JP2009231530A - 気相成長装置 - Google Patents
気相成長装置 Download PDFInfo
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- JP2009231530A JP2009231530A JP2008075082A JP2008075082A JP2009231530A JP 2009231530 A JP2009231530 A JP 2009231530A JP 2008075082 A JP2008075082 A JP 2008075082A JP 2008075082 A JP2008075082 A JP 2008075082A JP 2009231530 A JP2009231530 A JP 2009231530A
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- flange
- susceptor
- holding member
- substrate holding
- inner flange
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- 238000005096 rolling process Methods 0.000 claims abstract description 22
- 239000000758 substrate Substances 0.000 claims description 56
- 230000002093 peripheral effect Effects 0.000 claims description 34
- 238000001947 vapour-phase growth Methods 0.000 claims description 22
- 230000004308 accommodation Effects 0.000 claims description 8
- 239000002994 raw material Substances 0.000 claims description 4
- 239000007795 chemical reaction product Substances 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract 1
- 239000010409 thin film Substances 0.000 description 4
- 238000012423 maintenance Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 1
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- Chemical Vapour Deposition (AREA)
Abstract
【解決手段】サセプタ13の外周部に設けられた複数の収容孔20の内周下部に内フランジ20aを周設する。基板保持部材14の外周上部に内フランジ20aに対向する外フランジ14bを周設し、内フランジ20aの内周側に外フランジ方向に突出するリング状の上向き突片20bを設ける。外フランジ14bの外周側に内フランジ方向に突出するリング状の下向き突片14dを設ける。内フランジ20a、外フランジ14b、上向き突片20b及び下向き突片14dに囲まれた部分に、転動部材21を回転可能に配設する。
【選択図】図1
Description
Claims (2)
- チャンバー内に回転可能に設けられた円盤状のサセプタと、該サセプタの外周部に設けられた複数の収容孔内にそれぞれ回転可能に収容された円盤状の基板保持部材と、該基板保持部材の外周に設けられた外歯車に歯合する内歯車を備えた固定歯車部材と、前記チャンバー内のサセプタ表面側に原料ガスを導入する原料ガス導入部と、前記チャンバー内からガスを排出する排気部とを備えた自公転機構を有する気相成長装置において、前記収容孔の内周下部に内フランジを周設し、前記基板保持部材の外周上部に前記内フランジに対向する外フランジを周設し、前記内フランジの内周側に前記外フランジ方向に突出するリング状の上向き突片を設け、前記外フランジの外周側に前記内フランジ方向に突出するリング状の下向き突片を設けるとともに、前記内フランジ、前記外フランジ、前記上向き突片及び前記下向き突片に囲まれた部分に、前記基板保持部材を回転可能に支持する転動部材を回転可能に配設したことを特徴とする気相成長装置。
- 前記上向き突片は前記基板保持部材の外周面に沿って設けられ、前記下向き突片は前記内フランジの内周面に沿って設けられていることを特徴とする請求項1記載の気相成長装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008075082A JP5144328B2 (ja) | 2008-03-24 | 2008-03-24 | 気相成長装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008075082A JP5144328B2 (ja) | 2008-03-24 | 2008-03-24 | 気相成長装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009231530A true JP2009231530A (ja) | 2009-10-08 |
JP5144328B2 JP5144328B2 (ja) | 2013-02-13 |
Family
ID=41246603
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008075082A Active JP5144328B2 (ja) | 2008-03-24 | 2008-03-24 | 気相成長装置 |
Country Status (1)
Country | Link |
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JP (1) | JP5144328B2 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010212667A (ja) * | 2009-02-16 | 2010-09-24 | Canon Anelva Corp | トレイ及びトレイ支持部材並びに真空処理装置 |
JP2012156287A (ja) * | 2011-01-26 | 2012-08-16 | Sumitomo Electric Ind Ltd | 気相処理装置 |
KR20210113383A (ko) * | 2019-02-01 | 2021-09-15 | 도쿄엘렉트론가부시키가이샤 | 성막 방법 및 성막 장치 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002175992A (ja) * | 2000-12-07 | 2002-06-21 | Ee Technologies:Kk | 基板回転機構を備えた成膜装置 |
JP2006128561A (ja) * | 2004-11-01 | 2006-05-18 | Sharp Corp | 基板回転機構およびそれを備えた成膜装置 |
JP2007243060A (ja) * | 2006-03-10 | 2007-09-20 | Taiyo Nippon Sanso Corp | 気相成長装置 |
JP2009188289A (ja) * | 2008-02-08 | 2009-08-20 | Taiyo Nippon Sanso Corp | 気相成長装置 |
-
2008
- 2008-03-24 JP JP2008075082A patent/JP5144328B2/ja active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002175992A (ja) * | 2000-12-07 | 2002-06-21 | Ee Technologies:Kk | 基板回転機構を備えた成膜装置 |
JP2006128561A (ja) * | 2004-11-01 | 2006-05-18 | Sharp Corp | 基板回転機構およびそれを備えた成膜装置 |
JP2007243060A (ja) * | 2006-03-10 | 2007-09-20 | Taiyo Nippon Sanso Corp | 気相成長装置 |
JP2009188289A (ja) * | 2008-02-08 | 2009-08-20 | Taiyo Nippon Sanso Corp | 気相成長装置 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010212667A (ja) * | 2009-02-16 | 2010-09-24 | Canon Anelva Corp | トレイ及びトレイ支持部材並びに真空処理装置 |
JP2012156287A (ja) * | 2011-01-26 | 2012-08-16 | Sumitomo Electric Ind Ltd | 気相処理装置 |
KR20210113383A (ko) * | 2019-02-01 | 2021-09-15 | 도쿄엘렉트론가부시키가이샤 | 성막 방법 및 성막 장치 |
US20220098726A1 (en) * | 2019-02-01 | 2022-03-31 | Tokyo Electron Limited | Film forming method and film forming apparatus |
KR102652637B1 (ko) * | 2019-02-01 | 2024-04-01 | 도쿄엘렉트론가부시키가이샤 | 성막 방법 및 성막 장치 |
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JP5144328B2 (ja) | 2013-02-13 |
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