JP2009503546A5 - - Google Patents

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Publication number
JP2009503546A5
JP2009503546A5 JP2008525079A JP2008525079A JP2009503546A5 JP 2009503546 A5 JP2009503546 A5 JP 2009503546A5 JP 2008525079 A JP2008525079 A JP 2008525079A JP 2008525079 A JP2008525079 A JP 2008525079A JP 2009503546 A5 JP2009503546 A5 JP 2009503546A5
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JP
Japan
Prior art keywords
optical device
focus
ray
optical
subject
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JP2008525079A
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English (en)
Japanese (ja)
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JP4994375B2 (ja
JP2009503546A (ja
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Priority claimed from PCT/US2006/029732 external-priority patent/WO2007016484A2/en
Publication of JP2009503546A publication Critical patent/JP2009503546A/ja
Publication of JP2009503546A5 publication Critical patent/JP2009503546A5/ja
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Publication of JP4994375B2 publication Critical patent/JP4994375B2/ja
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JP2008525079A 2005-08-01 2006-07-31 点焦点湾曲モノクロメータ光学体を使用するｘ線結像系 Expired - Fee Related JP4994375B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US70441105P 2005-08-01 2005-08-01
US60/704,411 2005-08-01
PCT/US2006/029732 WO2007016484A2 (en) 2005-08-01 2006-07-31 X-ray imaging systems employing point-focusing, curved monochromating optics

Publications (3)

Publication Number Publication Date
JP2009503546A JP2009503546A (ja) 2009-01-29
JP2009503546A5 true JP2009503546A5 (enExample) 2009-09-17
JP4994375B2 JP4994375B2 (ja) 2012-08-08

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JP2008525079A Expired - Fee Related JP4994375B2 (ja) 2005-08-01 2006-07-31 点焦点湾曲モノクロメータ光学体を使用するｘ線結像系

Country Status (4)

Country Link
US (1) US7583789B1 (enExample)
JP (1) JP4994375B2 (enExample)
CN (1) CN101356589B (enExample)
WO (1) WO2007016484A2 (enExample)

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US10297359B2 (en) 2013-09-19 2019-05-21 Sigray, Inc. X-ray illumination system with multiple target microstructures
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US9449781B2 (en) 2013-12-05 2016-09-20 Sigray, Inc. X-ray illuminators with high flux and high flux density
US10304580B2 (en) 2013-10-31 2019-05-28 Sigray, Inc. Talbot X-ray microscope
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
US9594036B2 (en) 2014-02-28 2017-03-14 Sigray, Inc. X-ray surface analysis and measurement apparatus
US9823203B2 (en) 2014-02-28 2017-11-21 Sigray, Inc. X-ray surface analysis and measurement apparatus
US10401309B2 (en) 2014-05-15 2019-09-03 Sigray, Inc. X-ray techniques using structured illumination
JP6069609B2 (ja) * 2015-03-26 2017-02-01 株式会社リガク 二重湾曲ｘ線集光素子およびその構成体、二重湾曲ｘ線分光素子およびその構成体の製造方法
US10352880B2 (en) 2015-04-29 2019-07-16 Sigray, Inc. Method and apparatus for x-ray microscopy
CN105575454A (zh) * 2015-06-29 2016-05-11 中国建材检验认证集团股份有限公司 大面积全聚焦型双曲率弯曲晶体的制作方法
US10295486B2 (en) 2015-08-18 2019-05-21 Sigray, Inc. Detector for X-rays with high spatial and high spectral resolution
CN105223210A (zh) * 2015-10-13 2016-01-06 中国科学技术大学 一种新型x射线显微成像系统
US10677744B1 (en) * 2016-06-03 2020-06-09 U.S. Department Of Energy Multi-cone x-ray imaging Bragg crystal spectrometer
US10247683B2 (en) 2016-12-03 2019-04-02 Sigray, Inc. Material measurement techniques using multiple X-ray micro-beams
WO2018175570A1 (en) 2017-03-22 2018-09-27 Sigray, Inc. Method of performing x-ray spectroscopy and x-ray absorption spectrometer system
JP6775777B2 (ja) * 2017-08-29 2020-10-28 株式会社リガク Ｘ線回折測定における測定結果の表示方法
FR3079035B1 (fr) * 2018-03-14 2022-10-28 Alpyx Dispositif optique pour rayons x
US10578566B2 (en) 2018-04-03 2020-03-03 Sigray, Inc. X-ray emission spectrometer system
CN112424591B (zh) 2018-06-04 2024-05-24 斯格瑞公司 波长色散x射线光谱仪
DE112019003777B4 (de) 2018-07-26 2025-09-11 Sigray, Inc. Röntgenreflexionsquelle mit hoher helligkeit
US10656105B2 (en) 2018-08-06 2020-05-19 Sigray, Inc. Talbot-lau x-ray source and interferometric system
CN108872282A (zh) * 2018-08-31 2018-11-23 深圳市禾苗分析仪器有限公司 单色聚焦x射线光源及采用该光源分析低含量铅砷的方法
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US11056308B2 (en) 2018-09-07 2021-07-06 Sigray, Inc. System and method for depth-selectable x-ray analysis
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US11217357B2 (en) 2020-02-10 2022-01-04 Sigray, Inc. X-ray mirror optics with multiple hyperboloidal/hyperbolic surface profiles

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