JP2009527921A5 - - Google Patents

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Publication number
JP2009527921A5
JP2009527921A5 JP2008556370A JP2008556370A JP2009527921A5 JP 2009527921 A5 JP2009527921 A5 JP 2009527921A5 JP 2008556370 A JP2008556370 A JP 2008556370A JP 2008556370 A JP2008556370 A JP 2008556370A JP 2009527921 A5 JP2009527921 A5 JP 2009527921A5
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JP
Japan
Prior art keywords
gas
substrate
adjustment
edge
substrate support
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JP2008556370A
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English (en)
Japanese (ja)
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JP2009527921A (ja
JP5457037B2 (ja
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Priority claimed from US11/359,300 external-priority patent/US8097120B2/en
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Publication of JP2009527921A5 publication Critical patent/JP2009527921A5/ja
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JP2008556370A 2006-02-21 2007-02-16 基板縁部への不活性ガスの注入 Active JP5457037B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/359,300 US8097120B2 (en) 2006-02-21 2006-02-21 Process tuning gas injection from the substrate edge
US11/359,300 2006-02-21
PCT/US2007/004225 WO2007098071A2 (en) 2006-02-21 2007-02-16 Process tuning gas injection from the substrate edge

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2013118462A Division JP2013211586A (ja) 2006-02-21 2013-06-05 基板縁部からの処理調整ガスの注入

Publications (3)

Publication Number Publication Date
JP2009527921A JP2009527921A (ja) 2009-07-30
JP2009527921A5 true JP2009527921A5 (https=) 2010-04-02
JP5457037B2 JP5457037B2 (ja) 2014-04-02

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ID=38426959

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2008556370A Active JP5457037B2 (ja) 2006-02-21 2007-02-16 基板縁部への不活性ガスの注入
JP2013118462A Pending JP2013211586A (ja) 2006-02-21 2013-06-05 基板縁部からの処理調整ガスの注入

Family Applications After (1)

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JP2013118462A Pending JP2013211586A (ja) 2006-02-21 2013-06-05 基板縁部からの処理調整ガスの注入

Country Status (7)

Country Link
US (1) US8097120B2 (https=)
JP (2) JP5457037B2 (https=)
KR (1) KR101336446B1 (https=)
CN (1) CN101389788A (https=)
SG (1) SG170007A1 (https=)
TW (1) TWI364791B (https=)
WO (1) WO2007098071A2 (https=)

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