JP2008522439A5 - - Google Patents

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Publication number
JP2008522439A5
JP2008522439A5 JP2007544429A JP2007544429A JP2008522439A5 JP 2008522439 A5 JP2008522439 A5 JP 2008522439A5 JP 2007544429 A JP2007544429 A JP 2007544429A JP 2007544429 A JP2007544429 A JP 2007544429A JP 2008522439 A5 JP2008522439 A5 JP 2008522439A5
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JP
Japan
Prior art keywords
pulse
tuning
center wavelength
laser light
positioning mechanism
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JP2007544429A
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English (en)
Japanese (ja)
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JP5030786B2 (ja
JP2008522439A (ja
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Priority claimed from US11/000,684 external-priority patent/US7366219B2/en
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Publication of JP2008522439A publication Critical patent/JP2008522439A/ja
Publication of JP2008522439A5 publication Critical patent/JP2008522439A5/ja
Application granted granted Critical
Publication of JP5030786B2 publication Critical patent/JP5030786B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2007544429A 2004-11-30 2005-11-28 線狭帯域化モジュール Expired - Lifetime JP5030786B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/000,684 2004-11-30
US11/000,684 US7366219B2 (en) 2004-11-30 2004-11-30 Line narrowing module
PCT/US2005/043056 WO2006060360A2 (en) 2004-11-30 2005-11-28 Line narrowing module

Publications (3)

Publication Number Publication Date
JP2008522439A JP2008522439A (ja) 2008-06-26
JP2008522439A5 true JP2008522439A5 (https=) 2009-01-22
JP5030786B2 JP5030786B2 (ja) 2012-09-19

Family

ID=36565613

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007544429A Expired - Lifetime JP5030786B2 (ja) 2004-11-30 2005-11-28 線狭帯域化モジュール

Country Status (6)

Country Link
US (4) US7366219B2 (https=)
EP (2) EP2665141B1 (https=)
JP (1) JP5030786B2 (https=)
KR (2) KR101147316B1 (https=)
TW (1) TWI281296B (https=)
WO (1) WO2006060360A2 (https=)

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US8520186B2 (en) * 2009-08-25 2013-08-27 Cymer, Llc Active spectral control of optical source
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US8837536B2 (en) 2010-04-07 2014-09-16 Cymer, Llc Method and apparatus for controlling light bandwidth
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US9207119B2 (en) 2012-04-27 2015-12-08 Cymer, Llc Active spectral control during spectrum synthesis
CN103091860B (zh) 2012-12-28 2014-12-17 中国科学院上海光学精密机械研究所 棱镜扩束器装调仪及装调方法
US9147995B2 (en) * 2013-03-15 2015-09-29 Daylight Solutions, Inc. Rapidly tunable laser source assembly with long stroke grating mover
US9715180B2 (en) 2013-06-11 2017-07-25 Cymer, Llc Wafer-based light source parameter control
US9599510B2 (en) 2014-06-04 2017-03-21 Cymer, Llc Estimation of spectral feature of pulsed light beam
WO2016075806A1 (ja) * 2014-11-14 2016-05-19 ギガフォトン株式会社 狭帯域化モジュール、狭帯域化レーザ装置、及び、狭帯域化モジュールを位置決めする方法
WO2016189722A1 (ja) 2015-05-28 2016-12-01 ギガフォトン株式会社 レーザ装置及び狭帯域化光学系
US9785050B2 (en) 2015-06-26 2017-10-10 Cymer, Llc Pulsed light beam spectral feature control
CN105186277B (zh) * 2015-07-16 2018-05-22 中国科学院光电研究院 一种光谱控制装置
US10416471B2 (en) 2016-10-17 2019-09-17 Cymer, Llc Spectral feature control apparatus
US9997888B2 (en) 2016-10-17 2018-06-12 Cymer, Llc Control of a spectral feature of a pulsed light beam
US9835959B1 (en) 2016-10-17 2017-12-05 Cymer, Llc Controlling for wafer stage vibration
US9989866B2 (en) 2016-10-17 2018-06-05 Cymer, Llc Wafer-based light source parameter control
WO2018198215A1 (ja) * 2017-04-26 2018-11-01 ギガフォトン株式会社 狭帯域化モジュール
WO2018229854A1 (ja) 2017-06-13 2018-12-20 ギガフォトン株式会社 レーザ装置及び光学素子の製造方法
US10585215B2 (en) 2017-06-29 2020-03-10 Cymer, Llc Reducing optical damage on an optical element
WO2020183644A1 (ja) 2019-03-13 2020-09-17 ギガフォトン株式会社 レーザ装置、及び電子デバイスの製造方法
US12374853B2 (en) 2019-05-22 2025-07-29 Cymer, Llc Control system for a plurality of deep ultraviolet optical oscillators
WO2021091675A1 (en) * 2019-11-07 2021-05-14 Cymer, Llc Controlling a spectral property of an output light beam produced by an optical source
US12130558B2 (en) 2019-11-08 2024-10-29 Cymer, Llc Radiation system for controlling bursts of pulses of radiation
WO2021126641A1 (en) 2019-12-20 2021-06-24 Cymer, Llc Directed gas purge to reduce dusting of excimer discharge chamber windows
US12332569B2 (en) 2019-12-23 2025-06-17 Cymer, Llc Metrology for improving DUV laser alignment
CN114868313A (zh) 2019-12-23 2022-08-05 西默有限公司 激光放电腔内金属氟化物粉尘捕集用填充床过滤器
CN115039031B (zh) * 2020-03-19 2025-07-22 极光先进雷射株式会社 窄带化装置和电子器件的制造方法
US11329722B2 (en) 2020-03-27 2022-05-10 Relative Dynamics Incorporated Optical terminals
WO2021252103A1 (en) 2020-06-09 2021-12-16 Cymer, Llc Systems and methods for controlling a center wavelength
WO2022125289A1 (en) * 2020-12-10 2022-06-16 Cymer, Llc Multifocal imaging with increased wavelength separation
US20240006838A1 (en) 2020-12-16 2024-01-04 Cymer, Llc Apparatus for and method of modulating a wavelength of an excimer laser as a function of its repetition frequency
WO2025133752A1 (en) * 2023-12-21 2025-06-26 Cymer, Llc Apparatus for and method of wavelength control for multifocal imaging

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