JP5135246B2 - 半導体モジュールおよびその製造方法、ならびに携帯機器 - Google Patents
半導体モジュールおよびその製造方法、ならびに携帯機器 Download PDFInfo
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Description
実施形態1に係る半導体モジュールの構成について図1および図2を参照して説明する。図1は、実施形態1に係る半導体モジュールの構成を示す概略断面図である。図2は、図1の半導体モジュールの端部領域を含む部分拡大概略断面図である。
半導体モジュール1は、素子搭載用基板10と半導体素子50とを備える。
半導体基板51は、たとえばP型シリコンウエハである。半導体基板51の主表面S1側(図1の上面側)には、周知の技術により集積回路(IC)または大規模集積回路(LSI)(図示せず)などが形成されている。
実施形態1に係る半導体モジュールの製造方法について図3〜図9を参照して説明する。図3〜図9は、実施形態1に係る半導体モジュールの製造方法を示す工程断面図である。図3は、突起電極16とダミーバンプ17の形成工程を示し、図4〜図9は、突起電極16と素子電極52の接続、配線層14の形成、配線保護層18の積層、半導体モジュール1の個片化の各工程を示している。図7〜図9は、図4(A)中の点線で囲まれた領域Aの部分拡大概略断面図であり、図7(A)、(B)は図4(A)、(B)に、図8(A)〜(C)は図5(A)〜(C)に、図9(A)、(B)は図6(A)、(B)にそれぞれ対応している。
次に、上述の各実施形態に係る半導体モジュール1を備えた携帯機器について説明する。なお、携帯機器として携帯電話に搭載する例を示すが、たとえば、個人用携帯情報端末(PDA)、デジタルビデオカメラ(DVC)、及びデジタルスチルカメラ(DSC)といった電子機器であってもよい。
Claims (8)
- 絶縁樹脂層と、
前記絶縁樹脂層の一方の主表面に設けられ、外部接続領域を含む配線層と、
前記配線層と電気的に接続され、前記配線層から前記絶縁樹脂層の側に突出している突起電極と、
前記絶縁樹脂層の他方の主表面に設けられ、前記突起電極と接合された素子電極を含む半導体素子と、
前記配線層および前記絶縁樹脂層の上に、前記外部接続領域が露出するように設けられた配線保護層と、を備え、
前記配線保護層の外縁端部近傍における前記絶縁樹脂層と接する面に凹凸が設けられており、
側端面において前記絶縁樹脂層の少なくとも一部が隠れるように、前記配線保護層の外縁端部と前記半導体素子の外縁端部とが接していることを特徴とする半導体モジュール。 - 前記半導体素子は、前記素子電極が露出するように設けられた素子保護層を含み、
前記配線保護層の外縁端部と前記半導体素子の外縁端部とが接する領域よりも内側で、前記素子保護層の外縁端部の少なくとも一部を覆うように、前記絶縁樹脂層の外縁端部が前記半導体素子と接していることを特徴とする請求項1に記載の半導体モジュール。 - 前記配線保護層の外縁端部と前記半導体素子の外縁端部とは、平面視で前記半導体素子の全周にわたって接していることを特徴とする請求項1または2に記載の半導体モジュール。
- 前記半導体素子は、平面視多角形状であり、
前記半導体素子の角部において、前記配線保護層の外縁端部と前記半導体素子の外縁端部とが接していることを特徴とする請求項1または2に記載の半導体モジュール。 - 前記絶縁樹脂層の外縁端部における前記配線保護層と接する面は、断面視で曲線状であることを特徴とする請求項1乃至4のいずれか1項に記載の半導体モジュール。
- 請求項1乃至5のいずれか1項に記載の半導体モジュールを搭載したことを特徴とする携帯機器。
- 一方の主表面に突起電極が設けられ、前記一方の主表面におけるスクライブラインに対応する領域に、頂部面の幅がダイシングラインの幅よりも大きいダミーバンプが設けられた金属板を用意する工程と、
スクライブラインにより区画された複数の領域に、素子電極を含む複数の半導体素子がそれぞれ形成され、前記素子電極が露出するように素子保護層が設けられた半導体基板を用意する工程と、
前記金属板と前記半導体基板との間に絶縁樹脂層が介在する状態で前記金属板と前記半導体基板とを圧着して、前記突起電極と前記素子電極とを電気的に接続させるとともに前記素子保護層の外縁端部よりも外側で前記ダミーバンプを前記半導体基板に当接させる工程と、
前記金属板を選択的に除去して外部接続領域を含む配線層を形成するとともに前記ダミーバンプを除去する工程と、
前記配線層および前記絶縁樹脂層の上に、前記外部接続領域が露出するように配線保護層を設けるとともに前記ダミーバンプが除去された部分に配線保護層を充填して、互いに連結された複数の半導体モジュールを形成する工程と、
前記半導体基板および前記金属板を前記スクライブラインに沿って切断して前記半導体モジュールを個片化する工程と、
を含むことを特徴とする半導体モジュールの製造方法。 - 前記ダミーバンプの側面に凹凸を形成する工程を含むことを特徴とする請求項7に記載の半導体モジュールの製造方法。
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