JP2009509036A - 封止フィルムの透過率の改善方法 - Google Patents
封止フィルムの透過率の改善方法 Download PDFInfo
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- JP2009509036A JP2009509036A JP2008531097A JP2008531097A JP2009509036A JP 2009509036 A JP2009509036 A JP 2009509036A JP 2008531097 A JP2008531097 A JP 2008531097A JP 2008531097 A JP2008531097 A JP 2008531097A JP 2009509036 A JP2009509036 A JP 2009509036A
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- amorphous carbon
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Abstract
Description
本発明の実施形態は、概して、化学気相蒸着処理を用いての薄膜の堆積に関する。更に具体的には、本発明は大面積基板上に薄膜を堆積するための方法に関する。
有機発光ダイオード(OLED)ディスプレイは、液晶ディスプレイ(LCD)と比較した場合のその迅速な応答時間、広い視野角、高いコントラスト、軽量性、低電力及び可撓性基板への適合度の高さという観点から、近年、ディスプレイ用途で非常に高い関心を得ている。OLEDの実際的な応用は、図1に図示されるように、2つの電極102、104に挟持されて基板101上に構成される有機材料103の層を用いて可能となる。例えば、従来の単一の有機層とは対照的に、単極(孔)輸送が可能な層ともう一方のエレクトロルミネセンス用の層を含む2つの有機層をアノード層及びカソード層と共に用いてOLEDディスプレイに必要な動作電圧を低下させることが可能である。通常、カソード層は金属材料を含み、アノード層はインジウムスズ酸化物(ITO)材料等の透明材料を含んでいてもよく、トップエミッション方式のデバイス又はボトムエミッション方式のデバイスでの発光用にそれぞれ基板に隣接した底部又はOLEDデバイスの最上部に配置される。有機薄膜トランジスタ(TFT)デバイス、アクティブマトリクス方式デバイス、及びその他のデバイスはTFT構造等の追加の構造を含んでいてもよい。
本発明の態様は可視光スペクトルの全ての波長、例えば波長400nm〜900nmでの光透過率が改善された炭素含有材料層の堆積を提供する。波長約430nm〜約570nmでの改善が最も劇的である。約4未満の誘電率(k)を有する一例示的な炭素含有材料層が非晶質炭素材料である。炭素含有材料のその他の例には炭素含有低誘電率材料、ケイ素ドープ炭素材料、炭素ドープケイ素材料、ダイヤモンド様炭素材料その他が含まれる。
本発明の態様は、炭素含有材料層とケイ素含有無機バリア層とを交互に堆積することを提供する。図4は本発明の方法を用いて製造した例示的なディスプレイデバイス500を図示しており、本発明の実施形態による改善された光透過率を備えた1つ以上の炭素含有材料層を有する多層型封止フィルムを含む。ディスプレイデバイス500は基板501とデバイス502とを含んでいてもよい。複数の材料層と約1000Å以上の厚さを有し得る封止フィルム510を次に本発明の方法を用いて堆積して水/水分及び空気が基板501とデバイス502に浸透することを防ぎ、かつ電圧を印加した際にデバイス502から発光するように高光透過性を付与する。
1つ以上のケイ素含有無機バリア層を、処理チャンバに供給される前駆体混合物から堆積する。前駆体はケイ素含有前駆体、例えばシラン(SiH4)、Si2H6、SiF4その他を含んでいてもよく、窒化ケイ素(SiN)、酸窒化ケイ素(SiON)又は酸化ケイ素(SiO)、炭化ケイ素その他の層を基板上に封止層として堆積する。ケイ素含有前駆体は、基板サイズ約400mmx約500mmの場合、例えば流量10sccm以上、例えば約100sccm〜約500sccmで供給可能である。窒素含有前駆体は流量約5sccm以上、例えば多様な窒素含有前駆体について約100sccm〜約6000sccmで供給可能である。
本発明を、大面積基板の処理用に構成されたプラズマ化学気相蒸着システムを参照しながら以下で実例と共に説明する。システムにはカリフォルニア州サンタクララのアプライドマテリアル社の事業部であるAKTから入手可能な、様々な基板サイズについてのAKT1600、AKT3500、AKT4300、AKT5500、AKT10K、AKT15K、及びAKT25Kを含む多様な平行平板高周波(RF)プラズマ化学気相蒸着(PECVD)システムが挙げられる。但し、当然ながら本発明は円形基板を処理するように構成されたシステムを含め、その他のシステム構成、例えばその他の化学気相蒸着システム及びその他のフィルム堆積システムでも有用である。
Claims (39)
- 基板処理システム内に配置された基板上に多層型封止フィルムを形成するための方法であり、
複数のケイ素含有無機バリア層を基板表面上に堆積し、この堆積が第1ケイ素含有化合物を基板処理システムに供給することを含み、
1つ以上の炭素含有材料層を1つ以上のケイ素含有無機バリア層の間に基板温度約200℃以下で堆積し、この堆積が炭素含有化合物、第2ケイ素含有化合物、及び窒素含有化合物を含む前駆体混合物を基板処理システムに供給することを含む多層型封止フィルムの形成方法。 - 1つ以上の炭素含有材料層の透過率が波長400nm〜900nmで約80%以上である請求項1記載の方法。
- 1つ以上の炭素含有材料層の透過率が波長400nm〜900nmで約90%以上である請求項1記載の方法。
- 1つ以上の炭素含有材料層の透過率が波長400nm〜900nmで約95%以上である請求項1記載の方法。
- 1つ以上の炭素含有材料層の透過率が波長400nm〜900nmで約97%以上である請求項1記載の方法。
- 1つ以上の炭素含有材料層を基板温度約20℃〜約150℃で堆積する請求項1記載の方法。
- 複数のケイ素含有無機バリア層が窒化ケイ素、酸窒化ケイ素、酸化ケイ素、炭化ケイ素及びその組合せから成る群から選択された材料を含む請求項1記載の方法。
- 1つ以上の炭素含有材料層が非晶質炭素、ケイ素ドープ炭素材料、ダイヤモンド様炭素、及びその組合せから成る群から選択された材料を含む請求項1記載の方法。
- 炭素含有化合物がアセチレン(C2H2)、エタン(C2H6)、エテン(C2H4)、メタン(CH4)、プロピレン(C3H6)、プロピン(C3H4)、プロパン(C3H8)、ブタン(C4H10)、ブチレン(C4H8)、ブタジエン(C4H6)、ベンゼン(C6H6)、トルエン(C7H8)、及びその組み合わせから成る群から選択された化合物を含む請求項1記載の方法。
- 第2ケイ素含有化合物がシラン、SiF4、Si2H6、及びその組合せから成る群から選択された化合物を含む請求項1記載の方法。
- 窒素含有化合物が、アンモニア(NH3)、亜酸化窒素(N2O)、一酸化窒素(NO)、窒素ガス(N2)及びその組合せから成る群から選択された化合物を含む請求項1記載の方法。
- 前駆体混合物が更に水素ガスを含む請求項1記載の方法。
- 前駆体混合物がアセチレン、水素ガス、シラン及びアンモニアを含む請求項1記載の方法。
- 前駆体混合物がアセチレン、水素ガス、シラン及び窒素ガスを含む請求項1記載の方法。
- 前駆体混合物がアセチレン、水素ガス、シラン(SiH4)、アンモニア(NH3)、及び窒素ガス(N2)を含む請求項1記載の方法。
- 1つ以上のケイ素含有無機バリア層及び1つ以上の炭素含有材料層が基板処理システム内の単一の処理チャンバ内で堆積される請求項1記載の方法。
- 基板処理システム内の基板上に多層型封止フィルムの非晶質炭素層を形成するための方法であり、
非晶質炭素層用の炭化水素含有前駆体を供給し、
非晶質炭素層のフィルム均一性を改善するための水素ガスを基板処理システムに供給し、
非晶質炭素層の光透過率を可視光スペクトルの全ての波長において約80%以上にまで改善するためのケイ素含有前駆体及び窒素含有前駆体を基板処理システムに供給し、
基板温度を約150℃以下に制御し、
プラズマを発生させて非晶質炭素層を基板表面上に堆積し、
所望の厚みの非晶質炭素層が得られるまで非晶質炭素層を基板上に堆積することを含む多層型封止フィルムの非晶質炭素層を形成するための方法。 - 非晶質炭素層の光透過率が波長400nm〜900nmで約90%以上である請求項17記載の方法。
- 非晶質炭素層の光透過率が波長400nm〜900nmで約95%以上である請求項17記載の方法。
- 非晶質炭素層の光透過率が波長400nm〜900nmで約97%以上である請求項17記載の方法。
- 非晶質炭素層を基板温度約20℃〜約100℃で堆積する請求項17記載の方法。
- ケイ素含有前駆体がシラン、SiF4、Si2H6及びその組合せから成る群から選択された化合物を含む請求項17記載の方法。
- 窒素含有前駆体が、アンモニア(NH3)、亜酸化窒素(N2O)、一酸化窒素(NO)、窒素ガス(N2)及びその組合せから成る群から選択された化合物を含む請求項17記載の方法。
- 窒素含有前駆体がアンモニア(NH3)及び窒素ガス(N2)を含む請求項17記載の方法。
- 炭化水素含有前駆体がアセチレン(C2H2)、エタン(C2H6)、エテン(C2H4)、メタン(CH4)、プロピレン(C3H6)、プロピン(C3H4)、プロパン(C3H8)、ブタン(C4H10)、ブチレン(C4H8)、ブタジエン(C4H6)、ベンゼン(C6H6)、トルエン(C7H8)、及びその組み合わせから成る群から選択された化合物を含む請求項17記載の方法。
- ケイ素含有無機バリア材料と炭素含有材料の1つ以上の層を有する封止層を基板処理システム内の基板上に堆積するための方法であり、
ケイ素含有無機バリア層用の第1前駆体混合物を供給し、水素ガスを基板処理システムに供給し、
基板温度を約150℃以下に制御し、
プラズマを発生させてケイ素含有無機バリア層を基板表面上に堆積し、
炭素含有材料層用の炭化水素含有前駆体と、ケイ素含有前駆体と、窒素含有前駆体を含む第2前駆体混合物を供給し、水素ガスを基板処理システムに供給し、
基板温度を約150℃以下に制御し、
プラズマを発生させて炭素含有材料層をケイ素含有無機バリア層の表面上に堆積し、
厚さ約15000オングストローム以上の封止層が得られるまで上記工程を繰り返すことで封止層を基板上に堆積することを含む堆積方法。 - 炭素含有材料層が非晶質炭素、ケイ素ドープ炭素材料、ダイヤモンド様炭素、及びその組合せから成る群から選択された材料を含む請求項26記載の方法。
- ケイ素含有無機バリア層が基板表面上に封止層の最終材料層として堆積される請求項26記載の方法。
- ケイ素含有無機バリア層及び炭素含有材料層が基板処理システム内の単一の処理チャンバ内で堆積される請求項26記載の方法。
- 基板処理システム内の基板上に多層型封止フィルムの非晶質炭素層を形成するための方法であり、
非晶質炭素層用に炭化水素含有前駆体を第1流量で供給し、
非晶質炭素層のフィルム均一性を改善するための水素ガスを基板処理システムに供給し、
ケイ素含有前駆体を第2流量で、窒素含有前駆体を第3流量で基板処理システムに供給し、
基板温度を約150℃以下に制御し、
基板処理システム内で一定時間に亘ってプラズマを発生させて非晶質炭素層を基板表面上に堆積することを含み、ここで第1流量と第2流量の比が4:1以上である多層型封止フィルムの非晶質炭素層の形成方法。 - 非晶質炭素層の光透過率が波長400nm〜900nmで約80%以上である請求項30記載の方法。
- 非晶質炭素層の光透過率が波長400nm〜900nmで約90%以上である請求項30記載の方法。
- 非晶質炭素層の光透過率が波長400nm〜900nmで約95%以上である請求項30記載の方法。
- 1つ以上の炭素含有材料層の透過率が波長400nm〜900nmで約97%以上である請求項30記載の方法。
- 非晶質炭素層を基板温度約20℃〜約100℃で堆積する請求項30記載の方法。
- 封止層を基板上に堆積するための装置であり、
処理チャンバと、
処理チャンバ内に配置された、基板をその上で支持するための基板支持体と、
処理チャンバ内部でプラズマを発生させるための、処理チャンバに連結されたRF源と、
処理チャンバに連結されたケイ素含有化合物供給源と、
処理チャンバに連結された窒素含有化合物供給源と、
処理チャンバに連結された水素ガス供給源と、
処理チャンバに連結された炭化水素含有前駆体化合物供給源と、
基板処理中、基板温度を約200℃以下に制御し、かつ1つ以上のケイ素含有無機バリア層とその間の1つ以上の炭素含有材料層を有する封止層を封止層の厚さが約15000オングストローム以上となるまで同一の処理チャンバ内で堆積するように適合された、処理チャンバに連結された制御装置とを含み、ここで1つ以上のケイ素含有無機バリア層をケイ素含有化合物供給源及び水素ガス供給源から供給された化合物を含む第1前駆体混合物から堆積し、1つ以上の炭素含有材料層を炭化水素含有前駆体供給源、水素ガス供給源、ケイ素含有化合物供給源、及び窒素含有化合物供給源から供給された化合物を含む第2前駆体混合物から堆積する装置。 - 1つ以上の炭素含有材料層が非晶質炭素、ケイ素ドープ炭素材料、ダイヤモンド様炭素、及びその組合せから成る群から選択した材料を含む請求項36記載の装置。
- 1つ以上のケイ素含有無機バリア層が基板表面上に封止層の最終材料層として堆積される請求項36記載の装置。
- 1つ以上の炭素含有材料層の光透過率が波長400nm〜900nmで約80%以上である請求項36記載の装置。
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US7214600B2 (en) | 2007-05-08 |
WO2007040798A2 (en) | 2007-04-12 |
CN101512728B (zh) | 2012-10-31 |
JP5544086B2 (ja) | 2014-07-09 |
TWI316735B (en) | 2009-11-01 |
CN101512728A (zh) | 2009-08-19 |
WO2007040798A3 (en) | 2009-05-07 |
KR20080046734A (ko) | 2008-05-27 |
TW200710956A (en) | 2007-03-16 |
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US20060078677A1 (en) | 2006-04-13 |
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