JP2008545153A5 - - Google Patents

Claims (30)

Each of the at least two projection objectives (20) has a projection objective for imaging one object field (50) into one image field (60, 60 ', 60 ");
The image field (60, 60 ′, 60 ″) is disposed in a substrate region (40), and the substrate region is movable relative to a plurality of projection objectives (20) in a predetermined scanning direction (S). ,
At least one of the image fields (60, 60 ′, 60 ″) has a plurality of sides extending linearly, and the normal (y1-y7) of the longest side is the scanning direction (S). A projection exposure apparatus, which is limited so as not to extend in parallel.   2. Projection exposure apparatus according to claim 1, characterized in that the angle between the normal and the scanning direction (S) is 2 [deg.] Or more, preferably 3 [deg.] Or more, and more preferably 4 [deg.] Or more.   3. An angle between at least two such normals of the various image fields is 2 ° or more, preferably 3 ° or more, and more preferably 4 ° or more with respect to the quantity. The projection exposure apparatus described.   The optical axis of all sub-systems of each projection objective in at least some of the projection objectives forms a unified optical axis of the projection objective. Projection exposure equipment.   At least some of the projection objectives have a first sub-system (210a, 220a) and at least one second sub-system (210b, 220b), where the first sub-system (210a, 220a) is a catadiometer. Projection exposure apparatus according to any one of the preceding claims, characterized in that it is a ptric subsystem and the second subsystem (210b, 220b) is a purely refractive subsystem.   6. The projection exposure apparatus according to claim 5, wherein the optical axes of the two partial systems are displaced in parallel to each other.   The intermediate image generated by the first sub-system (210a, 220a) is centered with respect to the optical axis of the second sub-system (210b, 220b). Projection exposure apparatus.   Projection exposure apparatus according to any one of the preceding claims, characterized in that the projection objectives (20) each have the same structure.   Projection exposure apparatus according to any one of the preceding claims, characterized in that adjacent projection objectives (230, 240, 250, 260) have an inverted arrangement of the optical elements of the projection objectives. .   Projection exposure apparatus according to any one of the preceding claims, characterized in that the projection objective (20) has one imaging magnification β = 1.   Projection exposure apparatus according to any one of the preceding claims, wherein at least one of the projection objectives (20) is not provided with a folding mirror.   Projection exposure apparatus according to any one of the preceding claims, wherein at least one of the projection objectives (20) generates at least one intermediate image.   13. Projection exposure apparatus according to claim 12, characterized in that at least one of the projection objectives (20) produces an odd number of intermediate images.   Projection exposure apparatus according to any one of the preceding claims, wherein at least one of the projection objectives has at least one catadioptric subsystem with at least one concave mirror.   Any of the preceding claims, wherein at least one of the projection objectives (140, 150, 160) comprises at least one ridge-type prism (141, 151, 164) or ridge-type mirror array (171-174). A projection exposure apparatus according to claim 1.   The projection exposure apparatus according to claim 1, wherein at least one of the projection objective lenses has at least one Offner type sub-system.   The projection exposure apparatus according to claim 1, wherein at least one of the projection objective lenses has at least one Dyson type subsystem.   The projection exposure apparatus according to claim 1, wherein at least one of the projection objective lenses has at least one Offner type partial system and at least one Dyson type partial system.   The first projection objective (230) has a first Offner sub-system (230a) and a second Dyson sub-system (230b) and is adjacent to the first projection objective. The projection objective (240) is adjacent to the first partial system (230a) of the first projection objective (230), the first Dyson type partial system (240a), and the first projection objective (230). The projection exposure apparatus according to claim 1, further comprising a second Offner type partial system (240 b) adjacent to the second partial system (230 b).   The first projection objective has a first Offner type sub-system and a second purely refractive sub-system, and the second projection objective adjacent to the first projection objective is the first Having a first purely refractive sub-system adjacent to the first sub-system of the projection objective and a second Offner-type sub-system adjacent to the second sub-system of the first projection objective. The projection exposure apparatus according to claim 1, wherein the projection exposure apparatus is characterized.   The first projection objective (260) has a first Dyson type sub-system (260a) and a second purely refractive sub-system (260b), and the first projection objective (260) A first purely refractive sub-system (250a) in which an adjacent second projection objective (250) is adjacent to a first sub-system (260a) of the first projection objective (260); Projection exposure apparatus according to any one of the preceding claims, characterized in that it has a second Dyson type sub-system (250b) adjacent to the second sub-system (260b) of the projection objective (260). .   The projection exposure apparatus according to claim 1, wherein at least one of the projection objectives has two Offner type partial systems, and an intermediate image is generated between the partial systems. .   The projection exposure apparatus according to claim 1, wherein at least one of the projection objectives has two Dyson type partial systems, and an intermediate image is generated between the partial systems. .   The object field (50) is arranged in a reticle area (30), the reticle area being movable relative to a plurality of projection objectives (20) in a predetermined scanning direction. The projection exposure apparatus according to any one of the above.   24. Projection exposure apparatus according to any one of the preceding claims, characterized in that the object field (50) is arranged at a fixed position relative to the plurality of projection objectives (20).   26. Projection exposure apparatus according to claim 25, characterized in that the pattern imaged by the projection objective in at least one of the object fields can be generated by a microelectromechanical system (MEMS).   27. Projection exposure apparatus according to claim 26, characterized in that the microelectromechanical system (MEMS) has at least one digital micromirror device (DMD).   28. Projection exposure apparatus according to claim 27, wherein a pattern imaged by a projection objective in each of at least one of the object fields is generated by a plurality of DMDs.   29. Projection exposure apparatus according to claim 28, characterized in that patterns generated by a plurality of DMDs are combined with one common object field.   The projection exposure apparatus according to claim 1, wherein the operating wavelength is specified to be 250 nm or less, preferably 200 nm or less, and more preferably 160 nm or less.