KR20070102030A - Substrate cleaning apparatus and cleaning method thereof - Google Patents

Abstract

A substrate cleaning apparatus and a cleaning method thereof are provided to improve cleaning performance for the substrate by forming a plurality of bodies of a cleaning head and locating a sprayer between the bodies for removing dusts or drugs, and by performing cleaning process while simultaneously spraying a cleaning solution and a cleaning gas on the substrate. A substrate cleaning apparatus includes a plurality of bodies(125a,125b) spraying a cleaning solution, a plurality of sprayers(150) located between the bodies, a first supply pipe(120) connecting the bodies with the sprayers, a second supply pipe(118) connected for supplying deionized water to each of the bodies, and an angle control unit provided to the first supply pipe for controlling angles of the bodies and the sprayers.

Description

Substrate cleaning device and its cleaning method {SUBSTRATE CLEANING APPARATUS AND CLEANING METHOD THEREOF}

1 is a perspective view showing a cleaning head of a cleaner according to the prior art.

2A and 2B illustrate a state of cleaning a substrate in accordance with the prior art.

3 is a view for explaining a substrate cleaning process according to the present invention.

4 is a view showing the structure of a substrate cleaning apparatus according to the present invention.

5 is a view for explaining the structure and cleaning principle of the cleaning head of the substrate cleaning apparatus according to the present invention.

6a and 6b are views showing a state of cleaning the substrate with a cleaning head of the substrate cleaning apparatus according to the present invention.

* Description of the symbols for the main parts of the drawings *

100: cleaning device 110: cleaning head

118: second supply pipe 117: injection hole

120: first supply pipe 125a: first body portion

125b: second body portion 140a: first adjusting portion

140b: second adjusting unit 150: injector

160: air device 170: controller

180: supply tank

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate cleaning apparatus, and more particularly, to a substrate cleaning apparatus capable of cleaning a substrate by injecting air and deionized water (DI) together in a substrate cleaning process and a cleaning method thereof.

Cathode ray tubes (CRTs), which are widely used in information display devices, have many advantages in terms of performance and price, but have many disadvantages in terms of miniaturization or portability.

On the other hand, liquid crystal displays have been attracting attention as an alternative means of overcoming the shortcomings of CRTs due to the advantages of miniaturization, light weight, and low power consumption, and are currently used in almost all information processing devices that require display devices. It is the situation that is attached.

The array substrate and the color filter substrate of the liquid crystal display device as described above deposit a metal film or an insulating film on a transparent substrate, and form an etching pattern according to a photolithography process, and then repeat the wet or dry etching process. It is manufactured by.

When the above process is performed, the process of cleaning the substrate is additionally performed. Generally, the cleaning process is performed before the deposition of the metal film or the insulating film on the substrate and after the photo process step or the wet / dry etching process step. Proceed.

Such a cleaning process removes foreign substances or chemicals present on the substrate to improve the uniformity of the metal film or insulating film patterned by the process. Therefore, it is very important to improve the cleaning efficiency because the manufacturing defect rate and the production yield of the liquid crystal display device vary depending on the degree of cleaning in the cleaning process.

1 is a perspective view showing a cleaning head of a cleaner according to the prior art.

As shown in FIG. 1, the cleaning head 10 for spraying pure water (DI) according to the prior art is connected to the body part 6 for spraying pure water of one stem and the body part 6 to supply pure water. It is composed of a plurality of supply pipes (8) and fixing brackets (5) disposed on both sides of the body (6) to fix the body (6). Although not shown in the drawings, 7 is an inlet connecting the supply pipe 8 and the body part 6 to each other.

The structure of the body portion 6 is formed in a wide width in the portion of the inlet 7 to which the supply pipe 8 is connected, the inlet region for injecting pure water is formed in a narrow width, which is the supply pipe (8) In order to be able to clean the surface of the substrate with a single stream of water when the pure water supplied through the spray to clean the substrate.

2A and 2B illustrate a state of cleaning a substrate according to the related art. As shown in FIGS. 2A and 2B, when the body 20 of the cleaning head 10 is cleaned while the substrate 20 proceeds in an inclined direction (FIG. 2A in which the substrate advances toward the body portion inlet), And when the substrate 20 moves away from the inclined direction of the body 6 of the cleaning head 10 (the substrate 2b moves in the direction ejected from the body), as follows.

First, as shown in FIG. 2A, when the substrate 20 proceeds in the inclined angle direction of the body 6 of the cleaning head 10, the rear end of the substrate 20 is cleaned well, but the substrate ( In the front end portion 20 of the cleaning head 10, that is, the body portion 6 of the cleaning head 10 and the substrate 20 overlap with each other, there is almost no flow of pure water sprayed so that the foreign substance (particle or chemical) remains as it is. Defective cleaning present in the phase occurs.

On the contrary, when cleaning the substrate 20 while moving the cleaning head 10 away from the inclined angular direction as shown in FIG. 2B, the cleaning is performed well at the front end of the substrate 20. In the region where the body portion 6 and the substrate 20 of the cleaning head 10 overlap with each other at the end, there is almost no flow of pure water injected, and the substrate 20 proceeds with the foreign matter or chemical liquid that has been washed. It moves in the direction to remain and remain on the substrate 20 as it is, poor cleaning occurs.

SUMMARY OF THE INVENTION An object of the present invention is to provide a substrate cleaning apparatus and a method for cleaning the substrate, in which a plurality of body portions of the cleaning head are formed and an injector for removing foreign substances or chemical liquid is disposed between the body portions to improve the cleaning power of the substrate.

In addition, another object of the present invention is to provide a substrate cleaning apparatus and a method for cleaning the substrate, the cleaning process of which is performed by simultaneously spraying the cleaning liquid and the cleaning gas on the substrate, thereby improving the substrate cleaning power.

In order to achieve the above object, the substrate cleaning apparatus according to the present invention,

A plurality of body parts for spraying the cleaning liquid; And

It includes a plurality of injectors disposed between the plurality of body parts.

The apparatus may further include a first supply pipe connecting the plurality of body parts and the injectors, and a second supply pipe connected to supply pure water to each of the plurality of body parts.

Substrate cleaning device according to another embodiment of the present invention,

A cleaning head including a plurality of body parts for injecting a cleaning liquid and a plurality of injectors disposed between the plurality of body parts;

An air device for supplying gas to the cleaning head;

A supply tank for supplying a cleaning liquid to the cleaning head; And

And a controller for controlling the air device and the supply tank.

Substrate cleaning method according to another embodiment of the present invention,

Providing a substrate; And

And cleaning by simultaneously spraying the cleaning liquid and the cleaning gas by using a cleaning apparatus including a plurality of body parts for spraying the cleaning liquid on the substrate and a plurality of injectors disposed between the plurality of body parts.

Here, after the substrate is provided, further comprising a substrate cleaning step using pure water or a cleaning step by ultraviolet irradiation.

In addition, after the substrate is provided, characterized in that it further comprises a substrate cleaning step using a brush.

According to the present invention, a plurality of body parts of the cleaning head are formed, and a plurality of injectors for removing foreign matters are disposed between the body parts to improve cleaning power of the substrate.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

In the liquid crystal display manufacturing process, a substrate cleaning process is performed for each process. Specifically, there is a pre-photo cleaner (PPCLN) process performed in a step before the photo process, and a pre-depo cleaner (PPCLN) process performed in a step before depositing a metal film or an insulating film on a substrate.

The reason for cleaning the substrate in the step before the photo process is that when a photoresist is exposed, developed, and patterned, a foreign material on the substrate cannot form a uniform photoresist pattern. Such a non-uniform photoresist pattern causes a non-uniform pattern of the metal film or the insulating film to be formed after the wet or dry etching process.

Similarly, when foreign matter is present on the substrate before the deposition of the metal film or the insulating film, the foreign material exists between the metal film or the insulating film and the substrate until the process is completed to form a defective pattern.

Therefore, in the substrate cleaning process, the large and small foreign matters must be completely removed from the substrate to improve the production yield of the liquid crystal display.

3 is a view for explaining a substrate cleaning process according to the present invention.

As shown in FIG. 3, the substrate cleaning process is performed in the following steps in the cleaning process equipment.

First, a step of loading a substrate (L / D: S1) and a step of first cleaning the loaded substrate using a DI shower (S2) are performed. Although not shown in the drawing, in some cases, a process of irradiating excimer ultraviolet (UV) onto the substrate to hydrophilize the surface of the substrate and to remove organic materials.

As such, when the primary cleaning process S2 is completed, large foreign substances existing on the substrate are removed by using a rotary brush (S3). Such a brush is usually used to remove foreign matter having a size of 5 μm or more present on the substrate.

When the cleaning process (S3) by the brush is completed as described above, the cleaning head (shown in Figure 4 below) according to the present invention (cleaning head formed integrally with the Aqua Knife for spraying the cleaning liquid and the sprayer for spraying the cleaning gas) The foreign matter or the chemical liquid present on the substrate is removed by using a cleaning device having a. At this time, the cleaning device (DI) and the cleaning gas (air, oxygen, AM gas, etc.) for the removal of foreign matters are sprayed on the substrate at the same time to remove the foreign substances and chemicals (S4). At this time, according to the operation by further spraying a high-pressure droplet on the substrate (Cavitation Jet) to remove the foreign matter of 5㎛ size or less, or ultrasonic cleaning process to remove the foreign matter by ultrasonic on the substrate (Mega Sonic) can be further proceeded.

When the cleaning process of spraying the cleaning liquid and the cleaning gas at the same time as described above (S4) is completed, the substrate drying process is performed using an air knife (S5), and then the substrate is unloaded (U / LD: S6) to complete the cleaning process.

As described above, in the present invention, when cleaning using the cleaning device, the cleaning liquid (DI) injection and the cleaning gas injection are performed together to completely remove the foreign matter present in the region without the flow of pure water.

4 is a view showing the structure of a substrate cleaning apparatus according to the present invention.

As shown in FIG. 4, the substrate cleaning apparatus according to the present invention includes a cleaning head 110 and an air apparatus for supplying cleaning gas (oxygen, ozone, air) to the cleaning head 110. 160, a supply tank 180 for supplying the cleaning liquid DI to the cleaning head 110, and a controller 170 for controlling the air device 160 and the supply tank 180. .

Here, the cleaning head 110 is an injector disposed between the first body portion 125a and the second body portion 1250b for discharging the cleaning liquid, and the first body portion 125a and the second body portion 125b. 150 and the gas (air, oxygen, ozone, etc.) supplied from the air device 160 while adjusting the angles of the first body portion 125a and the second body portion 125b. It consists of a first supply pipe 120 to be supplied to the second supply pipe 118 to receive the pure water from the supply tank 180 to supply to the first and second body parts (125a, 125b).

The first supply pipe 120 is further provided with an angle adjusting means for adjusting the angle of the first body portion (125a) and the second body portion (125b), or fastened to the edge of the first supply pipe (120) itself It may be integrally provided with a bracket for adjusting the angle of the injector 180 or the body parts (125a, 125b).

Here, a plurality of second supply pipes 118 are disposed in the first body part 125a and the second body part 125b, respectively, and each of the second supply pipes 118 and the first body part 125a is disposed. And the second body part 125b is connected by the injection hole 117.

In addition, each of the first adjusting part 140a and the first body part 125a and the second body part 125b is configured to spray the cleaning liquid supplied from the supply device 180 in the form of water or water. 2 adjustment part 140b is arrange | positioned.

In addition, the first body part 125a and the second body part 125b have a wide width of a region in which the cleaning liquid is supplied in order to spray the cleaning liquid DI in a predetermined direction, and in the inlet region direction in which pure water is injected. It is formed along the narrow width.

In the cleaning apparatus 100, two body parts for injecting the cleaning liquid and one injector are arranged, but the present invention is not limited thereto, and a plurality of body parts and a plurality of injectors may be disposed.

The cleaning device 100 having the structure as described above operates as follows.

First, the first supply pipe 120 is adjusted to adjust the first body part 125a and the second body part 125b at a predetermined angle, and then the control unit 170 controls the supply tank 180. ) And a cleaning gas of the air device 160 is supplied to the cleaning head (110).

That is, the supply tank 180 supplies the cleaning liquid to the second supply pipe 118, and the air device 160 supplies the cleaning gas to the first supply pipe 120.

The cleaning head 110 receives the cleaning liquid and the cleaning gas and sprays the cleaning liquid through the first body part 125a and the second body part 125b, and sprays the cleaning gas through the injector 150 to form a substrate. Clean. At this time, the cleaning gas of the injector 150 forms a cleaning gas curtain between the first body portion 125a and the second body portion 125b in which the sprayed cleaning liquid does not exist. The foreign substance or the chemical liquid present in the region between 125a and the second body portion 125b is moved to the region of the first body portion 125a and the second body portion 125b.

Therefore, when the substrate is cleaned using the cleaning apparatus 100 according to the present invention, foreign matter existing in all areas of the substrate is included in the cleaning liquid region injected during the cleaning process, thereby improving the cleaning efficiency of the substrate.

5 is a view for explaining the structure and cleaning principle of the cleaning head of the substrate cleaning apparatus according to the present invention, Figures 6a and 6b is a view showing a state of cleaning the substrate with the cleaning head of the substrate cleaning apparatus according to the present invention. Drawing.

A description with reference to FIGS. 5 and 6A and 6B is as follows.

When the substrate 300 is moved by the conveyor, the cleaning head 110 of the cleaning apparatus located above the substrate 300 sprays the cleaning liquid and the cleaning gas together.

At this time, the cleaning head 110 according to the present invention sprays the cleaning liquid on the substrate 300 from the first body portion 125a and the second body portion 125b. At this time, the injection angle of the first body portion (125a) and the second body portion (125b) can be adjusted by the angle adjusting means disposed in the first supply pipe 120 or the first supply pipe 120 itself. The body parts are adjusted at a predetermined angle by a bracket. 117 shown is an injection port.

Although the present invention describes a case in which the cleaning head 110 of the cleaning device is fixed to the upper portion of the substrate 300 and the substrate 300 moves in a predetermined direction, on the contrary, in the state in which the substrate 300 is fixed, The cleaning head 110 may move while the cleaning head 110 moves.

When the cleaning liquid DI is supplied from the second supply pipes 118 connected to the first body part 125a and the second body part 125b, the first body part 125a and the second body part 125b are provided. The cleaning liquid is sprayed onto the substrate 300 in the form of a stream of water according to the structure of FIG.

In addition, a first adjusting part 140a and a second adjusting part 140b are disposed in the first body part 125a and the second body part 125b, so that the first body part 125a and the second body part 125b are disposed. The body of water sprayed from the body portion 125b may be adjusted to a single body of water (direct water) or a fountain.

Therefore, the cleaning head 110 according to the present invention performs the cleaning operation by spraying the cleaning liquid in the left and right directions from the upper portion of the moving substrate 300. In this case, the injector 150 disposed between the first body part 125a and the second body part 125b injects air or cleaning gas (oxygen, ozone) to the first body part 125a and the second body part. The cleaning liquid having no mobility between the body portions 125b is moved to the area where the cleaning liquid is being injected.

Specifically, referring to Figures 6a and 6b to describe the process of removing the foreign matter as follows.

When the substrate 300 moves to a region where the cleaning head 110 is fixed, foreign substances existing on the substrate 300 are removed by the cleaning liquid sprayed from the first body part 125a.

At this time, the cleaning liquid sprayed from the first body part 125a generates a region in which the cleaning liquid does not move at the front end where the substrate 300 and the cleaning head 110 overlap for the first time, so that foreign substances are not completely removed. However, the cleaning liquid accumulated by the cleaning gas injection of the injector 150 which is continuously performed during the cleaning process is moved to the first body portion 125a or the second body portion 125b.

That is, in the conventional cleaning process, foreign substances existing at the front end of the substrate 300 have not been completely removed, but in the present invention, a plurality of body parts for spraying the cleaning liquid are disposed, and an injector 150 for moving the accumulated cleaning liquid is disposed. Since it is possible to completely remove the foreign matter in the front end of the substrate 300.

In addition, in the rear end of the substrate 300 and the region of the cleaning head 110, when the substrate 300 moves, the cleaning liquid accumulated by the first body portion 125a and the injector 150 is transferred to the first body portion 125a. ) And the second body portion 125b to move to the injection region, so that no foreign matter is present at the rear end of the substrate 300.

Therefore, the cleaning apparatus of the present invention has an advantage of improving the substrate cleaning power since there is no cleaning liquid section during the substrate cleaning.

As described in detail above, the present invention has the effect of improving the substrate cleaning power by forming a plurality of body parts of the cleaning head.

In addition, an injector for injecting gas into the cleaning head may be disposed to remove accumulated pure water and foreign matter, thereby improving the cleaning power of the substrate.

In addition, in the present invention, pure water and gas (air, oxygen, ozone) injection are simultaneously performed to clean the substrate, thereby improving the substrate cleaning power.

The present invention is not limited to the above-described embodiments, and various changes can be made by those skilled in the art without departing from the gist of the present invention as claimed in the following claims.

Claims (17)

A plurality of body parts for spraying the cleaning liquid; And And a plurality of injectors disposed between the plurality of body parts. The apparatus of claim 1, further comprising a first supply pipe connecting the plurality of body parts and the injectors, and a second supply pipe connected to supply pure water to each of the plurality of body parts. The substrate cleaning apparatus according to claim 2, wherein the first supply pipe further includes angle adjusting means for adjusting angles of the plurality of body parts and the injectors. 3. The substrate cleaning apparatus of claim 2, wherein the first supply pipe supplies a cleaning gas to the injector. The substrate cleaning apparatus of claim 4, wherein the cleaning gas is any one of oxygen, ozone, and air. The substrate cleaning apparatus according to claim 1, wherein each of the plurality of body parts is further provided with an adjusting part for converting the cleaning liquid into a direct water or a jet form. A cleaning head including a plurality of body parts for injecting a cleaning liquid and a plurality of injectors disposed between the plurality of body parts; An air device for supplying gas to the cleaning head; A supply tank for supplying a cleaning liquid to the cleaning head; And And a controller for controlling the air device and the supply tank. 8. The substrate cleaning apparatus of claim 7, further comprising a first supply pipe connecting the plurality of body parts and the injectors, and a second supply pipe connected to supply pure water to each of the plurality of body parts. 9. The substrate cleaning apparatus of claim 8, wherein the first supply pipe further includes angle adjusting means for adjusting angles of the plurality of body parts and the injectors. The substrate cleaning apparatus according to claim 8, wherein the first supply pipe supplies a cleaning gas to the injector. The substrate cleaning apparatus of claim 10, wherein the cleaning gas is any one of oxygen, ozone, and air. 8. The substrate cleaning apparatus according to claim 7, wherein each of the plurality of body parts further includes an adjusting part for converting the cleaning liquid into a direct water or a jet form. Providing a substrate; And Cleaning the substrate while simultaneously spraying the cleaning liquid and the cleaning gas by using a cleaning device including a plurality of body parts for spraying the cleaning liquid on the substrate and a plurality of injectors disposed between the plurality of body parts. . The method of claim 13, further comprising, after providing the substrate, cleaning the substrate using pure water or cleaning by ultraviolet irradiation. 14. The method of claim 13, further comprising a substrate cleaning step using a brush after the substrate is provided. The method of claim 13, further comprising an ultrasonic cleaning step of removing foreign matter on the substrate by ultrasonic waves after the substrate is provided. 15. The method of claim 13, further comprising a drying step after the cleaning by spraying a cleaning liquid and a cleaning gas on the substrate.

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