JP2009081310A - 半導体モジュール、半導体モジュールの製造方法および携帯機器 - Google Patents
半導体モジュール、半導体モジュールの製造方法および携帯機器 Download PDFInfo
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Abstract
【解決手段】半導体モジュール10は、配線層20、絶縁樹脂層30、半導体素子40がこの順で圧着により積層された構造を備える。配線層20には、半導体素子40の各素子電極42と対応する位置に、基部24と先端部26とを有する突起電極22が設けられる。突起電極22は絶縁樹脂層30を貫通して、対応する素子電極42と電気的に接続している。
【選択図】図1
Description
図1は、実施形態1に係る半導体モジュール10の構造を示す断面図である。配線層20には、半導体素子40の各素子電極42と対応する位置に突起電極22が設けられている。また、各突起電極22が形成されている部分の、配線層20の外面側にはんだバンプ28が設けられている。
図2(A)〜(E)は、突起電極22の形成方法を示す工程断面図である。
本実施形態の突起電極22の基部24の高さ、基面の径、頂部面の径は、それぞれ50μm、60μmφ、40μmφである。また、先端部26の高さ、径は、それぞれ5μm、30μmφである。
図4は、実施形態2に係る半導体モジュール10の部分拡大断面図である。本実施形態の半導体モジュール10では、素子電極42との圧着により先端部26が変形し、基部24と先端部26との界面のうち基部24の頂部面と平行な領域の面積よりも、先端部26と素子電極42との界面の面積のほうが大きくなっている。これにより、突起電極22と素子電極42との接続信頼性を向上させることができる。
図5は、実施形態3に係る半導体モジュール10の部分拡大断面図である。本実施形態の半導体モジュール10では、突起電極22の基部24の頂部面に凹部27を設け、先端部26を凹部27において突出するように形成している。
上述した実施形態1では、銅板21の基部24側にレジストをラミネートして、フォトマスクを用いてリソグラフィ法により該レジストを露光現像し、基部24上方の領域のレジストを開口して、先端部26を形成したが、本実施形態に示すように、以下のようにして先端部26を形成してもよい。
上述した実施形態1では、突起電極22の基部24と先端部26とを別体として形成したが、本実施形態に示すように、基部24と先端部26とを一体的に形成してもよい。
次に、本発明の半導体モジュールを備えた携帯機器について説明する。なお、携帯機器として携帯電話に搭載する例を示すが、たとえば、個人用携帯情報端末(PDA)、デジタルビデオカメラ(DVC)、及びデジタルスチルカメラ(DSC)といった電子機器であってもよい。
Claims (19)
- 突起電極が設けられた配線層と、
前記突起電極に対向する素子電極が設けられた半導体素子と、
前記配線層と前記半導体素子との間に設けられた絶縁樹脂層と、
を備え、
前記突起電極は、基部と、前記基部の頂部面から突出した先端部とを有し、
前記突起電極が前記絶縁樹脂層を貫通し、前記突起電極と前記素子電極とが電気的に接続されていることを特徴とする半導体モジュール。 - 前記先端部は、
前記基部よりも加圧により変形しやすい金属材料よりなることを特徴とする請求項1に記載の半導体モジュール。 - 前記先端部は、
塑性変形可能な金属材料よりなることを特徴とする請求項1または2に記載の半導体モジュール。 - 前記先端部は、複数層からなり、
前記先端部のうち前記素子電極と接する層が、前記基部よりも加圧により変形しやすい金属材料よりなることを特徴とする請求項1に記載の半導体モジュール。 - 前記先端部は、複数層からなり、
前記先端部のうち前記素子電極と接する層が、塑性変形可能な金属材料よりなることを特徴とする請求項1または4に記載の半導体モジュール。 - 前記基部と前記先端部との界面のうち前記頂部面と平行な領域の面積よりも、前記先端部と前記素子電極との界面の面積のほうが大きいことを特徴とする請求項2ないし5のいずれか1項に記載の半導体モジュール。
- 前記基部は、その頂部面に凹部を有し、
前記先端部は、前記凹部の底面に接していることを特徴とする請求項1ないし6のいずれか1項に記載の半導体モジュール。 - 前記絶縁樹脂層は、
加圧によって塑性流動を起こすことを特徴とする請求項1ないし7のいずれか1項に記載の半導体モジュール。 - 請求項1ないし8のいずれか1項に記載の半導体モジュールを搭載したことを特徴とする携帯機器。
- 金属板上に基部を形成し、前記基部の頂部面に、前記頂部面から突出するように先端部を形成して、突起電極を前記金属板上に形成する突起電極形成工程と、
前記金属板と、前記突起電極に対応する素子電極が設けられた半導体素子とを、絶縁樹脂層を介して圧着し、前記突起電極が前記絶縁樹脂層を貫通することにより、前記突起電極と前記素子電極とを電気的に接続する圧着工程と、
を備えることを特徴とする半導体モジュールの製造方法。 - 前記突起電極形成工程において、前記先端部は、頂部に、前記素子電極との接触面と平行な面を有するように形成されることを特徴とする請求項10に記載の半導体モジュールの製造方法。
- 前記突起電極形成工程において、前記先端部は、前記基部よりも加圧により変形しやすい金属材料で形成されることを特徴とする請求項10または11に記載の半導体モジュールの製造方法。
- 前記突起電極形成工程において、前記先端部は、塑性変形可能な金属材料で形成されることを特徴とする請求項10ないし12のいずれか1項に記載の半導体モジュールの製造方法。
- 前記突起電極形成工程において、前記先端部は、複数層となるように形成され、前記先端部のうち前記素子電極と接する層が、前記基部よりも加圧により変形しやすい金属材料で形成されることを特徴とする請求項10または11に記載の半導体モジュールの製造方法。
- 前記突起電極形成工程において、前記先端部は、複数層となるように形成され、前記先端部のうち前記素子電極と接する層が、塑性変形可能な金属材料で形成されることを特徴とする請求項10、11、14のいずれか1項に記載の半導体モジュールの製造方法。
- 前記圧着工程において、前記突起電極の前記基部と前記先端部との界面のうち前記頂部面と平行な領域の面積よりも、前記先端部と前記素子電極との界面の面積のほうが大きい状態で、前記突起電極と前記素子電極とが接続されることを特徴とする請求項12ないし15のいずれか1項に記載の半導体モジュールの製造方法。
- 前記突起電極形成工程において、前記基部はその頂部面に凹部が形成され、前記先端部は前記凹部において突出するように形成されることを特徴とする請求項10ないし16のいずれか1項に記載の半導体モジュールの製造方法。
- 前記絶縁樹脂層は、
加圧によって塑性流動を起こすことを特徴とする請求項10ないし17のいずれか1項に記載の半導体モジュールの製造方法。 - 前記突起電極形成工程において、前記基部を覆うように樹脂を積層し、前記樹脂のガラス転移温度以上の温度で加熱して、前記樹脂の膜厚が前記基部の中央部上方よりも前記基部の周縁部上方の方が厚くなるように前記樹脂を流動させ、エッチングして基部上方の樹脂に開口を形成し、前記開口内に前記先端部を形成した後、前記樹脂を除去することを特徴とする請求項10ないし18のいずれか1項に記載の半導体モジュールの製造方法。
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US7977160B2 (en) * | 2009-08-10 | 2011-07-12 | GlobalFoundries, Inc. | Semiconductor devices having stress relief layers and methods for fabricating the same |
US8673689B2 (en) * | 2011-01-28 | 2014-03-18 | Marvell World Trade Ltd. | Single layer BGA substrate process |
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