JP2008545153A5 - - Google Patents

Download PDF

Info

Publication number
JP2008545153A5
JP2008545153A5 JP2008518844A JP2008518844A JP2008545153A5 JP 2008545153 A5 JP2008545153 A5 JP 2008545153A5 JP 2008518844 A JP2008518844 A JP 2008518844A JP 2008518844 A JP2008518844 A JP 2008518844A JP 2008545153 A5 JP2008545153 A5 JP 2008545153A5
Authority
JP
Japan
Prior art keywords
projection
exposure apparatus
sub
projection exposure
objectives
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008518844A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008545153A (ja
JP6116788B2 (ja
Filing date
Publication date
Priority claimed from DE102005030839A external-priority patent/DE102005030839A1/de
Application filed filed Critical
Publication of JP2008545153A publication Critical patent/JP2008545153A/ja
Publication of JP2008545153A5 publication Critical patent/JP2008545153A5/ja
Application granted granted Critical
Publication of JP6116788B2 publication Critical patent/JP6116788B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2008518844A 2005-07-01 2006-06-28 複数の投影対物レンズを備えた投影露光装置 Active JP6116788B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102005030839A DE102005030839A1 (de) 2005-07-01 2005-07-01 Projektionsbelichtungsanlage mit einer Mehrzahl von Projektionsobjektiven
DE102005030839.2 2005-07-01
PCT/EP2006/063663 WO2007003563A1 (de) 2005-07-01 2006-06-28 Projektionsbelichtungsanlage mit einer mehrzahl von projektionsobjektiven

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012094123A Division JP6063637B2 (ja) 2005-07-01 2012-04-17 複数の投影対物レンズを備えた投影露光装置

Publications (3)

Publication Number Publication Date
JP2008545153A JP2008545153A (ja) 2008-12-11
JP2008545153A5 true JP2008545153A5 (https=) 2009-07-09
JP6116788B2 JP6116788B2 (ja) 2017-04-19

Family

ID=36955990

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2008518844A Active JP6116788B2 (ja) 2005-07-01 2006-06-28 複数の投影対物レンズを備えた投影露光装置
JP2012094123A Expired - Fee Related JP6063637B2 (ja) 2005-07-01 2012-04-17 複数の投影対物レンズを備えた投影露光装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2012094123A Expired - Fee Related JP6063637B2 (ja) 2005-07-01 2012-04-17 複数の投影対物レンズを備えた投影露光装置

Country Status (4)

Country Link
JP (2) JP6116788B2 (https=)
KR (2) KR101407797B1 (https=)
DE (1) DE102005030839A1 (https=)
WO (1) WO2007003563A1 (https=)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2157480B1 (en) 2003-04-09 2015-05-27 Nikon Corporation Exposure method and apparatus, and device manufacturing method
TWI360158B (en) 2003-10-28 2012-03-11 Nikon Corp Projection exposure device,exposure method and dev
TWI385414B (zh) 2003-11-20 2013-02-11 尼康股份有限公司 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
TWI609410B (zh) 2004-02-06 2017-12-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
KR20140140648A (ko) 2005-05-12 2014-12-09 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
US20080165333A1 (en) * 2007-01-04 2008-07-10 Nikon Corporation Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method
US8130364B2 (en) 2007-01-04 2012-03-06 Nikon Corporation Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
WO2009050977A1 (en) 2007-10-16 2009-04-23 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
CN101681123B (zh) 2007-10-16 2013-06-12 株式会社尼康 照明光学系统、曝光装置以及元件制造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
DE102007051669A1 (de) 2007-10-26 2009-04-30 Carl Zeiss Smt Ag Abbildende Optik, Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik sowie Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
WO2009142440A2 (ko) 2008-05-20 2009-11-26 Jung Jin Ho 마스크 리스 노광장치용 광학부품
KR100952158B1 (ko) * 2008-05-20 2010-04-09 진 호 정 마스크 리스 노광장치용 마이크로프리즘 어레이
EP2282188B1 (en) 2008-05-28 2015-03-11 Nikon Corporation Illumination optical system and exposure apparatus
JP5782336B2 (ja) 2011-08-24 2015-09-24 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
CN107247388B (zh) * 2012-12-18 2018-09-18 株式会社尼康 曝光装置、器件制造系统及器件制造方法
JP6738054B2 (ja) * 2019-03-22 2020-08-12 株式会社ニコン 露光装置、並びにディスプレイ及びデバイスの製造方法
JP7623915B2 (ja) * 2021-09-14 2025-01-29 株式会社アドテックエンジニアリング 直描式露光装置

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL194844C (nl) * 1991-02-08 2003-04-03 Zeiss Carl Fa Catadioptrisch reductie-objectief.
JP3348467B2 (ja) * 1993-06-30 2002-11-20 株式会社ニコン 露光装置及び方法
JP3316710B2 (ja) * 1993-12-22 2002-08-19 株式会社ニコン 露光装置
JPH088169A (ja) * 1994-06-23 1996-01-12 Nikon Corp 露光装置
KR100381629B1 (ko) * 1994-08-16 2003-08-21 가부시키가이샤 니콘 노광장치
JPH1064807A (ja) * 1996-08-19 1998-03-06 Nikon Corp 縮小投影走査型露光装置
TW448487B (en) * 1997-11-22 2001-08-01 Nippon Kogaku Kk Exposure apparatus, exposure method and manufacturing method of device
JP2001154368A (ja) * 1999-11-29 2001-06-08 Nikon Corp 露光装置及び露光方法
JP4505666B2 (ja) * 2000-04-19 2010-07-21 株式会社ニコン 露光装置、照明装置及びマイクロデバイスの製造方法
JP2002055059A (ja) * 2000-08-10 2002-02-20 Nikon Corp 異物検査装置、露光装置、及び露光方法
JP2001201688A (ja) * 2000-12-05 2001-07-27 Nikon Corp 露光装置及び方法並びに照明装置及び方法
AU2002360329A1 (en) * 2001-10-30 2003-05-12 Optical Research Associates Structures and methods for reducing aberration in optical systems
WO2003050587A2 (de) * 2001-12-10 2003-06-19 Carl Zeiss Smt Ag Katadioptrisches reduktionsobjektiv
JP4322564B2 (ja) * 2003-06-10 2009-09-02 富士フイルム株式会社 画素位置特定方法、画像ずれ補正方法、および画像形成装置
JP4874529B2 (ja) * 2003-07-03 2012-02-15 富士フイルム株式会社 画像形成装置
JP2006047670A (ja) * 2004-08-04 2006-02-16 Nikon Corp 露光装置および露光方法

Similar Documents

Publication Publication Date Title
JP2008545153A5 (https=)
JP6063637B2 (ja) 複数の投影対物レンズを備えた投影露光装置
US20190025710A1 (en) Imaging optical system
KR101444517B1 (ko) 이미징 광학 시스템 및 이러한 타입의 이미징 광학 시스템을 구비한 마이크로리소그래피용 투영 노광 장치
JP5643755B2 (ja) 結像光学系
JP2008525831A5 (https=)
KR20030045817A (ko) 8-거울 마이크로리소그래피 투사 대물렌즈
KR20170086559A (ko) 투영 리소그라피를 위한 광학 서브시스템 및 투영 리소그라피를 위한 조명 광학 유닛
JP2014534643A5 (https=)
JP5681236B2 (ja) マイクロリソグラフィ投影露光装置のための投影対物レンズ
CN104011568A (zh) 反射镜的布置
US8068276B2 (en) Projection objective for lithography
JP5913471B2 (ja) 傾斜偏向ミラーを有する反射屈折投影対物器械、投影露光装置、投影露光方法、及びミラー
JP2005311020A (ja) 露光方法及びデバイス製造方法
JP2010020017A5 (https=)
JP6510979B2 (ja) マイクロリソグラフィ投影露光装置の光学系
US20180074278A1 (en) Method for producing a lens for a lithography apparatus, and measurement system
US8436985B2 (en) Combination stop for catoptric projection arrangement
JP2008286888A5 (https=)
WO2008108123A1 (ja) 反射屈折投影光学系、投影光学装置、及び走査型露光装置
JPH10308344A5 (https=)
JP2009038152A5 (https=)
KR20180093923A (ko) 특히 마이크로리소그래픽 투영 노광 장치용 광학 시스템
JP2008529094A5 (https=)
US20090128896A1 (en) Catadioptric projection objective with intermediate image