JP2009302461A - Substrate processing device, and substrate processing method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To suppress occurrence of development spotting by efficiently and smoothly performing operations to perform separated recovery of first processing liquid supplied to a substrate to be processed on a conveyance line of a flush level and replace it with second processing liquid. <P>SOLUTION: The substrate processing device includes: the conveyance line 2 of a flush level including a first conveyance section M1 having a horizontal conveyance path, a second conveyance section wherein an upward inclined conveyance path is formed from the horizontal conveyance path, and a third conveyance section wherein a downward inclined conveyance line connecting with the second conveyance section M2 is formed in a state wherein the section conveyance section M2 is inclined upward; a conveyance driving unit which drives a conveyance body 6; a first processing liquid supply unit 9 which supplies the first processing liquid D onto the substrate G in the first conveyance section M1; a second processing liquid supply unit 13 which supplies the second processing liquid W onto the substrate G in the third conveyance section M3; and an elevation means of elevating the conveyance body 6 laid in the second conveyance section M2 in a state wherein the substrate G to be processed is mounted in the second conveyance section M2 to form the upward inclined conveyance path connecting with the first conveyance section M1. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a substrate processing technique for supplying a processing liquid onto a substrate to be processed and performing a predetermined processing, and in particular, a substrate processing apparatus and a substrate processing method for performing a liquid processing while transporting a substrate in a horizontal direction by a flat flow method. About.

  Recently, resist coating and development processing systems in LCD (liquid crystal display) manufacturing have been developed as a development method that can advantageously cope with the increase in size of LCD substrates (for example, glass substrates). On the other hand, a so-called flat-flow method is widely used in which a series of development processing steps such as development, rinsing, and drying are performed during conveyance. Such a flat flow method has advantages such as easier handling of a large substrate and less occurrence of mist or reattachment to the substrate, compared to a spinner method that rotates the substrate.

  In order to increase the separation recovery rate of the developing solution, the conventional developing processing apparatus adopting the flat flowing method has a substrate on the downstream side of the developing solution supply section in the flat conveying path as disclosed in Patent Document 1, for example. The substrate tilting mechanism is installed to tilt the substrate in the transport direction, and the developer is supplied on the horizontal substrate by the developer supply unit, and the substrate is flown as it is to the downstream side of the transport path, and a predetermined position on the transport path after a predetermined time. Then, the substrate tilting mechanism tilts the substrate forward or backward, drops the developer on the substrate by gravity, and collects the developer that has dropped down on the pan for collecting the developer.

  When the substrate tilting mechanism finishes draining the liquid in the tilted posture as described above within a predetermined time and returns the substrate to the horizontal posture, the substrate is then sent to the downstream rinse section in a flat flow, where the rinse nozzle is By spraying the rinsing liquid onto the horizontal substrate, the replacement of the developing solution with the rinsing liquid is performed on the substrate (development is stopped). The liquid that has fallen from the substrate in the rinse section is collected in a rinse liquid collecting pan. Then, while the rinsed substrate passes through the downstream drying section in a flat flow, the air knife applies a high-pressure air flow to the horizontal substrate in a direction opposite to the conveying direction to drain the substrate. The surface is dry.

  However, in the conventional development processing apparatus as described above, the substrate on which the developer is stacked is stopped on the transport path, the posture is changed from the horizontal state to the inclined state, and after the liquid is drained in the inclined posture, again There was one aspect that the mechanism and a series of operations of returning to a horizontal posture and resuming the conveyance of a flat flow are quite complicated and inefficient. Furthermore, since there is a long time lag from the start of liquid removal of the developer to the start of the liquid replacement at the downstream rinse portion, that is, the development stop rinse process, the front side of the substrate before the rinse process is executed. Therefore, there is a concern that the quality of the development process is deteriorated such that the surface to be processed is dried and spots of spots occur.

In response to such a problem, the applicant of the present application has disclosed a developing unit (substrate processing apparatus) in Patent Document 2 that can efficiently replace a developing solution on a substrate with a rinsing solution. The main part of the developing unit disclosed in Patent Document 2 is schematically shown in FIG.
In the flat flow conveyance path 90 shown in FIG. 7, the developing solution 91 discharges the developing solution D from the developing solution supply nozzle 92 to the processing surface of the substrate G conveyed in a horizontal posture, and the processing target is processed. The entire surface is filled with developer D. Next, the substrate G is transported to the rinsing section 93, and the developer D is poured off while being transported on a transport roller (transport path 90) that is inclined in a mountain-like manner, so that rinse water such as pure water is rinsed from the rinse liquid supply nozzle 94. The rinsing process is performed by supplying the liquid W.

That is, in the rinsing section 93, the substrate G passes through the conveying path 90 inclined in a mountain, so that the tip direction of the substrate G is inclined to a higher state and the developer D on the substrate flows backward. .
Then, when the front end of the substrate goes down the mountain-shaped conveyance path 90, the surface to be processed is rinsed with the rinsing liquid W supplied from the rinsing liquid supply nozzle 94 provided thereabove.

As described above, after collecting the developing solution D on the substrate, the developing solution D is efficiently replaced with the rinsing solution W without taking a long time, and thereby, from the front end side of the substrate G before the rinsing process is executed. The surface to be processed is not dried, and the developer D is poured off to prevent the occurrence of blotches.
JP 2003-7582 A JP 2007-5695 A

In recent years, for example, in the formation of amorphous Si TFT (amorphous silicon thin film transistor) in the LCD manufacturing process, a method using half-tone exposure (hereinafter referred to as half exposure) is often employed to shorten the exposure process.
As shown in FIG. 8A, half-exposure is to perform an exposure process on the resist film R on the substrate G1 using a halftone mask 150 having a difference in light transmittance. After development by this processing, as shown in FIG. 8B, resist patterns R having different film thicknesses (thin film portion R1 and thick film portion R2) are obtained.

However, when this half-exposed substrate is developed by the developing unit disclosed in Patent Document 2, there is a possibility that development spots may occur at a portion where the thin mask portion is to be exposed by the half mask portion.
That is, in the developing unit shown in FIG. 7, when the leading end of the substrate G reaches the mountain-shaped transport path of the rinse portion 93, the substrate G is gradually tilted upward from the leading end while being transported. As shown in FIG. 9A, the developing solution D near the front end of the substrate flows backward and starts to be pulled. At this time, a plurality of arcs C are drawn side by side in the substrate width direction by the traces drawn by the developer so as to hang from the front end side of the substrate.

  This arc extends downward as the substrate G rises in the mountain-shaped conveyance path 90, and until the tip of the substrate is supplied with the rinsing liquid W by the rinse supply nozzle 94, as shown in FIG. As shown in FIG. 9C, the developer D remains as a tangent C1 of the adjacent arc C. Here, if this linear developer remaining (tangent C1) is present on the half exposure portion (the portion where the thin film portion R1 is to be formed) as shown in FIG. 8B, it is washed away by the rinsing liquid W. It took a long time to develop, and the development progressed more than necessary at that portion, and there was a problem that development spots occurred.

  The present invention has been made in view of the above-described problems of the prior art, and separates and collects the first processing liquid supplied to the substrate to be processed on the flat-carrying transfer line, thereby providing the second processing liquid. An object of the present invention is to provide a substrate processing apparatus and a substrate processing method which can efficiently and smoothly perform the replacement operation to suppress development spots.

  In order to solve the above-described problems, a substrate processing apparatus according to the present invention supplies a first processing liquid to a substrate to be processed, performs a predetermined liquid processing, collects the first processing liquid, and performs a second processing. A substrate processing apparatus for cleaning with the processing liquid, wherein a transport body for transporting the substrate to be processed is laid in a predetermined transport direction, and has a transport path that is substantially horizontal in the transport direction. A second transport section that can form an upwardly inclined transport path following the first transport section from a horizontal transport path, and the second transport section in an upwardly inclined state. And a third conveyance section that forms a downwardly inclined conveyance path following the conveyance section, and a conveyance drive unit that drives the conveyance body to convey the substrate on the conveyance line; , Supplying a first processing liquid onto the substrate in the first transfer section A first processing liquid supply section, a second processing liquid supply section for supplying a second processing liquid onto the substrate in the third transport section, and the substrate to be processed in the second transport section. And a lifting means for ascending and moving the transport body laid in the second transport section to form an upwardly inclined transport path following the first transport section. Have.

With this configuration, when the substrate to be processed is placed in the second transport section, an upwardly inclined transport path is formed, and the first tilt from the top of the substrate as an upward slope immediately before supplying the second processing liquid. The second processing liquid can be supplied in order from the front end of the substrate drawn by the first processing liquid.
Thereby, the 1st processing liquid on a substrate can be immediately replaced with the 2nd processing liquid. In other words, after the developer (first processing solution) has flowed down as in the prior art, there is almost no time left in the state of remaining on the spots, and the occurrence of development spots can be suppressed.

Further, in the transfer line, a horizontal portion is formed on the top of the raised portion formed by the second transfer section inclined upward by the elevating means and the third transfer section inclined downward. It is desirable.
By providing the horizontal portion in this way, the flow force due to gravity can be suppressed by the surface tension of the first processing liquid, and the first processing liquid is applied to the entire substrate until just before the second processing liquid is supplied. A predetermined process can be performed.

Further, after the first processing liquid is supplied onto the substrate to be processed, before the second processing liquid is supplied, the substrate is transferred to the substrate to be processed which is transferred on the transfer line. It is desirable to provide surface leveling means for leveling the first treatment liquid remaining on the surface. The surface leveling means is provided along the width direction of the substrate, and a roller for leveling the substrate surface by contacting the substrate surface, or by applying a predetermined gas flow to the substrate surface. An air knife for leveling or a plate member for leveling the substrate surface by contacting the substrate surface is preferred.
By providing the surface leveling means in this way, the first processing liquid can be almost removed from the portion on the substrate to which the second processing liquid is supplied, and thereby the first processing liquid and the second processing liquid can be removed. Without mixing with the processing liquid, it is possible to suppress the occurrence of spots, and to facilitate the separate collection of the first processing liquid and the second processing liquid.

A control unit that controls driving of the lifting unit; and a substrate detection unit that detects that a substrate to be processed transported in the second transport section has reached a predetermined position and outputs a detection signal to the control unit. When the control means receives the detection signal from the substrate detection means, the control means drives the elevating means, and an upward inclined conveyance path that follows the first conveyance section is provided in the second conveyance section. It is desirable to form.
In addition, the transport body laid in the third transport section is provided so as to be movable up and down by the lifting and lowering means, and the control means drives the lifting and lowering means when receiving the detection signal from the substrate detecting means. It is desirable to form a downwardly inclined transport path following the second transport section in the third transport section.
With this configuration, it is possible to detect at a precise timing that the substrate has reached a predetermined position in the second transport section, and subsequent processing can be performed effectively.

In order to solve the above-described problem, a substrate processing method according to the present invention supplies a first processing liquid to a substrate to be processed, performs a predetermined liquid processing, and collects the first processing liquid. A substrate processing method for cleaning with a second processing liquid, the step of supplying the first processing liquid to a substrate to be processed transported in a horizontal posture in a first transport section; and the first processing A step of transporting the substrate to be processed supplied with the liquid to the second transport section in a horizontal posture, and a step of detecting that the substrate to be processed transported through the second transport section has reached a predetermined position. And after the detection, a step of forming an up-inclined conveyance path in the second conveyance section, and a first step of forming a down-inclined conveyance path formed following the up-inclined second conveyance section. The substrate to be processed is transferred to a transfer section 3 and the substrate to be processed Characterized in that run and providing the second treatment liquid. In addition, after detecting that the substrate to be processed transported in the second transport section has reached a predetermined position, simultaneously with the step of forming an upwardly inclined transport path in the second transport section, It is preferable that a step of forming a downwardly inclined conveyance path following the second conveyance section is performed in the third conveyance section.
By such a method, the first processing liquid on the substrate can be immediately replaced with the second processing liquid. In other words, after the developer (first processing solution) has flowed down as in the prior art, there is almost no time left in the state of remaining on the spots, and the occurrence of development spots can be suppressed.

In addition, after the step of detecting that the substrate to be processed transported in the second transport section has reached a predetermined position, a step of stopping the transport of the substrate to be processed is performed, and the second transport section It is desirable to execute a step of forming an upwardly inclined conveyance path.
By such control, a predetermined process with the first processing liquid can be performed on the entire substrate until just before the supply of the second processing liquid.

In addition, it is preferable that the speed of the substrate to be processed transported to the third transport section is controlled to increase after an upwardly inclined transport path is formed in the second transport section.
By such control, immediately after the first processing liquid is removed from the substrate, the second processing liquid can be supplied immediately onto the substrate, and the occurrence of development spots can be more reliably suppressed. .

  According to the present invention, the operation of separating and recovering the first processing liquid supplied to the substrate to be processed on the flat-flowing conveyance line and replacing it with the second processing liquid is performed efficiently and smoothly, and the occurrence of development spots is suppressed. A substrate processing apparatus and a substrate processing method that can be performed can be obtained.

Hereinafter, embodiments of the substrate processing apparatus and the substrate processing method of the present invention will be described with reference to the drawings. The substrate processing apparatus of the present invention uses, for example, a glass substrate for LCD as a substrate to be processed (hereinafter referred to as a substrate), and performs cleaning, resist coating, pre-baking, development, post-baking, etc. in the photolithography process in the LCD manufacturing process. The present invention can be applied to a partial configuration of a coating and developing processing system that performs each processing.
Specifically, the present invention can be applied to a development unit (DEV) that applies development and rinsing processing to a substrate that has been coated with a photoresist and subjected to exposure processing through a mask pattern. Hereinafter, an embodiment in which the present invention is applied to a developing unit (DEV) will be described with reference to the drawings.

  FIG. 1 schematically shows the overall configuration of the developing unit (DEV) 1 in this embodiment. As shown in the figure, the developing unit (DEV) 1 is provided with a flat flow conveying line 2 extending in the horizontal direction (X direction) along the process line A, and from the upstream side along the conveying line 2. A developing unit 3, a rinsing unit 4 and a drying unit 5 are provided in this order.

  The transfer line 2 has a roller 6 (transport body) for transporting the substrate G at a predetermined speed (for example, 60 mm / s) with the surface to be processed facing upward, in a transport direction (X direction). The rollers 6 are laid at intervals (e.g., 100 mm intervals), and each roller 6 is connected to a conveyance drive unit (not shown) having an electric motor, for example, via a transmission mechanism such as a gear mechanism or a belt mechanism.

  The transport line 2 does not continue at the same height position from the start point to the end point in the transport direction (X direction), but is a first bulge formed by bulging control of the roller 6 at a predetermined position on the way. 2a, a second raised portion 2b in which the arrangement of the rollers 6 is fixed, and a stepped portion 2c. As shown in FIG. 1, the shape of the conveyance path viewed from one side in the conveyance direction (X direction) According to, it can be divided into nine transport sections M1, M2, M3, M4, M5, M6, M7, M8, and M9.

The first conveyance section M1 is a first section set at a position slightly upstream (upstream side) from the start point P0 in the pass unit (PASS) of the multi-stage unit section (TB) 7 to the exit in the developing section 3. This is a section up to the change point P1, and has a horizontal conveyance path extending substantially in a horizontal straight line while maintaining the height position of the start point P0.
The second conveyance section M2 is a section from the first section change point P1 to the second section change point P2 set at a position near the boundary between the developing unit 3 and the rinse unit 4. By controlling the elevation of the height position, a predetermined inclination angle (for example, 2 to 5 °) is reached to the top of the first raised portion 2a that can be made a predetermined amount (for example, 10 to 25 mm) higher than the height position of the starting point P0. ) And an upwardly inclined conveying path.

The third conveyance section M3 is a section from the second section change point P2 to the third section change point P3 set in the vicinity of the entrance of the rinse section 4, and controls the height position of the roller 6 to be raised. Thus, the downwardly inclined runway that descends at a predetermined inclination angle (for example, 2 to 5 °) from the top of the first raised portion 2a to a first bottom position that is lower by a predetermined amount (for example, 10 to 25 mm) than that. have.
In addition, in this 1st protruding part 2a (when raised by the raising control of the roller 6), the conveyance line 2 has a trapezoidal shape having a flat (horizontal) horizontal part H on the top.

  The fourth transport section M4 is a section from the third section change point P3 near the entrance to the fourth section change point P4 set at a predetermined position inside the rinse section 4 in the vicinity of the entrance. And a horizontal conveyance path extending in a substantially horizontal straight line at the same height as the bottom position.

The fifth transport section M5 is a section from the fourth section change point P4 to a fifth section change point P5 set at a position downstream by a predetermined distance from the fourth section change point P4 in the rinsing unit 4. The transport path has an upward slope that rises at a predetermined inclination angle (for example, 2 to 5 °) to the top of the second raised portion 2b that is a predetermined amount (for example, 10 to 25 mm) higher than the first bottom position.
The sixth transport section M6 is a section from the fifth section change point P5 to a sixth section change point P6 set at a position downstream by a predetermined distance from the fifth section change point P5 in the rinse unit 4, A downwardly inclined traveling path that descends at a predetermined inclination angle (for example, 2 to 5 °) from the top of the second raised portion 2b to a second bottom position that is lower by a predetermined amount (for example, 10 to 25 mm) than that. ing.

The seventh transport section M7 is a seventh position set in the rinsing section 4 at a position that is a predetermined distance from the sixth section change point P6, that is, a position slightly upstream (upstream) from the outlet. And a horizontal conveyance path extending in a substantially horizontal line at the same height as the second bottom position.
The eighth transport section M8 is a section from the seventh section change point P7 to the eighth section change point P8 set near the boundary between the rinse section 4 and the drying section 5, and the second bottom section It has an upwardly inclined traveling path that rises at a predetermined inclination angle (for example, 2 to 5 °) to the upper position of the stepped portion 2c that is a predetermined amount (for example, 10 to 25 mm) higher than the position.

  The ninth transport section M9 is a section that extends from the eighth section change point P8 through the drying section 5 and the decoloring process section 8 to the subsequent processing section, and the height of the upper position of the step section 2c is constant. It has a horizontal runway extending in a horizontal straight line while being maintained at the same position.

  Further, in the developing unit 3, a developer having a reference concentration (first processing) is directed from above toward a predetermined position in the first transport section M1 toward the horizontal substrate G that moves by roller transport on the transport line 2. One or a plurality of developing solution supply nozzles (hereinafter abbreviated as “developing nozzles”) 9 serving as a first processing solution supply unit that discharges (liquid) are arranged in the transport direction. Each developing nozzle 9 is composed of, for example, a slit-shaped discharge port or a long nozzle having a large number of fine-diameter discharge ports arranged in a row, and the developer is supplied from a developer supply source (not shown) through a pipe. It is supposed to be liquid.

  In the developing unit 3, a pan 10 is provided for collecting the developer that has fallen under the transport line 2. The drainage port of the pan 10 communicates with the developer reuse mechanism 12 via the drainage pipe 11. The developer reuse mechanism 12 collects the developer spilled when the developer is deposited on the substrate G by the developer nozzle 9 through the pan 10 and the drain tube 11, and the stock solution and the solvent are added to the collected developer. In addition, a recycled developer adjusted to a reference density is sent to the developer supply source.

  In the rinsing unit 4, liquid replacement from above is performed at a predetermined position in the third transfer section M 3 near the entrance toward the substrate G passing through the down slope of the first raised portion 2 a of the transfer line 2 ( A first rinsing liquid supply nozzle (hereinafter abbreviated as “rinsing nozzle”) 13 as a second processing liquid supply unit that discharges a rinsing liquid (second processing liquid) for development stop) is provided in the transport direction. One or more are arranged along.

In addition, a rinsing liquid for cleaning is discharged from above toward the substrate G passing through the ascending slope of the second raised portion 2b of the transfer line 2 at a predetermined position in the fifth transfer section M5 in the center. Two or more rinse nozzles 14 are arranged along the transport direction.
Further, a rinse liquid for finishing cleaning is discharged from above to a predetermined position in the sixth transport section M6 adjacent to the downstream side toward the substrate G passing through the descending slope of the second raised portion 2b of the transport line 2. One or more third rinse nozzles 15 are arranged along the transport direction.

  Further, a fourth rinse nozzle 16 that discharges a rinse liquid for final cleaning from above toward a substrate G that goes up the ascending step 2c of the transport line 2 at a predetermined position in the eighth transport section M8 near the outlet. Are arranged along the conveying direction. Each of the rinsing nozzles 13, 14, 15, 16 is composed of a long nozzle having the same configuration as the developer nozzle 9, for example, and is supplied with a rinsing liquid from a rinsing liquid supply source (not shown) via a pipe. It has become.

  In the rinse section 4, a pan 17 is provided for collecting the rinse liquid that has fallen under the transport line 2. The drain port of the pan 17 communicates with a rinse liquid recovery unit (not shown) via a drain pipe 18. Although not shown in the drawing, a lower rinse nozzle that sprays a rinse solution for cleaning onto the lower surface of the substrate G from below the transfer line 2 may be provided.

In the drying unit 5, the liquid is drained from above toward the substrate G immediately after the stepped portion 2c of the transfer line 2 at a predetermined position near the start end of the ninth transfer section M9 in the direction opposite to the transfer direction from above. One or a plurality of long gas nozzles or air knives 20 that apply a high-pressure gas flow (usually an air flow) for drying are arranged along the transport direction. A lower air knife (not shown) for applying a high-pressure gas flow for draining or drying from the bottom of the transfer line 2 toward the lower surface of the substrate G can also be installed. Moreover, you may provide the bread | pan (not shown) for collecting the liquid which fell under the conveyance line 2 in the drying part 5. FIG.
An i-ray irradiation unit (i-UV) that irradiates decoloring i-line (wavelength 365 nm) from above toward the substrate G moving on the conveyance line 2 by roller conveyance on the decolorization process unit 8 adjacent to the downstream side. 21 is provided.

  Further, the developing unit (DEV) 1 accommodates the developing unit 3, the rinsing unit 4 and the drying unit 5 in an integral housing 30, and the boundary between the different processing units is a peripheral line along the transport line 2. Partition walls 30a and 30b extending in the vertical direction for separating the space into the upstream side and the downstream side are provided. More specifically, a partition wall 30a is provided near the boundary between the developing unit 3 and the rinse unit 4, that is, in the vicinity of the boundary between the second conveyance section M2 and the third conveyance section M3, and the boundary between the rinse section 4 and the drying section 5 That is, the partition wall 30b is provided near the boundary between the eighth transport section M8 and the ninth transport section M9. Openings 31 and 32 through which the conveyance line 2 passes are formed in the respective partition walls 30a and 30b.

  In the developing unit (DEV) 1, the spaces in the processing units 3, 4 and 5 communicate with each other through the openings 31 and 32 of the partition walls 30a and 30b. In the developing unit 3 and the drying unit 5, clean air is lowered from the ceiling by the fans 33 and 34 for drawing outdoor air and the air filters 35 and 36 for removing dust from the air flow from the fans 33 and 34. It is designed to be supplied indoors with a flow. Among these, the clean air supplied from the ceiling of the developing unit 3 flows into the chamber of the rinse unit 4 through the opening 31 of the partition wall 30a so as to involve the mist of the developer generated during the developing process.

On the other hand, the clean air supplied from the ceiling of the drying unit 5 flows into the chamber of the rinse unit 4 through the opening 32 of the partition wall 30b so as to involve the mist of the rinse liquid generated in the drying (liquid draining) process. It is like that. An exhaust port 38 communicating with an exhaust mechanism 37 having an exhaust pump or an exhaust fan, for example, is provided at the bottom of the rinse unit 4.
As described above, the mist mixed air flowing in from the developing unit 3 side and the mist mixed air flowing in from the drying unit 5 side also join the mist generated in the rinse unit 4 from the left and right sides. The gas is discharged from the exhaust port 38.

In addition, there is a resin on the surface of the substrate G in the vicinity of the opening 31 where the substrate G moves from the developing unit 3 to the rinse unit 4 and in the vicinity of the end of the horizontal portion H formed on the top of the first raised portion 2a. A leveling roller 66 (surface leveling means) is provided along the substrate width direction for contacting a rotating roller made of a material and leveling the substrate surface. The leveling roller 66 is used to evenly push the developer remaining on the substrate G in a thin film state in the second conveying section M2 inclined upward so as to uniformly push the developer remaining on the substrate G to the rear. Is provided. By providing the leveling roller 66, when the substrate G is carried into the rinse section 4, most of the developer can be removed from the substrate G, and the effect of the subsequent rinsing process can be further improved. Further, mixing of the developing solution and the rinsing solution can be prevented, the occurrence of spots caused by the mixture can be suppressed, and the separation and collection can be facilitated.
Since the leveling roller 66 is provided for the purpose of leveling the substrate surface, the surface leveling means is not limited to this, and an air knife that applies a high-pressure gas flow to drain the liquid toward the lower surface may be used. Alternatively, the substrate surface may be leveled by bringing a plate member made of a resin material into contact with the substrate surface.

Next, the configurations of the developing unit 3 and the rinse unit 4 will be described in more detail.
FIG. 2 is a plan view showing a configuration of a roller conveyance path suitable for the second conveyance section M2. In this configuration example, two types of rollers 6 </ b> A and 6 </ b> B are used for the rollers 6 of the transfer line 2 according to the transfer section.
Specifically, the first type roller 6A constituting the first conveyance section M1 that is a horizontal conveyance path and the third conveyance section M3 that is a downward inclined path has a large diameter at several locations on a relatively thin shaft 50. The roller portion 51 is fixed, and the substrate G is placed on the roller portion 51 and rotated.

  The second type of roller 6B used in the second conveyance section M2 capable of forming an upward inclined path has a columnar or cylindrical shaft 52 having the same diameter as that of the first type roller portion 51. The substrate G is placed and rotated. In addition, it is preferable to attach a plurality of, for example, a rubber non-slip ring 53 to the second type roller 6B at an appropriate interval in the axial direction.

  Each roller 6 (6A, 6B) is rotatably supported at both ends by a bearing 55, and a timing belt of a belt transmission mechanism is attached to a gear pulley 56 attached to an end outside the bearing 55 at one end. 57 is wound. The timing belt 57 is connected to a rotation drive shaft of a conveyance drive unit (not shown) made of an electric motor. Note that the gear pulley 56 and the timing belt 57 of each roller 6 are disposed outside the housing 30.

Here, the structure of the 2nd conveyance area M2 and the 3rd conveyance area M3 which form the 1st protruding part 2a is demonstrated in detail using FIG. FIG. 3 is a side view for explaining the raising / lowering means of the roller 6 provided to form the first raised portion 2a.
As shown in FIG. 3, the bearing 55 of the second type roller 6 </ b> B used in the second transport section M <b> 2 that is an upward slope is supported by the lifting shaft 60. Each lifting / lowering shaft 60 is provided for each roller 6B, and can be moved up and down by, for example, a lifting / lowering driving unit 61 formed of a motor-driven cylinder. Elevation control is performed.

  Similarly, the bearing 55 of the first type roller 6A used in the third transport section M3 serving as a downward slope is supported by the lifting shaft 62. Each lifting / lowering shaft 62 is provided so as to be lifted / lowered by a lifting / lowering drive unit 63 provided for each roller 6 </ b> A, and lift control is performed by a section M <b> 3 lift control unit 72 of the control unit 70.

A substrate detection unit 65 (substrate detection means) that detects that the substrate G has reached a predetermined position and outputs a detection signal to the control unit 70 below the roller 6 near the end of the second transport section. Is provided. For example, a pendulum sensor that outputs a detection signal based on a rocking displacement at the time of passing through the substrate can be used as the substrate detection unit 65.
When the substrate detection unit 65 detects that the tip of the substrate G has approached the end of the second transport section (that is, the vicinity of the start of the third transport section), the section M2 elevating control unit 71 and the section M3 The elevating drive units 61 and 63 are driven by the control of the elevating control unit 72, and the elevating shafts 60 and 62 are moved up to form an upward inclined conveying path in the conveying section M2, and a downward inclined conveying path is formed in the conveying section M3. It is made to form (that is, the 1st protruding part 2a is formed).
The control unit 70 is also configured to perform drive control of the transport drive unit (not shown) to which a timing belt 57 for rotationally driving each roller 6 is connected.

  Moreover, when the 1st protruding part 2a is formed in the conveyance area M2 and the conveyance area M3, as above-mentioned, the flat horizontal part H is formed in the top. By forming the horizontal portion H, a predetermined developing process can be performed by leaving the developer on the entire surface of the substrate until immediately before the rinsing process with the rinsing liquid supplied from the rinsing nozzle 13.

Next, the overall operation of the developing unit (DEV) 1 will be described based on the flow of FIG. 4 and using the state transition diagrams of FIGS. 5 and 6 as appropriate. 5 shows the roller ascent control state of the transport sections M2 and M3 when the first raised portion 2a is formed, and FIG. 6 shows the state of the developer D on the substrate G at that time.
The substrate G that has undergone a series of heat treatments after exposure in a thermal processing unit (not shown) is carried into a pass unit (PASS) of the multi-stage unit unit (TB) 7 by a transport mechanism (not shown).
As shown in FIG. 1, a lift pin raising / lowering mechanism 40 for receiving the substrate G from the transport mechanism is provided in the pass unit (PASS). When the substrate G is horizontally transferred onto the transport line 2 by the lift pin lifting mechanism 40, the substrate G is adjacent to the developing unit (DEV) by roller transport at a constant speed (for example, 40 mm / s) by driving the transport driving unit. 1 (step S1 in FIG. 4).

  In the developing unit (DEV) 1, first, in the developing unit 3, the developing solution D is supplied from the stationary developing nozzle 9 while the substrate G moves in a horizontal posture in the first conveying section M 1 of the conveying line 2. On the substrate G, the developer D is deposited from the front end of the substrate toward the rear end of the substrate at a scanning speed equal to the transport speed (step S2 in FIG. 4, state shown in FIG. 6A). The developer D spilled from the substrate G is collected in the pan 10.

The substrate G on which the developer D has been deposited as described above is immediately transferred to the second transfer section M2 (step S3 in FIG. 4). Here, as shown in FIG. 5A, the second transport section M2 forms a horizontal transport path at the same height as the first transport section M1.
The substrate G (the front end) transported in the second transport section M2 reaches a predetermined position, specifically, the third transport section M3 on the rinse section 4 side as shown in FIG. 5B. (Step S4 in FIG. 4), the substrate detector 65 detects the substrate G and outputs a detection signal to the controller 70.
The control unit 70 that has received this detection signal temporarily stops driving the rollers 6 that are transporting the substrate G, and the substrate G is temporarily stopped for a predetermined time on the second transport section M2 (step of FIG. 4). S5).

Next, each lift drive unit 61 is driven by the control of the section M2 lift control unit 71, and the corresponding lift shaft 60 is lifted. At the same time, each lift drive unit 63 is driven by the control of the section M3 lift control unit 72, and the corresponding lift shaft 62 is lifted.
As a result, the roller 6 rises, and a mountain-shaped first raised portion 2a is formed as shown in FIG. 5C (stop S6 in FIG. 4).

  Here, since the flat horizontal portion H is formed on the top of the first raised portion 2a, the flow force due to gravity is suppressed by the surface tension of the developer, and the first raised portion 2a is completely formed. It is not until the developed state that the developer on the substrate moves downward, that is, rearward by gravity and begins to flow down from the rear end of the substrate. Further, as shown in FIG. 6B, the developer D starts to be drawn backward from the front end portion of the substrate. The developer that has flowed down is collected in the pan 10.

  Further, as soon as the first raised portion 2a is formed, the driving of the roller 6 is started. Here, the conveyance speed due to the rotation of the roller 6 is controlled to be increased (high speed) so that the rinsing process is quickly performed. The substrate G starts to be transported toward the third transport section M3 at a speed (for example, 60 mm / s) faster than the transport speed up to that time (step S7 in FIG. 4).

The substrate G started to be conveyed at a higher speed toward the rinsing unit 4 is subjected to a leveling process by a leveling roller 66 provided at a predetermined position in order from the substrate leading end direction where the developing solution D starts to the substrate end. (Step S8 in FIG. 4). As a result, almost no developer D remains on the substrate G at the leveled portion.
And the rinse liquid W is supplied to the site | part where the leveling process was performed immediately by the rinse nozzle 13 provided in the back | latter stage (state of FIG.6 (c)).
The rinse liquid supply onto the substrate G by the rinse nozzle 13 is performed in a time series as shown in FIGS. 5D and 5E when the substrate G descends the down slope of the third transport section M3. This is performed continuously (step S9 in FIG. 4). As a result, the developing solution D on the substrate G is completely replaced by the rinsing solution W, and the development stops.
The developing solution and the rinsing solution that have flowed forward of the substrate G are collected by the pan 17.

  In this way, in the process of replacing the processing solution on the substrate G from the developing solution D to the rinsing solution W, the developing solution and the rinsing solution are hardly mixed and can be performed without taking time. Accordingly, there is almost no time for the developer D to flow down and remain on the spots as in the conventional case, and the occurrence of development spots can be suppressed.

  The substrate G that has been subjected to the development processing as described above passes through the horizontal fourth transport section M4, and goes up the uphill slope of the second raised portion 2b in the next fifth transport section M5. At this time, the rinsing liquid for replacement remaining on the substrate G moves backward from the front end side of the substrate by gravity and flows down from the rear end of the substrate. Further, a rinse liquid for primary cleaning is supplied onto the substrate G from the upper rinse nozzle 14, and this new rinse liquid also flows down from the rear end of the substrate while expelling the old rinse liquid (step S10 in FIG. 4). The rinse liquid that has flowed down to the back of the substrate is collected by the pan 17. Thus, the substrate G that exceeds the apex of the second raised portion 2b is in a state in which the rinse liquid for primary cleaning remains as a thin liquid film on the upper surface of the substrate G. The conveyance section M6) is reached.

  Next, when the substrate G descends the descending ramp (M6) of the second raised portion 2b, a new rinse liquid for secondary cleaning is supplied onto the substrate G by the upper rinse nozzle 15, and the substrate G A new rinse liquid also flows down from the front edge of the substrate while chasing the primary cleaning liquid remaining thinly forward (step S11 in FIG. 4). The rinse liquid that has flowed down in front of the substrate G is collected by the pan 17.

  The substrate G that has been rinsed as described above passes through the horizontal seventh transport section M7 and goes up the slope of the ascending step 2c in the next eighth transport section M8. At this time, the finishing rinse liquid remaining on the substrate G moves from the substrate front end side to the rear by gravity and flows down from the substrate rear end. Further, the rinse liquid for final cleaning is supplied onto the substrate G from the upper rinse nozzle 16, and this new rinse liquid also flows down from the rear end of the substrate while expelling the old rinse liquid (step S12 in FIG. 4). The rinse liquid that has flowed down behind the substrate G is received and collected by the pan 17. And when the board | substrate G goes up the level | step-difference part 2c and enters the upper stage conveyance path in the drying part 5 side, ie, the 9th conveyance area M6, the air knife 20 makes a high-pressure gas flow with respect to the board | substrate G in a direction opposite to a conveyance direction. By applying, the remaining rinsing liquid on the substrate G is moved toward the rear of the substrate and driven out (removed) from the rear end of the substrate. The rinse liquid blown behind the substrate G is collected by the pan 17.

  The substrate G that has completed a series of development processing steps in the development unit (DEV) 1 moves straight on the transport line 2 as it is and undergoes decoloring processing in the decoloring process unit 8 adjacent to the downstream side, and then the multistage unit unit. (TB) is sent to a pass unit (PASS) (not shown) (step S13 in FIG. 4).

As described above, according to the embodiment of the present invention, the conveyance path before carrying in the rinsing unit is configured to be a conveyance path inclined upward from the horizontal conveyance path, and the substrate G is formed as an upward inclination immediately before the rinsing process. The developer D is poured from the top toward the rear end, and rinse treatment is sequentially performed from the front end of the substrate from which the developer D is drawn.
Thereby, the developing solution D on the substrate G can be immediately replaced with the rinsing solution W. That is, unlike the prior art, there is almost no time for the developer D to flow down and remain on the spots, and the occurrence of development spots can be suppressed.
Further, by performing the process of leveling the developer D on the substrate G by the leveling roller 66 before the rinse process, the developer D can be almost removed from the portion on the substrate G to which the rinse liquid W is supplied. Thus, the developing solution D and the rinsing solution W are not mixed, so that development spots caused by the mixing can be suppressed, and the separated collection of the developing solution D and the rinsing solution W can be facilitated.

In the above-described embodiment, the transport section M3 is also controlled to be lifted in accordance with the lift control of the transport section M2, and the first raised portion 2a is formed. The conveyance section M3 may be in the state of the downward conveyance path.
In addition, after the substrate G is transported to the transport section M2 and stopped at a predetermined position, the transport section M2 is controlled to be lifted to form an upwardly inclined transport path, but without stopping the transport of the substrate G. Alternatively, the conveyance section M2 may be lifted while being conveyed so as to form an upwardly inclined conveyance path.

FIG. 1 is a diagram schematically showing the overall configuration of a developing unit (DEV) to which the substrate processing apparatus of the present invention can be applied. FIG. 2 is a plan view showing a configuration of a roller conveyance path suitable for use in the second conveyance section. FIG. 3 is a side view for explaining a roller raising / lowering means provided for forming the first raised portion. FIG. 4 is a flowchart showing the flow of the entire operation in the developing unit (DEV). FIG. 5 is a diagram illustrating a roller raising control state in the second and third transport sections when the first raised portion is formed. FIG. 6 is a diagram illustrating a state of the developer on the substrate when the first raised portion is formed and the rinsing process is performed. FIG. 7 is a diagram schematically showing a main part of a conventional developing unit. FIG. 8 is a diagram for explaining halftone exposure processing. FIG. 9 is a diagram showing a state in which the developer on the substrate is poured off in the conventional developing unit.

Explanation of symbols

1 Development unit (substrate processing equipment)
2 Conveyance line 9 Developer supply nozzle (first processing solution supply unit)
13 Rinse solution supply nozzle (second treatment solution supply unit)
60 Lifting shaft (lifting means)
61 Lifting drive (lifting means)
62 Lifting shaft (lifting means)
63 Lifting drive part (lifting means)
65 Substrate detector (substrate detector)
66 Leveling roller (surface leveling means)
70 Control unit (control means)
G Substrate D D Developer (first treatment liquid)
W rinse liquid (second treatment liquid)

Claims (10)

A substrate processing apparatus that supplies a first processing liquid to a substrate to be processed, performs a predetermined liquid processing, collects the first processing liquid and cleans it with a second processing liquid,
A transport body for transporting the substrate to be processed is laid in a predetermined transport direction, and follows a first transport section having a transport path substantially horizontal in the transport direction, and the first transport section. A second conveying section capable of forming an upward inclined conveying path from a horizontal conveying path, and a downward inclined conveying path following the second conveying section are formed in a state where the second conveying section is inclined upward. A plain flow conveying line including a third conveying section;
A transport driving unit for driving the transport body to transport the substrate on the transport line;
A first processing liquid supply unit for supplying a first processing liquid onto the substrate in the first transfer section;
A second processing liquid supply unit for supplying a second processing liquid onto the substrate in the third transfer section;
In a state where the substrate to be processed is placed in the second transport section, the transport body laid in the second transport section is moved upward, and an upward inclined transport path following the first transport section A substrate processing apparatus comprising: lifting means for forming. In the transfer line,
A horizontal portion is formed on the top of the raised portion formed by the second transport section inclined upward by the elevating means and the third transport section inclined downward. Item 2. The substrate processing apparatus according to Item 1.   After the first processing liquid is supplied onto the substrate to be processed, before the second processing liquid is supplied, the substrate to be processed that is transported on the transport line is placed on the substrate. 3. The substrate processing apparatus according to claim 1, further comprising surface leveling means for leveling the remaining first processing liquid.   The surface leveling means is provided along the width direction of the substrate, and a roller for leveling the substrate surface by contacting the substrate surface or leveling the substrate surface by applying a predetermined gas flow to the substrate surface. The substrate processing apparatus according to claim 3, wherein the substrate processing apparatus is an air knife or a plate member that levels the substrate surface by contacting the substrate surface. Control means for controlling driving of the elevating means;
A substrate detection unit that detects that the substrate to be processed transported in the second transport section has reached a predetermined position, and outputs a detection signal to the control unit;
When the control means receives the detection signal from the substrate detection means, the control means drives the elevating means to form an upwardly inclined conveyance path following the first conveyance section in the second conveyance section. The substrate processing apparatus according to claim 1, wherein the substrate processing apparatus is characterized. The transport body laid in the third transport section is provided so as to be movable up and down by the lifting means,
When the control means receives the detection signal from the substrate detection means, the control means drives the elevating means to form a downwardly inclined conveyance path following the second conveyance section in the third conveyance section. The substrate processing apparatus according to claim 5, wherein the apparatus is a substrate processing apparatus. A substrate processing method of supplying a first processing liquid to a substrate to be processed, performing a predetermined liquid processing, recovering the first processing liquid and cleaning with a second processing liquid,
Supplying the first processing liquid to the substrate to be processed which is transported in a horizontal posture in the first transport section;
Transporting the substrate to be processed supplied with the first processing liquid to the second transport section in a horizontal posture;
Detecting that the substrate to be processed transported in the second transport section has reached a predetermined position;
After the detection is made, forming an upwardly inclined conveying path in the second conveying section;
The substrate to be processed is transported to a third transport section that forms a transport path having a downward slope formed following the second transport section having the upward slope, and the second processing liquid is supplied to the substrate to be processed. And a substrate processing method.   After detecting that the substrate to be processed transported in the second transport section has reached a predetermined position, simultaneously with the step of forming an upwardly inclined transport path in the second transport section, the first 8. The substrate processing method according to claim 7, wherein a step of forming a downwardly inclined transport path following the second transport section is performed in three transport sections. After the step of detecting that the substrate to be processed transported through the second transport section has reached a predetermined position,
Execute the step of stopping the transfer of the substrate to be processed,
The substrate processing method according to claim 7, wherein a step of forming an upwardly inclined conveyance path in the second conveyance section is executed.   The speed of the substrate to be processed transported to the third transport section is controlled to increase after an upwardly inclined transport path is formed in the second transport section. 9. The substrate processing method described in any one of 9 above.

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