JP4994375B2 - 点焦点湾曲モノクロメータ光学体を使用するｘ線結像系 - Google Patents

点焦点湾曲モノクロメータ光学体を使用するｘ線結像系 Download PDF

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JP4994375B2
JP4994375B2 JP2008525079A JP2008525079A JP4994375B2 JP 4994375 B2 JP4994375 B2 JP 4994375B2 JP 2008525079 A JP2008525079 A JP 2008525079A JP 2008525079 A JP2008525079 A JP 2008525079A JP 4994375 B2 JP4994375 B2 JP 4994375B2
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optical device
ray
focus
optical
detector
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JP2009503546A5 (enExample
JP2009503546A (ja
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エー．マクドナルド キャロリン
メイル ノア
ゼウー チェン
Original Assignee
ザ リサーチ ファウンデーション オブ ステート ユニバーシティ オブ ニューヨーク
エックス−レイ オプティカル システムズ インコーポレーテッド
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K7/00—Gamma- or X-ray microscopes
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/062—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2008525079A 2005-08-01 2006-07-31 点焦点湾曲モノクロメータ光学体を使用するｘ線結像系 Expired - Fee Related JP4994375B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US70441105P 2005-08-01 2005-08-01
US60/704,411 2005-08-01
PCT/US2006/029732 WO2007016484A2 (en) 2005-08-01 2006-07-31 X-ray imaging systems employing point-focusing, curved monochromating optics

Publications (3)

Publication Number Publication Date
JP2009503546A JP2009503546A (ja) 2009-01-29
JP2009503546A5 JP2009503546A5 (enExample) 2009-09-17
JP4994375B2 true JP4994375B2 (ja) 2012-08-08

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JP2008525079A Expired - Fee Related JP4994375B2 (ja) 2005-08-01 2006-07-31 点焦点湾曲モノクロメータ光学体を使用するｘ線結像系

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Country Link
US (1) US7583789B1 (enExample)
JP (1) JP4994375B2 (enExample)
CN (1) CN101356589B (enExample)
WO (1) WO2007016484A2 (enExample)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5307503B2 (ja) * 2008-07-01 2013-10-02 株式会社日立ハイテクサイエンス Ｘ線分析装置及びｘ線分析方法
JP5483840B2 (ja) * 2008-08-01 2014-05-07 株式会社日立製作所 Ｘ線撮像装置及びｘ線撮像方法
US8217353B1 (en) * 2009-05-06 2012-07-10 U.S. Department Of Energy Non-astigmatic imaging with matched pairs of spherically bent reflectors
US8111807B2 (en) * 2009-09-16 2012-02-07 Rigaku Corporation Crystallite size analysis method and apparatus using powder X-ray diffraction
EP3168606A1 (en) 2011-10-26 2017-05-17 X-Ray Optical Systems, Inc. X-ray monochromator and support
US20150117599A1 (en) 2013-10-31 2015-04-30 Sigray, Inc. X-ray interferometric imaging system
CN103454299A (zh) * 2013-08-15 2013-12-18 浙江工业大学 便携式微束x射线荧光光谱仪
US9570265B1 (en) 2013-12-05 2017-02-14 Sigray, Inc. X-ray fluorescence system with high flux and high flux density
US10297359B2 (en) 2013-09-19 2019-05-21 Sigray, Inc. X-ray illumination system with multiple target microstructures
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
US9449781B2 (en) 2013-12-05 2016-09-20 Sigray, Inc. X-ray illuminators with high flux and high flux density
US10269528B2 (en) 2013-09-19 2019-04-23 Sigray, Inc. Diverging X-ray sources using linear accumulation
US10304580B2 (en) 2013-10-31 2019-05-28 Sigray, Inc. Talbot X-ray microscope
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
US9594036B2 (en) 2014-02-28 2017-03-14 Sigray, Inc. X-ray surface analysis and measurement apparatus
US9823203B2 (en) 2014-02-28 2017-11-21 Sigray, Inc. X-ray surface analysis and measurement apparatus
US10401309B2 (en) 2014-05-15 2019-09-03 Sigray, Inc. X-ray techniques using structured illumination
JP6069609B2 (ja) * 2015-03-26 2017-02-01 株式会社リガク 二重湾曲ｘ線集光素子およびその構成体、二重湾曲ｘ線分光素子およびその構成体の製造方法
US10352880B2 (en) 2015-04-29 2019-07-16 Sigray, Inc. Method and apparatus for x-ray microscopy
CN105575454A (zh) * 2015-06-29 2016-05-11 中国建材检验认证集团股份有限公司 大面积全聚焦型双曲率弯曲晶体的制作方法
US10295486B2 (en) 2015-08-18 2019-05-21 Sigray, Inc. Detector for X-rays with high spatial and high spectral resolution
CN105223210A (zh) * 2015-10-13 2016-01-06 中国科学技术大学 一种新型x射线显微成像系统
US10677744B1 (en) * 2016-06-03 2020-06-09 U.S. Department Of Energy Multi-cone x-ray imaging Bragg crystal spectrometer
US10247683B2 (en) 2016-12-03 2019-04-02 Sigray, Inc. Material measurement techniques using multiple X-ray micro-beams
WO2018175570A1 (en) 2017-03-22 2018-09-27 Sigray, Inc. Method of performing x-ray spectroscopy and x-ray absorption spectrometer system
JP6775777B2 (ja) * 2017-08-29 2020-10-28 株式会社リガク Ｘ線回折測定における測定結果の表示方法
FR3079035B1 (fr) * 2018-03-14 2022-10-28 Alpyx Dispositif optique pour rayons x
US10578566B2 (en) 2018-04-03 2020-03-03 Sigray, Inc. X-ray emission spectrometer system
CN112424591B (zh) 2018-06-04 2024-05-24 斯格瑞公司 波长色散x射线光谱仪
CN112470245B (zh) 2018-07-26 2025-03-18 斯格瑞公司 高亮度x射线反射源
US10656105B2 (en) 2018-08-06 2020-05-19 Sigray, Inc. Talbot-lau x-ray source and interferometric system
CN108872282A (zh) * 2018-08-31 2018-11-23 深圳市禾苗分析仪器有限公司 单色聚焦x射线光源及采用该光源分析低含量铅砷的方法
DE112019004433B4 (de) 2018-09-04 2024-09-12 Sigray, Inc. System und verfahren für röntgenstrahlfluoreszenz mit filterung
US11056308B2 (en) 2018-09-07 2021-07-06 Sigray, Inc. System and method for depth-selectable x-ray analysis
US11898971B2 (en) * 2019-06-24 2024-02-13 Sms Group Gmbh Controlling process parameters by means of radiographic online determination of material properties when producing metallic strips and sheets
WO2021162947A1 (en) 2020-02-10 2021-08-19 Sigray, Inc. X-ray mirror optics with multiple hyperboloidal / hyperbolic surface profiles

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4203034A (en) 1978-06-01 1980-05-13 University Of Florida Board Of Regents Diffraction camera for imaging penetrating radiation
US4599741A (en) 1983-11-04 1986-07-08 USC--Dept. of Materials Science System for local X-ray excitation by monochromatic X-rays
JP2921038B2 (ja) * 1990-06-01 1999-07-19 キヤノン株式会社 Ｘ線を用いた観察装置
US5127028A (en) 1990-08-01 1992-06-30 Wittry David B Diffractord with doubly curved surface steps
DE4027285A1 (de) 1990-08-29 1992-03-05 Zeiss Carl Fa Roentgenmikroskop
US5570404A (en) 1994-09-30 1996-10-29 Siemens Corporate Research Method and apparatus for editing abdominal CT angiographic images for blood vessel visualization
US5787146A (en) 1996-10-18 1998-07-28 Spad Technologies, Inc. X-ray imaging system using diffractive x-ray optics for high definition low dosage three dimensional imaging of soft tissue
JP3923151B2 (ja) * 1997-10-24 2007-05-30 株式会社リガク Ｘ線集光装置
DE19955848A1 (de) 1998-11-17 2000-05-18 Ifg Inst Fuer Geraetebau Gmbh Verfahren zur röntgenologischen Abbildung von Untersuchungsobjekten mit geringen Dichteunterschieden sowie röntgenoptische Systeme
US6285506B1 (en) 1999-01-21 2001-09-04 X-Ray Optical Systems, Inc. Curved optical device and method of fabrication
US6498830B2 (en) * 1999-02-12 2002-12-24 David B. Wittry Method and apparatus for fabricating curved crystal x-ray optics
US6259763B1 (en) * 1999-05-21 2001-07-10 The United States Of America As Represented By The United States Department Of Energy X-ray imaging crystal spectrometer for extended X-ray sources
JP3373803B2 (ja) * 1999-05-28 2003-02-04 科学技術振興事業団 コンビナトリアルｘ線回折装置
US6317483B1 (en) 1999-11-29 2001-11-13 X-Ray Optical Systems, Inc. Doubly curved optical device with graded atomic planes
US6970532B2 (en) * 2000-05-10 2005-11-29 Rigaku Corporation Method and apparatus for measuring thin film, and thin film deposition system
US6697454B1 (en) * 2000-06-29 2004-02-24 X-Ray Optical Systems, Inc. X-ray analytical techniques applied to combinatorial library screening
CN1246858C (zh) * 2001-06-19 2006-03-22 X射线光学系统公司 X射线荧光(xrf)光谱测定系统和方法
WO2003049510A2 (en) 2001-12-04 2003-06-12 X-Ray Optical Systems, Inc. X-ray source assembly having enhanced output stability, and fluid stream analysis applications thereof
CN1280835C (zh) * 2002-03-05 2006-10-18 姆拉丁·阿布比奇罗维奇·库马科夫 X射线显微镜
ATE488011T1 (de) * 2002-08-02 2010-11-15 X Ray Optical Sys Inc Optische vorrichtung aus einer vielzahl von gekrümmten optischen kristallen zum fokussieren von röntgenstrahlen
DE10254026C5 (de) * 2002-11-20 2009-01-29 Incoatec Gmbh Reflektor für Röntgenstrahlung

Also Published As

Publication number Publication date
US20090225947A1 (en) 2009-09-10
WO2007016484A2 (en) 2007-02-08
CN101356589B (zh) 2013-02-27
WO2007016484A3 (en) 2007-04-19
CN101356589A (zh) 2009-01-28
JP2009503546A (ja) 2009-01-29
US7583789B1 (en) 2009-09-01

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