JP2009026962A5 - - Google Patents

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Publication number
JP2009026962A5
JP2009026962A5 JP2007188664A JP2007188664A JP2009026962A5 JP 2009026962 A5 JP2009026962 A5 JP 2009026962A5 JP 2007188664 A JP2007188664 A JP 2007188664A JP 2007188664 A JP2007188664 A JP 2007188664A JP 2009026962 A5 JP2009026962 A5 JP 2009026962A5
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JP
Japan
Prior art keywords
layout
shot
substrate
surface shape
determining unit
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JP2007188664A
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English (en)
Japanese (ja)
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JP2009026962A (ja
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Priority to JP2007188664A priority Critical patent/JP2009026962A/ja
Priority claimed from JP2007188664A external-priority patent/JP2009026962A/ja
Priority to US12/174,915 priority patent/US8212990B2/en
Publication of JP2009026962A publication Critical patent/JP2009026962A/ja
Publication of JP2009026962A5 publication Critical patent/JP2009026962A5/ja
Pending legal-status Critical Current

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JP2007188664A 2007-07-19 2007-07-19 露光装置、情報処理装置及びデバイス製造方法 Pending JP2009026962A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2007188664A JP2009026962A (ja) 2007-07-19 2007-07-19 露光装置、情報処理装置及びデバイス製造方法
US12/174,915 US8212990B2 (en) 2007-07-19 2008-07-17 Exposure apparatus, information processing apparatus, and method of manufacturing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007188664A JP2009026962A (ja) 2007-07-19 2007-07-19 露光装置、情報処理装置及びデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2009026962A JP2009026962A (ja) 2009-02-05
JP2009026962A5 true JP2009026962A5 (enExample) 2010-09-02

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ID=40346176

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007188664A Pending JP2009026962A (ja) 2007-07-19 2007-07-19 露光装置、情報処理装置及びデバイス製造方法

Country Status (2)

Country Link
US (1) US8212990B2 (enExample)
JP (1) JP2009026962A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6448220B2 (ja) * 2014-05-22 2019-01-09 キヤノン株式会社 露光装置、露光方法及びデバイスの製造方法
JP6397265B2 (ja) * 2014-08-20 2018-09-26 キヤノン株式会社 リソグラフィ装置、物品の製造方法、情報処理装置及び決定方法
US20250244680A1 (en) * 2024-01-30 2025-07-31 Tokyo Electron Limited Method for selective exposure of wafer to corrective irradiation at a per-die level

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07283106A (ja) * 1994-04-07 1995-10-27 Rohm Co Ltd 露光装置及び露光方法
JP4548969B2 (ja) * 2001-04-20 2010-09-22 パナソニック株式会社 露光装置、及び露光方法
JP2003188089A (ja) * 2001-12-21 2003-07-04 Canon Inc 露光条件算出方法、露光条件算出プログラム、記録媒体、レチクルの製造方法、構造体の製造方法、装置及び露光条件算出サービス提供方法
JP2004281434A (ja) * 2003-03-12 2004-10-07 Toshiba Corp ショットマップ作成方法、露光方法、プロセッサ、半導体装置の製造方法及びプログラム
US7113256B2 (en) * 2004-02-18 2006-09-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method with feed-forward focus control
JP4177375B2 (ja) * 2005-11-30 2008-11-05 株式会社日立製作所 回路パターンの検査方法及び検査装置

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