ATE134065T1 - Röntgenmikroskop - Google Patents

Röntgenmikroskop

Info

Publication number
ATE134065T1
ATE134065T1 AT91113635T AT91113635T ATE134065T1 AT E134065 T1 ATE134065 T1 AT E134065T1 AT 91113635 T AT91113635 T AT 91113635T AT 91113635 T AT91113635 T AT 91113635T AT E134065 T1 ATE134065 T1 AT E134065T1
Authority
AT
Austria
Prior art keywords
ray
high resolution
source
onto
radiation
Prior art date
Application number
AT91113635T
Other languages
English (en)
Inventor
Juergen Dr Thieme
Guenter Prof Dr Schmahl
Bastian Dr Nieman
Dietbert Dr Rudolph
Original Assignee
Zeiss Carl Fa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Fa filed Critical Zeiss Carl Fa
Application granted granted Critical
Publication of ATE134065T1 publication Critical patent/ATE134065T1/de

Links

Classifications

    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KHANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K7/00Gamma- or X-ray microscopes

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
  • Liquid Crystal Substances (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
AT91113635T 1990-08-29 1991-08-14 Röntgenmikroskop ATE134065T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4027285A DE4027285A1 (de) 1990-08-29 1990-08-29 Roentgenmikroskop

Publications (1)

Publication Number Publication Date
ATE134065T1 true ATE134065T1 (de) 1996-02-15

Family

ID=6413137

Family Applications (1)

Application Number Title Priority Date Filing Date
AT91113635T ATE134065T1 (de) 1990-08-29 1991-08-14 Röntgenmikroskop

Country Status (5)

Country Link
US (1) US5222113A (de)
EP (1) EP0475098B1 (de)
JP (1) JP3133103B2 (de)
AT (1) ATE134065T1 (de)
DE (2) DE4027285A1 (de)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5528646A (en) * 1992-08-27 1996-06-18 Olympus Optical Co., Ltd. Sample vessel for X-ray microscopes
JP3703483B2 (ja) * 1993-09-15 2005-10-05 カール−ツァイス−スチフツング 位相コントラスト−x線顕微鏡
US6091796A (en) * 1994-11-23 2000-07-18 Thermotrex Corporation Scintillator based microscope
US5965065A (en) * 1994-12-05 1999-10-12 Powell; Stephen Forbes Method of filtering x-rays
EP0873565B1 (de) * 1996-01-10 1999-10-20 Bastian Niemann Kondensor-monochromator-anordnung für röntgenstrahlung
US6167112A (en) * 1996-01-12 2000-12-26 Bastian Nieman X-ray microscope with zone plates
IL132351A (en) * 1997-04-08 2003-03-12 X Ray Technologies Pty Ltd High resolution x-ray imaging of very small objects
GB9815968D0 (en) 1998-07-23 1998-09-23 Bede Scient Instr Ltd X-ray focusing apparatus
DE19956782C2 (de) * 1999-11-25 2001-11-15 Lutz Kipp Optisches Fokussierelement, Meßsystem und Apparatur mit einem solchen optischen Element und Verwendung desselben
EP1126477A3 (de) * 2000-02-14 2003-06-18 Leica Microsystems Lithography GmbH Verfahren zur Untersuchung von Strukturen auf einem Halbleiter-Substrat
US6195272B1 (en) 2000-03-16 2001-02-27 Joseph E. Pascente Pulsed high voltage power supply radiography system having a one to one correspondence between low voltage input pulses and high voltage output pulses
JP4220170B2 (ja) * 2002-03-22 2009-02-04 浜松ホトニクス株式会社 X線像拡大装置
EP1446813B1 (de) * 2002-05-10 2010-11-10 Carl Zeiss SMT AG Reflektives roentgenmikroskop zur untersuchung von objekten mit wellenlaengen = 100nm in reflexion
US7245696B2 (en) * 2002-05-29 2007-07-17 Xradia, Inc. Element-specific X-ray fluorescence microscope and method of operation
ATE488011T1 (de) * 2002-08-02 2010-11-15 X Ray Optical Sys Inc Optische vorrichtung aus einer vielzahl von gekrümmten optischen kristallen zum fokussieren von röntgenstrahlen
US7365909B2 (en) * 2002-10-17 2008-04-29 Xradia, Inc. Fabrication methods for micro compounds optics
US7072442B1 (en) * 2002-11-20 2006-07-04 Kla-Tencor Technologies Corporation X-ray metrology using a transmissive x-ray optical element
DE10254026C5 (de) * 2002-11-20 2009-01-29 Incoatec Gmbh Reflektor für Röntgenstrahlung
US7119953B2 (en) * 2002-12-27 2006-10-10 Xradia, Inc. Phase contrast microscope for short wavelength radiation and imaging method
DE10319269A1 (de) * 2003-04-25 2004-11-25 Carl Zeiss Sms Gmbh Abbildungssystem für ein, auf extrem ultravioletter (EUV) Strahlung basierendem Mikroskop
DE10334169A1 (de) 2003-07-26 2005-02-24 Bruker Axs Gmbh Gekapselter Röntgenspiegel
US7170969B1 (en) * 2003-11-07 2007-01-30 Xradia, Inc. X-ray microscope capillary condenser system
US20050211910A1 (en) * 2004-03-29 2005-09-29 Jmar Research, Inc. Morphology and Spectroscopy of Nanoscale Regions using X-Rays Generated by Laser Produced Plasma
US7302043B2 (en) * 2004-07-27 2007-11-27 Gatan, Inc. Rotating shutter for laser-produced plasma debris mitigation
US7452820B2 (en) * 2004-08-05 2008-11-18 Gatan, Inc. Radiation-resistant zone plates and method of manufacturing thereof
US7466796B2 (en) * 2004-08-05 2008-12-16 Gatan, Inc. Condenser zone plate illumination for point X-ray sources
US7231017B2 (en) * 2005-07-27 2007-06-12 Physical Optics Corporation Lobster eye X-ray imaging system and method of fabrication thereof
CN101356589B (zh) 2005-08-01 2013-02-27 纽约州立大学研究基金会 采用点聚焦、弯曲单色光学器件的x射线成像系统
US20070108387A1 (en) * 2005-11-14 2007-05-17 Xradia, Inc. Tunable x-ray fluorescence imager for multi-element analysis
DE102005056404B4 (de) * 2005-11-23 2013-04-25 Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh Röntgenmikroskop mit Kondensor-Monochromator-Anordnung hoher spektraler Auflösung
US7499521B2 (en) * 2007-01-04 2009-03-03 Xradia, Inc. System and method for fuel cell material x-ray analysis
DE102007041939A1 (de) * 2007-09-04 2009-03-05 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung und Verfahren für die XUV-Mikroskopie
US9291578B2 (en) 2012-08-03 2016-03-22 David L. Adler X-ray photoemission microscope for integrated devices
US9129715B2 (en) 2012-09-05 2015-09-08 SVXR, Inc. High speed x-ray inspection microscope
US20160086681A1 (en) * 2014-09-24 2016-03-24 Carl Zeiss X-ray Microscopy, Inc. Zone Plate and Method for Fabricating Same Using Conformal Coating
CN114424054B (zh) 2019-06-24 2024-03-22 Sms集团有限公司 用于确定多晶产品的材料特性的设备和方法
DE102019124919B4 (de) 2019-09-17 2021-08-26 Ri Research Instruments Gmbh Mikroskopisches System zur Prüfung von Strukturen und Defekten auf EUV-Lithographie-Photomasken
JP7572033B2 (ja) * 2020-10-23 2024-10-23 株式会社リガク 結像型x線顕微鏡
DE102024002214A1 (de) * 2024-06-25 2026-01-08 Helmholtz-Zentrum Berlin für Materialien und Energie Gesellschaft mit beschränkter Haftung Reflexionsoptik und Mikroskop mit Reflexionsoptik

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3332711A1 (de) * 1983-09-10 1985-03-28 Fa. Carl Zeiss, 7920 Heidenheim Vorrichtung zur erzeugung einer plasmaquelle mit hoher strahlungsintensitaet im roentgenbereich
JPS6221223A (ja) * 1985-07-19 1987-01-29 Shimadzu Corp 軟x線用投影結像装置
DE3642457A1 (de) * 1986-12-12 1988-06-30 Zeiss Carl Fa Roentgen-mikroskop
US4912737A (en) * 1987-10-30 1990-03-27 Hamamatsu Photonics K.K. X-ray image observing device
JP2844703B2 (ja) * 1989-08-09 1999-01-06 株式会社ニコン 結像型軟x線顕微鏡装置
JP2883122B2 (ja) * 1989-10-20 1999-04-19 オリンパス光学工業株式会社 X線顕微鏡
JP2921038B2 (ja) * 1990-06-01 1999-07-19 キヤノン株式会社 X線を用いた観察装置

Also Published As

Publication number Publication date
EP0475098A3 (en) 1992-07-22
JPH04262300A (ja) 1992-09-17
EP0475098A2 (de) 1992-03-18
US5222113A (en) 1993-06-22
EP0475098B1 (de) 1996-02-07
DE59107380D1 (de) 1996-03-21
JP3133103B2 (ja) 2001-02-05
DE4027285A1 (de) 1992-03-05

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Legal Events

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REN Ceased due to non-payment of the annual fee