CN104102096A - Developing solution supply system, developing solution supply method and developing equipment - Google Patents
Developing solution supply system, developing solution supply method and developing equipment Download PDFInfo
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- CN104102096A CN104102096A CN201410246973.3A CN201410246973A CN104102096A CN 104102096 A CN104102096 A CN 104102096A CN 201410246973 A CN201410246973 A CN 201410246973A CN 104102096 A CN104102096 A CN 104102096A
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Abstract
The invention discloses a developing solution supply system, a developing solution supply method and developing equipment. The developing solution supply system comprises a developing solution supply device, a wetting solution supply device, a detection device and a control device, wherein the developing solution supply device is used for supplying a developing solution to a spray head; the wetting solution supply device is used for supplying a wetting solution to the spray head; the detection device is used for detecting whether a display substrate reaches a preset position at a detection time point; and the control device is used for controlling the developing solution supply device to supply the developing solution to the spray head when the detection device detects that the display substrate reaches the preset position at the detection time point, and controlling the wetting solution supply device to supply the wetting solution to the spray head when the detection device detects that the display substrate fails to reach the preset position at the detection time point. In the technical scheme, the spray head is not required to spray the developing solution, but sprays the wetting solution when the display substrate fails to reach the preset position, so that consumption of the developing solution is reduced, and waste of the developing solution is avoided.
Description
Technical field
The present invention relates to display technique field, particularly a kind of developer solution supply system, method and developing apparatus.
Background technology
At present, in the manufacture process of display base plate, can form the various pattern structures on display base plate by composition technique, composition technique can comprise conventionally: the techniques such as photoresist coating, exposure, development, etching and photoresist lift off.Wherein, can realize developing process by developing apparatus, developing apparatus can comprise developer solution supply system and shower nozzle, and developer solution supply system can provide developer solution to shower nozzle, and shower nozzle is the display base plate to develop after exposure to spraying developer solution on display base plate.
In developing process, according to technological requirement, need to remain the wettability of shower nozzle, developer solution supply system can be always to developing solution spray head supply developer solution for this reason.And in actual production run, board deadlock (Down machine), produce line at goods (Work In Process, be called for short: WIP) all can cause developing apparatus in idle condition not and in the process of exposure machine replacing mask plate, be in developing apparatus, not place display base plate to be developed, but now developing solution spray head also can flow out developer solution always, thereby cause the waste of developer solution.
Summary of the invention
The invention provides a kind of developer solution supply system, method and developing apparatus, for reducing the use amount of developer solution, thereby avoid the waste of developer solution.
For achieving the above object, the invention provides a kind of developer solution supply system, comprise developer solution feeding mechanism, wetting solution feeding mechanism, pick-up unit and control device;
Described developer solution feeding mechanism, for supplying developer solution to shower nozzle;
Described wetting solution feeding mechanism, for supplying wetting solution to shower nozzle;
Whether described pick-up unit, for arriving precalculated position at some detection detection time display base plate;
Described control device, if for described pick-up unit in the time that detection time point detects display base plate and arrives precalculated position, control described developer solution feeding mechanism and supply described developer solution to shower nozzle, spray described developer solution for described shower nozzle; If described pick-up unit, in the time that detection time point detects display base plate and do not arrive precalculated position, is controlled described wetting solution feeding mechanism and supplied described wetting solution to described shower nozzle, spray described wetting solution for described shower nozzle.
Alternatively, described detection time, point was positioned at before described the developments start time puts.
Alternatively, described pick-up unit is also for continuing to carry out the described step that whether arrives precalculated position at some detection detection time display base plate after supplying described developer solution at developer solution feeding mechanism described in control device control to shower nozzle.
Alternatively, described pick-up unit also at wetting solution feeding mechanism described in control device control after described shower nozzle is supplied described wetting solution, detect whether end exposure of display base plate in exposure machine;
If when described control device also detects the display base plate end exposure of exposure machine for pick-up unit, control described developer solution feeding mechanism and supply developer solution to shower nozzle; If pick-up unit detects in exposure machine display base plate exposure while not finishing, continue to carry out the whether step of end exposure of the display base plate that detects in exposure machine by described pick-up unit.
Alternatively, described developer solution supply system also comprises pipe connecting part and common conduit, described developer solution feeding mechanism comprises developer solution storing unit, developer solution pipeline and the first switch, described wetting solution feeding mechanism comprises wetting solution storing unit, wetting solution pipeline and second switch, described the first switch is arranged on described developer solution pipeline, described second switch is arranged on described wetting solution pipeline, one end of described developer solution pipeline is connected in described developer solution storing unit, the other end of described developer solution pipeline is connected in described pipe connecting part, one end of described wetting solution pipeline is connected in described wetting solution storing unit, the other end of described wetting solution pipeline is connected in described pipe connecting part, one end of described common conduit is connected in described pipe connecting part, the other end of described common conduit is connected in described shower nozzle,
Described developer solution storing unit is used for depositing described developer solution;
Described wetting solution storing unit is used for depositing described wetting solution;
Described control device is specifically for cutting out by controlling described the first switch open and described second switch, so that the developer solution of depositing in described developer solution storing unit enters in described shower nozzle by described developer solution pipeline, described pipe connecting part and described common conduit successively; Or by controlling, described second switch is opened and described the first switch cuts out, so that the wetting solution of depositing in described wetting solution storing unit enters in described shower nozzle by described wetting solution pipeline, described pipe connecting part and described common conduit successively.
Alternatively, on described pipe connecting part, be also provided with pump arrangement;
Described pump arrangement, for driving described developer solution to enter described shower nozzle by described common conduit, or drives described wetting solution to enter in described shower nozzle by described common conduit.
Alternatively, in described common conduit, be also provided with flowmeter;
Described flowmeter, for measuring the developer solution of the described common conduit of flowing through or the flow of wetting solution.
For achieving the above object, the invention provides a kind of developing apparatus, comprising: shower nozzle and above-mentioned developer solution supply system.
For achieving the above object, the invention provides a kind of developer solution Supply Method, comprising:
Whether pick-up unit arrives precalculated position at some detection detection time display base plate;
If described pick-up unit is in the time that detection time, point detected display base plate arrival precalculated position, control device control developer solution feeding mechanism is supplied developer solution to shower nozzle, sprays described developer solution for described shower nozzle; If described pick-up unit is in the time that detection time point detects display base plate and do not arrive precalculated position, control device control wetting solution feeding mechanism is supplied described wetting solution to described shower nozzle, sprays described wetting solution for described shower nozzle.
Alternatively, described control device control developer solution feeding mechanism also comprises after shower nozzle supply developer solution:
Continue whether the described pick-up unit of execution arrives precalculated position step at some detection detection time display base plate.
Alternatively, described control device control wetting solution feeding mechanism also comprises after described shower nozzle is supplied described wetting solution:
Described pick-up unit detects whether end exposure of display base plate in exposure machine;
If when pick-up unit detects the display base plate end exposure in exposure machine, developer solution feeding mechanism is supplied developer solution to shower nozzle described in described control device control; If pick-up unit detects in exposure machine display base plate exposure while not finishing, described pick-up unit continues to carry out the whether step of end exposure of the display base plate that detects in exposure machine.
The present invention has following beneficial effect:
Developer solution supply system provided by the invention, in the technical scheme of method and developing apparatus, if pick-up unit is in the time that detection time, point detected display base plate arrival precalculated position, spray described developer solution to shower nozzle supply developer solution for shower nozzle by control device control developer solution feeding mechanism, if pick-up unit is in the time that detection time point detects display base plate and do not arrive precalculated position, spray wetting solution to shower nozzle supply wetting solution for shower nozzle by control device control wetting solution feeding mechanism, when in the present invention, display base plate does not reach precalculated position shower nozzle without spray developing liquid but spray wetting solution, reduce the use amount of developer solution, thereby avoid the waste of developer solution.
Brief description of the drawings
The structural representation of a kind of developer solution supply system that Fig. 1 provides for the embodiment of the present invention one;
Fig. 2 is the schematic diagram of continuous flow in embodiment mono-;
The process flow diagram of a kind of developer solution Supply Method that Fig. 3 provides for the embodiment of the present invention three.
Embodiment
For making those skilled in the art understand better technical scheme of the present invention, below in conjunction with accompanying drawing, developer solution supply system provided by the invention, method and developing apparatus are described in detail.
The structural representation of a kind of developer solution supply system that Fig. 1 provides for the embodiment of the present invention one, as shown in Figure 1, this developer solution supply system comprises: developer solution feeding mechanism 1, wetting solution feeding mechanism 2, pick-up unit 3 and control device 4.
Alternatively, developer solution feeding mechanism 1 and wetting solution feeding mechanism 2 are all connected to shower nozzle 5, and pick-up unit 3 is connected with control device 4, and control device 4 is connected with developer solution feeding mechanism 1 and wetting solution feeding mechanism 2.
Developer solution feeding mechanism 1 is for supplying developer solution to shower nozzle 5.Wetting solution feeding mechanism 2 is for supplying wetting solution to shower nozzle 5.Whether pick-up unit 3 is for arriving precalculated position at some detection detection time display base plate 6.If control device 4, is controlled developer solution feeding mechanism 1 and is supplied developer solution to shower nozzle 5, for shower nozzle 5 spray developing liquid for pick-up unit 3 in the time that detection time point detects display base plate 6 and arrives precalculated position; If control device 4 also for pick-up unit 3 in the time that detection time point detects display base plate 6 and does not arrive precalculated position, control wetting solution feeding mechanism 2 and supply wetting solution to shower nozzle 5, spray wetting solution for shower nozzle 5.Wherein, precalculated position is developing apparatus carries out developing process position to display base plate 6.For example: do not arrive precalculated position if pick-up unit 3 detects display base plate 6 at detection time point, can show that display base plate 6 is arranged in exposure machine, in developing apparatus, do not place any display base plate, this developing apparatus is in idle condition, now only need to supply wetting solution to shower nozzle 5, without supplying developer solution to shower nozzle.Shower nozzle 5 spray developing liquid are to display base plate 6 so that display base plate 6 develops, and shower nozzle 6 sprays wetting solution to keep shower nozzle 6 moistening.
In the present embodiment, preferably, wetting solution is deionized water.
The process that developing apparatus carries out developing process to display base plate 6 comprises following two kinds of situations: flow and discontinuous flow continuously.
Wherein, flow refers to continuously: in composition technique, each technique is normally moved, and multiple display base plate 6 enters in developing apparatus by the predetermined process time successively.Fig. 2 is the schematic diagram of continuous flow in embodiment mono-, as shown in Figure 2, after every display base plate 6 exposes in exposure machine, entering developing apparatus develops again, owing to needing that before developing process starts display base plate 6 is moved to the precalculated position in developing apparatus from exposure machine, therefore expose and develop between there is technique t1 interval time.Opening display base plate 6 and n+1 taking n opens display base plate 6 and describes as example, n opens display base plate 6 and n+1 and opens display base plate 6 and enter successively developing apparatus, the development start time point that n opens display base plate 6 is A (n), and the development start time point that n+1 opens display base plate 6 is A (n+1).In the present embodiment, pick-up unit 3 is set development start time that development start time point that n opens display base plate 6 and n+1 open display base plate 6 and is spaced apart t between putting, if now to open the development start time point of display base plate 6 be A (n) to n, to set A (n)+t be some detection time to pick-up unit 3, that is to say that pick-up unit 3 assert that opening display base plate at A (n)+t n+1 starts to develop and start at A (n)+t whether display base plate 6 is reached to precalculated position to detect.
Wherein, discontinuous flow refers to: in actual production run, board crashes, and produces line WIP process inadequate and exposure machine replacing mask plate and all can cause developing apparatus in idle condition, and display base plate 6 cannot enter in developing apparatus by the predetermined process time successively.For example: put A (n)+t in detection time, n opens display base plate 6 and do not arrive the precalculated position in developing apparatus, but rest on and in exposure machine, carry out exposure technology.
For ensureing before developing process starts, shower nozzle 5 has started spray developing liquid, preferably, and before detection time point is positioned at the start time point that develops.That is to say, whether pick-up unit 3 can arrive precalculated position by detection display substrate 6 before the start time point that develops.
Further, pick-up unit 3 also continues to carry out for control developer solution feeding mechanism 1 at control device 4 step that whether arrives precalculated position at some detection detection time display base plate 6 after shower nozzle 5 is supplied developer solution.
Further, pick-up unit 3 is also for controlling wetting solution feeding mechanism 2 after shower nozzle 5 is supplied wetting solution at control device 4, detects whether end exposure of display base plate in exposure machine 6.If when control device 4 also detects display base plate 6 end exposure of exposure machine for pick-up unit 3, control developer solution feeding mechanism 1 and supply developer solution to shower nozzle 5; If when control device 4 also detects exposure machine display base plate exposure and do not finish for pick-up unit 3, continue to carry out the whether step of end exposure of the display base plate 6 that detects in exposure machine by pick-up unit 3.Wherein, when pick-up unit 3 detects display base plate 6 end exposures in exposure machine, show that display base plate 6 is about to enter developing apparatus and carries out developing process; In the time that pick-up unit 3 detects in exposure machine display base plate exposure and do not finish, proceed to detect, until detect display base plate 6 end exposures in exposure machine.
In the present embodiment, developer solution supply system also comprises pipe connecting part 7 and common conduit 8, developer solution feeding mechanism 1 comprises developer solution storing unit 11, developer solution pipeline 12 and the first K switch 1, wetting solution feeding mechanism 2 comprises wetting solution storing unit 21, wetting solution pipeline 22 and second switch K2, the first K switch 1 is arranged on developer solution pipeline 12, second switch K2 is arranged on wetting solution pipeline 22, one end of developer solution pipeline 12 is connected in developer solution storing unit 11, the other end of developer solution pipeline 12 is connected in pipe connecting part 7, one end of wetting solution pipeline 22 is connected in wetting solution storing unit 21, the other end of wetting solution pipeline 22 is connected in pipe connecting part 7, one end of common conduit 8 is connected in pipe connecting part 7, the other end of common conduit 8 is connected in shower nozzle 5.Developer solution storing unit 11 is for depositing developer solution.Wetting solution storing unit 21 is for depositing wetting solution.Control device 14 is specifically for by controlling, the first K switch 1 is opened and second switch K2 closes, so that the developer solution of depositing in developer solution storing unit 11 enters in shower nozzle 5 by developer solution pipeline 11, pipe connecting part 7 and common conduit 8 successively; Or by controlling, second switch K2 opens and the first K switch 1 is closed, so that the wetting solution of depositing in wetting solution storing unit 21 enters in shower nozzle 5 by wetting solution pipeline 22, pipe connecting part 7 and common conduit 8 successively.
Alternatively, on pipe connecting part 7, be also provided with pump arrangement 9.Pump arrangement 9 is for driving developer solution to enter shower nozzle 5 by common conduit 8, or driving wetting solution enters in shower nozzle 5 by common conduit 8.Particularly, in the time that developer solution enters in pipe connecting part 7, pump arrangement 9 is urged to by common conduit 8 developer solution entering in pipe connecting part 7 in shower nozzle 5; In the time that wetting solution enters in pipe connecting part 7, pump arrangement 9 is urged to by common conduit 8 the wetting solution liquid entering in pipe connecting part 7 in shower nozzle 5.
Alternatively, in common conduit 8, be also provided with flowmeter 10.Flowmeter 10 is for measuring the flow through developer solution of common conduit 8 or the flow of wetting solution.
In the technical scheme of the developer solution supply system that the present embodiment provides, if pick-up unit is in the time that detection time, point detected display base plate arrival precalculated position, spray described developer solution to shower nozzle supply developer solution for shower nozzle by control device control developer solution feeding mechanism, if pick-up unit is in the time that detection time point detects display base plate and do not arrive precalculated position, spray wetting solution to shower nozzle supply wetting solution for shower nozzle by control device control wetting solution feeding mechanism, when in the present embodiment, display base plate does not reach precalculated position shower nozzle without spray developing liquid but spray wetting solution, reduce the use amount of developer solution, thereby avoid the waste of developer solution.The present embodiment can be realized the automatic conversion of shower nozzle spray developing liquid or wetting solution by pick-up unit and control device, and this can realize real-time detection by pick-up unit, can realize real-time adjusting process by control device, thereby make the present embodiment technique simple and be easy to realize.
The embodiment of the present invention two provides a kind of developing apparatus, and this developing apparatus comprises: shower nozzle and developer solution supply system.The developer solution supply system that developer solution supply system can adopt above-described embodiment one to provide, specific descriptions can, referring to the description of above-described embodiment one, repeat no more herein.
In the technical scheme of the developing apparatus that the present embodiment provides, if pick-up unit is in the time that detection time, point detected display base plate arrival precalculated position, spray described developer solution to shower nozzle supply developer solution for shower nozzle by control device control developer solution feeding mechanism, if pick-up unit is in the time that detection time point detects display base plate and do not arrive precalculated position, spray wetting solution to shower nozzle supply wetting solution for shower nozzle by control device control wetting solution feeding mechanism, when in the present embodiment, display base plate does not reach precalculated position shower nozzle without spray developing liquid but spray wetting solution, reduce the use amount of developer solution, thereby avoid the waste of developer solution.The present embodiment can be realized the automatic conversion of shower nozzle spray developing liquid or wetting solution by pick-up unit and control device, and this can realize real-time detection by pick-up unit, can realize real-time adjusting process by control device, thereby make the present embodiment technique simple and be easy to realize.
The process flow diagram of a kind of developer solution Supply Method that Fig. 3 provides for the embodiment of the present invention three, as shown in Figure 3, the method comprises:
Whether step 101, pick-up unit arrive precalculated position at some detection detection time display base plate, if so, perform step 102; If not, perform step 103.
Preferably, before detection time point is positioned at the start time point that develops.
Step 102, control device control developer solution feeding mechanism are supplied developer solution to shower nozzle, for shower nozzle spray developing liquid, and continue execution step 101.
Step 103, control device control wetting solution feeding mechanism are supplied wetting solution to shower nozzle, spray wetting solution for shower nozzle.
Alternatively, the method also comprises:
Step 104, pick-up unit detect whether end exposure of display base plate in exposure machine, if so, perform step 102; If not, continue execution step 104.
In the technical scheme of the developer solution Supply Method that the present embodiment provides, if pick-up unit is in the time that detection time, point detected display base plate arrival precalculated position, spray described developer solution to shower nozzle supply developer solution for shower nozzle by control device control developer solution feeding mechanism, if pick-up unit is in the time that detection time point detects display base plate and do not arrive precalculated position, spray wetting solution to shower nozzle supply wetting solution for shower nozzle by control device control wetting solution feeding mechanism, when in the present embodiment, display base plate does not reach precalculated position shower nozzle without spray developing liquid but spray wetting solution, reduce the use amount of developer solution, thereby avoid the waste of developer solution.The present embodiment can be realized the automatic conversion of shower nozzle spray developing liquid or wetting solution by pick-up unit and control device, and this can realize real-time detection by pick-up unit, can realize real-time adjusting process by control device, thereby make the present embodiment technique simple and be easy to realize.
Be understandable that, above embodiment is only used to principle of the present invention is described and the illustrative embodiments that adopts, but the present invention is not limited thereto.For those skilled in the art, without departing from the spirit and substance in the present invention, can make various modification and improvement, these modification and improvement are also considered as protection scope of the present invention.
Claims (11)
1. a developer solution supply system, is characterized in that, comprises developer solution feeding mechanism, wetting solution feeding mechanism, pick-up unit and control device;
Described developer solution feeding mechanism, for supplying developer solution to shower nozzle;
Described wetting solution feeding mechanism, for supplying wetting solution to shower nozzle;
Whether described pick-up unit, for arriving precalculated position at some detection detection time display base plate;
Described control device, if for described pick-up unit in the time that detection time point detects display base plate and arrives precalculated position, control described developer solution feeding mechanism and supply described developer solution to shower nozzle, spray described developer solution for described shower nozzle; If described pick-up unit, in the time that detection time point detects display base plate and do not arrive precalculated position, is controlled described wetting solution feeding mechanism and supplied described wetting solution to described shower nozzle, spray described wetting solution for described shower nozzle.
2. developer solution supply system according to claim 1, is characterized in that, described detection time, point was positioned at before described the developments start time puts.
3. developer solution supply system according to claim 1, it is characterized in that, described pick-up unit is also for continuing to carry out the described step that whether arrives precalculated position at some detection detection time display base plate after supplying described developer solution at developer solution feeding mechanism described in control device control to shower nozzle.
4. developer solution supply system according to claim 1, it is characterized in that, described pick-up unit also at wetting solution feeding mechanism described in control device control after described shower nozzle is supplied described wetting solution, detect whether end exposure of display base plate in exposure machine;
If when described control device also detects the display base plate end exposure of exposure machine for pick-up unit, control described developer solution feeding mechanism and supply developer solution to shower nozzle; If pick-up unit detects in exposure machine display base plate exposure while not finishing, continue to carry out the whether step of end exposure of the display base plate that detects in exposure machine by described pick-up unit.
5. developer solution supply system according to claim 1, it is characterized in that, described developer solution supply system also comprises pipe connecting part and common conduit, described developer solution feeding mechanism comprises developer solution storing unit, developer solution pipeline and the first switch, described wetting solution feeding mechanism comprises wetting solution storing unit, wetting solution pipeline and second switch, described the first switch is arranged on described developer solution pipeline, described second switch is arranged on described wetting solution pipeline, one end of described developer solution pipeline is connected in described developer solution storing unit, the other end of described developer solution pipeline is connected in described pipe connecting part, one end of described wetting solution pipeline is connected in described wetting solution storing unit, the other end of described wetting solution pipeline is connected in described pipe connecting part, one end of described common conduit is connected in described pipe connecting part, the other end of described common conduit is connected in described shower nozzle,
Described developer solution storing unit is used for depositing described developer solution;
Described wetting solution storing unit is used for depositing described wetting solution;
Described control device is specifically for cutting out by controlling described the first switch open and described second switch, so that the developer solution of depositing in described developer solution storing unit enters in described shower nozzle by described developer solution pipeline, described pipe connecting part and described common conduit successively; Or by controlling, described second switch is opened and described the first switch cuts out, so that the wetting solution of depositing in described wetting solution storing unit enters in described shower nozzle by described wetting solution pipeline, described pipe connecting part and described common conduit successively.
6. developer solution supply system according to claim 5, is characterized in that, is also provided with pump arrangement on described pipe connecting part;
Described pump arrangement, for driving described developer solution to enter described shower nozzle by described common conduit, or drives described wetting solution to enter in described shower nozzle by described common conduit.
7. developer solution supply system according to claim 5, is characterized in that, is also provided with flowmeter in described common conduit;
Described flowmeter, for measuring the developer solution of the described common conduit of flowing through or the flow of wetting solution.
8. a developing apparatus, is characterized in that, comprising: the arbitrary described developer solution supply system of shower nozzle and claim 1 to 7.
9. a developer solution Supply Method, is characterized in that, comprising:
Whether pick-up unit arrives precalculated position at some detection detection time display base plate;
If described pick-up unit is in the time that detection time, point detected display base plate arrival precalculated position, control device control developer solution feeding mechanism is supplied developer solution to shower nozzle, sprays described developer solution for described shower nozzle; If described pick-up unit is in the time that detection time point detects display base plate and do not arrive precalculated position, control device control wetting solution feeding mechanism is supplied described wetting solution to described shower nozzle, sprays described wetting solution for described shower nozzle.
10. developer solution Supply Method according to claim 9, is characterized in that, described control device control developer solution feeding mechanism also comprises after shower nozzle supply developer solution:
Continue whether the described pick-up unit of execution arrives precalculated position step at some detection detection time display base plate.
11. developer solution Supply Methods according to claim 9, is characterized in that, described control device control wetting solution feeding mechanism also comprises after described shower nozzle is supplied described wetting solution:
Described pick-up unit detects whether end exposure of display base plate in exposure machine;
If when pick-up unit detects the display base plate end exposure in exposure machine, developer solution feeding mechanism is supplied developer solution to shower nozzle described in described control device control; If pick-up unit detects in exposure machine display base plate exposure while not finishing, described pick-up unit continues to carry out the whether step of end exposure of the display base plate that detects in exposure machine.
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| CN201410246973.3A CN104102096A (en) | 2014-06-05 | 2014-06-05 | Developing solution supply system, developing solution supply method and developing equipment |
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| CN201410246973.3A CN104102096A (en) | 2014-06-05 | 2014-06-05 | Developing solution supply system, developing solution supply method and developing equipment |
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| CN101034660A (en) * | 2006-03-08 | 2007-09-12 | 住友精密工业株式会社 | Basal plate processing device |
| CN101458462A (en) * | 2007-12-13 | 2009-06-17 | 上海华虹Nec电子有限公司 | Photolithography developing method for reducing photoresist developing defect in semiconductor process |
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Application publication date: 20141015 |