JP2009149389A - 浮上ユニット及びそれを有する装置 - Google Patents
浮上ユニット及びそれを有する装置 Download PDFInfo
- Publication number
- JP2009149389A JP2009149389A JP2007326935A JP2007326935A JP2009149389A JP 2009149389 A JP2009149389 A JP 2009149389A JP 2007326935 A JP2007326935 A JP 2007326935A JP 2007326935 A JP2007326935 A JP 2007326935A JP 2009149389 A JP2009149389 A JP 2009149389A
- Authority
- JP
- Japan
- Prior art keywords
- conveyance path
- air
- workpiece
- groove
- guide groove
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005339 levitation Methods 0.000 claims description 42
- 239000012530 fluid Substances 0.000 claims description 37
- 230000001681 protective effect Effects 0.000 claims description 23
- 239000011521 glass Substances 0.000 abstract description 40
- 239000000758 substrate Substances 0.000 abstract description 39
- 230000032258 transport Effects 0.000 description 18
- 239000007789 gas Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 238000005304 joining Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
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- 238000011144 upstream manufacturing Methods 0.000 description 3
- 238000009423 ventilation Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
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- 238000005192 partition Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000008439 repair process Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000007849 furan resin Substances 0.000 description 1
- 229910021397 glassy carbon Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
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- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Images
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007326935A JP2009149389A (ja) | 2007-12-19 | 2007-12-19 | 浮上ユニット及びそれを有する装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007326935A JP2009149389A (ja) | 2007-12-19 | 2007-12-19 | 浮上ユニット及びそれを有する装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009149389A true JP2009149389A (ja) | 2009-07-09 |
JP2009149389A5 JP2009149389A5 (enrdf_load_stackoverflow) | 2011-02-10 |
Family
ID=40919033
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007326935A Pending JP2009149389A (ja) | 2007-12-19 | 2007-12-19 | 浮上ユニット及びそれを有する装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2009149389A (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2388808A1 (de) * | 2010-05-20 | 2011-11-23 | Westfälische Wilhelms-Universität Münster | Berührungsloses Transportsystem |
JP2012138481A (ja) * | 2010-12-27 | 2012-07-19 | Tokyo Ohka Kogyo Co Ltd | 塗布装置及び塗布方法 |
JP2019529283A (ja) * | 2016-09-13 | 2019-10-17 | コーニング インコーポレイテッド | ガラス基板を加工する装置および方法 |
EP3900025A4 (en) * | 2018-12-21 | 2022-09-14 | Kateeva, Inc. | SUBSTRATE FLOATATION CONTROL DEVICES, SYSTEMS AND METHODS |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06255775A (ja) * | 1993-03-05 | 1994-09-13 | Ochiai Nekusasu:Kk | 搬送装置 |
JPH08293292A (ja) * | 1995-04-25 | 1996-11-05 | Matsushita Electric Ind Co Ltd | 薄物電池部材の搬送装置 |
JP2004331265A (ja) * | 2003-05-01 | 2004-11-25 | Olympus Corp | 浮上ユニット及び基板検査装置 |
JP2006206320A (ja) * | 2005-01-27 | 2006-08-10 | Taesung Engineering Corp | 板ガラス移送装置 |
JP2007106521A (ja) * | 2005-10-11 | 2007-04-26 | Nippon Sekkei Kogyo:Kk | 薄板状材料搬送用エアテーブル及び薄板状材料搬送装置 |
-
2007
- 2007-12-19 JP JP2007326935A patent/JP2009149389A/ja active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06255775A (ja) * | 1993-03-05 | 1994-09-13 | Ochiai Nekusasu:Kk | 搬送装置 |
JPH08293292A (ja) * | 1995-04-25 | 1996-11-05 | Matsushita Electric Ind Co Ltd | 薄物電池部材の搬送装置 |
JP2004331265A (ja) * | 2003-05-01 | 2004-11-25 | Olympus Corp | 浮上ユニット及び基板検査装置 |
JP2006206320A (ja) * | 2005-01-27 | 2006-08-10 | Taesung Engineering Corp | 板ガラス移送装置 |
JP2007106521A (ja) * | 2005-10-11 | 2007-04-26 | Nippon Sekkei Kogyo:Kk | 薄板状材料搬送用エアテーブル及び薄板状材料搬送装置 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2388808A1 (de) * | 2010-05-20 | 2011-11-23 | Westfälische Wilhelms-Universität Münster | Berührungsloses Transportsystem |
JP2012138481A (ja) * | 2010-12-27 | 2012-07-19 | Tokyo Ohka Kogyo Co Ltd | 塗布装置及び塗布方法 |
JP2019529283A (ja) * | 2016-09-13 | 2019-10-17 | コーニング インコーポレイテッド | ガラス基板を加工する装置および方法 |
JP7002824B2 (ja) | 2016-09-13 | 2022-01-20 | コーニング インコーポレイテッド | ガラス基板を加工する装置および方法 |
US11420895B2 (en) | 2016-09-13 | 2022-08-23 | Corning Incorporated | Apparatus and method for processing a glass substrate |
EP3900025A4 (en) * | 2018-12-21 | 2022-09-14 | Kateeva, Inc. | SUBSTRATE FLOATATION CONTROL DEVICES, SYSTEMS AND METHODS |
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