JP2009537993A5 - - Google Patents

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Publication number
JP2009537993A5
JP2009537993A5 JP2009511203A JP2009511203A JP2009537993A5 JP 2009537993 A5 JP2009537993 A5 JP 2009537993A5 JP 2009511203 A JP2009511203 A JP 2009511203A JP 2009511203 A JP2009511203 A JP 2009511203A JP 2009537993 A5 JP2009537993 A5 JP 2009537993A5
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JP
Japan
Prior art keywords
chamber
low frequency
discharge line
gas
degrees celsius
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JP2009511203A
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English (en)
Japanese (ja)
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JP5269770B2 (ja
JP2009537993A (ja
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Priority claimed from US11/435,065 external-priority patent/US20070267143A1/en
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Publication of JP2009537993A5 publication Critical patent/JP2009537993A5/ja
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Publication of JP5269770B2 publication Critical patent/JP5269770B2/ja
Expired - Fee Related legal-status Critical Current
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JP2009511203A 2006-05-16 2007-05-15 Ｃｖｄシステム排出のイン・シトゥー洗浄 Expired - Fee Related JP5269770B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/435,065 2006-05-16
US11/435,065 US20070267143A1 (en) 2006-05-16 2006-05-16 In situ cleaning of CVD system exhaust
PCT/US2007/068948 WO2007137035A2 (en) 2006-05-16 2007-05-15 In situ cleaning of cvd system exhaust

Publications (3)

Publication Number Publication Date
JP2009537993A JP2009537993A (ja) 2009-10-29
JP2009537993A5 true JP2009537993A5 (https=) 2010-05-20
JP5269770B2 JP5269770B2 (ja) 2013-08-21

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ID=38659696

Family Applications (1)

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JP2009511203A Expired - Fee Related JP5269770B2 (ja) 2006-05-16 2007-05-15 Ｃｖｄシステム排出のイン・シトゥー洗浄

Country Status (7)

Country Link
US (2) US20070267143A1 (https=)
JP (1) JP5269770B2 (https=)
KR (1) KR101046969B1 (https=)
CN (1) CN101535525B (https=)
DE (1) DE112007001223T5 (https=)
TW (1) TWI388689B (https=)
WO (1) WO2007137035A2 (https=)

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KR101855217B1 (ko) 2010-12-30 2018-05-08 비코 인스트루먼츠 인코포레이티드 캐리어 연장부를 이용한 웨이퍼 처리
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JP5605464B2 (ja) * 2013-06-25 2014-10-15 東京エレクトロン株式会社 成膜装置及びそのクリーニング方法
US11414759B2 (en) 2013-11-29 2022-08-16 Taiwan Semiconductor Manufacturing Co., Ltd Mechanisms for supplying process gas into wafer process apparatus
CN103938177B (zh) * 2014-05-07 2015-12-30 南昌黄绿照明有限公司 可用氯气在线清洗的非钎焊mocvd喷头
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CN111069192A (zh) * 2018-10-22 2020-04-28 北京北方华创微电子装备有限公司 原位清洗装置和半导体处理设备
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KR102368157B1 (ko) 2020-02-03 2022-03-02 주식회사 제이엔케이 화학기상증착 장치
KR20250155606A (ko) 2023-03-14 2025-10-30 어플라이드 머티어리얼스, 인코포레이티드 개선된 프로세스 챔버 세정

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