WO2012105313A1 - 気相成長装置 - Google Patents
気相成長装置 Download PDFInfo
- Publication number
- WO2012105313A1 WO2012105313A1 PCT/JP2012/050892 JP2012050892W WO2012105313A1 WO 2012105313 A1 WO2012105313 A1 WO 2012105313A1 JP 2012050892 W JP2012050892 W JP 2012050892W WO 2012105313 A1 WO2012105313 A1 WO 2012105313A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- susceptor
- substrate holding
- vapor phase
- substrate
- rolling
- Prior art date
Links
- 239000012808 vapor phase Substances 0.000 title abstract description 6
- 239000000758 substrate Substances 0.000 claims abstract description 66
- 238000005096 rolling process Methods 0.000 claims abstract description 27
- 238000010438 heat treatment Methods 0.000 claims abstract description 4
- 238000001947 vapour-phase growth Methods 0.000 claims description 17
- 239000010409 thin film Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000009194 climbing Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 1
- 238000000927 vapour-phase epitaxy Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
- C23C16/4584—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally the substrate being rotated
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68771—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by supporting more than one semiconductor substrate
Definitions
- the present invention relates to a vapor phase growth apparatus, and more particularly to a vapor phase growth apparatus provided with a mechanism for rotating and revolving a substrate on a susceptor.
- a vapor phase growth apparatus for supplying a vapor phase raw material into the flow channel while the substrate held on the susceptor in the flow channel is heated to a predetermined temperature and depositing a thin film on the substrate surface, the thin film is uniformly formed on a plurality of substrates.
- a vapor phase growth apparatus provided with a mechanism for rotating the susceptor and rotating the substrate holding member (substrate tray) holding the substrate along with the rotation of the susceptor to rotate the substrate during film formation.
- a rolling member is interposed between the susceptor and the substrate holding member so that the substrate holding member rotates smoothly (see, for example, Patent Document 1).
- the rolling members that rotate adjacent to each other rotate in the opposite directions, so that when the surface of the rolling member deteriorates and the frictional force increases, the rotating member rotates. There is a possibility that the rear rolling member rides on the rolling member forward in the direction. For this reason, it is necessary to periodically replace the rolling member with a new one. However, in order to replace the rolling member, the entire susceptor must be taken out of the chamber. Maintenance was required, which took time and money.
- an object of the present invention is to provide a vapor phase growth apparatus provided with a self-revolving mechanism that can prevent a rolling member from riding on an adjacent rolling member.
- the vapor phase growth apparatus of the present invention rotates a plurality of substrate holding members in a circumferential direction of the susceptor via a rolling member on a susceptor heated by a heating unit and rotated by a driving unit.
- Vapor phase epitaxy provided with a self-revolving structure capable of rotating while rotating the substrate holding member as the susceptor rotates and rotating the substrate held by the substrate holding member with respect to the rotation axis of the susceptor.
- the rolling member rolling members having different diameters are alternately arranged.
- vapor phase growth apparatus of the present invention by alternately arranging rolling members having different diameters, adjacent rolling members can be rotated in the same direction, so that the rolling members can be prevented from climbing up. Thus, a stable rotation state can be continued for a long time.
- the vapor phase growth apparatus shown in this embodiment is a multi-rotation type vapor phase growth apparatus in which six substrates 12 can be placed on the upper surface of a disk-shaped susceptor 11, and the susceptor 11 is made of quartz glass or the like. It is rotatably provided inside a cylindrical flow channel 13 formed by the above.
- a rotating shaft 14 is provided at the center of the lower surface of the susceptor 11, and a heater 15 and a thermometer 16 for heating the substrate 12 via the susceptor 11 are provided around the rotating shaft 14. Is covered with a reflector 17.
- a vapor phase material inlet 18 is opened, and an exhaust port 19 is provided on the outer periphery of the bottom plate.
- the substrate 12 is held by a disk-shaped substrate holding member (substrate tray) 21 having a substrate holding recess 20 on the upper surface, and the substrate holding member 21 is a rolling member having a different diameter formed of carbon or ceramic.
- the guide member 24 is supported by a disc-shaped guide member 24 via two kinds of balls 22 and 23 having a large diameter and a small diameter, and the guide member 24 is placed in a guide member holding recess 25 provided at equal intervals in the circumferential direction of the susceptor 11. Is retained.
- an external gear 26 is provided at the lower outer periphery of the substrate holding member 21, and a ring-shaped fixing having an internal gear 27 that meshes with the external gear 26 of the substrate holding member 21 at the outer peripheral position of the susceptor 11.
- a gear member 28 is provided. Further, a cover member 29 that covers the fixed gear member 28, the internal gear 27 and the external gear 26, and the upper surface of the central portion of the susceptor 11 is provided. The upper surface of the cover member 29 and the substrate holding recess 20 are provided. The upper surface of the outer peripheral portion and the upper surface of the substrate 12 are flush with each other.
- Ring-shaped V grooves 21 a and 24 a centering on the axis of the substrate 12 are provided opposite to each other on the lower surface of each substrate holding member 21 and the upper surface of each guide member 24, and both V grooves 21 a. 24a, the balls 22 and 23 are held so as to roll.
- the guide member 24 is formed separately from the susceptor 11 for manufacturing convenience, but a member corresponding to the guide member 24 provided with the V-groove 24a can be formed integrally with the susceptor 11. is there.
- the susceptor 11 rotates integrally with the rotating shaft 14, and each of the components except for the fixed gear member 28 is rotated along with the rotation of the susceptor 11.
- the member rotates, and the substrate 12 is rotated around the axis of the susceptor 11, that is, revolved.
- the external gear 26 meshes with the internal gear 27 of the fixed gear member 28
- the substrate holding member 21 is rotated around the axis of the substrate holding member 21, that is, is rotated.
- the substrate 12 held by the substrate holding member 21 revolves around the axis of the susceptor 11.
- the substrate 12 revolves and the substrate 12 is heated from the heater 15 through the susceptor 11 to a predetermined temperature, for example, 1100 ° C.
- a predetermined temperature for example, 1100 ° C.
- a predetermined thin film can be uniformly deposited on the surfaces of the plurality of substrates 12.
- the two kinds of balls 22 and 23 of large and small disposed between the V groove 21a of the substrate holding member 21 and the V groove 24a of the guide member 24 are used.
- the ball 22 having a large diameter (large diameter ball) 22 is sandwiched between the V grooves 21a and 24a and is in contact with both, so that the substrate holding member 21 is shown in FIG.
- the large-diameter ball 22 rotates in the direction of rotation of the substrate holding member 21 shown by arrow B in FIG.
- the ball (small-diameter ball) 23 having a smaller diameter than the large-diameter ball 22 is positioned below the substrate holding member by its own weight. It will be in the state which contacted only 21 V groove 21a. Therefore, the small-diameter ball 23 is pushed by the large-diameter ball 22 that rotates (arrow B) in the rotation direction (arrow A) of the substrate holding member 21, and the substrate holding member 21 moves toward the rotation direction of the substrate holding member 21. It will advance in the V groove 21a.
- the large-diameter ball 22 does not ride on the small-diameter ball 23, and the substrate holding member 21 It is supported by 22 and rotates in a stable state.
- both balls 22 and 23 can be obtained by alternately arranging two types of balls 22 and 23 having different diameters between the V groove 21a of the substrate holding member 21 and the V groove 24a of the guide member 24. Even if the frictional force increases due to deterioration, the ball does not climb up and the substrate holding member 21, that is, the substrate 12 can be rotated in a stable state over a long period of time.
- the small-diameter ball 23 may be set to have a diameter that does not contact the surface of the V-groove 21a of the substrate holding member 21 supported by the large-diameter ball 22 and is set to a diameter sandwiched between the large-diameter balls 22.
- the diameter may be 0.1 to 10% smaller than the diameter of the large-diameter ball 22.
- the frictional force between the balls 22 and 23 can be made larger than the frictional force between the small-diameter ball 23 and the V groove 21a from the time of manufacture.
- the large-diameter ball 22 and the small-diameter ball 23 can be formed of different materials.
- the present invention can also be applied to a vapor phase growth apparatus in which the thin film formation surface of the substrate faces downward, a revolution type vapor phase growth apparatus that revolves the substrate with respect to the rotation axis of the susceptor, and a rotation type vapor phase growth that allows only rotation. It can also be used for equipment.
- the shape of each part can be appropriately set according to various conditions such as the size of the susceptor and the substrate, the cover member can be omitted, and the shape of the rolling member is not limited to the ball, and the rolling member Is not limited to the V-groove.
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Vapour Deposition (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims (1)
- 加熱手段によって加熱されるとともに駆動手段によって回転するサセプタに、該サセプタの周方向に複数の基板保持部材を転動部材を介して回転可能に設け、前記サセプタの回転に伴って前記基板保持部材を回転させ、該基板保持部材に保持された基板をサセプタの回転軸に対して公転させながら自転させる自公転構造を備えた気相成長装置において、前記転動部材として、径が異なる転動部材を交互に配置した気相成長装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020137013894A KR20140005163A (ko) | 2011-02-03 | 2012-01-18 | 기상 성장 장치 |
US13/821,426 US20130298836A1 (en) | 2011-02-03 | 2012-01-18 | Vapor phase growth apparatus |
CN201280003331XA CN103154315A (zh) | 2011-02-03 | 2012-01-18 | 气相生长装置 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011-021505 | 2011-02-03 | ||
JP2011021505A JP2012162752A (ja) | 2011-02-03 | 2011-02-03 | 気相成長装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2012105313A1 true WO2012105313A1 (ja) | 2012-08-09 |
Family
ID=46602533
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2012/050892 WO2012105313A1 (ja) | 2011-02-03 | 2012-01-18 | 気相成長装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20130298836A1 (ja) |
JP (1) | JP2012162752A (ja) |
KR (1) | KR20140005163A (ja) |
CN (1) | CN103154315A (ja) |
TW (1) | TW201233844A (ja) |
WO (1) | WO2012105313A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103834926A (zh) * | 2012-11-22 | 2014-06-04 | 上海法德机械设备有限公司 | 真空镀膜工件转台 |
US10428424B2 (en) * | 2012-11-16 | 2019-10-01 | Beijing Naura Microelectronics Equipment Co., Ltd. | Tray device, reaction chamber and MOCVD apparatus |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10428425B2 (en) * | 2016-01-26 | 2019-10-01 | Tokyo Electron Limited | Film deposition apparatus, method of depositing film, and non-transitory computer-readable recording medium |
US11174554B2 (en) | 2016-03-03 | 2021-11-16 | Core Technology, Inc. | Substrate tray for use in thin-film formation device |
CN109881179B (zh) * | 2019-04-19 | 2023-07-25 | 江苏可润光电科技有限公司 | 一种全包裹派瑞林镀膜工艺及镀膜装置 |
Citations (4)
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---|---|---|---|---|
JPS5413478Y2 (ja) * | 1972-08-12 | 1979-06-08 | ||
JPS5919245U (ja) * | 1982-07-30 | 1984-02-06 | 富士通株式会社 | 角度割出し治具 |
JP2003166529A (ja) * | 2001-11-27 | 2003-06-13 | Hisao Kitayama | 直線及び曲線移動型ベアリング |
JP2007243060A (ja) * | 2006-03-10 | 2007-09-20 | Taiyo Nippon Sanso Corp | 気相成長装置 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
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US2723169A (en) * | 1953-03-31 | 1955-11-08 | Clary Corp | Bearing construction |
US2724624A (en) * | 1953-05-29 | 1955-11-22 | Aircraft Armaments Inc | High impact strength bearing |
US3455618A (en) * | 1968-01-10 | 1969-07-15 | Moog Industries Inc | Thrust bearing |
US3549223A (en) * | 1969-10-27 | 1970-12-22 | Sinclair Co The | Polymeric bearing for papermaking machines |
JPS5258791A (en) * | 1975-11-08 | 1977-05-14 | Sumitomo Chem Co Ltd | Process for preparing adducts of maleic anhydride with liquid polymers |
US4215906A (en) * | 1979-07-19 | 1980-08-05 | General Dynamics Corporation | Zero slip four-point contact thrust bearing |
JP3344131B2 (ja) * | 1994-12-16 | 2002-11-11 | 日本精工株式会社 | 自己潤滑リニアガイド装置 |
JP3624998B2 (ja) * | 1996-09-30 | 2005-03-02 | 光洋精工株式会社 | 転がり軸受 |
JP2992004B2 (ja) * | 1997-07-08 | 1999-12-20 | 三星電子株式会社 | 回転体のバランシング装置 |
US6419397B1 (en) * | 2000-12-01 | 2002-07-16 | The Torrington Company | Housed steering column |
US7368018B2 (en) * | 2001-08-14 | 2008-05-06 | Powdec K.K. | Chemical vapor deposition apparatus |
DE10162473B4 (de) * | 2001-12-19 | 2005-12-01 | Fag Kugelfischer Ag & Co. Ohg | Wälzlager in Tiefbohreinrichtung |
US8033245B2 (en) * | 2004-02-12 | 2011-10-11 | Applied Materials, Inc. | Substrate support bushing |
WO2006035947A1 (ja) * | 2004-09-30 | 2006-04-06 | Thk Co., Ltd. | 転がり案内装置 |
JP4470680B2 (ja) * | 2004-10-12 | 2010-06-02 | 日立電線株式会社 | 気相成長装置 |
JP5436043B2 (ja) * | 2009-05-22 | 2014-03-05 | 大陽日酸株式会社 | 気相成長装置 |
CN102804339B (zh) * | 2009-06-19 | 2015-01-14 | 大阳日酸株式会社 | 气相生长装置 |
-
2011
- 2011-02-03 JP JP2011021505A patent/JP2012162752A/ja active Pending
-
2012
- 2012-01-16 TW TW101101553A patent/TW201233844A/zh unknown
- 2012-01-18 WO PCT/JP2012/050892 patent/WO2012105313A1/ja active Application Filing
- 2012-01-18 CN CN201280003331XA patent/CN103154315A/zh active Pending
- 2012-01-18 US US13/821,426 patent/US20130298836A1/en not_active Abandoned
- 2012-01-18 KR KR1020137013894A patent/KR20140005163A/ko not_active Application Discontinuation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5413478Y2 (ja) * | 1972-08-12 | 1979-06-08 | ||
JPS5919245U (ja) * | 1982-07-30 | 1984-02-06 | 富士通株式会社 | 角度割出し治具 |
JP2003166529A (ja) * | 2001-11-27 | 2003-06-13 | Hisao Kitayama | 直線及び曲線移動型ベアリング |
JP2007243060A (ja) * | 2006-03-10 | 2007-09-20 | Taiyo Nippon Sanso Corp | 気相成長装置 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10428424B2 (en) * | 2012-11-16 | 2019-10-01 | Beijing Naura Microelectronics Equipment Co., Ltd. | Tray device, reaction chamber and MOCVD apparatus |
CN103834926A (zh) * | 2012-11-22 | 2014-06-04 | 上海法德机械设备有限公司 | 真空镀膜工件转台 |
Also Published As
Publication number | Publication date |
---|---|
KR20140005163A (ko) | 2014-01-14 |
JP2012162752A (ja) | 2012-08-30 |
TW201233844A (en) | 2012-08-16 |
US20130298836A1 (en) | 2013-11-14 |
CN103154315A (zh) | 2013-06-12 |
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