CN105319872A - Developing liquid constant temperature maintaining pipeline system - Google Patents
Developing liquid constant temperature maintaining pipeline system Download PDFInfo
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- CN105319872A CN105319872A CN201410334927.9A CN201410334927A CN105319872A CN 105319872 A CN105319872 A CN 105319872A CN 201410334927 A CN201410334927 A CN 201410334927A CN 105319872 A CN105319872 A CN 105319872A
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Abstract
The invention belongs to the field of semiconductor even glue developing, and specifically relates to a developing liquid constant temperature maintaining pipeline system. The outlet of a thermal insulation water circulating system enters a developing unit through a water inlet pipe and is connected to a liquid collecting block, a developing liquid pipe that is connected to a developing liquid source enters the developing unit and is connected to the liquid collecting block, a water-liquid separation type liquid valve, and a liquid dividing block; the developing liquid pipe arranged between the liquid collecting block and the water-liquid separation type liquid valve and the developing liquid pipe arranged between the liquid dividing block and the water-liquid separation type liquid valve are both provided with a thermal insulation water sleeve; thermal insulation water provided by the thermal insulation water circulation system flows between the thermal insulation water sleeve and the developing liquid pipe; the thermal insulation water, which flows out from the liquid dividing block, enters one cavity of a nozzle and is communicated with the thermal insulation water circulating system through a water return pipe; the developing liquid that flows out from the liquid dividing block enters the other cavity of the nozzle and is sprayed on the surface of wafers. Through the provided system, after the developing liquid enters the developing unit, the developing liquid is completely soaked in thermal insulation water, the exposure of developing liquid to external space is avoided, and thus the influences of other factors on developing liquid are reduced.
Description
Technical field
The invention belongs to semiconductor even glue developing field, specifically a kind of developer solution constant temperature keeps pipe system, in order to the control of developer temperatur in IC manufacturing monolithic wet processing apparatus.
Background technology
At present, in semiconductor crystal wafer production run, in order to complete more and more harsher technological requirement, need to carry out strict control to the links of equipment, and the temperature of developer solution controls to be the most important thing.Development is a most important step in gel developer, and because developer solution is to very temperature sensitive, the scope exceeding regulation will cause extreme influence to technique, whole wafer process may be caused from newly, will to have a strong impact on production capacity, affect economic benefit.And now to insulation just local or the bilayer sleeve of developer solution, make backwater have an impact very difficult controlled to insulation water.
Summary of the invention
For the problems referred to above, a kind of developer solution constant temperature is the object of the present invention is to provide to keep pipe system.The constant of developer temperatur can be realized by this pipe system and keep always, making when developing process developer solution control from start to finish in the technological temperature of setting.
The object of the invention is to be achieved through the following technical solutions:
The present invention includes the liquid collecting block being incubated water circulation system and being positioned at developing cell, water liquid separate type liquid valve and the nozzle being provided with liquid-separating block, the outlet being wherein incubated water circulation system enters described developing cell by water inlet pipe, be connected to described liquid collecting block, the developer solution pipe be connected with developer solution source enters described developing cell, connect liquid collecting block successively, water liquid separate type liquid valve and liquid-separating block, insulation jacket pipe is equipped with outside developer solution pipe between described liquid collecting block and water liquid separate type liquid valve and the developer solution pipe between described liquid-separating block and water liquid separate type liquid valve, circulate by the insulation water being incubated water circulation system and providing between described insulation jacket pipe and developer solution pipe, the insulation water flowed out through described liquid-separating block enters a chamber of described nozzle, and is connected by the entrance of return pipe with described insulation water circulation system, and the developer solution flowed out through described liquid-separating block enters another chamber of described nozzle, is sprayed to the surface of wafer.
Wherein: described liquid collecting block is provided with the thermistor detecting and enter the insulation coolant-temperature gage of developing cell, this thermistor is electrically connected with described insulation water circulation system; Be provided with the first separate chamber and the second chamber in described liquid-separating block, described developer solution pipe and insulation jacket pipe are connected with liquid-separating block respectively, and described developer solution pipe and described first chamber, described insulation jacket pipe and described second chamber; The 3rd chamber is provided with in described liquid collecting block, this liquid collecting block has the inlet opening be connected with described 3rd chamber, described developer solution Guan You tri-chamber passes, described inlet opening is connected with insulation water circulation system by described water inlet pipe, insulation water is flowed into by this inlet opening, and is incubated jacket pipe through flowing between described developer solution pipe and the inwall of described 3rd chamber; Developer solution in described developer solution pipe controls flow by water liquid separate type liquid valve.
Advantage of the present invention and good effect are:
1. the present invention realizes developer solution by liquid collecting block and is incubated collecting of water, the uninterrupted of developer solution is controlled by water liquid separate type liquid valve, be fully immersed in after making developer solution pipe enter developing cell in insulation water, avoid outside exposed, reduce the impact of other factors on developer solution.
2. liquid collecting block of the present invention is provided with thermistor, control system is interrelated outward to achieve pipe system and unit in unit, thus ensures the constant of insulation water.
3. thermostatted water of the present invention is provided by the insulation water circulation system outside developing cell, and the temperature of thermostatted water can set according to different technological requirements.And the value of initial setting automatically can be adjusted to according to temperature variation.
Accompanying drawing explanation
Fig. 1 is structural representation of the present invention;
Fig. 2 is the inner structure schematic diagram of liquid collecting block of the present invention;
Fig. 3 is the inner structure schematic diagram of liquid-separating block of the present invention;
Wherein: 1 is wafer, 2 is nozzle, and 3 is liquid-separating block, 301 is the first chamber, and 302 is the second chamber, and 4 is insulation jacket pipe, 5 is water liquid separate type liquid valve, and 6 is thermistor, and 7 is liquid collecting block, 701 is inlet opening, 702 is the 3rd chamber, and 8 is return pipe, and 9 is water inlet pipe, 10 is developer solution pipe, and 11 is insulation water circulation system.
Embodiment
Below in conjunction with accompanying drawing, the invention will be further described.
As shown in Figure 1, the present invention includes insulation water circulation system 11 and be positioned at the liquid collecting block 7 of developing cell, water liquid separate type liquid valve 5 and the nozzle 2 of liquid-separating block 3 is installed, after wherein the outlet of insulation water circulation system 11 enters developing cell by water inlet pipe 9, be connected to liquid collecting block 7, after the developer solution pipe 10 be connected with developer solution source enters developing cell, connect liquid collecting block 7, water liquid separate type liquid valve 5 and liquid-separating block 3 successively; Be equipped with outside developer solution pipe 10 between liquid collecting block 7 and water liquid separate type liquid valve 5 and the developer solution pipe 10 between liquid-separating block 3 and water liquid separate type liquid valve 5 and be incubated jacket pipe 4, the longitudinal center line conllinear of developer solution pipe 10 and insulation jacket pipe 4, circulates between insulation jacket pipe 4 and developer solution pipe 10 by the insulation water being incubated water circulation system 11 and providing.Insulation water through liquid-separating block 3 outflow enters a chamber of nozzle 2, and is connected by the entrance of return pipe 8 with insulation water circulation system 11, and the developer solution through liquid-separating block 3 outflow enters another chamber of nozzle 2, is sprayed to the surface of wafer 1.Liquid collecting block 7 is provided with thermistor 6, this thermistor 6 is electrically connected with insulation water circulation system 11, forms a closed-loop feedback system, for detecting the insulation coolant-temperature gage that enters developing cell.Whole pipe system of the present invention is divided into three parts, comprises pipe system only, the outer control system of unit and feedback system; Wherein in unit, pipe system comprises liquid collecting block 7, water liquid separate type liquid valve 5, liquid-separating block 3, nozzle 2 and insulation jacket pipe 4, and the outer control system of unit comprises insulation water circulation system 11, and feedback system then comprises thermistor 6.When insulation water circulation system 11 is set temperature, insulation water controls the temperature of developer solution pipe 10 in sleeve pipe through insulation jacket pipe 4, after insulation water to enter the liquid collecting block 7 in developing cell by water inlet pipe 9, thermistor 6 will be monitored the temperature of insulation water, when temperature changes thermistor 6 result feedback to the insulation water circulation system 11 outside developing cell, control the temperature that insulation water circulation system 11 readjusts needs, thus control the object of the temperature remained constant of developer solution.
As shown in Figure 2, the first separate chamber 301 and the second chamber 302 is provided with in liquid-separating block 3, developer solution pipe 10 and insulation jacket pipe 4 are connected with liquid-separating block 3 respectively, and developer solution pipe 10 is communicated with the first chamber 301, is incubated jacket pipe 4 and is communicated with the second chamber 302.
As shown in Figure 3, the 3rd chamber 702 is provided with in liquid collecting block 7, this liquid collecting block 7 has the inlet opening 701 be connected with the 3rd chamber 702, developer solution pipe 10 is passed by the 3rd chamber 702, inlet opening 701 is connected with insulation water circulation system 11 by water inlet pipe 9, insulation water is flowed into by this inlet opening 701, and is incubated jacket pipe 4 through flowing between developer solution pipe 10 and the inwall of the 3rd chamber 702.
Water liquid separate type liquid valve 5 is housed between liquid collecting block 7 of the present invention and liquid-separating block 3, can control the uninterrupted of developer solution through this water liquid separate type liquid valve 5, import and the outlet of water liquid separate type liquid valve 5 can also realize developer solution and be separated with insulation water and collect.
Principle of work of the present invention is:
If the exposed interference that will be subject to Different factor in developing cell outside of developer solution pipeline, such developer temperatur is difficult to controlled, causes the undulatory property of developer temperatur.After the present invention makes developer solution pipe 10 enter into developing cell inside exactly, all developer solution pipes all pass in insulation jacket pipe inside, avoid developer solution pipeline outside exposed, make it completely controlled.
The course of work of the present invention is:
Thermostatted water of the present invention is provided by the insulation water circulation system 11 outside developing cell, and the temperature of thermostatted water can set according to different technological requirements, and automatically can be adjusted to the value of initial setting according to temperature variation.
Before work, first unit Surgery therapy water circulation system 11 is set to the temperature value required for technique, then starts insulation water circulation system 11, make it in running order.At this moment be incubated water after water inlet pipe 9 enters developing cell, entered in insulation jacket pipe 4 by liquid collecting block 7, the temperature before completing the import of water liquid separate type liquid valve 5 controls.Thermistor 6 on liquid collecting block 7, for detecting the insulation coolant-temperature gage entering unit, if temperature and setting value are not inconsistent, thermistor 6 signals to insulation water circulation system 11, controls its change current water temperature and makes it reach setting value.When being incubated water and exporting at water liquid separate type liquid valve 5, again flow in insulation jacket pipe 4, complete the pipeline heat insulation before nozzle 2.When through liquid-separating block 3, insulation water is separated with developer solution and enters in the different chamber of nozzle 2, completes nozzle 2 inside and controls the temperature of developer solution.Finally be incubated water and enter into return pipe 8 li through the water delivering orifice of nozzle 2, turn back to the insulation water circulation system 11 li of developing cell outside, complete the temperature controlled processes to developer solution.The developer solution entered in nozzle 2 before being sprayed onto wafer 1 is all in the control of insulation water, does not have exposed pipeline.Such developer solution is eventually all controlled to starting from from entering into unit inside afterwards, and get rid of uncertain factor to the impact of developer solution, the constant temperature realizing developer solution keeps.
Insulation water circulation system 11 of the present invention is commercial products, and purchase in Japanese SMC company, model is HRS012-W-F-10-J; Water liquid separate type liquid valve 5 is commercial products, and purchase in Japanese CKD company, model is AMD312-8-1.
Claims (5)
1. a developer solution constant temperature keeps pipe system, it is characterized in that: comprise the liquid collecting block (7) being incubated water circulation system (11) and being positioned at developing cell, water liquid separate type liquid valve (5) and be provided with the nozzle (2) of liquid-separating block (3), the outlet being wherein incubated water circulation system (11) enters described developing cell by water inlet pipe (9), be connected to described liquid collecting block (7), the developer solution pipe (10) be connected with developer solution source enters described developing cell, connect liquid collecting block (7) successively, water liquid separate type liquid valve (5) and liquid-separating block (3), be equipped with outside developer solution pipe (10) between described liquid collecting block (7) and water liquid separate type liquid valve (5) and the developer solution pipe (10) between described liquid-separating block (3) and water liquid separate type liquid valve (5) and be incubated jacket pipe (4), circulate by the insulation water being incubated water circulation system (11) and providing between described insulation jacket pipe (4) and developer solution pipe (10), the insulation water flowed out through described liquid-separating block (3) enters a chamber of described nozzle (2), and be connected by the entrance of return pipe (8) with described insulation water circulation system (11), the developer solution flowed out through described liquid-separating block (3) enters another chamber of described nozzle (2), is sprayed to the surface of wafer (1).
2. keep pipe system by developer solution constant temperature according to claim 1, it is characterized in that: described liquid collecting block (7) is provided with the thermistor (6) detecting and enter the insulation coolant-temperature gage of developing cell, this thermistor (6) is electrically connected with described insulation water circulation system (11).
3. keep pipe system by the developer solution constant temperature described in claim 1 or 2, it is characterized in that: in described liquid-separating block (3), be provided with separate the first chamber (301) and the second chamber (302), described developer solution pipe (10) and insulation jacket pipe (4) are connected with liquid-separating block (3) respectively, and described developer solution pipe (10) is communicated with described first chamber (301), described insulation jacket pipe (4) is communicated with described second chamber (302).
4. keep pipe system by the developer solution constant temperature described in claim 1 or 2, it is characterized in that: in described liquid collecting block (7), be provided with the 3rd chamber (702), this liquid collecting block (7) has the inlet opening (701) be connected with described 3rd chamber (702), described developer solution pipe (10) is passed by the 3rd chamber (702), described inlet opening (701) is connected with insulation water circulation system (11) by described water inlet pipe (9), insulation water is flowed into by this inlet opening (701), and be incubated jacket pipe (4) through flowing between described developer solution pipe (10) and the inwall of described 3rd chamber (702).
5. keep pipe system by the developer solution constant temperature described in claim 1 or 2, it is characterized in that: the developer solution in described developer solution pipe (10) controls flow by water liquid separate type liquid valve (5).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410334927.9A CN105319872B (en) | 2014-07-15 | 2014-07-15 | Developing solution constant-temperature maintaining pipeline system |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410334927.9A CN105319872B (en) | 2014-07-15 | 2014-07-15 | Developing solution constant-temperature maintaining pipeline system |
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| CN105319872A true CN105319872A (en) | 2016-02-10 |
| CN105319872B CN105319872B (en) | 2020-02-07 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114077169A (en) * | 2021-11-17 | 2022-02-22 | 沈阳芯达半导体设备有限公司 | Developer heat exchange system |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6427717B1 (en) * | 1998-07-02 | 2002-08-06 | Tokyo Electron Limited | Process solution supplying apparatus and fluid passageway opening-closing valve device for process solution supplying apparatus |
| CN101369105A (en) * | 2008-10-14 | 2009-02-18 | 上海市激光技术研究所 | Automatic spraying development apparatus and method after exposure of large-face optical resist glass plate |
| CN101403868A (en) * | 2008-11-07 | 2009-04-08 | 清溢精密光电（深圳）有限公司 | Constant temperature method and device for mask plate developing solution |
| CN101639633A (en) * | 2008-07-29 | 2010-02-03 | 和舰科技(苏州)有限公司 | Supply pipeline of developing solution |
| CN102298276A (en) * | 2010-06-25 | 2011-12-28 | 中国科学院微电子研究所 | Silicon wafer degumming device and method |
| CN103464311A (en) * | 2013-08-28 | 2013-12-25 | 清华大学深圳研究生院 | Technologic nozzle and thermal circulation heat-insulation device for same |
| CN103807571A (en) * | 2012-11-06 | 2014-05-21 | 沈阳芯源微电子设备有限公司 | Heat-preservation device of photoresist pipeline casing pipe |
| CN103955123A (en) * | 2014-04-11 | 2014-07-30 | 武汉高芯科技有限公司 | Wet photoresist removing liquid and photoresist removing method of wafers after ion implantation |
| CN104565478A (en) * | 2014-11-14 | 2015-04-29 | 宁波敏宝卫浴五金水暖洁具有限公司 | Separate valve body structure for water tap |
-
2014
- 2014-07-15 CN CN201410334927.9A patent/CN105319872B/en active Active
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6427717B1 (en) * | 1998-07-02 | 2002-08-06 | Tokyo Electron Limited | Process solution supplying apparatus and fluid passageway opening-closing valve device for process solution supplying apparatus |
| CN101639633A (en) * | 2008-07-29 | 2010-02-03 | 和舰科技(苏州)有限公司 | Supply pipeline of developing solution |
| CN101369105A (en) * | 2008-10-14 | 2009-02-18 | 上海市激光技术研究所 | Automatic spraying development apparatus and method after exposure of large-face optical resist glass plate |
| CN101403868A (en) * | 2008-11-07 | 2009-04-08 | 清溢精密光电（深圳）有限公司 | Constant temperature method and device for mask plate developing solution |
| CN102298276A (en) * | 2010-06-25 | 2011-12-28 | 中国科学院微电子研究所 | Silicon wafer degumming device and method |
| CN103807571A (en) * | 2012-11-06 | 2014-05-21 | 沈阳芯源微电子设备有限公司 | Heat-preservation device of photoresist pipeline casing pipe |
| CN103464311A (en) * | 2013-08-28 | 2013-12-25 | 清华大学深圳研究生院 | Technologic nozzle and thermal circulation heat-insulation device for same |
| CN103955123A (en) * | 2014-04-11 | 2014-07-30 | 武汉高芯科技有限公司 | Wet photoresist removing liquid and photoresist removing method of wafers after ion implantation |
| CN104565478A (en) * | 2014-11-14 | 2015-04-29 | 宁波敏宝卫浴五金水暖洁具有限公司 | Separate valve body structure for water tap |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114077169A (en) * | 2021-11-17 | 2022-02-22 | 沈阳芯达半导体设备有限公司 | Developer heat exchange system |
| CN114077169B (en) * | 2021-11-17 | 2023-07-21 | 沈阳芯达半导体设备有限公司 | Developer solution heat exchange system |
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| CN105319872B (en) | 2020-02-07 |
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Address after: 110168 No. 16 Feiyun Road, Hunnan District, Shenyang City, Liaoning Province Applicant after: Shenyang Core Source Microelectronic Equipment Co., Ltd. Address before: 110168 No. 16 Feiyun Road, Hunnan New District, Shenyang City, Liaoning Province Applicant before: Shenyang Siayuan Electronic Equipment Co., Ltd. |
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