2002-02-15 | 2005-03-01 | E.I. Du Pont De Nemours And Company | Method to embed thick film components |
| US7038900B2 (en) * | 2003-02-27 | 2006-05-02 | Greatbatch-Sierra, Inc. | EMI filter terminal assembly with wire bond pads for human implant applications |
| US7022402B2 (en) * | 2003-07-14 | 2006-04-04 | E. I. Du Pont De Nemours And Company | Dielectric substrates comprising a polymide core layer and a high temperature fluoropolymer bonding layer, and methods relating thereto |
| US20050154105A1 (en) | 2004-01-09 | 2005-07-14 | Summers John D. | Compositions with polymers for advanced materials |
-
2006
- 2006-06-15 US US11/453,388 patent/US20070290379A1/en not_active Abandoned
-
2007
- 2007-06-13 EP EP07796113A patent/EP2027184A2/en not_active Withdrawn
- 2007-06-13 KR KR1020097000844A patent/KR20090028769A/ko not_active Ceased
- 2007-06-13 CN CNA2007800219430A patent/CN101466773A/zh active Pending
- 2007-06-13 WO PCT/US2007/013965 patent/WO2007146382A2/en not_active Ceased
- 2007-06-13 JP JP2009515491A patent/JP2009540104A/ja active Pending
- 2007-06-14 TW TW096121525A patent/TW200806744A/zh unknown
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005154502A (ja) * | 2003-11-21 | 2005-06-16 | Hitachi Chem Co Ltd | ポリイミド樹脂ペースト及び被膜形成材料 |
| JP2005325332A (ja) * | 2004-01-09 | 2005-11-24 | E I Du Pont De Nemours & Co | 水分収着耐性を有するポリイミド組成物およびそれに関連する方法 |
| WO2005080505A1 (ja) * | 2004-02-20 | 2005-09-01 | Ube Industries, Ltd. | ポリイミドシロキサン溶液組成物 |
| JP2006077172A (ja) * | 2004-09-10 | 2006-03-23 | Sumitomo Bakelite Co Ltd | 絶縁性樹脂組成物、その製造方法及び電子部品 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20180080904A (ko) | 2017-01-05 | 2018-07-13 | 주식회사 엘지화학 | 소수성 표면처리를 이용한 배터리 모듈 및 제작방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2027184A2 (en) | 2009-02-25 |
| CN101466773A (zh) | 2009-06-24 |
| TW200806744A (en) | 2008-02-01 |
| US20070290379A1 (en) | 2007-12-20 |
| KR20090028769A (ko) | 2009-03-19 |
| WO2007146382A3 (en) | 2008-02-07 |
| WO2007146382A2 (en) | 2007-12-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100611 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20100611 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20130208 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130215 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20130802 |