CN101000466A - Wet and cleaning device of developer solution cylinder - Google Patents
Wet and cleaning device of developer solution cylinder Download PDFInfo
- Publication number
- CN101000466A CN101000466A CN 200610172068 CN200610172068A CN101000466A CN 101000466 A CN101000466 A CN 101000466A CN 200610172068 CN200610172068 CN 200610172068 CN 200610172068 A CN200610172068 A CN 200610172068A CN 101000466 A CN101000466 A CN 101000466A
- Authority
- CN
- China
- Prior art keywords
- developer solution
- moistening
- cylinder
- cleaning plant
- nozzle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Landscapes
- Liquid Crystal (AREA)
Abstract
A wet and cleaning device of developer solution cylinder consists of developing chamber, developer solution roller for driving base plate into developing chamber, developing tank for storing developer solution, nozzle set at bottom of developing chamber and used to spray developer solution in said tank onto developer solution roller, pressure control unit for controlling flow rate and pressure of said nozzle.
Description
Technical field
The present invention relates to a kind of moistening and cleaning plant, relate in particular to the moistening and cleaning plant of a kind of developer solution cylinder.
Background technology
Usually when making Thin Film Transistor-LCD (TFT-LCD), must make the pattern of thin film transistor (TFT) earlier on clean glass substrate, the technology of its technology and general semiconductor is similar.At first want deposit film, as dielectric film or metal film; Enter photoetching process (photo process) then, spray photoresist, put mask again and expose, then deliver to developing machine (developer) spray and sweep developer solution,, make the typing of photoresist layer with the photoresist behind the removal irradiation to film; The last film that will expose with etching is again removed, and removes the photoresist that stays after etching, and this has promptly finished the required circuit pattern of transistor.
Wherein, developing machine mostly continue to use developer solution in the round-robin mode, and liquid is contained cylinder is used for the film forming of developing in first road and moistening, so that developer solution can be distributed in rapidly on the glass baseplate surface of coating exposure equably.Now, because developer solution of a great variety and add consideration to cost, the part developer solution has adopted does not have the interface activating agent (surfactant) of interpolation, this kind developer solution not only is easy to generate bubble, and easily stagnate to produce crystal and be deposited on liquid and contain on the cylinder because of volatilization or system running, cause the film of glass baseplate surface to scrape and fail to understand aberration (Mura), make product percent of pass descend.
For addressing the above problem; can temporarily earlier liquid be contained cylinder removes; solve the problem that produces crystal because of the running stagnation with this; but this mode can make the moistening in advance defunctionalization of development; and still can't get rid of and fall and contain crystal on the cylinder attached to liquid; so must shut down often and clear up, could remove liquid and contain residual crystal on the cylinder.In addition, also developing room first row's nozzle can be turned to spray developing liquid, but still have the problem of the area coverage deficiency of spray developing liquid, also need shut down cleaning liquid contain on the cylinder residual crystal.
Though said method can reduce the crystal that is produced on the liquid Sheng cylinder a little, but still needs to shut down the residual crystal of cleaning, makes production line interrupt and the increase manufacturing cost.Therefore, how to avoid residual crystal on liquid Sheng cylinder, prevent that glass baseplate surface from producing film and scraping and aberration, promote quality and qualification rate with this, and reduce number of times and the time that stops the line cleaning, and then reduce manufacturing cost, be the problem of institute of the present invention desire improvement.
Summary of the invention
In view of the above, the object of the present invention is to provide the moistening and cleaning plant of a kind of developer solution cylinder, it can effectively avoid containing residual crystal on the cylinder at liquid.
The present invention proposes the moistening and cleaning plant of a kind of developer solution cylinder, it is positioned at the bottom of developing room, contains the drum driven substrate by liquid and enters developing room, and this device comprises: at least one nozzle, it contains cylinder in order to developer solution is sprayed to liquid, and avoids containing residual crystal on the cylinder at liquid; And pressure controller, it is in order to the flow and the pressure of control nozzle.
The present invention has also proposed the moistening and cleaning plant of a kind of developer solution cylinder, comprises: developing room; Liquid is contained cylinder, and it enters developing room in order to driving substrate; Developing trough stores developer solution; At least one nozzle, it is positioned at the bottom of developing room, is sprayed to liquid in order to the developer solution with developing trough and contains cylinder, and avoid containing residual crystal on the cylinder at liquid; And pressure controller, it is in order to the flow and the pressure of control nozzles spray.
Liquid of the present invention is contained cylinder and is kept moistening by the developer solution that nozzle sprayed, and can not produce crystal for a long time because of stagnating, and avoids containing the aberration that residual crystal causes substrate surface generation film to scrape or fail to understand on the cylinder because of liquid.
Relevant preferred embodiment of the present invention and effect thereof, existing conjunction with figs. explanation as after.
Description of drawings
Fig. 1 is the structural representation of first embodiment of the invention.
Fig. 2 is the schematic appearance of first embodiment of the invention.
Fig. 3 is the structural representation of second embodiment of the invention.
Wherein, description of reference numerals is as follows:
Moistening and the cleaning plant of 10 developer solution cylinders
112 outlets of 11 developing rooms, 111 inlets
12 liquid are contained cylinder 13 developing troughs 14 nozzles
15 pressure controllers, 151 switches, 152 pressure gauges
16 flowmeters, 20 substrates
Embodiment
As Fig. 1 and shown in Figure 2, it is first preferred embodiment of the present invention.
Moistening and the cleaning plant 10 of developer solution cylinder comprises: developing room 11, liquid are contained cylinder 12, developing trough 13, nozzle 14, pressure controller 15.
Developing room 11 is provided with inlet 111 and export 112, makes one to be exposed substrate 20 after the device exposure and to enter developing room 11 and carry out developing programs, and after finishing developing programs substrate 20 is sent by outlet 112.
Liquid is contained cylinder 12, is arranged on inlet 111 places of developing room 11, and it enters developing room 11 in order to driving substrate 20.
Developing trough 13 is positioned at the below of developing room 11, and it is in order to store developer solution.
A plurality of nozzles 14 are positioned at the bottom of developing room 11, and connect developing trough 13 by flexible pipe, and it is in order to contain cylinder 12 to avoid containing residual crystal on the cylinder 12 at liquid with the oblique from lower to upper liquid that is sprayed to of the developer solution of developing trough 13.
The nozzle 14 of above-mentioned explanation removably is fixed on the bottom of developing room 11, so that user's dismounting nozzle 14 keeps in repair, changes, and nozzle can rotation mode be adjusted the angle of spray developing liquid, also can adjust the angle of spray developing liquid up and down, sweep the area that the back covering liquid is contained cylinder 12 to adjust the developer solution spray by different spray angles.
According to the disclosed structure of the present invention, pressure controller 15 comprises switch 151 and pressure gauge 152, and the mode of operation of switch 151 can be the user with manual mode of operation, also can operate automatically according to the default value that the user sets, or take to have concurrently manual operation and the semi-automatic operation of operating automatically.
When substrate 20 is moved to the inlet 111 of developing room 11, contain cylinder 12 driving substrate 20 by liquid and enter developing room 11, and the developer solution of developing trough 13 flow to nozzle 14, make nozzle 14 contain cylinder 12 and substrate 20 toward upper left oblique spray developing liquid to liquid by the bottom right, and with the switch 151 of pressure controller 15 and the flow and the pressure of pressure gauge 152 control nozzles 14 spray developing liquid, can utilize developer solution flush clean liquid to contain cylinder 12, avoid liquid to contain the aberration that residual crystal causes substrate 20 surface generation films to scrape or fail to understand on the cylinder 12, simultaneously, utilize the back of the body dirt of developer solution cleaning substrate 20 lower surfaces, developer solution after the sprinkling flows back into developing trough 13, to reach the purpose that continues to recycle developer solution.When liquid Sheng cylinder 12 shuts down, nozzle 14 is contained cylinder 12 by the bottom right toward upper left oblique spray developing liquid to liquid, can clear up liquid and contain cylinder 12, avoid crystal residual, guarantee that again liquid Sheng cylinder 12 keeps moistening, the fog that prevents developer solution forms crystal and drops and be built-up in liquid and contain cylinder 12 surfaces behind developing room 11 inner drying.
As shown in Figure 3, it is second preferred embodiment of the present invention.
In this embodiment, also comprise flowmeter 16, be arranged between developing trough 13 and the pressure controller 15, and be connected with flexible pipe, flow in order to 14 sprinklings of metering developing trough 13 supply nozzles, with foundation as nozzle 14 spray developing liquid, and can allow the user be convenient to grasp the flow that nozzle 14 sprays, cooperate the switch 151 of pressure controller 15 and the flow and the pressure of pressure gauge 152 control nozzles 14 spray developing liquid simultaneously, make nozzle 14 according to user's setting with at regular time and quantity or the mode of spraying continuously spray and sweep developer solution.
The present invention is provided with a plurality of nozzles 14 in the bottom of developing room 11, the oblique from lower to upper liquid that is sprayed to of the developer solution of developing trough 13 is contained cylinder 12, whether no matter liquid is contained cylinder 12 turns round, all can use the moistening and cleaning liquid of developer solution to contain cylinder 12, avoid liquid to contain on the cylinder 12 residual crystal and cause substrate 20 surfaces to produce that films are scraped or not clear aberration.Simultaneously, can remove the back of the body dirt of substrate 20, reduce number of times and the time that stops the line cleaning with this, and reduce the discharge capacity of developer solution indirectly, solution is often interrupted influencing the problem of production capacity because of production line, and then reduces manufacturing cost and promote quality and qualification rate.
The above is the preferred embodiments of the present invention only, is not in order to limiting scope of the present invention, therefore, all other not breaking away from change and the retouching of being done under the disclosed spirit of the present invention, all should be encompassed in the category of the present invention.
Claims (22)
1. moistening and cleaning plant of developer solution cylinder is positioned at the bottom of a developing room, and contains drum driven one substrate by a liquid and enter this developing room, and the moistening and cleaning plant of this developer solution cylinder comprises:
At least one nozzle, it contains cylinder in order to developer solution is sprayed to this liquid, to avoid containing residual crystal on the cylinder at this liquid; And
One pressure controller, its flow and pressure in order to control this nozzle.
2. the moistening and cleaning plant of developer solution cylinder as claimed in claim 1, wherein this nozzle removably is fixed on the bottom of this developing room.
3. the moistening and cleaning plant of developer solution cylinder as claimed in claim 1, wherein this nozzle angle of can the rotation mode adjustment spraying this developer solution.
4. the moistening and cleaning plant of developer solution cylinder as claimed in claim 1, wherein this nozzle can be adjusted the angle of spraying this developer solution up and down.
5. the moistening and cleaning plant of developer solution cylinder as claimed in claim 1, wherein this developer solution of this nozzles spray to this substrate to clear up this substrate.
6. the moistening and cleaning plant of developer solution cylinder as claimed in claim 1, wherein oblique from lower to upper this developer solution of sprinkling of this nozzle.
7. the moistening and cleaning plant of developer solution cylinder as claimed in claim 1, wherein this developer solution is placed in the developing trough.
8. the moistening and cleaning plant of developer solution cylinder as claimed in claim 7, wherein this developing trough is supplied with this developer solution of this nozzles spray, and this developer solution after the sprinkling flows back into this developing trough.
9. the moistening and cleaning plant of developer solution cylinder as claimed in claim 1, wherein this pressure controller comprises a switch and a pressure gauge.
10. the moistening and cleaning plant of developer solution cylinder as claimed in claim 9, wherein the switch of this pressure controller can be manually, automatically or semi-automatic operation.
11. the moistening and cleaning plant of developer solution cylinder as claimed in claim 1, wherein moistening the and cleaning plant of this developer solution cylinder also comprises a flowmeter, in order to measure the flow of this nozzle.
12. the moistening and cleaning plant of developer solution cylinder comprises:
One developing room;
One liquid is contained cylinder, and it enters this developing room in order to drive a substrate;
One developing trough stores developer solution;
At least one nozzle is positioned at the bottom of this developing room, and it is sprayed to this liquid in order to this developer solution with this developing trough and contains cylinder, to avoid containing residual crystal on the cylinder at this liquid; And
One pressure controller, its flow and pressure in order to control this nozzles spray.
13. the moistening and cleaning plant of developer solution cylinder as claimed in claim 12, wherein this developing trough is positioned at the below of this developing room.
14. the moistening and cleaning plant of developer solution cylinder as claimed in claim 13, wherein this developer solution after this nozzles spray flows back into this developing trough.
15. the moistening and cleaning plant of developer solution cylinder as claimed in claim 13, wherein this nozzle removably is fixed on the bottom of this developing room.
16. the moistening and cleaning plant as the developer solution cylinder of claim 13, wherein this nozzle angle of can the rotation mode adjustment spraying this developer solution.
17. the moistening and cleaning plant of developer solution cylinder as claimed in claim 13, wherein this nozzle can be adjusted the angle of spraying this developer solution up and down.
18. the moistening and cleaning plant of developer solution cylinder as claimed in claim 13, wherein this developer solution of this nozzles spray to this substrate to clear up this substrate.
19. the moistening and cleaning plant of developer solution cylinder as claimed in claim 13, wherein oblique from lower to upper this developer solution of sprinkling of this nozzle.
20. the moistening and cleaning plant of developer solution cylinder as claimed in claim 13, wherein this pressure controller comprises a switch and a pressure gauge.
21. the moistening and cleaning plant of developer solution cylinder as claimed in claim 20, wherein the switch of this pressure controller can be manually, automatically or semi-automatic operation.
22. the moistening and cleaning plant of developer solution cylinder as claimed in claim 12, wherein moistening the and cleaning plant of this developer solution cylinder also comprises a flowmeter, and it supplies with the flow of this nozzles spray in order to measure this developing trough.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2006101720683A CN101000466B (en) | 2006-12-29 | 2006-12-29 | Wet and cleaning device of developer solution cylinder |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2006101720683A CN101000466B (en) | 2006-12-29 | 2006-12-29 | Wet and cleaning device of developer solution cylinder |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101000466A true CN101000466A (en) | 2007-07-18 |
| CN101000466B CN101000466B (en) | 2012-02-08 |
Family
ID=38692485
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2006101720683A Expired - Fee Related CN101000466B (en) | 2006-12-29 | 2006-12-29 | Wet and cleaning device of developer solution cylinder |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101000466B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101639633B (en) * | 2008-07-29 | 2012-02-29 | 和舰科技(苏州)有限公司 | Supply pipeline of developing solution |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1195248C (en) * | 2001-11-13 | 2005-03-30 | 铼宝科技股份有限公司 | Development device of organic light emitted pixel definition layer |
-
2006
- 2006-12-29 CN CN2006101720683A patent/CN101000466B/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101639633B (en) * | 2008-07-29 | 2012-02-29 | 和舰科技(苏州)有限公司 | Supply pipeline of developing solution |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101000466B (en) | 2012-02-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7914843B2 (en) | Slit coater having pre-applying unit and coating method using the same | |
| KR101097519B1 (en) | Coating apparatus and method of forming coating layer | |
| US10741427B2 (en) | Coating apparatus for reducing waste of coating liquid, method for recycling coating liquid by utilization of the same, and method for cleaning the same | |
| CN102921663B (en) | A kind of clean method of alignment film printing machine shower nozzle and device | |
| CN101000466B (en) | Wet and cleaning device of developer solution cylinder | |
| CN100473466C (en) | Method of washing paint gun | |
| KR100763249B1 (en) | Device for controlling chemical dispense of photo spinner equipment | |
| JP5908078B2 (en) | Chemical treatment equipment | |
| JP5361657B2 (en) | Priming processing method and priming processing apparatus | |
| CN201959946U (en) | Cleaning device of photoresist nozzle | |
| KR101309037B1 (en) | Slit coater | |
| KR20090015413A (en) | Apparatus for cleaning slit nozzle used in manufacturing flat panal display devices | |
| CN113663872B (en) | Coating device for improving utilization rate of high-viscosity material | |
| CN219664130U (en) | Photoresist spraying device | |
| CN214704308U (en) | Developing device | |
| JPH03242253A (en) | Electrostatic coater of conductive coating | |
| CN214262419U (en) | Upper roller gun cleaning device | |
| CN219143868U (en) | Spraying and etching device for conductive film | |
| KR20070102030A (en) | Substrate cleaning apparatus and cleaning method thereof | |
| CN216286155U (en) | Desktop type spin coating developing machine | |
| CN216759442U (en) | Photovoltaic glass grinds powder clearing device | |
| CN113359398A (en) | Developing device | |
| CN218184451U (en) | Dual-purpose emitter for spraying and drip irrigation | |
| CN106378331A (en) | Mixed type metal opening non-contact cleaning device and cleaning method | |
| JP2007069144A (en) | Coating apparatus and its cleaning method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120208 Termination date: 20201229 |