DE59107380D1 - Röntgenmikroskop - Google Patents

Röntgenmikroskop

Info

Publication number
DE59107380D1
DE59107380D1 DE59107380T DE59107380T DE59107380D1 DE 59107380 D1 DE59107380 D1 DE 59107380D1 DE 59107380 T DE59107380 T DE 59107380T DE 59107380 T DE59107380 T DE 59107380T DE 59107380 D1 DE59107380 D1 DE 59107380D1
Authority
DE
Germany
Prior art keywords
ray
high resolution
source
onto
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE59107380T
Other languages
English (en)
Inventor
Juergen Dr Thieme
Guenter Prof Dr Schmahl
Bastian Dr Nieman
Dietbert Dr Rudolph
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Carl Zeiss AG
Original Assignee
Carl Zeiss SMT GmbH
Carl Zeiss AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH, Carl Zeiss AG filed Critical Carl Zeiss SMT GmbH
Application granted granted Critical
Publication of DE59107380D1 publication Critical patent/DE59107380D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K7/00—Gamma- or X-ray microscopes

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Liquid Crystal Substances (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
DE59107380T 1990-08-29 1991-08-14 Röntgenmikroskop Expired - Fee Related DE59107380D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4027285A DE4027285A1 (de) 1990-08-29 1990-08-29 Roentgenmikroskop

Publications (1)

Publication Number Publication Date
DE59107380D1 true DE59107380D1 (de) 1996-03-21

Family

ID=6413137

Family Applications (2)

Application Number Title Priority Date Filing Date
DE4027285A Withdrawn DE4027285A1 (de) 1990-08-29 1990-08-29 Roentgenmikroskop
DE59107380T Expired - Fee Related DE59107380D1 (de) 1990-08-29 1991-08-14 Röntgenmikroskop

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE4027285A Withdrawn DE4027285A1 (de) 1990-08-29 1990-08-29 Roentgenmikroskop

Country Status (5)

Country Link
US (1) US5222113A (de)
EP (1) EP0475098B1 (de)
JP (1) JP3133103B2 (de)
AT (1) ATE134065T1 (de)
DE (2) DE4027285A1 (de)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5528646A (en) * 1992-08-27 1996-06-18 Olympus Optical Co., Ltd. Sample vessel for X-ray microscopes
JP3703483B2 (ja) * 1993-09-15 2005-10-05 カール−ツァイス−スチフツング 位相コントラスト−ｘ線顕微鏡
US6091796A (en) * 1994-11-23 2000-07-18 Thermotrex Corporation Scintillator based microscope
US5965065A (en) * 1994-12-05 1999-10-12 Powell; Stephen Forbes Method of filtering x-rays
WO1997025722A2 (de) * 1996-01-10 1997-07-17 Bastian Niemann Kondensor-monochromator-anordnung für röntgenstrahlung
WO1997025723A2 (de) * 1996-01-12 1997-07-17 Niemann, Bastian Röntgenmikroskop mit zonenplatten
JP2001519022A (ja) * 1997-04-08 2001-10-16 エックス−レイ・テクノロジーズ・プロプライエタリー・リミテッド 微小物の高解像度ｘ線撮像方法
GB9815968D0 (en) 1998-07-23 1998-09-23 Bede Scient Instr Ltd X-ray focusing apparatus
DE19956782C2 (de) * 1999-11-25 2001-11-15 Lutz Kipp Optisches Fokussierelement, Meßsystem und Apparatur mit einem solchen optischen Element und Verwendung desselben
EP1126477A3 (de) * 2000-02-14 2003-06-18 Leica Microsystems Lithography GmbH Verfahren zur Untersuchung von Strukturen auf einem Halbleiter-Substrat
US6195272B1 (en) 2000-03-16 2001-02-27 Joseph E. Pascente Pulsed high voltage power supply radiography system having a one to one correspondence between low voltage input pulses and high voltage output pulses
JP4220170B2 (ja) * 2002-03-22 2009-02-04 浜松ホトニクス株式会社 Ｘ線像拡大装置
EP1455365A3 (de) * 2002-05-10 2014-12-17 Carl Zeiss SMS GmbH Reflektives Röntgenmikroskop und Inspektionssystem zur Untersuchung von Objekten mit Wellenlängen 100nm
US7245696B2 (en) * 2002-05-29 2007-07-17 Xradia, Inc. Element-specific X-ray fluorescence microscope and method of operation
ATE488011T1 (de) * 2002-08-02 2010-11-15 X Ray Optical Sys Inc Optische vorrichtung aus einer vielzahl von gekrümmten optischen kristallen zum fokussieren von röntgenstrahlen
US7365909B2 (en) * 2002-10-17 2008-04-29 Xradia, Inc. Fabrication methods for micro compounds optics
US7072442B1 (en) * 2002-11-20 2006-07-04 Kla-Tencor Technologies Corporation X-ray metrology using a transmissive x-ray optical element
DE10254026C5 (de) * 2002-11-20 2009-01-29 Incoatec Gmbh Reflektor für Röntgenstrahlung
US7119953B2 (en) * 2002-12-27 2006-10-10 Xradia, Inc. Phase contrast microscope for short wavelength radiation and imaging method
DE10319269A1 (de) * 2003-04-25 2004-11-25 Carl Zeiss Sms Gmbh Abbildungssystem für ein, auf extrem ultravioletter (EUV) Strahlung basierendem Mikroskop
DE10334169A1 (de) 2003-07-26 2005-02-24 Bruker Axs Gmbh Gekapselter Röntgenspiegel
US7170969B1 (en) * 2003-11-07 2007-01-30 Xradia, Inc. X-ray microscope capillary condenser system
US20050211910A1 (en) * 2004-03-29 2005-09-29 Jmar Research, Inc. Morphology and Spectroscopy of Nanoscale Regions using X-Rays Generated by Laser Produced Plasma
US7302043B2 (en) * 2004-07-27 2007-11-27 Gatan, Inc. Rotating shutter for laser-produced plasma debris mitigation
US7452820B2 (en) * 2004-08-05 2008-11-18 Gatan, Inc. Radiation-resistant zone plates and method of manufacturing thereof
US7466796B2 (en) * 2004-08-05 2008-12-16 Gatan, Inc. Condenser zone plate illumination for point X-ray sources
US7231017B2 (en) * 2005-07-27 2007-06-12 Physical Optics Corporation Lobster eye X-ray imaging system and method of fabrication thereof
US7583789B1 (en) 2005-08-01 2009-09-01 The Research Foundation Of State University Of New York X-ray imaging systems employing point-focusing, curved monochromating optics
US20070108387A1 (en) * 2005-11-14 2007-05-17 Xradia, Inc. Tunable x-ray fluorescence imager for multi-element analysis
DE102005056404B4 (de) * 2005-11-23 2013-04-25 Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh Röntgenmikroskop mit Kondensor-Monochromator-Anordnung hoher spektraler Auflösung
US7499521B2 (en) * 2007-01-04 2009-03-03 Xradia, Inc. System and method for fuel cell material x-ray analysis
DE102007041939A1 (de) * 2007-09-04 2009-03-05 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung und Verfahren für die XUV-Mikroskopie
US9291578B2 (en) 2012-08-03 2016-03-22 David L. Adler X-ray photoemission microscope for integrated devices
US9129715B2 (en) 2012-09-05 2015-09-08 SVXR, Inc. High speed x-ray inspection microscope
US20160086681A1 (en) * 2014-09-24 2016-03-24 Carl Zeiss X-ray Microscopy, Inc. Zone Plate and Method for Fabricating Same Using Conformal Coating
EP3987279B1 (de) 2019-06-24 2023-11-08 SMS Group GmbH Vorrichtung und verfahren zum bestimmen der werkstoffeigenschaften eines polykristallinen produkts
DE102019124919B4 (de) * 2019-09-17 2021-08-26 Ri Research Instruments Gmbh Mikroskopisches System zur Prüfung von Strukturen und Defekten auf EUV-Lithographie-Photomasken

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3332711A1 (de) * 1983-09-10 1985-03-28 Fa. Carl Zeiss, 7920 Heidenheim Vorrichtung zur erzeugung einer plasmaquelle mit hoher strahlungsintensitaet im roentgenbereich
JPS6221223A (ja) * 1985-07-19 1987-01-29 Shimadzu Corp 軟ｘ線用投影結像装置
DE3642457A1 (de) * 1986-12-12 1988-06-30 Zeiss Carl Fa Roentgen-mikroskop
US4912737A (en) * 1987-10-30 1990-03-27 Hamamatsu Photonics K.K. X-ray image observing device
JP2844703B2 (ja) * 1989-08-09 1999-01-06 株式会社ニコン 結像型軟ｘ線顕微鏡装置
JP2883122B2 (ja) * 1989-10-20 1999-04-19 オリンパス光学工業株式会社 Ｘ線顕微鏡
JP2921038B2 (ja) * 1990-06-01 1999-07-19 キヤノン株式会社 Ｘ線を用いた観察装置

Also Published As

Publication number Publication date
US5222113A (en) 1993-06-22
EP0475098A2 (de) 1992-03-18
JPH04262300A (ja) 1992-09-17
JP3133103B2 (ja) 2001-02-05
ATE134065T1 (de) 1996-02-15
EP0475098A3 (en) 1992-07-22
EP0475098B1 (de) 1996-02-07
DE4027285A1 (de) 1992-03-05

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee