JP2000162424A - Developing device for color filter substrate - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain a developing device for a color filter substrate capable of spraying a developer over even a large-size color filter substrate at an even spraying pressure in every corner, at an even and fast developing speed, to evenly develop all the surface of the substrate. SOLUTION: This developing device for a color filter substrate is provided with a spray device 40 having plural spray nozzles 42. The spray nozzles 42 are disposed in a matrix state in one plane facing to a color filter substrate K, while spraying a developer with rotationally moving in the plane. Accordingly, the developer is evenly sprayed over the whole surface (the whole area) of the color filter substrate K with an even spraying pressure.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter substrate developing apparatus, and more particularly, to a color filter substrate developing apparatus which performs development by spraying a developing solution onto the color filter substrate after exposure in a process of manufacturing the color filter substrate. .

[0002]

2. Description of the Related Art One of the color filter substrates is a liquid crystal color filter substrate. When a mask is exposed in a process of forming each of R, G, and B pixels, the liquid crystal color filter substrate has After the exposure, development is performed to remove an excessive colored layer. The present applicant has already proposed a liquid crystal color filter substrate developing device suitable for carrying out the present processing (for example, Japanese Patent Application No. 9-121979).
issue).

In the liquid crystal color filter substrate developing apparatus, a developing tank is provided with a pyramid spray nozzle.
A liquid crystal color filter substrate for development is conveyed to the developing tank, and a developer and pure water are switched and jetted from a full pyramid spray nozzle.
As a result, the liquid crystal color filter substrate can be developed and washed (washed) with a single developing tank, so that the size of the apparatus can be reduced. Can be continuously fed to the processing device.

In the liquid crystal color filter substrate developing apparatus as described above, the developing solution is sprayed from a single (one) conical pyramid spray nozzle onto the liquid crystal color filter substrate to perform the developing process. When the size of the liquid crystal color filter substrate is increased, the peripheral portion of the liquid crystal color filter substrate is necessarily far from the full-color pyramid spray nozzle. For this reason, in the peripheral portion of such a liquid crystal color filter substrate, the pressure at which the developing solution hits the liquid crystal color filter substrate is reduced, and the developing speed is reduced, making it difficult to perform uniform development within the substrate surface. Therefore, measures to prevent this have been eagerly desired.

[0005]

In view of the above, the present invention takes into account the above facts, and even if the substrate is a large color filter substrate, the pressure applied to the developing solution becomes uniform to all corners, and the developing speed becomes uniform and faster. An object of the present invention is to provide a color filter substrate developing device capable of uniformly developing an in-plane image.

[0006]

According to a first aspect of the present invention, there is provided a color filter substrate developing apparatus for developing a color filter substrate by spraying a developing solution onto the color filter substrate. A plurality of spray nozzles for spraying, arranged to face the color filter substrate for developing, the color filter substrate is stationary, and, while moving the plurality of spray nozzles, spray the developer. It is characterized by:

According to the first aspect of the present invention, a plurality of spray nozzles are arranged to face the color filter substrate, and the developer is moved while the plurality of spray nozzles are moved while the color filter substrate is stationary. Is injected. Therefore, even if the color filter substrate to be processed becomes large as compared with a configuration in which the developing solution is sprayed from a single (one) charged pyramid spray nozzle onto the color filter substrate, the color can be increased. The developer is sprayed uniformly over the entire surface (entire region) of the filter substrate. That is, over the entire area of the color filter substrate for development, the pressure of the developer is uniform without lowering. Therefore, the developing speed is uniform and fast, and uniform development within the substrate surface can be achieved.

As described above, in the color filter substrate developing apparatus according to the first aspect, even if the color filter substrate is large, the pressure applied to the developer becomes uniform to all corners, and the developing speed is uniform and fast. It is possible to uniformly develop the surface of the substrate.

According to a second aspect of the present invention, in the color filter substrate developing apparatus of the first aspect, the plurality of spray nozzles are arranged in a matrix on the same plane facing the color filter substrate. And disposing the developer while rotating the plurality of spray nozzles on the same plane.

[0010] In the color filter substrate developing device of the present invention, a plurality of spray nozzles are arranged in a matrix on the same plane facing the color filter substrate. Further, the developer is sprayed while the plurality of spray nozzles are rotationally moved on the same plane. Therefore, even when the color filter substrate to be processed becomes large, the developer is sprayed more uniformly over the entire surface (entire area) of the color filter substrate. That is, over the entire area of the color filter substrate for development, the pressure of the developing solution is more uniform without lowering. Therefore, the developing speed is uniform and fast, and uniform development within the substrate surface can be achieved.

As described above, in the color filter substrate developing apparatus according to the second aspect, even if the color filter substrate is large, the pressure applied to the developing solution becomes uniform to all corners, and the developing speed becomes uniform and faster. It is possible to further uniformly develop the surface of the substrate.

The optimum conditions for the distance between the plurality of spray nozzles and the distance from the color filter substrate vary depending on the size of the color filter substrate and the shape of the spray nozzles. It is preferably from 30 mm to 200 mm, particularly preferably from 50 mm to 150 mm. The distance between the spray nozzle and the color filter substrate is 100mm ~ 500mm
It is preferably 100 mm to 350 mm.
In addition, the rotational movement speed of the spray nozzles arranged in a matrix is preferably 3 rpm to 180 rpm, and more preferably, the rotation surface is substantially parallel to the color filter substrate. Spray pressure of spray nozzle is 0.01MP
a to 0.3 MPa, and the injection time is preferably 10 seconds to 70 seconds. The flow rate of the developer is preferably in the range of 5 liter / min to 40 liter / min.

According to a third aspect of the present invention, in the color filter substrate developing device of the first aspect, the plurality of spray nozzles are spirally formed on the same plane facing the color filter substrate. Place,
In addition, the developer is sprayed while rotating the plurality of spray nozzles on the same plane.

According to a third aspect of the present invention, the plurality of spray nozzles are spirally arranged on the same plane facing the color filter substrate. Further, the developer is sprayed while the plurality of spray nozzles are rotationally moved on the same plane. Therefore, even when the color filter substrate to be processed becomes large, the developer is sprayed more uniformly over the entire surface (entire area) of the color filter substrate. That is, over the entire area of the color filter substrate for development, the pressure of the developing solution is more uniform without lowering. Therefore, the developing speed is uniform and fast, and uniform development within the substrate surface can be achieved.

As described above, in the color filter substrate developing device according to the third aspect, even if the color filter substrate is a large-sized color filter substrate, the pressure applied to the developer becomes uniform to all corners, and the developing speed becomes uniform and faster. It is possible to further uniformly develop the surface of the substrate.

In the case where the spray nozzles are spirally arranged, it is preferable to determine the positions of the spray nozzles so that the number of nozzles per unit area is substantially the same when the developer is sprayed while rotating. When the spirally arranged spray nozzles are used, conditions such as the rotational movement speed of the spray nozzles and the injection pressure of the developer are the same as those of the invention according to claim 2 described above. Can be.

According to a fourth aspect of the present invention, in the color filter substrate developing device of the third aspect, the plurality of spray nozzles are rotationally moved in a direction in which the spiral spirals expand outward. Is characterized.

According to a fourth aspect of the present invention, in the color filter substrate developing apparatus, the plurality of spirally arranged spray nozzles comprises:
The developer is ejected while being rotated in a direction in which the spiral spirals spread outward. Therefore, a flow is generated that sweeps the developer remaining on the color filter substrate toward the outside of the substrate. As a result, not only the contact pressure of the developer becomes uniform, but also a fresh developer is sequentially supplied to each part of the color filter substrate (renewal of the developer is encouraged). Therefore, the developing speed is further increased.

As described above, in the color filter substrate developing apparatus according to the fourth aspect, even if the color filter substrate is large, the pressure applied to the developing solution becomes uniform to all corners, so that the substrate surface can be more uniformly developed. Not only can be achieved, but also the development speed is further increased, which is more effective.

According to a fifth aspect of the present invention, in the color filter substrate developing apparatus of the first aspect, the plurality of spray nozzles are arranged in a row on the same line facing the color filter substrate. The developer is sprayed while moving the plurality of spray nozzles in a row along a direction orthogonal to the same line.

In the color filter substrate developing apparatus according to the fifth aspect, the plurality of spray nozzles are arranged in a row on the same plane facing the color filter substrate. Further, the developer is sprayed while the plurality of spray nozzles in the row are moved along a direction orthogonal to the same line. Therefore, even if the color filter substrate to be processed becomes large, the entire surface of the color filter substrate (entire area)
The developer is more evenly sprayed over the range. That is, over the entire area of the color filter substrate for development, the pressure of the developing solution is more uniform without lowering. Therefore, the developing speed is uniform and fast, and uniform development within the substrate surface can be achieved.

As described above, in the color filter substrate developing apparatus according to the fifth aspect, even if the color filter substrate is large, the pressure applied to the developer becomes uniform to all corners, and the developing speed becomes uniform and faster. It is possible to further uniformly develop the surface of the substrate.

The moving speed of the spray nozzles arranged in a row is controlled in accordance with the development progress of the corresponding color filter substrate. For example, in the control of the moving speed, the moving speed is gradually increased at the same time as the start of the movement, and then reaches a stable moving speed and becomes constant. The section where the moving speed gradually increases (running section) is adjusted by the development progress rate (development speed) of the color filter substrate.
The range of 50 mm to 200 mm is good.

According to a sixth aspect of the present invention, there is provided a color filter substrate developing apparatus according to the fifth aspect, wherein the plurality of spray nozzles in a row are provided in a plurality of rows, and the plurality of nozzle rows are provided. The developer is ejected while being alternately moved along a direction orthogonal to the same line.

In the color filter substrate developing device of the present invention, a plurality of rows of spray nozzles are provided. Further, the developer is ejected while the plurality of nozzle rows are alternately moved along the direction orthogonal to the same line. Therefore, the time for injecting the developer (the time required for processing) can be effectively used (for example, while one nozzle array returns to the initial position after injecting the developer, the developer is injected by another nozzle array. Can be sprayed), and the development time (time required for processing) can be reduced.

As described above, in the color filter substrate developing apparatus according to the sixth aspect, even if the color filter substrate is large, the pressure applied to the developing solution becomes uniform to all corners, so that the development within the substrate surface becomes more uniform. Not only can be achieved, but also the development time can be shortened, which is more effective.

According to a seventh aspect of the present invention, there is provided a color filter substrate developing apparatus according to any one of the first to sixth aspects, wherein the plurality of spray nozzles are arranged with respect to the color filter substrate. It is characterized by being located at the same distance.

In the color filter substrate developing device according to the present invention, since the plurality of spray nozzles are located at the same distance from the color filter substrate, the development is performed more uniformly over the entire surface (entire area) of the color filter substrate. Liquid is injected. That is, over the entire area of the color filter substrate for development, the pressure of the developing solution is more uniform without lowering. Therefore, the developing speed is uniform and fast, and uniform development within the substrate surface can be achieved.

As described above, according to the color filter substrate developing device of the present invention, even if the color filter substrate is large, the pressure applied to the developing solution becomes uniform to all corners, and the developing speed becomes uniform and fast. It is possible to further uniformly develop the surface of the substrate.

According to a eighth aspect of the present invention, there is provided a color filter substrate developing apparatus for developing a color filter substrate by injecting a developing solution onto the color filter substrate. Disposing the developer while disposing the color filter substrate for development, stopping the color filter substrate, and moving the slit nozzle along a direction orthogonal to the slit, It is characterized by.

In the color filter substrate developing device according to the present invention, the slit nozzle is arranged to face the color filter substrate. Further, while the color filter substrate is stationary, the developer is ejected while the slit nozzle is moved along a direction orthogonal to the slit. Therefore, even if the color filter substrate to be processed becomes large, the developing solution is sprayed uniformly over the entire surface (entire area) of the color filter substrate. That is, over the entire area of the color filter substrate for development, the pressure of the developer is uniform without lowering. Therefore, the developing speed is uniform and fast, and uniform development within the substrate surface can be achieved.

As described above, according to the color filter substrate developing apparatus of the present invention, even if the color filter substrate is large, the contact pressure of the developer becomes uniform to all corners, and the developing speed is uniform and fast. It is possible to uniformly develop the surface of the substrate.

The slit nozzle ejects the developing solution while moving from one end of the color filter substrate to the other end on the opposite side, and stops the ejection when the slit nozzle reaches the other end on the opposite side. After returning to the movement start position, the movement and the injection of the developing solution are performed thereafter. This operation is repeated until the development is completed.

The slit width of the slit nozzle is preferably in the range of 0.05 mm to 1.0 mm. Further, the slit length can be in the range of 100 mm to 1500 mm, but is 50 m larger than the width of the color filter substrate.
Those having a length of m to 100 mm are particularly preferred. The distance from the color filter substrate to the tip of the slit nozzle is 100mm
To 500 mm is preferable, and particularly preferably, 100 mm
It is in the range of 350 mm. Further, the flow rate of the developer is preferably in a range of 5 L / min to 40 L / min.

Further, the moving speed of the slit nozzle is controlled in accordance with the development progress of the corresponding color filter substrate. For example, in the control of the moving speed, the moving speed is gradually increased at the same time as the start of the movement, and then reaches a stable moving speed and becomes constant. The section in which the moving speed gradually increases (running section) is adjusted by the development progress rate (development speed) of the color filter substrate.
A range of 0 mm is good.

According to a ninth aspect of the present invention, in the color filter substrate developing apparatus according to the eighth aspect, a plurality of the slit nozzles are provided, and the plurality of slit nozzles are orthogonal to the respective slits. The developer is ejected while being alternately moved along a direction.

In the color filter substrate developing apparatus according to the ninth aspect, a plurality of slit nozzles are provided. Further, the developer is ejected while the plurality of slit nozzles are alternately moved along a direction orthogonal to each slit. Therefore, the time for injecting the developer (the time required for processing) can be effectively used (for example,
While one slit nozzle returns to the initial position after injecting the developer, the other slit nozzle can inject the developer, and the development time (time required for processing) can be reduced.

As described above, in the color filter substrate developing apparatus according to the ninth aspect, even if the color filter substrate is large, the contact pressure of the developing solution becomes uniform to all corners, so that the substrate can be more uniformly developed. Not only can be achieved, but also the development time can be shortened, which is more effective.

[0039]

DESCRIPTION OF THE PREFERRED EMBODIMENTS [First Embodiment] FIG.
1 schematically shows an overall configuration of a color filter substrate developing device 10 according to a first embodiment of the present invention.

This color filter substrate developing device 10
The supply unit 12 and the draining unit 14 provided adjacent to each other,
And a developing unit 16. The supply unit 12 is provided with a plurality of transport rollers 18, and a color filter substrate K for development processing is placed on these transport rollers 18 manually or by a loader.

On the other hand, the transport roller 18
The feed roller 1 is provided continuously with the feeding unit 1.
2, the color filter substrate K can be transferred. The draining unit 14 is provided with draining air knives 22 opposite to the upper and lower sides of the color filter substrate K on the transport roller 20, and jets air toward the color filter substrate K to discharge the processing liquid ( Pure water).

A developing unit 16 is provided on the side of the draining unit 14. In the developing tank 24 of the developing unit 16, a transport roller 26 is provided continuously to the transport roller 20 of the drain unit 14, and the color filter substrate K can be transferred to and from the drain unit 14. Further, the developing unit 16 is provided with an ejection device 40, which will be described in detail later, opposite to the upper side (front surface side) of the color filter substrate K on the transport roller 26, and is directed to the stationary color filter substrate K. The developer can be switched between a developing solution and pure water for spraying.

In the developing section 16, push-up pins 28 are provided between the transport rollers 26, and the push-up pins 28 can slightly push up the center of the color filter substrate K. Thus, the flow of the processing liquid (developer or pure water) from the center of the color filter substrate K to the outside is generated without the developer and pure water stagnation on the color filter substrate K. .

Further, a transport roller 26 is provided in the developing section 16.
A plurality of back surface cleaning nozzles 30 are provided facing the lower side (back surface side) of the upper color filter substrate K, and can spray a developer toward the color filter substrate K.

In the developing section 16, the developing solution jetted to the color filter substrate K stopped by the jetting device 40 is returned from the developing tank 24 to the developing solution tank 34 via the rotary drain 32 and circulates. When the injection of the developer by the injection device 40 is completed, the rotating drain 32 rotates to connect the developing tank 24 to the drainage tank 36 and the injection device 40
In addition, pure water is jetted from the back surface cleaning nozzle 30 to wash the color filter substrate K and the developing tank 24 with water.

Here, FIG. 1 is a schematic perspective view showing the configuration of the injection device 40 provided in the developing section 16.

The injection device 40 includes a plurality of spray nozzles 4
2 is provided. The plurality of spray nozzles 42
They are arranged in a matrix on the same plane facing the color filter substrate K. Further, the plurality of spray nozzles 42 are configured to spray a developing solution or pure water for cleaning while rotating and moving on the same plane.

The optimum conditions for the distance between the spray nozzles 42 and the distance from the color filter substrate K depend on the size of the color filter substrate K and the shape of the spray nozzles 42 themselves. Is preferably 30 mm to 200 mm, and particularly preferably 50 mm to 150 mm. Spray nozzle 4
The distance between 2 and the color filter substrate K is 100 mm-5.
00 mm is good, preferably 100 mm to 350 mm
It is. The rotational movement speed of the spray nozzles 42 arranged in a matrix as described above ranges from 3 rpm to 180 rpm.
It is preferable that the rotation surface be substantially parallel to the color filter substrate K at rpm. The spray pressure of the spray nozzle 42 is 0.1.
01 MPa to 0.3 MPa, and the injection time is preferably 10 seconds to 70 seconds. The flow rate of the developer is preferably in the range of 5 liter / min to 40 liter / min.

The above-configured color filter substrate developing apparatus 1
In the case of 0, the color filter substrate K for development is placed on the transport roller 18 manually or by a loader. This color filter substrate K is transported by rollers 18, 20, 2.
After being fed into the developing section 16 (developing tank 24) by the operation of 6, the apparatus is stopped. In the developing unit 16, the developer and pure water are switched from the ejecting device 40 and are ejected onto the surface of the color filter substrate K.

When the injection of the developer is completed, the injection device 40
Then, pure water is sprayed from the back surface cleaning nozzle 30 to wash the color filter substrate K and the developing tank 24 with water. After the water washing is completed, the conveying rollers 26, 20, and 18 are operated, and the color filter substrate K is conveyed to the draining unit 14, where air is jetted from the draining air knife 22 to drain the water. After passing through the draining section 14, the flow returns to the supply section 12 (initial position) again. When there are several types of developers, development and washing with water may be repeated.

Here, in the color filter substrate developing device 10 according to the first embodiment, the injection device 40 has a plurality of spray nozzles 42, and the plurality of spray nozzles 42 They are arranged in a matrix on the same plane facing K. further,
The developer is sprayed while the plurality of spray nozzles 42 are rotated on the same plane. Therefore, even when the color filter substrate K to be processed becomes large, the developer is sprayed more uniformly over the entire surface (entire area) of the color filter substrate K. In other words, over the entire area of the color filter substrate K for development, the contact pressure of the developing solution becomes more uniform without lowering.
Therefore, the developing speed is uniform and fast, and uniform development within the substrate surface can be achieved.

As described above, in the color filter substrate developing device 10 according to the first embodiment, even if the color filter substrate K is large, the contact pressure of the developing solution becomes uniform throughout, and the developing speed is reduced. The development is uniform and quick, and the development within the substrate surface can be performed more uniformly. Therefore, a color filter substrate K with good pattern accuracy can be obtained.

Next, another embodiment of the present invention will be described.
Note that components (components) that are basically the same as those in the first embodiment described above are given the same reference numerals as in the first embodiment, and descriptions thereof are omitted. [Second Embodiment] FIG. 3 is a schematic perspective view showing a configuration of an injection device 50 according to a second embodiment.

The injection device 50 includes a plurality of spray nozzles 5.
2 is provided. The plurality of spray nozzles 52
They are spirally arranged on the same plane facing the color filter substrate K. Further, the plurality of spray nozzles 52 are configured to spray a developing solution or pure water for cleaning while rotating and moving on the same plane. In this case, when rotating the plurality of spray nozzles 52,
It is preferable to set the position of the spray nozzle 52 so that the number of nozzles per unit area is substantially the same. Also,
The plurality of spray nozzles 52 are rotationally moved in a direction in which the spiral spiral of the spray nozzles 52 expands outward.

Further, the conditions such as the rotational speed of the spray nozzle 52 and the injection pressure are determined by the color filter substrate developing device 10 (the injection device 4) according to the first embodiment.
This can be performed under the same conditions as in (0).

In the color filter substrate developing device 10 having the injection device 50 having the above configuration, the plurality of spray nozzles 5
2 are spirally arranged on the same plane facing the color filter substrate K. Further, the developer is sprayed while the plurality of spray nozzles 52 are rotated on the same plane. Therefore, even if the color filter substrate K to be processed becomes large, the color filter substrate K
The developer is sprayed uniformly over the entire surface (entire region). That is, over the entire area of the color filter substrate K for development, the pressure of the developer is uniform without lowering. Therefore, the development speed is uniform and faster,
It is possible to uniformly develop the surface of the substrate.

Further, in the injection device 50 according to the second embodiment, the plurality of spray nozzles 52 arranged in a spiral form are rotated while the spiral swirls are spread outward, and the developer is discharged. It is injected. Therefore, a flow is generated that sweeps out the developer remaining on the color filter substrate K toward the outside of the substrate. As a result, not only the contact pressure of the developer becomes uniform, but also a fresh developer is sequentially supplied to each part of the color filter substrate K (renewal of the developer is encouraged). Therefore, the developing speed is further increased.

As described above, in the color filter substrate developing device 10 including the jetting device 50 according to the second embodiment, even if the color filter substrate K is a large color filter substrate, the pressure applied to the developing solution reaches all corners. The development becomes uniform and the development speed becomes uniform and faster, so that the development within the substrate surface can be performed more uniformly. Therefore, a color filter substrate K with good pattern accuracy can be obtained. [Third Embodiment] FIG. 4 is a schematic perspective view showing a configuration of an injection device 60 according to a third embodiment.

The spray device 60 includes a plurality of spray nozzles 6.
2 is provided. The plurality of spray nozzles 62
They are arranged in a row on the same line as the color filter substrate K. Further, the plurality of spray nozzles 62 in a row are configured to eject a developing solution or pure water for cleaning while moving along a direction orthogonal to the same line.

Further, the moving speed of the spray nozzles 62 arranged in a row (in a straight line) is controlled in accordance with the development progress of the color filter substrate K corresponding thereto. For example, in the control of the moving speed, as shown in FIG. 5A or 5B, the moving speed is gradually increased at the same time as the start of the movement, and thereafter reaches a stable moving speed and becomes a constant speed. Section where the traveling speed gradually increases (run-up section)
Is adjusted according to the development progress (development speed) of the color filter substrate, and is preferably in the range of 50 mm to 200 mm.

In the color filter substrate developing device 10 having the injection device 60 having the above configuration, the plurality of spray nozzles 6
2 are arranged in a row on the same plane facing the color filter substrate K. Further, the developer is ejected while the plurality of spray nozzles 62 in the row are moved along a direction orthogonal to the same line. Therefore, even when the color filter substrate K to be processed becomes large, the developer is sprayed more uniformly over the entire surface (entire area) of the color filter substrate K. That is, over the entire area of the color filter substrate K for development, the pressure of the developer is uniform without lowering. Therefore, the developing speed is uniform and fast, and uniform development within the substrate surface can be achieved.

As described above, in the color filter substrate developing device 10 provided with the injection device 60 according to the third embodiment, even if the color filter substrate K is a large size, the pressure of the developing solution applied to every corner is large. As a result, the developing speed is uniform and faster, and uniform development can be performed on the substrate surface. Therefore, a color filter substrate K with good pattern accuracy can be obtained.

In the third embodiment, a single nozzle row is used in which a plurality of spray nozzles 62 are arranged in a row (in a straight line). However, the present invention is not limited to this. Alternatively, a configuration may be adopted in which a plurality of rows of such spray nozzles 62 are provided. For example, as shown in FIG. 6, a nozzle row A and a nozzle row B in which a plurality of spray nozzles 62 are arranged in a row (in a straight line) are provided. The developer may be ejected while being alternately moved along a direction perpendicular to the direction.

According to this configuration, for example, while one nozzle row returns to the initial position after ejecting the developer, the developer can be ejected by another nozzle row. Therefore, the time for injecting the developer (time required for processing) can be effectively used, and the time for developing (time required for processing) can be effectively used.
Can be shortened, which is more effective. [Fourth Embodiment] FIG. 7 is a schematic perspective view showing the configuration of an injection device 70 according to a fourth embodiment.

The injection device 70 has a slit nozzle 72. The slit nozzle 72 is arranged to face the color filter substrate K. Further, the slit nozzle 72 is configured to eject a developing solution or pure water for cleaning while moving along a direction orthogonal to the slit.

In this case, the moving speed of the slit nozzle 72 is controlled in accordance with the corresponding development progress of the color filter substrate K. For example, as shown in FIG. 5 (A) or FIG. 5 (B), the control of the moving speed gradually increases the moving speed simultaneously with the start of the movement as in the third embodiment, and thereafter, The speed reaches a stable speed and becomes constant. The section in which the moving speed gradually increases (running section) is the development progress of the color filter substrate (development speed).
Is adjusted, but a range of 50 mm to 200 mm is preferable.

After the slit nozzle 72 reaches one end of the color filter substrate K, the injection of the developing solution is stopped, the process returns to the movement start position, and the movement and the injection of the developing solution are performed again. This operation is repeated until the development is completed.

Further, the slit width of such a slit nozzle 72 is preferably in the range of 0.05 mm to 1.0 mm. Also, the slit length is 100 mm to 1500
Although it can be used in the range of mm, it is particularly preferable that the width is 50 mm to 100 mm longer than the width of the color filter substrate K. The distance from the color filter substrate K to the tip of the slit nozzle 72 is preferably 100 mm to 500 mm, particularly preferably in the range of 100 mm to 350 mm.
Further, the flow rate of the developer is preferably in a range of 5 L / min to 40 L / min.

In the color filter substrate developing device 10 provided with the injection device 70 having the above configuration, the slit nozzle 72 is arranged to face the color filter substrate K. Further, the developing solution is jetted while the slit nozzle 72 is moved along a direction orthogonal to the slit. Therefore, even if the color filter substrate K to be processed becomes large, the entire surface of the color filter substrate K (the entire area)
The developer is more evenly sprayed over the range. That is, over the entire area of the color filter substrate K for development, the pressure of the developer is uniform without lowering. Therefore, the developing speed is uniform and fast, and uniform development within the substrate surface can be achieved.

As described above, in the color filter substrate developing device 10 provided with the injection device 70 according to the fourth embodiment, even if the color filter substrate K is a large color filter, the pressure applied to the developing solution is not limited to every corner. As a result, the developing speed is uniform and faster, and uniform development can be performed on the substrate surface. Therefore, a color filter substrate K with good pattern accuracy can be obtained.

In the fourth embodiment, a single slit nozzle 72 is used.
The invention is not limited to this, and a plurality of rows (for example, two rows) of such slit nozzles 72 are provided, and the developer is ejected while alternately moving the plurality of slit nozzles 72 along a direction orthogonal to the slits. It may be configured as follows.

According to this configuration, for example, while one slit nozzle 72 returns to the initial position after ejecting the developing solution, the other slit nozzle 72 can eject the developing solution. Therefore, the time for injecting the developing solution (time required for processing) can be effectively used, and the developing time (time required for processing) can be reduced, which is more effective. [Summary of Each Embodiment] As described above, the color filter substrate developing device 10 (the ejection device 40,
50, 60, 70), the large color filter substrate K
Even in this case, the contact pressure of the developer becomes uniform to all corners, and the developing speed becomes uniform and faster, so that the substrate can be uniformly developed. Therefore, the film thickness after development,
A color filter substrate K with good pattern accuracy and development residue can be obtained.

The color filter substrate developing device 10 (ejection devices 40, 50, 60, 70) according to each embodiment
Since the developer is sprayed while rotating and moving the spray nozzles 42, 52, 62 or the slit nozzle 72, the color filter substrate K itself for development does not need to be moved, and the apparatus can be downsized. -Space saving can be achieved.

Further, the injection devices 40, 50, 60, and 70 shown in the first to fourth embodiments can be easily added to or added to existing equipment, and have a processing capacity per unit time. It is simple and can be implemented at low cost to improve equipment.

In the above-described first to fourth embodiments, the color filter substrate developing device 10 is connected to the supply side (input side) of the color filter substrate K and the discharge side (extraction side) after the development is completed. 8), the developing unit 86 is disposed between the supply unit 82 and the draining unit 84 as in the color filter substrate developing device 80 shown in FIG. The supply side (input side) of the filter substrate K and the discharge side (extraction side) after the development is completed may be configured separately. With such a configuration, the color filter substrate developing device 80 can be incorporated into a production line, and the developed color filter substrate K can be continuously fed to another processing device. .

The substrate which can be developed using the color filter substrate developing apparatus according to the present invention includes, but is not limited to, a liquid crystal color filter substrate. In the color filter substrate developing apparatus according to the present invention, a color filter substrate having a substantially flat plate shape may be used as long as it requires development processing with a developing solution. For example, a display CRT incorporating a color filter substrate of three colors may be used. Also, it can be used for manufacturing a color plasma display (color PDP) having a built-in color filter.

[0077]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Color filter substrate K after development as described above
In order to evaluate the development unevenness, the results of measurement (experiment) of the following examples will be described. [Example 1] Color filter substrate K for development processing
As shown in FIG. 9, the width is 550 mm and the length is 650
A liquid crystal color filter substrate (No. 1737, manufactured by Corning Japan KK) having a thickness of 0.7 mm and a thickness of 0.7 mm was used.
Further, as a developing solution, T.F.
-PD1, T-CD1, and T-SD1 were used. further,
The distance between the spray nozzles 42 is 125 mm, and the distance from the spray nozzles 42 to the liquid crystal color filter substrate is 260 mm.
mm, rotation speed of the spray nozzle 42 is 15 rpm
m, the injection pressure of the developer was 0.02 MPa, and the injection was performed for 40 seconds. The developer flow was 20 liters / minute.

In order to evaluate the development unevenness, as shown in FIG.
The land pattern was exposed in advance, and after the development processing, the pattern dimensions were measured. The result was shown in FIG. 10A.

On the other hand, for comparison, development was carried out using a single conventional conical pyramid nozzle as a comparative example. The liquid crystal color filter substrate to be developed and the developing solution to be used are the same as in the first embodiment. Further, the distance from the conical pyramid nozzle to the liquid crystal color filter substrate was 300 mm, and the ejection pressure of the developer was 0.2 MPa, and ejection was performed for 40 seconds. The developer flow was 15 liters / minute.

When the development unevenness was evaluated in the same manner as in Example 1, the result was as shown in FIG. 10 (B).

As shown in FIG. 10B, when a full-colored pyramid nozzle as in the comparative example is used, the developing speed at the center and the periphery of the liquid crystal color filter substrate (land pattern having a length of 100 μm) is low, and The pattern size of the central part and the peripheral part is 110 μm for the target value 100 μm.
(+10 μm with respect to the target value).

On the other hand, when the color filter substrate developing device 10 (ejection device 40) according to the first embodiment is used,
As shown in FIG. 10A, 99 μm for a target of 100 μm.
The pattern dimensional accuracy of μm to 101 μm (within ± 1 μm with respect to the target value) was shown, which was a good result. Further, the film thickness distribution of the liquid crystal color filter substrate after development and the development residue were also uniform in the substrate.

As described above, in the color filter substrate developing device 10 according to the first embodiment, even if the liquid crystal color filter substrate is large, the pressure applied to the developing solution is uniform throughout, and the developing speed is uniform. As a result, development can be performed more uniformly in the substrate surface. Therefore, a liquid crystal color filter substrate with good pattern accuracy can be obtained. [Example 2] The same liquid crystal color filter substrate and developer as in Example 1 were used. Further, an injection device 50 in which a plurality of spray nozzles 52 are spirally arranged in a cross pipe as shown in FIG. 11 was used. The distance from the spray nozzle 52 to the liquid crystal color filter substrate was 260 mm, the rotation speed of the spray nozzle 52 was 15 rpm, the injection pressure of the developer was 0.02 MPa, and the liquid was injected for 40 seconds. The developer flow was 20 liters / minute.

When the development unevenness was evaluated in the same manner as in Example 1, the results were as shown in FIG. 10A as in Example 1.

On the other hand, for comparison, a comparative example similar to that applied in Example 1 was applied, and the development unevenness was evaluated in the same manner as in Example 1.
The result shown in (B) was obtained.

As shown in FIG. 10B, when a full-cone pyramid nozzle as in the comparative example is used, the developing speed at the center and the periphery of the liquid crystal color filter substrate (land pattern having a length of 100 μm) is slow, and the liquid crystal color filter substrate The pattern size of the central part and the peripheral part is 110 μm for the target value 100 μm.
(+10 μm with respect to the target value).

On the other hand, when the injection device 50 according to the second embodiment is used, as shown in FIG.
99 μm to 101 μm for μm (± 1 for target value)
(within μm), which was a good result. Further, the film thickness distribution of the liquid crystal color filter substrate after development and the development residue were also uniform in the substrate.

As described above, the injection device 5 according to the second embodiment
In the color filter substrate developing apparatus 10 provided with a zero, even with a large-sized liquid crystal color filter substrate, the pressure applied to the developer becomes uniform to all corners, the developing speed becomes uniform and faster, and the in-plane of the substrate is further improved. It can be uniformly developed. Therefore, a liquid crystal color filter substrate with good pattern accuracy can be obtained. Example 3 The same liquid crystal color filter substrate and developing solution as in Example 1 were used. Further, as shown in FIG. 4, a developer injection device 60 in which the above-described spray nozzles 62 were linearly arranged was used. The interval between the spray nozzles 62 is 5
0 mm, the distance from the spray nozzle 62 to the liquid crystal color filter substrate is 260 mm, and the moving speed of the spray nozzle 62 is controlled as shown in FIG.
0 mm and a stable moving speed of 1.0 m / min. The developer is injected at an injection pressure of 0.02 MPa, and the flow rate of the developer is 15
Liters / minute.

When the development unevenness was evaluated in the same manner as in Example 1, the result was as shown in FIG.

On the other hand, for comparison, a comparative example similar to that applied in Example 1 was applied, and the development unevenness was evaluated in the same manner as in Example 1.
The result shown in (B) was obtained.

As shown in FIG. 12 (B), when a full pyramid nozzle as in the comparative example is used, the developing speed at the center and the peripheral portion of the liquid crystal color filter substrate (land pattern having a length of 100 μm) is low, and The pattern size of the central part and the peripheral part is 110 μm with respect to the target value of 100 μm.
(+10 μm with respect to the target value).

On the other hand, when the injection device 60 according to the third embodiment is used, as shown in FIG.
99 μm to 101 μm for μm (± 1 for target value)
(within μm), which was a good result. Further, the film thickness distribution of the liquid crystal color filter substrate after development and the development residue were also uniform in the substrate.

As described above, the injection device 6 according to the third embodiment
In the color filter substrate developing device 10 provided with a zero, even for a large-sized liquid crystal color filter substrate, the pressure applied to the developer becomes uniform to all corners, the developing speed becomes uniform and fast, and the substrate surface becomes uniform. It can be developed. Therefore, a liquid crystal color filter substrate with good pattern accuracy can be obtained. Example 4 The same liquid crystal color filter substrate and developer as in Example 1 were used. Further, a developer injection device 70 having a slit nozzle 72 as shown in FIG. 7 was used. The slit width of the slit nozzle 72 is 0.2 m
m, the slit length was 600 mm, and the moving speed of the slit nozzle 72 was controlled under the same conditions as in Example 3. The distance from the tip of the slit nozzle 72 to the liquid crystal color filter substrate was 150 mm, and the flow rate of the developing solution was 10 L / min.

When the development unevenness was evaluated in the same manner as in Example 1, the result was as shown in FIG.

On the other hand, for comparison, a comparative example similar to that applied in Example 1 was applied, and its development unevenness was evaluated in the same manner as in Example 1.
The result shown in (B) was obtained.

As shown in FIG. 12B, when a full-cone pyramid nozzle as in the comparative example is used, the developing speed at the center and the periphery of the liquid crystal color filter substrate (land pattern having a length of 100 μm) is low, and the liquid crystal color filter substrate The pattern size of the central part and the peripheral part is 110 μm with respect to the target value of 100 μm.
(+10 μm with respect to the target value).

On the other hand, when the injection device 70 according to the fourth embodiment is used, as shown in FIG.
99 μm to 101 μm for μm (± 1 for target value)
(within μm), which was a good result. Further, the film thickness distribution of the liquid crystal color filter substrate after development and the development residue were also uniform in the substrate.

As described above, the injection device 7 according to the fourth embodiment is
In the color filter substrate developing device 10 provided with a zero, even for a large-sized liquid crystal color filter substrate, the pressure applied to the developer becomes uniform to all corners, the developing speed becomes uniform and fast, and the substrate surface becomes uniform. It can be developed. Therefore, a liquid crystal color filter substrate with good pattern accuracy can be obtained. [Summary of Each Example] Characteristic configurations and development unevenness (pattern accuracy) of the above-described Examples 1 to 4 and Comparative Example
Table 1 shows the evaluation results.

[0099]

[Table 1]

As is apparent from Table 1, when the conventional full-cone pyramid nozzle is used as in the comparative example, the developing speed of the central portion and the peripheral portion of the liquid crystal color filter substrate (land pattern) is slow, and the developing speed is 100 μm. The pattern size of the land pattern is very bad, ie, 110 μm for the target value of 100 μm (+10 μm for the target value). On the other hand, the color filter substrate developing device 10 (injection devices 40, 50,
60, 70), 99 μm for a target of 100 μm.
A pattern dimensional accuracy of μm to 101 μm (within ± 1 μm with respect to a target value) is shown, and good results can be obtained.
Further, the film thickness distribution of the liquid crystal color filter substrate after development and the development residue are also uniform in the substrate.

Therefore, even in the case of a large liquid crystal color filter substrate, the pressure applied by the developing solution is uniform throughout, and the developing speed is uniform and fast, and uniform development can be performed on the surface of the substrate. Therefore, the film thickness after development,
A liquid crystal color filter substrate with good pattern accuracy and development residue can be obtained.

[0102]

As described above, in the color filter substrate developing apparatus according to the present invention, even if the color filter substrate is large, the pressure applied to the developing solution becomes uniform to all corners, and the developing speed becomes uniform and fast. In addition, it has an excellent effect that it is possible to uniformly develop the surface of the substrate, and to obtain a color filter substrate having good film thickness after development, pattern accuracy, and development residue.

[Brief description of the drawings]

FIG. 1 is a schematic perspective view illustrating a configuration of an ejection device provided in a developing unit of a color filter substrate developing device according to a first embodiment of the present invention.

FIG. 2 is a schematic overall configuration diagram of the color filter substrate developing device according to the first embodiment of the present invention.

FIG. 3 is a schematic perspective view illustrating a configuration of an ejection device provided in a developing unit of a color filter substrate developing device according to a second embodiment of the present invention.

FIG. 4 is a schematic perspective view illustrating a configuration of an ejection device provided in a developing unit of a color filter substrate developing device according to a third embodiment of the present invention.

FIG. 5 is a diagram showing a control state of a moving speed of a spray nozzle of a color filter substrate developing device according to a third embodiment of the present invention.

FIG. 6 is a schematic perspective view showing a modified example of an ejection device provided in a developing section of a color filter substrate developing device according to a third embodiment of the present invention.

FIG. 7 is a schematic perspective view illustrating a configuration of an ejection device provided in a developing unit of a color filter substrate developing device according to a fourth embodiment of the present invention.

FIG. 8 is a schematic overall configuration diagram showing another example of the color filter substrate developing device.

FIG. 9 is a plan view showing a pattern dimensional accuracy measurement position of the liquid crystal color filter substrate according to the example of the present invention.

10A is a diagram showing a measurement result of a pattern dimensional accuracy of a liquid crystal color filter substrate corresponding to Example 1, and FIG. 10B is a diagram showing a measurement result of a pattern dimensional accuracy of a liquid crystal color filter substrate corresponding to a comparative example; FIG.

FIG. 11 is a plan view showing an arrangement state of spray nozzles of an injection device according to Embodiment 2.

FIG. 12A is a diagram showing a pattern dimensional accuracy measurement result of a liquid crystal color filter substrate corresponding to Example 3, and FIG. 12B is a pattern dimensional accuracy measurement result of a liquid crystal color filter substrate corresponding to a comparative example; FIG.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 10 Color filter substrate developing device 12 Supply part 14 Drain part 16 Developing part 24 Developing tank 40 Injecting device 42 Spray nozzle 50 Injecting device 52 Spray nozzle 60 Injecting device 62 Spray nozzle 70 Injecting device 72 Slit nozzle

 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2H048 BA02 BA45 BB02 BB42 2H091 FA02Y FC10 FC29 FD04 LA12 2H096 AA30 GA31

Claims (9)

[Claims] 1. A color filter substrate developing apparatus for developing a color filter substrate by injecting a developing solution onto a color filter substrate, wherein a plurality of spray nozzles for injecting the developing solution are provided on the color filter substrate for developing. A color filter substrate developing device, which is disposed to face the device, stops the color filter substrate, and ejects the developer while moving the plurality of spray nozzles. 2. The method according to claim 1, wherein the plurality of spray nozzles are arranged in a matrix on the same plane facing the color filter substrate, and the developer is supplied while rotating the plurality of spray nozzles on the same plane. The color filter substrate developing device according to claim 1, wherein the color filter substrate is developed. 3. A method according to claim 1, wherein the plurality of spray nozzles are spirally arranged on the same plane facing the color filter substrate, and the developer is supplied while rotating the plurality of spray nozzles on the same plane. The color filter substrate developing device according to claim 1, wherein the color filter substrate is developed. 4. A rotating movement of the plurality of spray nozzles in a direction in which the spiral spiral expands outward,
The color filter substrate developing device according to claim 3, wherein: 5. The plurality of spray nozzles are arranged in a row on the same line facing the color filter substrate, and the plurality of spray nozzles in the row are moved in a direction orthogonal to the same line. The color filter substrate developing device according to claim 1, wherein the developing solution is jetted while the developing is performed. 6. A method according to claim 1, wherein a plurality of said plurality of spray nozzles are provided in a row, and said developer is sprayed while said plurality of nozzle rows are alternately moved along a direction orthogonal to said same line. The color filter substrate developing device according to claim 5, wherein: 7. The color filter substrate developing device according to claim 1, wherein the plurality of spray nozzles are located at the same distance from the color filter substrate. 8. A color filter substrate developing apparatus for developing a color filter substrate by injecting a developer onto a color filter substrate, wherein a slit nozzle for injecting the developer is opposed to the color filter substrate for development. Wherein the color filter substrate is stationary, and the developer is ejected while moving the slit nozzle along a direction orthogonal to the slit. 9. A plurality of slit nozzles are provided, and
9. The color filter substrate developing device according to claim 8, wherein the developer is ejected while alternately moving the plurality of slit nozzles along a direction orthogonal to each slit. 10.