JP2009518167A - ナノサイズ材料の製造 - Google Patents

ナノサイズ材料の製造 Download PDF

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JP2009518167A
JP2009518167A JP2008543663A JP2008543663A JP2009518167A JP 2009518167 A JP2009518167 A JP 2009518167A JP 2008543663 A JP2008543663 A JP 2008543663A JP 2008543663 A JP2008543663 A JP 2008543663A JP 2009518167 A JP2009518167 A JP 2009518167A
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fluid
range
mixing zone
temperature
mixing
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JP2009518167A5 (https=
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ブルメルステット イベルセン,ステーン
イェンセン,ヘンリク
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エスセーエフ テクノロジーズ アクティーゼルスカブ
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J13/00Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J13/00Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
    • B01J13/02Making microcapsules or microballoons
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G1/00Methods of preparing compounds of metals not covered by subclasses C01B, C01C, C01D, or C01F, in general
    • C01G1/02Oxides
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00Compounds of titanium
    • C01G23/04Oxides; Hydroxides
    • C01G23/047Titanium dioxide
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00Compounds of titanium
    • C01G23/04Oxides; Hydroxides
    • C01G23/047Titanium dioxide
    • C01G23/053Producing by wet processes, e.g. hydrolysing titanium salts
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G25/00Compounds of zirconium
    • C01G25/006Compounds containing zirconium, with or without oxygen or hydrogen, and containing two or more other elements
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G25/00Compounds of zirconium
    • C01G25/02Oxides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208Oxides, e.g. ceramics
    • C23C18/1216Metal oxides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125Process of deposition of the inorganic material
    • C23C18/1254Sol or sol-gel processing
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125Process of deposition of the inorganic material
    • C23C18/1262Process of deposition of the inorganic material involving particles, e.g. carbon nanotubes [CNT], flakes
    • C23C18/1266Particles formed in situ
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125Process of deposition of the inorganic material
    • C23C18/1283Control of temperature, e.g. gradual temperature increase, modulation of temperature
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/14Decomposition by irradiation, e.g. photolysis, particle radiation or by mixed irradiation sources
    • C23C18/143Radiation by light, e.g. photolysis or pyrolysis
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/64Nanometer sized, i.e. from 1-100 nanometer

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Thermal Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Nanotechnology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Toxicology (AREA)
  • Composite Materials (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP2008543663A 2005-12-11 2006-12-11 ナノサイズ材料の製造 Pending JP2009518167A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DKPA200501755 2005-12-11
PCT/DK2006/000706 WO2007065446A2 (en) 2005-12-11 2006-12-11 Production of nanosized materials

Publications (2)

Publication Number Publication Date
JP2009518167A true JP2009518167A (ja) 2009-05-07
JP2009518167A5 JP2009518167A5 (https=) 2010-02-12

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Country Status (10)

Country Link
US (1) US7829598B2 (https=)
EP (1) EP1960098A2 (https=)
JP (1) JP2009518167A (https=)
KR (1) KR20080077680A (https=)
CN (1) CN101326001A (https=)
AU (1) AU2006322458A1 (https=)
BR (1) BRPI0619635A2 (https=)
CA (1) CA2633809A1 (https=)
EA (1) EA013089B1 (https=)
WO (1) WO2007065446A2 (https=)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007210092A (ja) * 2005-12-30 2007-08-23 General Electric Co <Ge> ナノ粒子を製造する方法及びシステム
JP2011011179A (ja) * 2009-07-06 2011-01-20 Kimoto Denshi Kogyo Kk 超臨界マイクロ波反応装置
WO2013061621A1 (ja) * 2011-10-26 2013-05-02 公立大学法人高知工科大学 球状多孔質酸化チタンナノ粒子の合成方法、該合成方法により製造される球状多孔質酸化チタンナノ粒子、及び該球状多孔質酸化チタンナノ粒子からなる遺伝子銃用担体
JP2013245137A (ja) * 2012-05-25 2013-12-09 Kochi Univ Of Technology 多孔質無機酸化物ナノ粒子の合成方法、並びに該合成方法により製造される多孔質無機酸化物ナノ粒子及び球状多孔質無機酸化物ナノ粒子
WO2014178387A1 (ja) 2013-04-30 2014-11-06 エム・テクニック株式会社 流体処理方法
JP2018508440A (ja) * 2014-12-23 2018-03-29 エシロール アンテルナシオナル (コンパニー ジェネラル ドプティック) 超臨界溶媒熱合成により表面変性金属酸化物ナノ粒子を製造するための連続フロー式プロセス
JP2023061896A (ja) * 2021-10-20 2023-05-02 財團法人工業技術研究院 コアシェル型量子ドットの調製装置および調製方法

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HU230862B1 (hu) * 2008-04-28 2018-10-29 DARHOLDING Vagyonkezelő Kft Berendezés és eljárás nanorészecskék folyamatos üzemű előállítására
US8008237B2 (en) * 2008-06-18 2011-08-30 Afton Chemical Corporation Method for making a titanium-containing lubricant additive
FR2940766B1 (fr) * 2009-01-06 2011-05-27 Commissariat Energie Atomique Procede de realisation d'un depot de nanoparticules a adherence augmentee et dispositif pour la mise en oeuvre d'un tel procede
DK2387478T3 (en) * 2009-01-15 2018-10-29 Clene Nanomedicine Inc CONTINUOUS PROCESS AND APPARATUS FOR THE CREATION OF GOLD-BASED NANOPARTICLES
IT1393040B1 (it) 2009-03-02 2012-04-11 Colorobbia Italiana Spa Processo per la preparazione di sospensioni stabili di nanoparticelle metalliche e sospensioni colloidali stabili cosi' ottenute
KR101009583B1 (ko) * 2009-03-10 2011-01-20 충남대학교산학협력단 전이금속산화물 나노입자의 제조방법
US9963609B2 (en) * 2009-03-23 2018-05-08 Valinge Photocatalytic Ab Production of titania nanoparticle colloidal suspensions with maintained crystallinity by using a bead mill with micrometer sized beads
CN101618308B (zh) * 2009-06-09 2011-12-21 宋玉军 用于纳米颗粒制备的微流体反应器及颗粒的可控制备工艺
TWI398469B (zh) * 2009-10-19 2013-06-11 Ind Tech Res Inst 一階段固定TiO2奈米結晶粒於高分子基材的方法及其應用
RU2474010C2 (ru) * 2010-03-09 2013-01-27 Федеральное государственное бюджетное научное учреждение "Технологический институт сверхтвердых и новых углеродных материалов" (ФГБНУ ТИСНУМ) Нанокомпозитный термоэлектрик и способ его получения
US8101680B1 (en) 2010-10-12 2012-01-24 Sabic Innovative Plastics Ip B.V. Methods of preparing polymer nanocomposites
CN102173452B (zh) * 2011-03-04 2012-12-26 北京工业大学 一种单一材料ZrO2纳米点、制备方法及应用
KR101308020B1 (ko) 2011-09-22 2013-09-12 한국과학기술연구원 코어-셀 구조의 복합 분말 및 그 제조 방법
RU2494045C1 (ru) * 2012-04-27 2013-09-27 Федеральное государственное бюджетное учреждение науки Институт катализа им. Г.К. Борескова Сибирского отделения Российской академии наук Способ получения диоксида титана
WO2015012715A1 (ru) * 2013-07-26 2015-01-29 Общество С Ограниченной Ответственностью "Плазма-Ск" Способ и устройство наноструктурированного углеродного покрытия
KR101455040B1 (ko) * 2014-07-29 2014-10-27 (주)일신오토클레이브 초고압 균질기를 이용한 연속식 금속산화물 나노입자의 제조 장치 및 이를 이용한 제조 방법
EP3302423B1 (en) 2015-06-04 2022-05-25 Crititech, Inc. Particle production system and particle collection device
BR112018069628A2 (pt) 2016-04-04 2019-02-12 Crititech, Inc. métodos para tratamento de tumor sólido
RU2633582C1 (ru) * 2016-06-23 2017-10-13 Общество с ограниченной ответственностью "Инновационные Технологии Синтеза" Способ получения нанодисперсных оксидов металлов
EP3615145B1 (en) 2017-06-09 2024-05-15 Crititech, Inc. Compositions for use in the treatment of epithelial cysts by intracystic injection of antineoplastic particles
WO2018231908A1 (en) 2017-06-14 2018-12-20 Crititech, Inc. Methods for treating lung disorders
KR20250057947A (ko) 2017-10-03 2025-04-29 크리티테크, 인크. 암의 치료를 위한 면역치료제의 전신 전달과 조합된 항신생물성 입자의 국소 전달
CN108149229B (zh) * 2017-12-29 2020-04-10 南京理工大学 一种用于纳米薄膜沉积的液相基板火焰合成装置和方法
RU2724243C1 (ru) * 2020-02-03 2020-06-22 Федеральное государственное бюджетное учреждение науки Ордена Трудового Красного Знамени Институт химии силикатов им. И.В. Гребенщикова Российской академии наук (ИХС РАН) Способ получения фотокаталитически активного нанокристаллического диоксида титана в кристаллической модификации анатаз

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JPH07138020A (ja) * 1993-11-12 1995-05-30 High Frequency Heattreat Co Ltd 超微粒子二酸化チタン複合化酸化物及びその製造方法
JP2003261329A (ja) * 2002-03-08 2003-09-16 National Institute Of Advanced Industrial & Technology 高結晶性チタン酸バリウム超微粒子とその製造方法

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Patent Citations (2)

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Publication number Priority date Publication date Assignee Title
JPH07138020A (ja) * 1993-11-12 1995-05-30 High Frequency Heattreat Co Ltd 超微粒子二酸化チタン複合化酸化物及びその製造方法
JP2003261329A (ja) * 2002-03-08 2003-09-16 National Institute Of Advanced Industrial & Technology 高結晶性チタン酸バリウム超微粒子とその製造方法

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007210092A (ja) * 2005-12-30 2007-08-23 General Electric Co <Ge> ナノ粒子を製造する方法及びシステム
JP2011011179A (ja) * 2009-07-06 2011-01-20 Kimoto Denshi Kogyo Kk 超臨界マイクロ波反応装置
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US20090004099A1 (en) 2009-01-01
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