CN101639633B - Supply pipeline of developing solution - Google Patents
Supply pipeline of developing solution Download PDFInfo
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- CN101639633B CN101639633B CN200810144417XA CN200810144417A CN101639633B CN 101639633 B CN101639633 B CN 101639633B CN 200810144417X A CN200810144417X A CN 200810144417XA CN 200810144417 A CN200810144417 A CN 200810144417A CN 101639633 B CN101639633 B CN 101639633B
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Abstract
The invention relates to a supply pipeline of developing solution, comprising developing solution pipelines, developing solution nozzles arranged at front end of the developing solution pipelines, and a de-ionized water pipeline parallel with the developing solution pipelines, wherein the de-ionized water pipeline is connected to the developing solution pipelines by being mounted to a control valve of the developing solution pipelines. By adopting the structure of the invention, crystallized substance in the nozzle can be discharged, and the deposit in the pipelines can be cleared up, thereby avoiding phenomena of degeneration of the developing solution or carbonate deposition, and overcoming easy block and smudgy nozzles because of no device for cleaning the pipelines is arranged on the traditional developing solution pipelines, and the degeneration of the developing solution and insufficient development capacity caused by arranging a constant temperature device in the midway of part of developing solution pipelines and the dirty inner wall of the pipelines and dirty outer wall of the constant temperature tubes of the developing solution nozzles, thereby improving the product qualified rate and reducing the opportunities of poor development.
Description
Technical field
The present invention relates to the semiconductor developing process, particularly relate to a kind of supply pipeline of developing solution.
Background technology
As shown in Figure 1, traditional supply pipeline of developing solution comprises devices such as developer solution pipeline 11, constant temperature exchange system 6, temperature monitoring 7, temperature controller 4, developer solution nozzle.In traditional developing cell; Because the nozzle diameter (0.4mm) of E2/E3 is very little; And developer solution be easy to generate carbonate crystallization after air combines, cause nozzle blockage easily, make developer solution when nozzle spues, can't be evenly distributed on the wafer; Thereby cause the crystal on wafer poor visualization or the nozzle to drop on the wafer, cause product rejection.
Simultaneously, because traditional supply pipeline of developing solution does not provide the device that makes line clear (referring to Fig. 1), so pipeline inner wall, pipe joint, pipeline valve member and developer solution nozzle are dirty easily.Because part developer solution pipeline is not provided with thermostat midway, add the pipeline inner wall dirt again, the constant warm tube outer wall dirt of developer solution nozzle causes developer solution rotten easily, causes development capability not enough.
Summary of the invention
To developer solution nozzle crystallization blocking problem in the prior art; The objective of the invention is to propose a kind of supply pipeline of developing solution; On the basis of original supply pipeline of developing solution, increase the deionized water pipeline that is used to clean the developer solution nozzle, the crystal that is present in the nozzle is discharged; And the sediment in the cleaning channels, thereby the chance of reduction poor visualization.
In order to reach above-mentioned and other purposes of the present invention; The present invention proposes a kind of supply pipeline of developing solution; Comprise the developer solution pipeline, be positioned at the developer solution nozzle of developer solution pipeline front end; And the deionized water pipeline that is in parallel with the developer solution pipeline, this deionized water pipeline is connected to the developer solution pipeline through the by-pass valve control that is installed to the developer solution pipeline.
As preferably, this deionized water pipeline is parallel on the supply pipeline of developing solution between constant temperature exchange system and the filtrator.
As preferably, this by-pass valve control is manual three-phase valve, and this manual three-phase valve can be used to control deionized water and developer solution simultaneously.
As preferably, this developer solution nozzle is the nozzle of E series.
As preferably, this supply pipeline of developing solution also comprises temperature controller, and this temperature controller is connected with the chemicals input/output board (Chemical I/O board) of board, is used for the temperature of senses flow to the developer solution of developer solution nozzle.
The present invention is through increasing the deionized water pipeline on the basis of original supply pipeline of developing solution; Can the crystal dirty and the developer solution nozzle in the developer solution pipeline be discharged fast through the hydraulic pressure that the deionized water pipeline is provided, not have dirt to keep pipeline inner wall, pipe joint, pipeline valve member and developer solution nozzle; Simultaneously; Owing to kept the internal and external parts of all spare and accessory parts of developer solution pipeline clean; Though part developer solution pipeline does not have thermostat midway; But the deionized water that provides is regularly made cleaning channels usefulness, is unlikely to produce the rotten or carbonate deposition of developer solution, thereby has avoided above phenomenon to cause the not enough problem of development capability.
Description of drawings
Fig. 1 is traditional supply pipeline of developing solution synoptic diagram;
Fig. 2 is a kind of supply pipeline of developing solution synoptic diagram of the present invention.
Fig. 3 is an E2 nozzle synoptic diagram involved in the present invention;
Fig. 4 is an E3 nozzle synoptic diagram involved in the present invention.
Embodiment
Make more detailed description below in conjunction with the accompanying drawing specific embodiments of the invention.
Referring to Fig. 2; A kind of supply pipeline of developing solution; Comprise developer solution pipeline 11, be positioned at the developer solution nozzle 12 of developer solution pipeline front end; And the deionized water pipeline 21 that is in parallel with the developer solution pipeline, this deionized water pipeline 21 is connected to developer solution pipeline 11 through the by-pass valve control 3 that is installed to the developer solution pipeline.This developer solution pipeline generally has surge tank (Buffer tank; Be used for the temporary of developer solution), Teflon pipeline, filtrator (Filter; Being used for developer solution filters), ventilation blower (Fan flow; Be used to detect flow), pneumatic valve (being used to control the switch of developer solution spraying), constant temperature exchange system 6, temperature monitoring 7, nozzle 12 devices such as (being used for spraying to wafer surface to developer solution), this deionized water pipeline 21 is made up of the Teflon pipeline usually.
As preferably, this deionized water pipeline 21 is parallel on the supply pipeline of developing solution 11 between constant temperature exchange system 6 and the filtrator 5.
As preferably, this by-pass valve control 3 is manual three-phase valve, and this manual three-phase valve can be used to control deionized water 2 and developer solution 1 simultaneously.
As preferably, this manual three-phase valve is used for regularly switching deionized water 2, and the preparatory spray mechanism of utilizing board to provide is being borrowed the hydraulic pressure of deionized water 2, with existing the crystals (carbonate) in the developer solution nozzle 12 to discharge fast, and the interior sediment of detergent line.
As preferably, this developer solution nozzle 12 is the nozzle of E series, preferably E2 or E3 nozzle.Referring to Fig. 3, the aperture that it is 0.4mm that the E2 nozzle has 104 diameters, deionized water 2 is discharged behind the formation loop in this developer solution nozzle through this developer solution nozzle of pipeline turnover, thus the sediment in detergent line and the nozzle.Referring to Fig. 4, the E3 nozzle has 102 apertures, and the diameter of each aperture of center section 122 is less than the diameter of each aperture of Outboard Sections 121; In E3 nozzle shown in Figure 4, the diameter of the aperture 81 of center section 122 is 0.15mm, and the diameter of aperture 82 is 0.20mm; The diameter of aperture 83 is 0.25mm, and the diameter of aperture 84 is 0.30mm, and the diameter of aperture 85 is 0.32mm; The diameter of aperture 86 is 0.34mm, and the diameter of aperture 87 is 0.36mm, and the diameter of aperture 88 is 0.38mm; The diameter of the aperture 90 of Outboard Sections 121 is 0.40mm.Deionized water 2 is discharged behind the formation loop in this developer solution nozzle through this developer solution nozzle of pipeline turnover, thus the sediment in detergent line and the nozzle.These two kinds of nozzles all can spray developer solution in wafer surface equably when inserting developer solution.
As preferably; This supply pipeline of developing solution also comprises temperature controller 4; This temperature controller 4 is positioned at the position of the front end of developer solution pipeline 11 near developer solution nozzle 12; Be connected with the chemicals input/output board (Chemical I/O board) of board, be used for the temperature of senses flow to the developer solution 1 of developer solution nozzle 12.
Compare with existing supply pipeline of developing solution; The present invention has increased deionized water pipeline 21; Utilization is provided in the hydraulic pressure of deionized water pipeline 21; Can the crystal dirty and developer solution nozzle 12 in the developer solution pipeline 11 be discharged fast, thereby keep pipeline inner wall, pipe joint, pipeline valve member and developing nozzle not to have dirt; Simultaneously; Owing to kept the internal and external parts of developer solution pipeline 11 all spare and accessory parts clean; Though part developer solution pipeline does not have thermostat midway,, the rotten or carbonate deposition phenomenon of developer solution is avoided through regularly providing deionized water 2 to be used for cleaning channels; Thereby overcome the not enough problem of traditional development capability that supply pipeline of developing solution caused, improved the qualification rate of product.
Preferred embodiment of the present invention and effect thereof have more than been described; Certainly; The present invention also can have other embodiment; Under the situation of spirit that does not deviate from the present invention and essence, the person of ordinary skill in the field works as can make various corresponding changes and distortion according to the present invention, but these corresponding changes and distortion all should belong to the protection domain of claim of the present invention.
Claims (5)
1. supply pipeline of developing solution; Comprise the developer solution pipeline, be positioned at the developer solution nozzle of developer solution pipeline front end; It is characterized in that; Also comprise the deionized water pipeline that is in parallel with the developer solution pipeline, this deionized water pipeline is connected to the developer solution pipeline through the by-pass valve control that is installed to the developer solution pipeline.
2. a kind of supply pipeline of developing solution according to claim 1 is characterized in that, this deionized water pipeline is parallel on the supply pipeline of developing solution between constant temperature exchange system and the filtrator.
3. a kind of supply pipeline of developing solution according to claim 1 and 2 is characterized in that, this by-pass valve control is manual three-phase valve, and this manual three-phase valve can be used to control deionized water and developer solution simultaneously.
4. a kind of supply pipeline of developing solution according to claim 1 and 2 is characterized in that, this developer solution nozzle is the nozzle of E series.
5. a kind of supply pipeline of developing solution according to claim 1 and 2; It is characterized in that; This supply pipeline of developing solution also comprises temperature controller, and this temperature controller is connected with the chemicals input/output board of board, is used for the temperature of senses flow to the developer solution of developer solution nozzle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200810144417XA CN101639633B (en) | 2008-07-29 | 2008-07-29 | Supply pipeline of developing solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200810144417XA CN101639633B (en) | 2008-07-29 | 2008-07-29 | Supply pipeline of developing solution |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101639633A CN101639633A (en) | 2010-02-03 |
| CN101639633B true CN101639633B (en) | 2012-02-29 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200810144417XA Expired - Fee Related CN101639633B (en) | 2008-07-29 | 2008-07-29 | Supply pipeline of developing solution |
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| Country | Link |
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Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104102096A (en) * | 2014-06-05 | 2014-10-15 | 京东方科技集团股份有限公司 | Developing solution supply system, developing solution supply method and developing equipment |
| CN105319872B (en) * | 2014-07-15 | 2020-02-07 | 沈阳芯源微电子设备股份有限公司 | Developing solution constant-temperature maintaining pipeline system |
| CN106298584B (en) * | 2015-06-02 | 2018-09-28 | 沈阳芯源微电子设备有限公司 | One kind removing glue constant temperature system |
| CN117501409A (en) * | 2021-09-29 | 2024-02-02 | 华为技术有限公司 | Developing device, developing method and glue coating developing system |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6427717B1 (en) * | 1998-07-02 | 2002-08-06 | Tokyo Electron Limited | Process solution supplying apparatus and fluid passageway opening-closing valve device for process solution supplying apparatus |
| CN1441321A (en) * | 2002-02-27 | 2003-09-10 | 三菱化学工程株式会社 | Development liquid supply device |
| CN1574221A (en) * | 2003-06-04 | 2005-02-02 | 大日本网目版制造株式会社 | Liquid supplying device and substrate processing device |
| CN101000466A (en) * | 2006-12-29 | 2007-07-18 | 友达光电股份有限公司 | Wet and cleaning device of developer solution cylinder |
| CN101092957A (en) * | 2006-06-19 | 2007-12-26 | 东京应化工业株式会社 | Treatment solution supply apparatus |
-
2008
- 2008-07-29 CN CN200810144417XA patent/CN101639633B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6427717B1 (en) * | 1998-07-02 | 2002-08-06 | Tokyo Electron Limited | Process solution supplying apparatus and fluid passageway opening-closing valve device for process solution supplying apparatus |
| CN1441321A (en) * | 2002-02-27 | 2003-09-10 | 三菱化学工程株式会社 | Development liquid supply device |
| CN1574221A (en) * | 2003-06-04 | 2005-02-02 | 大日本网目版制造株式会社 | Liquid supplying device and substrate processing device |
| CN101092957A (en) * | 2006-06-19 | 2007-12-26 | 东京应化工业株式会社 | Treatment solution supply apparatus |
| CN101000466A (en) * | 2006-12-29 | 2007-07-18 | 友达光电股份有限公司 | Wet and cleaning device of developer solution cylinder |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101639633A (en) | 2010-02-03 |
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