JP2009084509A5 - - Google Patents
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- Publication number
- JP2009084509A5 JP2009084509A5 JP2007258954A JP2007258954A JP2009084509A5 JP 2009084509 A5 JP2009084509 A5 JP 2009084509A5 JP 2007258954 A JP2007258954 A JP 2007258954A JP 2007258954 A JP2007258954 A JP 2007258954A JP 2009084509 A5 JP2009084509 A5 JP 2009084509A5
- Authority
- JP
- Japan
- Prior art keywords
- cleaning composition
- group
- carbon atoms
- nonionic surfactant
- amine compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 238000004140 cleaning Methods 0.000 claims 5
- 239000000758 substrate Substances 0.000 claims 5
- -1 amine compound Chemical class 0.000 claims 4
- 125000004432 carbon atom Chemical group C* 0.000 claims 4
- 239000002736 nonionic surfactant Substances 0.000 claims 3
- ZZXDRXVIRVJQBT-UHFFFAOYSA-N 2,3-dimethylbenzenesulfonic acid Chemical compound CC1=CC=CC(S(O)(=O)=O)=C1C ZZXDRXVIRVJQBT-UHFFFAOYSA-N 0.000 claims 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 claims 1
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 125000005037 alkyl phenyl group Chemical group 0.000 claims 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 claims 1
- 229940092714 benzenesulfonic acid Drugs 0.000 claims 1
- MVIOINXPSFUJEN-UHFFFAOYSA-N benzenesulfonic acid;hydrate Chemical compound O.OS(=O)(=O)C1=CC=CC=C1 MVIOINXPSFUJEN-UHFFFAOYSA-N 0.000 claims 1
- 239000002738 chelating agent Substances 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 125000006353 oxyethylene group Chemical group 0.000 claims 1
- 150000003839 salts Chemical class 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
- 229920003169 water-soluble polymer Polymers 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007258954A JP5403890B2 (ja) | 2007-10-02 | 2007-10-02 | ハードディスク用基板用の洗浄剤組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007258954A JP5403890B2 (ja) | 2007-10-02 | 2007-10-02 | ハードディスク用基板用の洗浄剤組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009084509A JP2009084509A (ja) | 2009-04-23 |
| JP2009084509A5 true JP2009084509A5 (https=) | 2010-11-11 |
| JP5403890B2 JP5403890B2 (ja) | 2014-01-29 |
Family
ID=40658347
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007258954A Active JP5403890B2 (ja) | 2007-10-02 | 2007-10-02 | ハードディスク用基板用の洗浄剤組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5403890B2 (https=) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011105824A (ja) * | 2009-11-16 | 2011-06-02 | Dai Ichi Kogyo Seiyaku Co Ltd | 硬質表面用洗浄剤組成物 |
| JP5086450B2 (ja) * | 2010-01-21 | 2012-11-28 | 三洋化成工業株式会社 | 磁気ディスク基板用洗浄剤 |
| JP5711589B2 (ja) * | 2010-03-31 | 2015-05-07 | 三洋化成工業株式会社 | 磁気ディスク基板用洗浄剤 |
| JP5801051B2 (ja) * | 2010-12-28 | 2015-10-28 | 花王株式会社 | ハードディスク用ガラス基板用のアルカリ洗浄剤組成物 |
| MY193814A (en) | 2017-12-27 | 2022-10-27 | Kao Corp | Method for producing aluminum-made platter |
| JP7399554B2 (ja) * | 2019-02-26 | 2023-12-18 | 日本化薬株式会社 | 洗浄液及び洗浄方法 |
| JP7294910B2 (ja) * | 2019-06-21 | 2023-06-20 | 花王株式会社 | 磁気ディスク基板用洗浄剤組成物 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3962468B2 (ja) * | 1997-12-25 | 2007-08-22 | 花王株式会社 | 洗浄剤組成物 |
| JP4283952B2 (ja) * | 1999-10-12 | 2009-06-24 | 多摩化学工業株式会社 | 非鉄金属洗浄用洗浄液組成物 |
| JP2002212597A (ja) * | 2001-01-18 | 2002-07-31 | Lion Corp | 精密部品用水系洗浄剤組成物 |
| JP2002224948A (ja) * | 2001-01-26 | 2002-08-13 | Daido Chem Ind Co Ltd | 磁気ディスクＮｉ−Ｐ基板の研磨液用洗浄剤組成物及び該洗浄剤組成物を使用する磁気ディスクＮｉ−Ｐ基板の製造方法 |
| JP4304988B2 (ja) * | 2002-01-28 | 2009-07-29 | 三菱化学株式会社 | 半導体デバイス用基板の洗浄方法 |
| JP4350364B2 (ja) * | 2002-12-12 | 2009-10-21 | 昭和電工株式会社 | 洗浄剤組成物、半導体ウェーハの洗浄方法および製造方法 |
-
2007
- 2007-10-02 JP JP2007258954A patent/JP5403890B2/ja active Active
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