ATE472822T1 - Instrument zur aberrationskorrektur für ein kathodenlinsenmikroskop - Google Patents
Instrument zur aberrationskorrektur für ein kathodenlinsenmikroskopInfo
- Publication number
- ATE472822T1 ATE472822T1 AT07756958T AT07756958T ATE472822T1 AT E472822 T1 ATE472822 T1 AT E472822T1 AT 07756958 T AT07756958 T AT 07756958T AT 07756958 T AT07756958 T AT 07756958T AT E472822 T1 ATE472822 T1 AT E472822T1
- Authority
- AT
- Austria
- Prior art keywords
- magnetic deflector
- diffraction pattern
- electron diffraction
- instrument
- disposed
- Prior art date
Links
- 230000004075 alteration Effects 0.000 title abstract 2
- 238000002524 electron diffraction data Methods 0.000 abstract 7
- 238000000386 microscopy Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/295—Electron or ion diffraction tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/05—Arrangements for energy or mass analysis
- H01J2237/055—Arrangements for energy or mass analysis magnetic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/153—Correcting image defects, e.g. stigmators
- H01J2237/1534—Aberrations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/25—Tubes for localised analysis using electron or ion beams
- H01J2237/2505—Tubes for localised analysis using electron or ion beams characterised by their application
- H01J2237/2538—Low energy electron microscopy [LEEM]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/25—Tubes for localised analysis using electron or ion beams
- H01J2237/2505—Tubes for localised analysis using electron or ion beams characterised by their application
- H01J2237/2538—Low energy electron microscopy [LEEM]
- H01J2237/2544—Diffraction [LEED]
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Electron Tubes For Measurement (AREA)
- Lenses (AREA)
- Electron Sources, Ion Sources (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/364,299 US7348566B2 (en) | 2006-02-28 | 2006-02-28 | Aberration-correcting cathode lens microscopy instrument |
| PCT/US2007/062101 WO2007100978A2 (en) | 2006-02-28 | 2007-02-14 | Aberration-correcting cathode lens microscopy instrument |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE472822T1 true ATE472822T1 (de) | 2010-07-15 |
Family
ID=38290996
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT07756958T ATE472822T1 (de) | 2006-02-28 | 2007-02-14 | Instrument zur aberrationskorrektur für ein kathodenlinsenmikroskop |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US7348566B2 (enExample) |
| EP (1) | EP1994544B1 (enExample) |
| JP (1) | JP5147734B2 (enExample) |
| CN (1) | CN101390186B (enExample) |
| AT (1) | ATE472822T1 (enExample) |
| CA (1) | CA2636239C (enExample) |
| DE (1) | DE602007007446D1 (enExample) |
| IL (1) | IL193703A (enExample) |
| WO (1) | WO2007100978A2 (enExample) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7348566B2 (en) | 2006-02-28 | 2008-03-25 | International Business Machines Corporation | Aberration-correcting cathode lens microscopy instrument |
| RU2362234C1 (ru) | 2007-10-03 | 2009-07-20 | Вячеслав Данилович Саченко | Корпускулярно-оптическая система формирования изображения (варианты) |
| JP5250350B2 (ja) * | 2008-09-12 | 2013-07-31 | 株式会社日立ハイテクノロジーズ | 荷電粒子線応用装置 |
| DE102009044989A1 (de) * | 2009-09-24 | 2011-03-31 | Funnemann, Dietmar, Dr. | Bildgebender Energiefilter für elektrisch geladene Teilchen sowie Spektroskop mit einem solchen |
| EP2385542B1 (en) * | 2010-05-07 | 2013-01-02 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Electron beam device with dispersion compensation, and method of operating same |
| US9355818B2 (en) * | 2010-05-28 | 2016-05-31 | Kla-Tencor Corporation | Reflection electron beam projection lithography using an ExB separator |
| US9504135B2 (en) * | 2010-07-28 | 2016-11-22 | General Electric Company | Apparatus and method for magnetic control of an electron beam |
| CN102479652B (zh) * | 2010-11-30 | 2016-03-16 | 中国科学院大连化学物理研究所 | 采用紫外或深紫外激光源的高空间分辨光发射电子显微镜 |
| US8334508B1 (en) * | 2011-02-22 | 2012-12-18 | Electron Optica, Inc. | Mirror energy filter for electron beam apparatus |
| WO2013077715A1 (ru) * | 2011-11-22 | 2013-05-30 | Bimurzaev Seitkerim Bimurzaevich | Корректор аберраций электронных линз |
| US8586923B1 (en) * | 2012-06-21 | 2013-11-19 | International Business Machines Corporation | Low-voltage transmission electron microscopy |
| US8729466B1 (en) * | 2013-03-14 | 2014-05-20 | Electron Optica, Inc. | Aberration-corrected and energy-filtered low energy electron microscope with monochromatic dual beam illumination |
| EP2997590B1 (en) | 2013-05-15 | 2018-01-10 | Okinawa Institute of Science and Technology School Corporation | Leed for sem |
| US9595417B2 (en) * | 2014-12-22 | 2017-03-14 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | High resolution charged particle beam device and method of operating the same |
| JP6339734B2 (ja) | 2015-02-18 | 2018-06-06 | 株式会社日立製作所 | 荷電粒子線応用装置、及び、収差補正器 |
| DE102015210893B4 (de) * | 2015-06-15 | 2019-05-09 | Carl Zeiss Microscopy Gmbh | Analyseeinrichtung zur Analyse der Energie geladener Teilchen und Teilchenstrahlgerät mit einer Analyseeinrichtung |
| US9472373B1 (en) * | 2015-08-17 | 2016-10-18 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Beam separator device, charged particle beam device and methods of operating thereof |
| NL2017213B1 (en) | 2016-07-22 | 2018-01-30 | Univ Delft Tech | Aberration correcting device for an electron microscope and an electron microscope comprising such a device |
| US10283315B2 (en) * | 2017-05-16 | 2019-05-07 | International Business Machines Corporation | Measuring spherical and chromatic aberrations in cathode lens electrode microscopes |
| US10777382B2 (en) | 2017-11-21 | 2020-09-15 | Focus-Ebeam Technology (Beijing) Co., Ltd. | Low voltage scanning electron microscope and method for specimen observation |
| US10755892B2 (en) | 2018-05-23 | 2020-08-25 | Kla-Tencor Corporation | Reflection-mode electron-beam inspection using ptychographic imaging |
| CN112432933B (zh) * | 2019-08-26 | 2021-11-19 | 北京大学 | 多激发光源光电子显微镜的超高时空分辨成像系统及方法 |
| CN111194133B (zh) * | 2020-01-13 | 2022-01-11 | 电子科技大学 | 一种利用紫外辐射和电子枪产生中性尘埃粒子流的装置 |
| CN114256043B (zh) | 2020-12-02 | 2024-04-05 | 聚束科技（北京）有限公司 | 一种电子束系统 |
| CN114220725B (zh) | 2020-12-02 | 2024-05-07 | 聚束科技（北京）有限公司 | 一种电子显微镜 |
| US11264229B1 (en) | 2020-12-03 | 2022-03-01 | Guennadi Lebedev | Time-of-flight mass spectrometer and method for improving mass and spatial resolution of an image |
| JP7381515B2 (ja) * | 2021-03-31 | 2023-11-15 | 株式会社日立ハイテク | 電子線応用装置 |
| JP7635103B2 (ja) | 2021-09-06 | 2025-02-25 | 株式会社日立ハイテク | 電子線応用装置及び検査方法 |
| EP4681241A1 (en) | 2023-03-16 | 2026-01-21 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. | Electron microscopy apparatus and method for a time resolved low energy electron microscopy investigation of a sample |
| CN118776445B (zh) * | 2023-04-07 | 2025-11-18 | 中国科学院大连化学物理研究所 | 自由电子激光中电子束与种子光到达时间抖动测量方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4129403A1 (de) * | 1991-09-04 | 1993-03-11 | Zeiss Carl Fa | Abbildungssystem fuer strahlung geladener teilchen mit spiegelkorrektor |
| EP0538938B1 (en) * | 1991-10-24 | 1996-08-28 | Koninklijke Philips Electronics N.V. | Electron beam apparatus |
| JPH11273610A (ja) * | 1998-03-23 | 1999-10-08 | Jeol Ltd | 高加速電圧反射電子顕微鏡 |
| JP2001319612A (ja) * | 2000-05-10 | 2001-11-16 | Jeol Ltd | 直接写像型電子顕微鏡 |
| DE10107910A1 (de) * | 2001-02-20 | 2002-08-22 | Leo Elektronenmikroskopie Gmbh | Teilchenstrahlsystem mit einem Spiegelkorrektor |
| US6878937B1 (en) * | 2004-02-10 | 2005-04-12 | Kla-Tencor Technologies Corporation | Prism array for electron beam inspection and defect review |
| US7348566B2 (en) | 2006-02-28 | 2008-03-25 | International Business Machines Corporation | Aberration-correcting cathode lens microscopy instrument |
-
2006
- 2006-02-28 US US11/364,299 patent/US7348566B2/en active Active
-
2007
- 2007-02-14 EP EP07756958A patent/EP1994544B1/en active Active
- 2007-02-14 WO PCT/US2007/062101 patent/WO2007100978A2/en not_active Ceased
- 2007-02-14 DE DE602007007446T patent/DE602007007446D1/de active Active
- 2007-02-14 CN CN2007800068799A patent/CN101390186B/zh not_active Expired - Fee Related
- 2007-02-14 JP JP2008557443A patent/JP5147734B2/ja active Active
- 2007-02-14 CA CA2636239A patent/CA2636239C/en active Active
- 2007-02-14 AT AT07756958T patent/ATE472822T1/de not_active IP Right Cessation
-
2008
- 2008-08-26 IL IL193703A patent/IL193703A/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| EP1994544A2 (en) | 2008-11-26 |
| JP5147734B2 (ja) | 2013-02-20 |
| CN101390186A (zh) | 2009-03-18 |
| WO2007100978A2 (en) | 2007-09-07 |
| US7348566B2 (en) | 2008-03-25 |
| IL193703A0 (en) | 2009-05-04 |
| CN101390186B (zh) | 2011-02-16 |
| CA2636239A1 (en) | 2007-07-09 |
| JP2009528668A (ja) | 2009-08-06 |
| WO2007100978A3 (en) | 2007-10-18 |
| US20070200070A1 (en) | 2007-08-30 |
| EP1994544B1 (en) | 2010-06-30 |
| DE602007007446D1 (de) | 2010-08-12 |
| IL193703A (en) | 2011-11-30 |
| CA2636239C (en) | 2015-10-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |