JP2008529094A - 中間像を有する反射屈折投影対物レンズ - Google Patents

中間像を有する反射屈折投影対物レンズ Download PDF

Info

Publication number
JP2008529094A
JP2008529094A JP2007553511A JP2007553511A JP2008529094A JP 2008529094 A JP2008529094 A JP 2008529094A JP 2007553511 A JP2007553511 A JP 2007553511A JP 2007553511 A JP2007553511 A JP 2007553511A JP 2008529094 A JP2008529094 A JP 2008529094A
Authority
JP
Japan
Prior art keywords
projection objective
image
plane
intermediate image
mirrors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007553511A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008529094A5 (https=
Inventor
ドドック アウレリアン
Original Assignee
カール・ツァイス・エスエムティー・アーゲー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by カール・ツァイス・エスエムティー・アーゲー filed Critical カール・ツァイス・エスエムティー・アーゲー
Publication of JP2008529094A publication Critical patent/JP2008529094A/ja
Publication of JP2008529094A5 publication Critical patent/JP2008529094A5/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/026—Catoptric systems, e.g. image erecting and reversing system having static image erecting or reversing properties only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2007553511A 2005-02-03 2006-01-28 中間像を有する反射屈折投影対物レンズ Pending JP2008529094A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US64914005P 2005-02-03 2005-02-03
PCT/EP2006/000740 WO2006081991A1 (en) 2005-02-03 2006-01-28 Catadioptric projection objective with intermediate image

Publications (2)

Publication Number Publication Date
JP2008529094A true JP2008529094A (ja) 2008-07-31
JP2008529094A5 JP2008529094A5 (https=) 2009-03-19

Family

ID=36096356

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007553511A Pending JP2008529094A (ja) 2005-02-03 2006-01-28 中間像を有する反射屈折投影対物レンズ

Country Status (5)

Country Link
US (1) US20090128896A1 (https=)
EP (1) EP1844365A1 (https=)
JP (1) JP2008529094A (https=)
KR (1) KR20070102533A (https=)
WO (1) WO2006081991A1 (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012185503A (ja) * 2009-08-13 2012-09-27 Carl Zeiss Smt Gmbh 反射屈折投影対物系
JP2013501370A (ja) * 2009-08-07 2013-01-10 カール・ツァイス・エスエムティー・ゲーエムベーハー 少なくとも２つの鏡面を有するミラーを製造する方法、マイクロリソグラフィ用投影露光装置のミラー、及び投影露光装置
JP2022517144A (ja) * 2019-03-27 2022-03-04 ズース マイクロテック フォトニック システムズ インコーポレイテッド 投影システムにおける光学歪み低減

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4171870A (en) * 1977-05-06 1979-10-23 Bell Telephone Laboratories, Incorporated Compact image projection apparatus
JPH04251812A (ja) * 1990-08-07 1992-09-08 Internatl Business Mach Corp <Ibm> 光学装置
JPH0757986A (ja) * 1993-06-30 1995-03-03 Nikon Corp 露光装置
JPH08181063A (ja) * 1994-12-26 1996-07-12 Nikon Corp 露光装置
JPH09289160A (ja) * 1996-04-23 1997-11-04 Nikon Corp 露光装置
JP2001297980A (ja) * 2000-02-05 2001-10-26 Carl Zeiss:Fa マイクロリソグラフィーの投影露光装置
JP2004186689A (ja) * 2002-12-02 2004-07-02 Asml Holding Nv レチクルに形成されたパターンをウェハに投影させる光学システム、ウェハにイメージを形成する方法及びウェハ光学素子にイメージを形成する方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5636066A (en) * 1993-03-12 1997-06-03 Nikon Corporation Optical apparatus
JP3635684B2 (ja) * 1994-08-23 2005-04-06 株式会社ニコン 反射屈折縮小投影光学系、反射屈折光学系、並びに投影露光方法及び装置
US5729331A (en) * 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
US5461455A (en) * 1993-08-23 1995-10-24 International Business Machines Corporation Optical system for the projection of patterned light onto the surfaces of three dimensional objects
JP4245286B2 (ja) * 2000-10-23 2009-03-25 株式会社ニコン 反射屈折光学系および該光学系を備えた露光装置
JP4292497B2 (ja) * 2002-04-17 2009-07-08 株式会社ニコン 投影光学系、露光装置および露光方法
JP2003309059A (ja) * 2002-04-17 2003-10-31 Nikon Corp 投影光学系、その製造方法、露光装置および露光方法
US6757110B2 (en) * 2002-05-29 2004-06-29 Asml Holding N.V. Catadioptric lithography system and method with reticle stage orthogonal to wafer stage
KR101790914B1 (ko) * 2003-05-06 2017-10-26 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
US20050185269A1 (en) * 2003-12-19 2005-08-25 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4171870A (en) * 1977-05-06 1979-10-23 Bell Telephone Laboratories, Incorporated Compact image projection apparatus
JPH04251812A (ja) * 1990-08-07 1992-09-08 Internatl Business Mach Corp <Ibm> 光学装置
JPH0757986A (ja) * 1993-06-30 1995-03-03 Nikon Corp 露光装置
JPH08181063A (ja) * 1994-12-26 1996-07-12 Nikon Corp 露光装置
JPH09289160A (ja) * 1996-04-23 1997-11-04 Nikon Corp 露光装置
JP2001297980A (ja) * 2000-02-05 2001-10-26 Carl Zeiss:Fa マイクロリソグラフィーの投影露光装置
JP2004186689A (ja) * 2002-12-02 2004-07-02 Asml Holding Nv レチクルに形成されたパターンをウェハに投影させる光学システム、ウェハにイメージを形成する方法及びウェハ光学素子にイメージを形成する方法

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013501370A (ja) * 2009-08-07 2013-01-10 カール・ツァイス・エスエムティー・ゲーエムベーハー 少なくとも２つの鏡面を有するミラーを製造する方法、マイクロリソグラフィ用投影露光装置のミラー、及び投影露光装置
US9606339B2 (en) 2009-08-07 2017-03-28 Carl Zeiss Smt Gmbh Mirror of a projection exposure apparatus for microlithography with mirror surfaces on different mirror sides, and projection exposure apparatus
JP2012185503A (ja) * 2009-08-13 2012-09-27 Carl Zeiss Smt Gmbh 反射屈折投影対物系
US8873137B2 (en) 2009-08-13 2014-10-28 Carl Zeiss Smt Gmbh Catadioptric projection objective
US9279969B2 (en) 2009-08-13 2016-03-08 Carl Zeiss Smt Gmbh Catadioptric projection objective
US9726870B2 (en) 2009-08-13 2017-08-08 Carl Zeiss Smt Gmbh Catadioptric projection objective
US10042146B2 (en) 2009-08-13 2018-08-07 Carl Zeiss Smt Gmbh Catadioptric projection objective
JP2022517144A (ja) * 2019-03-27 2022-03-04 ズース マイクロテック フォトニック システムズ インコーポレイテッド 投影システムにおける光学歪み低減
JP7101317B2 (ja) 2019-03-27 2022-07-14 ズース マイクロテック フォトニック システムズ インコーポレイテッド 投影システムにおける光学歪み低減

Also Published As

Publication number Publication date
KR20070102533A (ko) 2007-10-18
US20090128896A1 (en) 2009-05-21
WO2006081991A1 (en) 2006-08-10
EP1844365A1 (en) 2007-10-17

Similar Documents

Publication Publication Date Title
JP4717974B2 (ja) 反射屈折光学系及び該光学系を備える投影露光装置
KR100991584B1 (ko) 반사굴절식 투영 대물렌즈
CN102207609B (zh) 反射折射投影物镜
KR101200654B1 (ko) 고 개구율 및 평평한 단부면을 가진 투사 대물렌즈
USRE38421E1 (en) Exposure apparatus having catadioptric projection optical system
US20060232867A1 (en) Catoptric objectives and systems using catoptric objectives
JP2001185480A (ja) 投影光学系及び該光学系を備える投影露光装置
US20080068705A1 (en) Projection optical system and method
KR101101493B1 (ko) 투영 대물렌즈, 투영 노광 장치 및 마이크로리소그래피용반사형 레티클
US6144495A (en) Projection light source
JP7029564B2 (ja) カタディオプトリック光学系、照明光学系、露光装置および物品製造方法
JP5165700B2 (ja) 瞳補正を有する反射屈折投影対物系
JP2008529094A (ja) 中間像を有する反射屈折投影対物レンズ
EP1936421A1 (en) Catadioptric optical system and catadioptric optical element
CN1495461A (zh) 光刻系统的照明系统中使用的中继透镜
JP2005512151A (ja) カタジオプトリック縮小対物レンズ
WO2008101676A2 (en) Catadioptric projection objective
JP5567098B2 (ja) 瞳補正を有する反射屈折投影対物系
JP2005215579A (ja) 投影光学系、露光装置、および露光方法
JP2000003851A (ja) 反射屈折投影露光装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090128

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20090128

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20090128

RD03 Notification of appointment of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7423

Effective date: 20090128

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20090204

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20110829

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110905

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20120319