CN101639633A - Supply pipeline of developing solution - Google Patents
Supply pipeline of developing solution Download PDFInfo
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- CN101639633A CN101639633A CN200810144417A CN200810144417A CN101639633A CN 101639633 A CN101639633 A CN 101639633A CN 200810144417 A CN200810144417 A CN 200810144417A CN 200810144417 A CN200810144417 A CN 200810144417A CN 101639633 A CN101639633 A CN 101639633A
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- developing solution
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Abstract
The invention relates to a supply pipeline of developing solution, comprising developing solution pipelines, developing solution nozzle arranged at front end of the developing solution pipelines, anda de-ionized water pipeline parallel with the developing solution pipelines; the de-ionized water pipeline is connected to the developing solution pipelines by being mounted to a control valve of thedeveloping solution pipelines. By adopting the structure of the invention, crystallized substance in the nozzle can be discharged, and the deposit in the pipelines can be cleared up, thus reducing opportunities of poor development.
Description
Technical field
The present invention relates to the semiconductor developing process, particularly relate to a kind of supply pipeline of developing solution.
Background technology
As shown in Figure 1, traditional supply pipeline of developing solution comprises devices such as developer solution pipeline 11, constant temperature exchange system 6, temperature monitoring 7, temperature controller 4, developer solution nozzle.In traditional developing cell, because the nozzle diameter (0.4mm) of E2/E3 is very little, and developer solution be easy to generate carbonate crystallization after air combines, cause nozzle blockage easily, make developer solution when nozzle spues, can't be evenly distributed on the wafer, thereby cause the crystal on wafer poor visualization or the nozzle to drop on the wafer, cause product rejection.
Simultaneously, because traditional supply pipeline of developing solution does not provide the device that makes line clear (referring to Fig. 1), so pipeline inner wall, pipe joint, pipeline valve member and developer solution nozzle are dirty easily.Because part developer solution pipeline is not provided with thermostat midway, add the pipeline inner wall dirt again, the constant warm tube outer wall dirt of developer solution nozzle causes developer solution rotten easily, causes the development capability deficiency.
Summary of the invention
At developer solution nozzle crystallization blocking problem in the prior art, the objective of the invention is to propose a kind of supply pipeline of developing solution, on the basis of original supply pipeline of developing solution, increase the deionized water pipeline that is used to clean the developer solution nozzle, the crystal that is present in the nozzle is discharged, and the sediment in the cleaning channels, thereby the chance of reduction poor visualization.
In order to reach above-mentioned and other purposes of the present invention, the present invention proposes a kind of supply pipeline of developing solution, comprise the developer solution pipeline, be positioned at the developer solution nozzle of developer solution pipeline front end, and the deionized water pipeline that is in parallel with the developer solution pipeline, this deionized water pipeline is connected to the developer solution pipeline by the by-pass valve control that is installed to the developer solution pipeline.
As preferably, this deionized water pipeline is parallel on the supply pipeline of developing solution between constant temperature exchange system and the filtrator.
As preferably, this by-pass valve control is manual three-phase valve, and this manual three-phase valve can be used to control deionized water and developer solution simultaneously.
As preferably, this developer solution nozzle is the nozzle of E series.
As preferably, this supply pipeline of developing solution also comprises temperature controller, and this temperature controller is connected with the chemicals input/output board (Chemical I/O board) of board, is used for the temperature of senses flow to the developer solution of developer solution nozzle.
The present invention is by increasing the deionized water pipeline on the basis of original supply pipeline of developing solution, can the crystal dirty and the developer solution nozzle in the developer solution pipeline be discharged fast by the hydraulic pressure that the deionized water pipeline is provided, not have dirt to keep pipeline inner wall, pipe joint, pipeline valve member and developer solution nozzle; Simultaneously, because the internal and external parts cleaning that has kept all spare and accessory parts of developer solution pipeline, though part developer solution pipeline does not have thermostat midway, but the deionized water that provides is regularly made cleaning channels usefulness, be unlikely to produce the rotten or carbonate deposition of developer solution, thereby avoided above phenomenon to cause the problem of development capability deficiency.
Description of drawings
Fig. 1 is traditional supply pipeline of developing solution synoptic diagram;
Fig. 2 is a kind of supply pipeline of developing solution synoptic diagram of the present invention.
Fig. 3 is an E2 nozzle synoptic diagram involved in the present invention;
Fig. 4 is an E3 nozzle synoptic diagram involved in the present invention.
Embodiment
For a more detailed description below in conjunction with accompanying drawing to the specific embodiment of the present invention.
Referring to Fig. 2, a kind of supply pipeline of developing solution, comprise developer solution pipeline 11, be positioned at the developer solution nozzle 12 of developer solution pipeline front end, and the deionized water pipeline 21 that is in parallel with the developer solution pipeline, this deionized water pipeline 21 is connected to developer solution pipeline 11 by the by-pass valve control 3 that is installed to the developer solution pipeline.This developer solution pipeline generally has surge tank (Buffer tank, be used for the temporary of developer solution), Teflon pipeline, filtrator (Filter, being used for developer solution filters), ventilation blower (Fan flow, be used to detect flow), pneumatic valve (being used to control the switch of developer solution spraying), constant temperature exchange system 6, temperature monitoring 7, nozzle 12 devices such as (being used for developer solution is sprayed to wafer surface), this deionized water pipeline 21 is made up of the Teflon pipeline usually.
As preferably, this deionized water pipeline 21 is parallel on the supply pipeline of developing solution 11 between constant temperature exchange system 6 and the filtrator 5.
As preferably, this by-pass valve control 3 is manual three-phase valve, and this manual three-phase valve can be used to control deionized water 2 and developer solution 1 simultaneously.
As preferably, this manual three-phase valve is used for regularly switching deionized water 2, and the pre-spray mechanism of utilizing board to provide by the hydraulic pressure of deionized water 2, will exist the crystals (carbonate) in the developer solution nozzle 12 to discharge fast, and the interior sediment of detergent line.
As preferably, this developer solution nozzle 12 is the nozzle of E series, preferably E2 or E3 nozzle.Referring to Fig. 3, the aperture that it is 0.4mm that the E2 nozzle has 104 diameters, deionized water 2 passes in and out this developer solution nozzle by pipeline, in this developer solution nozzle, discharges behind the formation loop, thus the sediment in detergent line and the nozzle.Referring to Fig. 4, the E3 nozzle has 102 apertures, and the diameter of each aperture of center section 122 is less than the diameter of each aperture of Outboard Sections 121, in E3 nozzle shown in Figure 4, the diameter of the aperture 81 of center section 122 is 0.15mm, the diameter of aperture 82 is 0.20mm, and the diameter of aperture 83 is 0.25mm, and the diameter of aperture 84 is 0.30mm, the diameter of aperture 85 is 0.32mm, the diameter of aperture 86 is 0.34mm, and the diameter of aperture 87 is 0.36mm, and the diameter of aperture 88 is 0.38mm; The diameter of the aperture 90 of Outboard Sections 121 is 0.40mm.Deionized water 2 passes in and out this developer solution nozzle by pipeline, in this developer solution nozzle, discharges behind the formation loop, thus the sediment in detergent line and the nozzle.These two kinds of nozzles all can spray developer solution in wafer surface equably when inserting developer solution.
As preferably, this supply pipeline of developing solution also comprises temperature controller 4, this temperature controller 4 is positioned at the position of the front end of developer solution pipeline 11 near developer solution nozzle 12, be connected with the chemicals input/output board (Chemical I/O board) of board, be used for the temperature of senses flow to the developer solution 1 of developer solution nozzle 12.
Compare with existing supply pipeline of developing solution, the present invention has increased deionized water pipeline 21, utilization is provided in the hydraulic pressure of deionized water pipeline 21, crystal dirty and developer solution nozzle 12 in the developer solution pipeline 11 can be discharged fast, thereby keep pipeline inner wall, pipe joint, pipeline valve member and developing nozzle not to have dirt; Simultaneously, because the internal and external parts cleaning that has kept developer solution pipeline 11 all spare and accessory parts, though part developer solution pipeline there is no thermostat midway, but by regularly providing deionized water 2 to be used for cleaning channels, rotten or the carbonate deposition phenomenon of developer solution is avoided, thereby overcome the problem of traditional development capability deficiency that supply pipeline of developing solution caused, improved the qualification rate of product.
Preferred embodiment of the present invention and effect thereof have more than been described; certainly; the present invention also can have other embodiment; under the situation of spirit that does not deviate from the present invention and essence; the person of ordinary skill in the field works as can make various corresponding changes and distortion according to the present invention, but these corresponding changes and distortion all should belong to the protection domain of claim of the present invention.
Claims (5)
1. supply pipeline of developing solution, comprise the developer solution pipeline, be positioned at the developer solution nozzle of developer solution pipeline front end, it is characterized in that, also comprise the deionized water pipeline that is in parallel with the developer solution pipeline, this deionized water pipeline is connected to the developer solution pipeline by the by-pass valve control that is installed to the developer solution pipeline.
2. a kind of supply pipeline of developing solution according to claim 1 is characterized in that, this deionized water pipeline is parallel on the supply pipeline of developing solution between constant temperature exchange system and the filtrator.
3. a kind of supply pipeline of developing solution according to claim 1 and 2 is characterized in that, this by-pass valve control is manual three-phase valve, and this manual three-phase valve can be used to control deionized water and developer solution simultaneously.
4. a kind of supply pipeline of developing solution according to claim 1 and 2 is characterized in that, this developer solution nozzle is the nozzle of E series.
5. a kind of supply pipeline of developing solution according to claim 1 and 2, it is characterized in that, this supply pipeline of developing solution also comprises temperature controller, and this temperature controller is connected with the chemicals input/output board of board, is used for the temperature of senses flow to the developer solution of developer solution nozzle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200810144417XA CN101639633B (en) | 2008-07-29 | 2008-07-29 | Supply pipeline of developing solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200810144417XA CN101639633B (en) | 2008-07-29 | 2008-07-29 | Supply pipeline of developing solution |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101639633A true CN101639633A (en) | 2010-02-03 |
| CN101639633B CN101639633B (en) | 2012-02-29 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200810144417XA Expired - Fee Related CN101639633B (en) | 2008-07-29 | 2008-07-29 | Supply pipeline of developing solution |
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| CN (1) | CN101639633B (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104102096A (en) * | 2014-06-05 | 2014-10-15 | 京东方科技集团股份有限公司 | Developing solution supply system, developing solution supply method and developing equipment |
| CN105319872A (en) * | 2014-07-15 | 2016-02-10 | 沈阳芯源微电子设备有限公司 | Developing liquid constant temperature maintaining pipeline system |
| CN106298584A (en) * | 2015-06-02 | 2017-01-04 | 沈阳芯源微电子设备有限公司 | One removes glue constant temperature system |
| WO2023050198A1 (en) * | 2021-09-29 | 2023-04-06 | 华为技术有限公司 | Developing device, developing method, and dispensing developing system |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW417148B (en) * | 1998-07-02 | 2001-01-01 | Tokyo Electron Ltd | Process solution supplying apparatus and fluid passageway opening-closing valve device for process solution supplying apparatus |
| JP4026376B2 (en) * | 2002-02-27 | 2007-12-26 | 三菱化学エンジニアリング株式会社 | Developer supply device |
| JP4298384B2 (en) * | 2003-06-04 | 2009-07-15 | 大日本スクリーン製造株式会社 | Liquid supply apparatus and substrate processing apparatus |
| JP4863782B2 (en) * | 2006-06-19 | 2012-01-25 | 東京応化工業株式会社 | Treatment liquid supply device |
| CN101000466B (en) * | 2006-12-29 | 2012-02-08 | 友达光电股份有限公司 | Wet and cleaning device of developer solution cylinder |
-
2008
- 2008-07-29 CN CN200810144417XA patent/CN101639633B/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104102096A (en) * | 2014-06-05 | 2014-10-15 | 京东方科技集团股份有限公司 | Developing solution supply system, developing solution supply method and developing equipment |
| CN105319872A (en) * | 2014-07-15 | 2016-02-10 | 沈阳芯源微电子设备有限公司 | Developing liquid constant temperature maintaining pipeline system |
| CN105319872B (en) * | 2014-07-15 | 2020-02-07 | 沈阳芯源微电子设备股份有限公司 | Developing solution constant-temperature maintaining pipeline system |
| CN106298584A (en) * | 2015-06-02 | 2017-01-04 | 沈阳芯源微电子设备有限公司 | One removes glue constant temperature system |
| CN106298584B (en) * | 2015-06-02 | 2018-09-28 | 沈阳芯源微电子设备有限公司 | One kind removing glue constant temperature system |
| WO2023050198A1 (en) * | 2021-09-29 | 2023-04-06 | 华为技术有限公司 | Developing device, developing method, and dispensing developing system |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101639633B (en) | 2012-02-29 |
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Granted publication date: 20120229 Termination date: 20160729 |