CN101390186B - 像差校正阴极透镜显微镜仪器 - Google Patents

像差校正阴极透镜显微镜仪器 Download PDF

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Publication number
CN101390186B
CN101390186B CN2007800068799A CN200780006879A CN101390186B CN 101390186 B CN101390186 B CN 101390186B CN 2007800068799 A CN2007800068799 A CN 2007800068799A CN 200780006879 A CN200780006879 A CN 200780006879A CN 101390186 B CN101390186 B CN 101390186B
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CN
China
Prior art keywords
magnetic deflector
diffraction pattern
aberration
electron diffraction
electron
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Expired - Fee Related
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CN2007800068799A
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English (en)
Chinese (zh)
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CN101390186A (zh
Inventor
R·M·特罗普
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International Business Machines Corp
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International Business Machines Corp
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Publication of CN101390186A publication Critical patent/CN101390186A/zh
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/295—Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/05—Arrangements for energy or mass analysis
    • H01J2237/055—Arrangements for energy or mass analysis magnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/25—Tubes for localised analysis using electron or ion beams
    • H01J2237/2505—Tubes for localised analysis using electron or ion beams characterised by their application
    • H01J2237/2538—Low energy electron microscopy [LEEM]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/25—Tubes for localised analysis using electron or ion beams
    • H01J2237/2505—Tubes for localised analysis using electron or ion beams characterised by their application
    • H01J2237/2538—Low energy electron microscopy [LEEM]
    • H01J2237/2544—Diffraction [LEED]

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Tubes For Measurement (AREA)
  • Lenses (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
CN2007800068799A 2006-02-28 2007-02-14 像差校正阴极透镜显微镜仪器 Expired - Fee Related CN101390186B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/364,299 2006-02-28
US11/364,299 US7348566B2 (en) 2006-02-28 2006-02-28 Aberration-correcting cathode lens microscopy instrument
PCT/US2007/062101 WO2007100978A2 (en) 2006-02-28 2007-02-14 Aberration-correcting cathode lens microscopy instrument

Publications (2)

Publication Number Publication Date
CN101390186A CN101390186A (zh) 2009-03-18
CN101390186B true CN101390186B (zh) 2011-02-16

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Family Applications (1)

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CN2007800068799A Expired - Fee Related CN101390186B (zh) 2006-02-28 2007-02-14 像差校正阴极透镜显微镜仪器

Country Status (9)

Country Link
US (1) US7348566B2 (enExample)
EP (1) EP1994544B1 (enExample)
JP (1) JP5147734B2 (enExample)
CN (1) CN101390186B (enExample)
AT (1) ATE472822T1 (enExample)
CA (1) CA2636239C (enExample)
DE (1) DE602007007446D1 (enExample)
IL (1) IL193703A (enExample)
WO (1) WO2007100978A2 (enExample)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7348566B2 (en) 2006-02-28 2008-03-25 International Business Machines Corporation Aberration-correcting cathode lens microscopy instrument
RU2362234C1 (ru) 2007-10-03 2009-07-20 Вячеслав Данилович Саченко Корпускулярно-оптическая система формирования изображения (варианты)
JP5250350B2 (ja) * 2008-09-12 2013-07-31 株式会社日立ハイテクノロジーズ 荷電粒子線応用装置
DE102009044989A1 (de) * 2009-09-24 2011-03-31 Funnemann, Dietmar, Dr. Bildgebender Energiefilter für elektrisch geladene Teilchen sowie Spektroskop mit einem solchen
EP2385542B1 (en) * 2010-05-07 2013-01-02 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Electron beam device with dispersion compensation, and method of operating same
US9355818B2 (en) * 2010-05-28 2016-05-31 Kla-Tencor Corporation Reflection electron beam projection lithography using an ExB separator
US9504135B2 (en) * 2010-07-28 2016-11-22 General Electric Company Apparatus and method for magnetic control of an electron beam
CN102479652B (zh) * 2010-11-30 2016-03-16 中国科学院大连化学物理研究所 采用紫外或深紫外激光源的高空间分辨光发射电子显微镜
US8334508B1 (en) * 2011-02-22 2012-12-18 Electron Optica, Inc. Mirror energy filter for electron beam apparatus
WO2013077715A1 (ru) * 2011-11-22 2013-05-30 Bimurzaev Seitkerim Bimurzaevich Корректор аберраций электронных линз
US8586923B1 (en) * 2012-06-21 2013-11-19 International Business Machines Corporation Low-voltage transmission electron microscopy
US8729466B1 (en) * 2013-03-14 2014-05-20 Electron Optica, Inc. Aberration-corrected and energy-filtered low energy electron microscope with monochromatic dual beam illumination
EP2997590B1 (en) 2013-05-15 2018-01-10 Okinawa Institute of Science and Technology School Corporation Leed for sem
US9595417B2 (en) * 2014-12-22 2017-03-14 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH High resolution charged particle beam device and method of operating the same
WO2016132487A1 (ja) 2015-02-18 2016-08-25 株式会社日立製作所 荷電粒子線応用装置、及び、収差補正器
DE102015210893B4 (de) * 2015-06-15 2019-05-09 Carl Zeiss Microscopy Gmbh Analyseeinrichtung zur Analyse der Energie geladener Teilchen und Teilchenstrahlgerät mit einer Analyseeinrichtung
US9472373B1 (en) * 2015-08-17 2016-10-18 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Beam separator device, charged particle beam device and methods of operating thereof
NL2017213B1 (en) * 2016-07-22 2018-01-30 Univ Delft Tech Aberration correcting device for an electron microscope and an electron microscope comprising such a device
US10283315B2 (en) 2017-05-16 2019-05-07 International Business Machines Corporation Measuring spherical and chromatic aberrations in cathode lens electrode microscopes
WO2019100600A1 (en) 2017-11-21 2019-05-31 Focus-Ebeam Technology (Beijing) Co., Ltd. Low voltage scanning electron microscope and method for specimen observation
US10755892B2 (en) 2018-05-23 2020-08-25 Kla-Tencor Corporation Reflection-mode electron-beam inspection using ptychographic imaging
CN112432933B (zh) * 2019-08-26 2021-11-19 北京大学 多激发光源光电子显微镜的超高时空分辨成像系统及方法
CN111194133B (zh) * 2020-01-13 2022-01-11 电子科技大学 一种利用紫外辐射和电子枪产生中性尘埃粒子流的装置
CN114220725B (zh) 2020-12-02 2024-05-07 聚束科技（北京）有限公司 一种电子显微镜
CN114256043B (zh) 2020-12-02 2024-04-05 聚束科技（北京）有限公司 一种电子束系统
US11264229B1 (en) 2020-12-03 2022-03-01 Guennadi Lebedev Time-of-flight mass spectrometer and method for improving mass and spatial resolution of an image
JP7381515B2 (ja) 2021-03-31 2023-11-15 株式会社日立ハイテク 電子線応用装置
JP7635103B2 (ja) 2021-09-06 2025-02-25 株式会社日立ハイテク 電子線応用装置及び検査方法
WO2024188471A1 (en) 2023-03-16 2024-09-19 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e. V. Electron microscopy apparatus and method for a time resolved low energy electron microscopy investigation of a sample
CN118776445B (zh) * 2023-04-07 2025-11-18 中国科学院大连化学物理研究所 自由电子激光中电子束与种子光到达时间抖动测量方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4129403A1 (de) * 1991-09-04 1993-03-11 Zeiss Carl Fa Abbildungssystem fuer strahlung geladener teilchen mit spiegelkorrektor
EP0538938B1 (en) * 1991-10-24 1996-08-28 Koninklijke Philips Electronics N.V. Electron beam apparatus
JPH11273610A (ja) * 1998-03-23 1999-10-08 Jeol Ltd 高加速電圧反射電子顕微鏡
JP2001319612A (ja) * 2000-05-10 2001-11-16 Jeol Ltd 直接写像型電子顕微鏡
DE10107910A1 (de) * 2001-02-20 2002-08-22 Leo Elektronenmikroskopie Gmbh Teilchenstrahlsystem mit einem Spiegelkorrektor
US6878937B1 (en) * 2004-02-10 2005-04-12 Kla-Tencor Technologies Corporation Prism array for electron beam inspection and defect review
US7348566B2 (en) 2006-02-28 2008-03-25 International Business Machines Corporation Aberration-correcting cathode lens microscopy instrument

Also Published As

Publication number Publication date
DE602007007446D1 (de) 2010-08-12
WO2007100978A3 (en) 2007-10-18
EP1994544B1 (en) 2010-06-30
CN101390186A (zh) 2009-03-18
JP2009528668A (ja) 2009-08-06
JP5147734B2 (ja) 2013-02-20
IL193703A (en) 2011-11-30
EP1994544A2 (en) 2008-11-26
ATE472822T1 (de) 2010-07-15
CA2636239C (en) 2015-10-06
CA2636239A1 (en) 2007-07-09
IL193703A0 (en) 2009-05-04
US7348566B2 (en) 2008-03-25
WO2007100978A2 (en) 2007-09-07
US20070200070A1 (en) 2007-08-30

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Granted publication date: 20110216