EP0475098A3 - X-ray microscope - Google Patents

X-ray microscope Download PDF

Info

Publication number
EP0475098A3
EP0475098A3 EP19910113635 EP91113635A EP0475098A3 EP 0475098 A3 EP0475098 A3 EP 0475098A3 EP 19910113635 EP19910113635 EP 19910113635 EP 91113635 A EP91113635 A EP 91113635A EP 0475098 A3 EP0475098 A3 EP 0475098A3
Authority
EP
European Patent Office
Prior art keywords
ray
high resolution
source
onto
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP19910113635
Other languages
German (de)
Other versions
EP0475098A2 (en
EP0475098B1 (en
Inventor
Juergen Dr. Thieme
Guenter Prof. Dr. Schmahl
Bastian Dr. Nieman
Dietbert Dr. Rudolph
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Carl Zeiss AG
Original Assignee
Carl Zeiss SMT GmbH
Carl Zeiss AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH, Carl Zeiss AG filed Critical Carl Zeiss SMT GmbH
Publication of EP0475098A2 publication Critical patent/EP0475098A2/en
Publication of EP0475098A3 publication Critical patent/EP0475098A3/en
Application granted granted Critical
Publication of EP0475098B1 publication Critical patent/EP0475098B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K7/00—Gamma- or X-ray microscopes

Abstract

The X-ray microscope has a pulsed X-ray source which supplies an intense line radiation such as, for example, a plasma focus source, a reflecting condenser which focuses the radiation of the X-ray source onto the object to be examined, and a X-ray optical system which is constructed as a zone plate and by means of which the object is projected at high resolution onto an X-ray detector. <??>By means of this combination, it is still possible in conjunction with a high resolution free from image defects simultaneously to release at the sample point on the imaging side a satisfactorily high level of X-ray energy, thus producing the short exposure times necessary for the examination of living cells.
EP91113635A 1990-08-29 1991-08-14 X-ray microscope Expired - Lifetime EP0475098B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4027285A DE4027285A1 (en) 1990-08-29 1990-08-29 X-RAY MICROSCOPE
DE4027285 1990-08-29

Publications (3)

Publication Number Publication Date
EP0475098A2 EP0475098A2 (en) 1992-03-18
EP0475098A3 true EP0475098A3 (en) 1992-07-22
EP0475098B1 EP0475098B1 (en) 1996-02-07

Family

ID=6413137

Family Applications (1)

Application Number Title Priority Date Filing Date
EP91113635A Expired - Lifetime EP0475098B1 (en) 1990-08-29 1991-08-14 X-ray microscope

Country Status (5)

Country Link
US (1) US5222113A (en)
EP (1) EP0475098B1 (en)
JP (1) JP3133103B2 (en)
AT (1) ATE134065T1 (en)
DE (2) DE4027285A1 (en)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5528646A (en) * 1992-08-27 1996-06-18 Olympus Optical Co., Ltd. Sample vessel for X-ray microscopes
WO1995008174A1 (en) * 1993-09-15 1995-03-23 Carl-Zeiss-Stiftung Handelnd Als Carl Zeiss Phase contrast x-ray mocroscope
US6091796A (en) * 1994-11-23 2000-07-18 Thermotrex Corporation Scintillator based microscope
US5965065A (en) * 1994-12-05 1999-10-12 Powell; Stephen Forbes Method of filtering x-rays
DE59700582D1 (en) * 1996-01-10 1999-11-25 Bastian Niemann CONDENSOR MONOCHROMATOR ARRANGEMENT FOR X-RAY RADIATION
DE59703140D1 (en) * 1996-01-12 2001-04-19 Niemann Bastian X-RAY MICROSCOPE WITH ZONE PLATES
CN1175430C (en) * 1997-04-08 2004-11-10 Xrt有限公司 High resolution X-ray imaging of vary small objects
GB9815968D0 (en) * 1998-07-23 1998-09-23 Bede Scient Instr Ltd X-ray focusing apparatus
DE19956782C2 (en) * 1999-11-25 2001-11-15 Lutz Kipp Optical focusing element, measuring system and apparatus with such an optical element and use of the same
EP1126477A3 (en) * 2000-02-14 2003-06-18 Leica Microsystems Lithography GmbH Method for structure investigation in a semiconductor substrate
US6195272B1 (en) 2000-03-16 2001-02-27 Joseph E. Pascente Pulsed high voltage power supply radiography system having a one to one correspondence between low voltage input pulses and high voltage output pulses
JP4220170B2 (en) * 2002-03-22 2009-02-04 浜松ホトニクス株式会社 X-ray image magnifier
EP1455365A3 (en) * 2002-05-10 2014-12-17 Carl Zeiss SMS GmbH Reflective X-ray microscope and inspection system for examining objects with wavelengths 100nm
US7245696B2 (en) * 2002-05-29 2007-07-17 Xradia, Inc. Element-specific X-ray fluorescence microscope and method of operation
ATE488011T1 (en) * 2002-08-02 2010-11-15 X Ray Optical Sys Inc OPTICAL DEVICE MADE OF A MULTIPLE CURVED OPTICAL CRYSTALS FOR FOCUSING X-RAYS
US7365909B2 (en) * 2002-10-17 2008-04-29 Xradia, Inc. Fabrication methods for micro compounds optics
US7072442B1 (en) * 2002-11-20 2006-07-04 Kla-Tencor Technologies Corporation X-ray metrology using a transmissive x-ray optical element
DE10254026C5 (en) * 2002-11-20 2009-01-29 Incoatec Gmbh Reflector for X-radiation
US7119953B2 (en) * 2002-12-27 2006-10-10 Xradia, Inc. Phase contrast microscope for short wavelength radiation and imaging method
DE10319269A1 (en) * 2003-04-25 2004-11-25 Carl Zeiss Sms Gmbh Imaging system for a microscope based on extremely ultraviolet (EUV) radiation
DE10334169A1 (en) 2003-07-26 2005-02-24 Bruker Axs Gmbh Encapsulated x-ray mirror
US7170969B1 (en) * 2003-11-07 2007-01-30 Xradia, Inc. X-ray microscope capillary condenser system
US20050211910A1 (en) * 2004-03-29 2005-09-29 Jmar Research, Inc. Morphology and Spectroscopy of Nanoscale Regions using X-Rays Generated by Laser Produced Plasma
US7302043B2 (en) * 2004-07-27 2007-11-27 Gatan, Inc. Rotating shutter for laser-produced plasma debris mitigation
US7452820B2 (en) * 2004-08-05 2008-11-18 Gatan, Inc. Radiation-resistant zone plates and method of manufacturing thereof
US7466796B2 (en) * 2004-08-05 2008-12-16 Gatan, Inc. Condenser zone plate illumination for point X-ray sources
US7231017B2 (en) * 2005-07-27 2007-06-12 Physical Optics Corporation Lobster eye X-ray imaging system and method of fabrication thereof
WO2007016484A2 (en) 2005-08-01 2007-02-08 The Research Foundation Of State University Of New York X-ray imaging systems employing point-focusing, curved monochromating optics
US20070108387A1 (en) * 2005-11-14 2007-05-17 Xradia, Inc. Tunable x-ray fluorescence imager for multi-element analysis
DE102005056404B4 (en) * 2005-11-23 2013-04-25 Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh X-ray microscope with condenser monochromator arrangement of high spectral resolution
US7499521B2 (en) * 2007-01-04 2009-03-03 Xradia, Inc. System and method for fuel cell material x-ray analysis
DE102007041939A1 (en) * 2007-09-04 2009-03-05 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Apparatus and method for XUV microscopy
US9291578B2 (en) 2012-08-03 2016-03-22 David L. Adler X-ray photoemission microscope for integrated devices
US9129715B2 (en) 2012-09-05 2015-09-08 SVXR, Inc. High speed x-ray inspection microscope
US20160086681A1 (en) * 2014-09-24 2016-03-24 Carl Zeiss X-ray Microscopy, Inc. Zone Plate and Method for Fabricating Same Using Conformal Coating
CN114424054B (en) 2019-06-24 2024-03-22 Sms集团有限公司 Apparatus and method for determining material properties of polycrystalline product
DE102019124919B4 (en) 2019-09-17 2021-08-26 Ri Research Instruments Gmbh Microscopic system for testing structures and defects on EUV lithography photomasks

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1987000644A1 (en) * 1985-07-19 1987-01-29 Shimadzu Corporation Soft x-ray lithographic system
EP0459833A2 (en) * 1990-06-01 1991-12-04 Canon Kabushiki Kaisha X-ray microscope

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3332711A1 (en) * 1983-09-10 1985-03-28 Fa. Carl Zeiss, 7920 Heidenheim DEVICE FOR GENERATING A PLASMA SOURCE WITH HIGH RADIATION INTENSITY IN THE X-RAY AREA
DE3642457A1 (en) * 1986-12-12 1988-06-30 Zeiss Carl Fa ROENTGEN MICROSCOPE
US4912737A (en) * 1987-10-30 1990-03-27 Hamamatsu Photonics K.K. X-ray image observing device
JP2844703B2 (en) * 1989-08-09 1999-01-06 株式会社ニコン Imaging soft X-ray microscope
JP2883122B2 (en) * 1989-10-20 1999-04-19 オリンパス光学工業株式会社 X-ray microscope

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1987000644A1 (en) * 1985-07-19 1987-01-29 Shimadzu Corporation Soft x-ray lithographic system
EP0459833A2 (en) * 1990-06-01 1991-12-04 Canon Kabushiki Kaisha X-ray microscope

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 15, no. 234 (P-1215)14. Juni 1991 & JP-03 071 100 (NIKON CORP.) 26. März 1991 *

Also Published As

Publication number Publication date
JP3133103B2 (en) 2001-02-05
DE4027285A1 (en) 1992-03-05
ATE134065T1 (en) 1996-02-15
EP0475098A2 (en) 1992-03-18
EP0475098B1 (en) 1996-02-07
JPH04262300A (en) 1992-09-17
DE59107380D1 (en) 1996-03-21
US5222113A (en) 1993-06-22

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