JP2009521342A5 - - Google Patents
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- JP2009521342A5 JP2009521342A5 JP2008547350A JP2008547350A JP2009521342A5 JP 2009521342 A5 JP2009521342 A5 JP 2009521342A5 JP 2008547350 A JP2008547350 A JP 2008547350A JP 2008547350 A JP2008547350 A JP 2008547350A JP 2009521342 A5 JP2009521342 A5 JP 2009521342A5
- Authority
- JP
- Japan
- Prior art keywords
- composition
- microlens
- light
- exposed
- mixtures
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 claims description 29
- 238000006243 chemical reaction Methods 0.000 claims description 6
- 239000002253 acid Substances 0.000 claims description 4
- 238000010521 absorption reaction Methods 0.000 claims description 3
- -1 alkylaryl borates Chemical class 0.000 claims description 3
- 238000003384 imaging method Methods 0.000 claims description 3
- 230000001939 inductive effect Effects 0.000 claims description 2
- 239000003504 photosensitizing agent Substances 0.000 claims description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims 1
- GNBHRKFJIUUOQI-UHFFFAOYSA-N fluorescein Chemical compound O1C(=O)C2=CC=CC=C2C21C1=CC=C(O)C=C1OC1=CC(O)=CC=C21 GNBHRKFJIUUOQI-UHFFFAOYSA-N 0.000 claims 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 claims 1
- 238000000034 method Methods 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000001493 electron microscopy Methods 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000399 optical microscopy Methods 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/313,482 US7583444B1 (en) | 2005-12-21 | 2005-12-21 | Process for making microlens arrays and masterforms |
| US11/313,482 | 2005-12-21 | ||
| PCT/US2006/047895 WO2007075406A1 (en) | 2005-12-21 | 2006-12-15 | Process for making microlens arrays and masterforms |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009521342A JP2009521342A (ja) | 2009-06-04 |
| JP2009521342A5 true JP2009521342A5 (enExample) | 2012-07-05 |
| JP5221375B2 JP5221375B2 (ja) | 2013-06-26 |
Family
ID=38218310
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008547350A Expired - Fee Related JP5221375B2 (ja) | 2005-12-21 | 2006-12-15 | マイクロレンズアレイ及び原型を作製する方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US7583444B1 (enExample) |
| EP (1) | EP1963892A4 (enExample) |
| JP (1) | JP5221375B2 (enExample) |
| CN (1) | CN101346644B (enExample) |
| WO (1) | WO2007075406A1 (enExample) |
Families Citing this family (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7583444B1 (en) * | 2005-12-21 | 2009-09-01 | 3M Innovative Properties Company | Process for making microlens arrays and masterforms |
| JP4880701B2 (ja) | 2005-12-21 | 2012-02-22 | スリーエム イノベイティブ プロパティズ カンパニー | 多光子硬化反応性組成物を処理するための方法及び装置 |
| CN101448632B (zh) * | 2006-05-18 | 2012-12-12 | 3M创新有限公司 | 用于制备具有提取结构的光导的方法以及由此方法生产的光导 |
| JP5040493B2 (ja) * | 2006-12-04 | 2012-10-03 | ソニー株式会社 | 撮像装置及び撮像方法 |
| WO2009032815A1 (en) * | 2007-09-06 | 2009-03-12 | 3M Innovative Properties Company | Tool for making microstructured articles |
| EP2197645B1 (en) * | 2007-09-06 | 2014-10-22 | 3M Innovative Properties Company | Methods of forming molds and methods of forming articles using said molds |
| JP5951928B2 (ja) | 2007-09-06 | 2016-07-13 | スリーエム イノベイティブ プロパティズ カンパニー | 光出力の領域制御を提供する光抽出構造体を有する光ガイド |
| US8451457B2 (en) | 2007-10-11 | 2013-05-28 | 3M Innovative Properties Company | Chromatic confocal sensor |
| CN101878438B (zh) | 2007-11-27 | 2013-09-25 | 3M创新有限公司 | 形成具有悬浮合成图像的片材以及母模具的方法 |
| JP5524856B2 (ja) | 2007-12-12 | 2014-06-18 | スリーエム イノベイティブ プロパティズ カンパニー | エッジ明瞭性が向上した構造の製造方法 |
| EP2257854B1 (en) * | 2008-02-26 | 2018-10-31 | 3M Innovative Properties Company | Multi-photon exposure system |
| US7968042B2 (en) | 2008-04-16 | 2011-06-28 | Aptina Imaging Corporation | Method and apparatus for step-and-repeat molding |
| DE102009019762B4 (de) * | 2009-05-05 | 2020-03-12 | 3D Global Holding Gmbh | Verfahren zum Herstellen von Gegenständen mit einer definiert strukturierten Oberfläche |
| PL2459867T3 (pl) | 2009-07-30 | 2014-08-29 | 3M Innovative Properties Co | Dysza i sposób jej wytwarzania |
| KR20120081856A (ko) * | 2011-01-12 | 2012-07-20 | 삼성전기주식회사 | 렌즈 제조 방법 및 렌즈 |
| CN106671317A (zh) | 2011-02-02 | 2017-05-17 | 3M创新有限公司 | 喷嘴及其制备方法 |
| JP2015512061A (ja) * | 2012-02-28 | 2015-04-23 | スリーエム イノベイティブ プロパティズ カンパニー | 陰性造影組成物を用いた多光子硬化方法 |
| EP2935861A1 (en) | 2012-12-21 | 2015-10-28 | 3M Innovative Properties Company | Method of making a nozzle including injection molding |
| EP3077421B1 (en) | 2013-12-06 | 2018-01-31 | 3M Innovative Properties Company | Liquid photoreactive composition and method of fabricating structures |
| JP5999121B2 (ja) * | 2014-02-17 | 2016-09-28 | 横河電機株式会社 | 共焦点光スキャナ |
| US9240428B1 (en) * | 2014-07-09 | 2016-01-19 | Visera Technologies Company Limited | Image sensor and manufacturing method thereof |
| JP6747769B2 (ja) | 2014-12-15 | 2020-08-26 | デクセリアルズ株式会社 | 光学素子、表示装置、原盤、及び光学素子の製造方法 |
| US10663745B2 (en) | 2016-06-09 | 2020-05-26 | 3M Innovative Properties Company | Optical system |
| JP6688807B2 (ja) | 2016-06-09 | 2020-04-28 | スリーエム イノベイティブ プロパティズ カンパニー | 光学系 |
| CN109313287B (zh) | 2016-06-09 | 2021-07-09 | 3M创新有限公司 | 显示系统和光导 |
| US11186110B2 (en) | 2016-08-31 | 2021-11-30 | Viavi Solutions Inc. | Article with angled reflective segments |
| CN110121574A (zh) | 2016-12-23 | 2019-08-13 | 3M创新有限公司 | 在结构化表面上制作喷嘴结构 |
| CN110100047B (zh) | 2016-12-23 | 2022-04-01 | 3M创新有限公司 | 电铸微结构制品的方法 |
| WO2019133585A1 (en) | 2017-12-26 | 2019-07-04 | 3M Innovative Properties Company | Fuel injector nozzle structure with choked through-hole outlet opening |
| EP3537216B1 (en) * | 2018-03-09 | 2021-09-15 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. | Method for producing an xuv and x-ray diffractive optic |
| JP7471801B2 (ja) | 2019-11-15 | 2024-04-22 | キヤノン株式会社 | 樹脂成形品、樹脂成形品の製造方法、樹脂成形品を備えた機器、樹脂成形用の金型、および金型の製造方法 |
| CN111025528A (zh) * | 2019-11-29 | 2020-04-17 | 华为机器有限公司 | 一种成像系统、摄像模组及移动终端 |
| JP7395410B2 (ja) * | 2020-04-06 | 2023-12-11 | 株式会社Ｓｃｒｅｅｎホールディングス | 光学装置および３次元造形装置 |
| CN113232341A (zh) * | 2021-02-02 | 2021-08-10 | 杭州电子科技大学 | 一种高精度透镜成型方法和装置 |
| CN114420803A (zh) * | 2022-01-19 | 2022-04-29 | 深圳市思坦科技有限公司 | 一种Micro-LED显示模组的制备方法、显示模组及显示装置 |
| CN115291305A (zh) * | 2022-07-20 | 2022-11-04 | 湖北宜美特全息科技有限公司 | 一种大幅面离轴裸眼3d显示光学薄膜及其制备方法 |
| GB2637697A (en) * | 2024-01-30 | 2025-08-06 | Siemens Mobility Ltd | Rail vehicle integrity proving device and method |
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2005
- 2005-12-21 US US11/313,482 patent/US7583444B1/en not_active Expired - Fee Related
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2006
- 2006-12-15 EP EP06845527A patent/EP1963892A4/en not_active Withdrawn
- 2006-12-15 CN CN2006800485631A patent/CN101346644B/zh not_active Expired - Fee Related
- 2006-12-15 JP JP2008547350A patent/JP5221375B2/ja not_active Expired - Fee Related
- 2006-12-15 WO PCT/US2006/047895 patent/WO2007075406A1/en not_active Ceased
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2009
- 2009-07-27 US US12/509,904 patent/US8004767B2/en not_active Expired - Fee Related
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