JP2008529094A5 - - Google Patents

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Publication number
JP2008529094A5
JP2008529094A5 JP2007553511A JP2007553511A JP2008529094A5 JP 2008529094 A5 JP2008529094 A5 JP 2008529094A5 JP 2007553511 A JP2007553511 A JP 2007553511A JP 2007553511 A JP2007553511 A JP 2007553511A JP 2008529094 A5 JP2008529094 A5 JP 2008529094A5
Authority
JP
Japan
Prior art keywords
image
projection objective
plane
reflection
image rotation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007553511A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008529094A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2006/000740 external-priority patent/WO2006081991A1/en
Publication of JP2008529094A publication Critical patent/JP2008529094A/ja
Publication of JP2008529094A5 publication Critical patent/JP2008529094A5/ja
Pending legal-status Critical Current

Links

JP2007553511A 2005-02-03 2006-01-28 中間像を有する反射屈折投影対物レンズ Pending JP2008529094A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US64914005P 2005-02-03 2005-02-03
PCT/EP2006/000740 WO2006081991A1 (en) 2005-02-03 2006-01-28 Catadioptric projection objective with intermediate image

Publications (2)

Publication Number Publication Date
JP2008529094A JP2008529094A (ja) 2008-07-31
JP2008529094A5 true JP2008529094A5 (https=) 2009-03-19

Family

ID=36096356

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007553511A Pending JP2008529094A (ja) 2005-02-03 2006-01-28 中間像を有する反射屈折投影対物レンズ

Country Status (5)

Country Link
US (1) US20090128896A1 (https=)
EP (1) EP1844365A1 (https=)
JP (1) JP2008529094A (https=)
KR (1) KR20070102533A (https=)
WO (1) WO2006081991A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011020690A2 (en) 2009-08-07 2011-02-24 Carl Zeiss Smt Gmbh Method for producing a mirror having at least two mirror surfaces, mirror of a projection exposure apparatus for microlithography, and projection exposure apparatus
DE102009037077B3 (de) 2009-08-13 2011-02-17 Carl Zeiss Smt Ag Katadioptrisches Projektionsobjektiv
US11175487B2 (en) * 2017-06-19 2021-11-16 Suss Microtec Photonic Systems Inc. Optical distortion reduction in projection systems

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4171870A (en) * 1977-05-06 1979-10-23 Bell Telephone Laboratories, Incorporated Compact image projection apparatus
US5159172A (en) * 1990-08-07 1992-10-27 International Business Machines Corporation Optical projection system
US5636066A (en) * 1993-03-12 1997-06-03 Nikon Corporation Optical apparatus
JP3635684B2 (ja) * 1994-08-23 2005-04-06 株式会社ニコン 反射屈折縮小投影光学系、反射屈折光学系、並びに投影露光方法及び装置
US5729331A (en) * 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
JP3348467B2 (ja) * 1993-06-30 2002-11-20 株式会社ニコン 露光装置及び方法
US5461455A (en) * 1993-08-23 1995-10-24 International Business Machines Corporation Optical system for the projection of patterned light onto the surfaces of three dimensional objects
JPH08181063A (ja) * 1994-12-26 1996-07-12 Nikon Corp 露光装置
JPH09289160A (ja) * 1996-04-23 1997-11-04 Nikon Corp 露光装置
DE10005189A1 (de) * 2000-02-05 2001-08-09 Zeiss Carl Projektionsbelichtungsanlage mit reflektivem Retikel
JP4245286B2 (ja) * 2000-10-23 2009-03-25 株式会社ニコン 反射屈折光学系および該光学系を備えた露光装置
JP4292497B2 (ja) * 2002-04-17 2009-07-08 株式会社ニコン 投影光学系、露光装置および露光方法
JP2003309059A (ja) * 2002-04-17 2003-10-31 Nikon Corp 投影光学系、その製造方法、露光装置および露光方法
US6757110B2 (en) * 2002-05-29 2004-06-29 Asml Holding N.V. Catadioptric lithography system and method with reticle stage orthogonal to wafer stage
US6731374B1 (en) * 2002-12-02 2004-05-04 Asml Holding N.V. Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system
KR101790914B1 (ko) * 2003-05-06 2017-10-26 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
US20050185269A1 (en) * 2003-12-19 2005-08-25 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting

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