CN105319872B - Developing solution constant-temperature maintaining pipeline system - Google Patents
Developing solution constant-temperature maintaining pipeline system Download PDFInfo
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- CN105319872B CN105319872B CN201410334927.9A CN201410334927A CN105319872B CN 105319872 B CN105319872 B CN 105319872B CN 201410334927 A CN201410334927 A CN 201410334927A CN 105319872 B CN105319872 B CN 105319872B
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Abstract
The invention belongs to the field of semiconductor spin coating development, in particular to a developing solution constant temperature maintaining pipeline system.A heat preservation water circulating system has an outlet which enters a developing unit through a water inlet pipe and is connected to a liquid collecting block, a developing solution pipe connected with a developing solution source enters the developing unit and is sequentially connected with the liquid collecting block, a water-liquid separation type liquid medicine valve and a liquid separating block, heat preservation water sleeves are respectively arranged outside a developing solution pipe between the liquid collecting block and the water-liquid separation type liquid medicine valve and a developing solution pipe between the liquid separating block and the water-liquid separation type liquid medicine valve, and heat preservation water provided by the heat preservation water circulating system flows through the heat preservation water sleeves and the developing solution pipe; the heat preservation water flowing out of the liquid separation block enters one cavity of the nozzle and is communicated with the heat preservation water circulation system through a water return pipe, and the developing solution flowing out of the liquid separation block enters the other cavity of the nozzle and is sprayed to the surface of the wafer. The invention ensures that the developing solution pipe is completely soaked in the heat insulation water after entering the developing unit, thereby avoiding the developing solution pipe from being exposed outside and reducing the influence of other factors on the developing solution.
Description
Technical Field
The invention belongs to the field of semiconductor spin coating and developing, and particularly relates to a developing solution constant-temperature maintaining pipeline system which is used for controlling the temperature of developing solution in a single-chip wet processing device for manufacturing an integrated circuit.
Background
At present, in the process of semiconductor wafer production, in order to meet increasingly stringent process requirements, each link of equipment needs to be strictly controlled, and the temperature control of the developing solution is important. The developing is the most important step in the spin coating developing equipment, and since the developing solution is particularly sensitive to the temperature, the process is greatly influenced when the developing solution exceeds the specified range, so that the whole wafer process is started from a new one, the productivity is seriously influenced, and the economic benefit is influenced. At present, the heat preservation of the developing solution is only partial or is a double-layer sleeve, so that the influence of the backwater on the heat preservation water is difficult to control.
Disclosure of Invention
In view of the above problems, an object of the present invention is to provide a developer solution constant temperature maintaining piping system. The pipeline system can realize the constancy and the maintenance of the temperature of the developing solution all the time, and the developing solution is controlled within the set process temperature all the time during the developing process.
The purpose of the invention is realized by the following technical scheme:
the developing device comprises a heat-preservation water circulating system, a liquid collecting block, a water-liquid separation type liquid medicine valve and a nozzle, wherein the liquid collecting block, the water-liquid separation type liquid medicine valve and the nozzle are positioned in a developing unit; and the heat preservation water flowing out of the liquid separation block enters one cavity of the nozzle and is communicated with an inlet of the heat preservation water circulation system through a water return pipe, and the developing solution flowing out of the liquid separation block enters the other cavity of the nozzle and is sprayed to the surface of the wafer.
Wherein: the liquid collecting block is provided with a thermistor for detecting the temperature of the heat preservation water entering the developing unit, and the thermistor is electrically connected with the heat preservation water circulating system; a first cavity and a second cavity which are mutually independent are arranged in the liquid separation block, the developing liquid pipe and the heat-preservation water sleeve are respectively connected with the liquid separation block, the developing liquid pipe is communicated with the first cavity, and the heat-preservation water sleeve is communicated with the second cavity; the liquid collecting block is internally provided with a third chamber, a water inlet hole communicated with the third chamber is formed in the liquid collecting block, the developing liquid pipe penetrates out of the third chamber, the water inlet hole is communicated with a heat preservation water circulating system through the water inlet pipe, heat preservation water flows in from the water inlet hole and flows into a heat preservation water sleeve pipe between the developing liquid pipe and the inner wall of the third chamber; the developing liquid in the developing liquid pipe is controlled by the liquid-liquid separation type liquid medicine valve.
The invention has the advantages and positive effects that:
1. the invention realizes the collection of the developing solution and the heat preservation water through the liquid collection block, controls the flow of the developing solution through the water-liquid separation type liquid medicine valve, and ensures that the developing solution pipe is completely soaked in the heat preservation water after entering the developing unit, thereby avoiding the developing solution pipe from being exposed outside and reducing the influence of other factors on the developing solution.
2. The thermistor is arranged on the liquid collecting block, so that the mutual correlation of the circuit system in the unit and the control system outside the unit is realized, and the constancy of heat preservation water is ensured.
3. The constant temperature water is provided by a heat preservation water circulation system outside the developing unit, and the temperature of the constant temperature water can be set according to different process requirements. And may be automatically adjusted to the initially set value according to the temperature change.
Drawings
FIG. 1 is a schematic structural view of the present invention;
FIG. 2 is a schematic view of the internal structure of the liquid separation block of the present invention;
FIG. 3 is a schematic view of the internal structure of the liquid-collecting block of the present invention;
wherein: 1 is the wafer, 2 is the nozzle, 3 is the branch liquid piece, 301 is first cavity, 302 is the second cavity, 4 is the insulating water sleeve pipe, 5 is water liquid disconnect-type liquid medicine valve, 6 is thermistor, 7 is the collection liquid piece, 701 is the inlet opening, 702 is the third cavity, 8 is the inlet tube, 9 is the wet return, 10 is the developer pipe, 11 is the insulating water circulation system.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings.
As shown in fig. 1, the invention comprises a heat preservation water circulation system 11, a liquid collection block 7, a water-liquid separation type liquid medicine valve 5 and a nozzle 2 provided with a liquid separation block 3, wherein the liquid collection block 7, the water-liquid separation type liquid medicine valve 5 and the liquid separation block 3 are positioned in a developing unit, an outlet of the heat preservation water circulation system 11 enters the developing unit through a water inlet pipe 8 and then is connected to the liquid collection block 7, and a developing liquid pipe 10 connected with a developing liquid source enters the developing unit and then is sequentially connected with the liquid collection block 7, the water-liquid separation type liquid medicine valve 5; the developing liquid pipe 10 between the liquid collecting block 7 and the liquid separating type liquid medicine valve 5 and the developing liquid pipe 10 between the liquid separating block 3 and the liquid separating type liquid medicine valve 5 are both externally provided with a heat preservation water sleeve 4, the developing liquid pipe 10 and the axial center line of the heat preservation water sleeve 4 are collinear, and heat preservation water provided by a heat preservation water circulating system 11 flows between the heat preservation water sleeve 4 and the developing liquid pipe 10. The heat preservation water flowing out of the liquid separation block 3 enters one cavity of the nozzle 2 and is communicated with an inlet of a heat preservation water circulation system 11 through a water return pipe 9, and the developing solution flowing out of the liquid separation block 3 enters the other cavity of the nozzle 2 and is sprayed to the surface of the wafer 1. The liquid collecting block 7 is provided with a thermistor 6, and the thermistor 6 is electrically connected with a heat preservation water circulating system 11 to form a closed feedback system for detecting the temperature of heat preservation water entering the developing unit. The whole pipeline system of the invention is divided into three parts, including a single internal pipeline system, a unit external control system and a feedback system; the unit inner pipeline system comprises a liquid collecting block 7, a water-liquid separation type liquid medicine valve 5, a liquid separating block 3, a nozzle 2 and a heat preservation water sleeve 4, the unit outer control system comprises a heat preservation water circulation system 11, and the feedback system comprises a thermistor 6. When the temperature is set for the heat preservation water circulation system 11, the temperature of the heat preservation water passes through the developing solution pipe 10 in the heat preservation water sleeve 4 control sleeve, after the heat preservation water enters the liquid collecting block 7 in the developing unit through the water inlet pipe 8, the temperature of the heat preservation water is monitored by the thermistor 6, when the temperature changes, the result is fed back to the heat preservation water circulation system 11 outside the developing unit by the thermistor 6, the required temperature is readjusted by the control heat preservation water circulation system 11, and therefore the purpose of keeping the temperature of the developing solution constant is achieved.
As shown in fig. 2, a first chamber 301 and a second chamber 302 which are independent from each other are provided in the liquid separation block 3, the developing solution pipe 10 and the heat insulating water sleeve 4 are respectively connected to the liquid separation block 3, and the developing solution pipe 10 is communicated with the first chamber 301 and the heat insulating water sleeve 4 is communicated with the second chamber 302.
As shown in fig. 3, a third chamber 702 is provided in the liquid collecting block 7, a water inlet 701 communicating with the third chamber 702 is provided in the liquid collecting block 7, the developer tube 10 penetrates out of the third chamber 702, the water inlet 701 communicates with the heat insulating water circulation system 11 through the water inlet tube 8, and the heat insulating water flows in through the water inlet 701 and flows into the heat insulating water sleeve 4 through between the developer tube 10 and the inner wall of the third chamber 702.
A water-liquid separation type liquid medicine valve 5 is arranged between the liquid collection block 7 and the liquid separation block 3, the flow of the developing solution can be controlled through the water-liquid separation type liquid medicine valve 5, and the developing solution and the heat preservation water can be separated and collected through the inlet and the outlet of the water-liquid separation type liquid medicine valve 5.
The working principle of the invention is as follows:
if the developer pipe is exposed, the developer pipe is interfered by different factors in the developing unit, so that the temperature of the developer is difficult to control, and the fluctuation of the temperature of the developer is caused. According to the invention, after the developing solution pipes 10 enter the developing unit, all the developing solution pipes pass through the inside of the heat-insulating water jacket pipe, so that the developing solution pipes are prevented from being exposed outside and are completely controlled.
The working process of the invention is as follows:
the constant temperature water of the invention is provided by a heat preservation water circulation system 11 outside the developing unit, the temperature of the constant temperature water can be set according to different process requirements, and can be automatically adjusted to the initially set value according to the temperature change.
Before working, the external heat-preservation water circulation system 11 is set to a temperature value required by the process, and then the heat-preservation water circulation system 11 is started to be in a working state. At this time, after the heat preservation water enters the developing unit through the water inlet pipe 8, the heat preservation water enters the heat preservation water sleeve 4 through the liquid collection block 7, and the temperature control before the water-liquid separation type liquid medicine valve 5 is arranged is completed. And the thermistor 6 on the liquid collecting block 7 is used for detecting the temperature of the heat preservation water entering the unit, and if the temperature is not consistent with a set value, the thermistor 6 sends a signal to the heat preservation water circulation system 11 to control the heat preservation water circulation system to change the current water temperature to reach the set value. When the heat preservation water is at the outlet of the water-liquid separation type liquid medicine valve 5, the heat preservation water flows into the heat preservation water sleeve 4 again to finish the heat preservation of the pipeline before the nozzle 2. When the developer passes through the liquid separation block 3, the heat preservation water and the developer are separated and enter different cavities of the nozzle 2, and the temperature control of the inside of the nozzle 2 on the developer is completed. Finally, the heat preservation water enters the water return pipe 9 through the water outlet of the nozzle 2 and returns to the heat preservation water circulation system 11 outside the developing unit, and the temperature control process of the developing solution is completed. The developing solution entering the nozzle 2 is controlled in the heat preservation water before being sprayed to the wafer 1, and no pipeline is exposed outside. Therefore, the developing solution is controlled from the inside of the unit to the beginning, the influence of uncertain factors on the developing solution is eliminated, and the constant temperature maintenance of the developing solution is realized.
The heat preservation water circulation system 11 is a commercial product, is purchased from the Japan SMC company, and has the model number of HRS 012-W-F-10-J; the liquid-liquid separating type liquid medicine valve 5 is a commercially available product, which is purchased from CKD corporation of Japan, and has a model number of AMD 312-8-1.
Claims (3)
1. The utility model provides a developing solution constant temperature keeps pipe-line system which characterized in that: comprises a heat preservation water circulation system (11), a liquid collecting block (7) positioned in a developing unit, a water-liquid separation type liquid medicine valve (5) and a nozzle (2) provided with a liquid separating block (3), wherein the outlet of the heat preservation water circulation system (11) enters the developing unit through a water inlet pipe (8) and is connected to the liquid collecting block (7), a developing liquid pipe (10) connected with a developing liquid source enters the developing unit and is sequentially connected with a liquid collecting block (7), a water-liquid separation type liquid medicine valve (5) and a liquid separating block (3), a heat-insulating water sleeve (4) is respectively arranged outside the developing liquid pipe (10) between the liquid collection block (7) and the water-liquid separation type liquid medicine valve (5) and the developing liquid pipe (10) between the liquid separation block (3) and the water-liquid separation type liquid medicine valve (5), heat preservation water provided by a heat preservation water circulation system (11) flows between the heat preservation water sleeve (4) and the developing liquid pipe (10); the heat preservation water flowing out of the liquid separation block (3) enters one cavity of the nozzle (2) and is communicated with an inlet of a heat preservation water circulation system (11) through a water return pipe (9), and the developing solution flowing out of the liquid separation block (3) enters the other cavity of the nozzle (2) and is sprayed to the surface of the wafer (1);
a first cavity (301) and a second cavity (302) which are independent of each other are arranged in the liquid separation block (3), the developing liquid pipe (10) and the heat-preservation water sleeve (4) are respectively connected with the liquid separation block (3), the developing liquid pipe (10) is communicated with the first cavity (301), and the heat-preservation water sleeve (4) is communicated with the second cavity (302);
the improved developing solution collector is characterized in that a third chamber (702) is arranged in the solution collecting block (7), a water inlet hole (701) communicated with the third chamber (702) is formed in the solution collecting block (7), a developing solution pipe (10) penetrates out of the third chamber (702), the water inlet hole (701) is communicated with a heat preservation water circulating system (11) through a water inlet pipe (8), heat preservation water flows in from the water inlet hole (701) and flows into a heat preservation water sleeve (4) between the developing solution pipe (10) and the inner wall of the third chamber (702).
2. The developer solution constant temperature maintenance piping system according to claim 1, characterized in that: the liquid collecting block (7) is provided with a thermistor (6) for detecting the temperature of heat preservation water entering the developing unit, and the thermistor (6) is electrically connected with the heat preservation water circulating system (11).
3. The developer solution constant-temperature maintenance piping system according to claim 1 or 2, characterized in that: the flow of the developing solution in the developing solution pipe (10) is controlled by a water-liquid separation type liquid medicine valve (5).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201410334927.9A CN105319872B (en) | 2014-07-15 | 2014-07-15 | Developing solution constant-temperature maintaining pipeline system |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410334927.9A CN105319872B (en) | 2014-07-15 | 2014-07-15 | Developing solution constant-temperature maintaining pipeline system |
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| CN105319872A CN105319872A (en) | 2016-02-10 |
| CN105319872B true CN105319872B (en) | 2020-02-07 |
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| CN114077169B (en) * | 2021-11-17 | 2023-07-21 | 沈阳芯达半导体设备有限公司 | Developer solution heat exchange system |
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| CN101403868A (en) * | 2008-11-07 | 2009-04-08 | 清溢精密光电（深圳）有限公司 | Constant temperature method and device for mask plate developing solution |
| CN101639633A (en) * | 2008-07-29 | 2010-02-03 | 和舰科技(苏州)有限公司 | Supply pipeline of developing solution |
| CN102298276A (en) * | 2010-06-25 | 2011-12-28 | 中国科学院微电子研究所 | Silicon wafer degumming device and method |
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Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103464311B (en) * | 2013-08-28 | 2016-01-20 | 清华大学深圳研究生院 | A kind of thermal circulating insulation device for technique nozzle and technique nozzle |
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Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6427717B1 (en) * | 1998-07-02 | 2002-08-06 | Tokyo Electron Limited | Process solution supplying apparatus and fluid passageway opening-closing valve device for process solution supplying apparatus |
| CN101639633A (en) * | 2008-07-29 | 2010-02-03 | 和舰科技(苏州)有限公司 | Supply pipeline of developing solution |
| CN101369105A (en) * | 2008-10-14 | 2009-02-18 | 上海市激光技术研究所 | Automatic spraying development apparatus and method after exposure of large-face optical resist glass plate |
| CN101403868A (en) * | 2008-11-07 | 2009-04-08 | 清溢精密光电（深圳）有限公司 | Constant temperature method and device for mask plate developing solution |
| CN102298276A (en) * | 2010-06-25 | 2011-12-28 | 中国科学院微电子研究所 | Silicon wafer degumming device and method |
| CN103807571A (en) * | 2012-11-06 | 2014-05-21 | 沈阳芯源微电子设备有限公司 | Heat-preservation device of photoresist pipeline casing pipe |
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| CN105319872A (en) | 2016-02-10 |
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Address after: 110168 No. 16 Feiyun Road, Hunnan District, Shenyang City, Liaoning Province Applicant after: Shenyang Core Source Microelectronic Equipment Co., Ltd. Address before: 110168 No. 16 Feiyun Road, Hunnan New District, Shenyang City, Liaoning Province Applicant before: Shenyang Siayuan Electronic Equipment Co., Ltd. |
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