JP2009528668A5 - - Google Patents

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Publication number
JP2009528668A5
JP2009528668A5 JP2008557443A JP2008557443A JP2009528668A5 JP 2009528668 A5 JP2009528668 A5 JP 2009528668A5 JP 2008557443 A JP2008557443 A JP 2008557443A JP 2008557443 A JP2008557443 A JP 2008557443A JP 2009528668 A5 JP2009528668 A5 JP 2009528668A5
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JP
Japan
Prior art keywords
magnetic deflector
diffraction pattern
electron
aberration correction
electron diffraction
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JP2008557443A
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English (en)
Japanese (ja)
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JP2009528668A (ja
JP5147734B2 (ja
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Priority claimed from US11/364,299 external-priority patent/US7348566B2/en
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Publication of JP2009528668A5 publication Critical patent/JP2009528668A5/ja
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Publication of JP5147734B2 publication Critical patent/JP5147734B2/ja
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JP2008557443A 2006-02-28 2007-02-14 収差補正カソード・レンズ顕微鏡機器 Active JP5147734B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/364,299 2006-02-28
US11/364,299 US7348566B2 (en) 2006-02-28 2006-02-28 Aberration-correcting cathode lens microscopy instrument
PCT/US2007/062101 WO2007100978A2 (en) 2006-02-28 2007-02-14 Aberration-correcting cathode lens microscopy instrument

Publications (3)

Publication Number Publication Date
JP2009528668A JP2009528668A (ja) 2009-08-06
JP2009528668A5 true JP2009528668A5 (enExample) 2012-08-16
JP5147734B2 JP5147734B2 (ja) 2013-02-20

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JP2008557443A Active JP5147734B2 (ja) 2006-02-28 2007-02-14 収差補正カソード・レンズ顕微鏡機器

Country Status (9)

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US (1) US7348566B2 (enExample)
EP (1) EP1994544B1 (enExample)
JP (1) JP5147734B2 (enExample)
CN (1) CN101390186B (enExample)
AT (1) ATE472822T1 (enExample)
CA (1) CA2636239C (enExample)
DE (1) DE602007007446D1 (enExample)
IL (1) IL193703A (enExample)
WO (1) WO2007100978A2 (enExample)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7348566B2 (en) 2006-02-28 2008-03-25 International Business Machines Corporation Aberration-correcting cathode lens microscopy instrument
RU2362234C1 (ru) 2007-10-03 2009-07-20 Вячеслав Данилович Саченко Корпускулярно-оптическая система формирования изображения (варианты)
JP5250350B2 (ja) * 2008-09-12 2013-07-31 株式会社日立ハイテクノロジーズ 荷電粒子線応用装置
DE102009044989A1 (de) * 2009-09-24 2011-03-31 Funnemann, Dietmar, Dr. Bildgebender Energiefilter für elektrisch geladene Teilchen sowie Spektroskop mit einem solchen
EP2385542B1 (en) * 2010-05-07 2013-01-02 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Electron beam device with dispersion compensation, and method of operating same
US9355818B2 (en) * 2010-05-28 2016-05-31 Kla-Tencor Corporation Reflection electron beam projection lithography using an ExB separator
US9504135B2 (en) * 2010-07-28 2016-11-22 General Electric Company Apparatus and method for magnetic control of an electron beam
CN102479652B (zh) * 2010-11-30 2016-03-16 中国科学院大连化学物理研究所 采用紫外或深紫外激光源的高空间分辨光发射电子显微镜
US8334508B1 (en) * 2011-02-22 2012-12-18 Electron Optica, Inc. Mirror energy filter for electron beam apparatus
WO2013077715A1 (ru) * 2011-11-22 2013-05-30 Bimurzaev Seitkerim Bimurzaevich Корректор аберраций электронных линз
US8586923B1 (en) * 2012-06-21 2013-11-19 International Business Machines Corporation Low-voltage transmission electron microscopy
US8729466B1 (en) * 2013-03-14 2014-05-20 Electron Optica, Inc. Aberration-corrected and energy-filtered low energy electron microscope with monochromatic dual beam illumination
EP2997590B1 (en) 2013-05-15 2018-01-10 Okinawa Institute of Science and Technology School Corporation Leed for sem
US9595417B2 (en) * 2014-12-22 2017-03-14 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH High resolution charged particle beam device and method of operating the same
WO2016132487A1 (ja) 2015-02-18 2016-08-25 株式会社日立製作所 荷電粒子線応用装置、及び、収差補正器
DE102015210893B4 (de) * 2015-06-15 2019-05-09 Carl Zeiss Microscopy Gmbh Analyseeinrichtung zur Analyse der Energie geladener Teilchen und Teilchenstrahlgerät mit einer Analyseeinrichtung
US9472373B1 (en) * 2015-08-17 2016-10-18 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Beam separator device, charged particle beam device and methods of operating thereof
NL2017213B1 (en) * 2016-07-22 2018-01-30 Univ Delft Tech Aberration correcting device for an electron microscope and an electron microscope comprising such a device
US10283315B2 (en) 2017-05-16 2019-05-07 International Business Machines Corporation Measuring spherical and chromatic aberrations in cathode lens electrode microscopes
WO2019100600A1 (en) 2017-11-21 2019-05-31 Focus-Ebeam Technology (Beijing) Co., Ltd. Low voltage scanning electron microscope and method for specimen observation
US10755892B2 (en) 2018-05-23 2020-08-25 Kla-Tencor Corporation Reflection-mode electron-beam inspection using ptychographic imaging
CN112432933B (zh) * 2019-08-26 2021-11-19 北京大学 多激发光源光电子显微镜的超高时空分辨成像系统及方法
CN111194133B (zh) * 2020-01-13 2022-01-11 电子科技大学 一种利用紫外辐射和电子枪产生中性尘埃粒子流的装置
CN114220725B (zh) 2020-12-02 2024-05-07 聚束科技（北京）有限公司 一种电子显微镜
CN114256043B (zh) 2020-12-02 2024-04-05 聚束科技（北京）有限公司 一种电子束系统
US11264229B1 (en) 2020-12-03 2022-03-01 Guennadi Lebedev Time-of-flight mass spectrometer and method for improving mass and spatial resolution of an image
JP7381515B2 (ja) 2021-03-31 2023-11-15 株式会社日立ハイテク 電子線応用装置
JP7635103B2 (ja) 2021-09-06 2025-02-25 株式会社日立ハイテク 電子線応用装置及び検査方法
WO2024188471A1 (en) 2023-03-16 2024-09-19 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e. V. Electron microscopy apparatus and method for a time resolved low energy electron microscopy investigation of a sample
CN118776445B (zh) * 2023-04-07 2025-11-18 中国科学院大连化学物理研究所 自由电子激光中电子束与种子光到达时间抖动测量方法

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Publication number Priority date Publication date Assignee Title
DE4129403A1 (de) * 1991-09-04 1993-03-11 Zeiss Carl Fa Abbildungssystem fuer strahlung geladener teilchen mit spiegelkorrektor
EP0538938B1 (en) * 1991-10-24 1996-08-28 Koninklijke Philips Electronics N.V. Electron beam apparatus
JPH11273610A (ja) * 1998-03-23 1999-10-08 Jeol Ltd 高加速電圧反射電子顕微鏡
JP2001319612A (ja) * 2000-05-10 2001-11-16 Jeol Ltd 直接写像型電子顕微鏡
DE10107910A1 (de) * 2001-02-20 2002-08-22 Leo Elektronenmikroskopie Gmbh Teilchenstrahlsystem mit einem Spiegelkorrektor
US6878937B1 (en) * 2004-02-10 2005-04-12 Kla-Tencor Technologies Corporation Prism array for electron beam inspection and defect review
US7348566B2 (en) 2006-02-28 2008-03-25 International Business Machines Corporation Aberration-correcting cathode lens microscopy instrument

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