JP2008522439A5 - - Google Patents

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Publication number
JP2008522439A5
JP2008522439A5 JP2007544429A JP2007544429A JP2008522439A5 JP 2008522439 A5 JP2008522439 A5 JP 2008522439A5 JP 2007544429 A JP2007544429 A JP 2007544429A JP 2007544429 A JP2007544429 A JP 2007544429A JP 2008522439 A5 JP2008522439 A5 JP 2008522439A5
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JP
Japan
Prior art keywords
pulse
tuning
center wavelength
laser light
positioning mechanism
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JP2007544429A
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English (en)
Japanese (ja)
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JP5030786B2 (ja
JP2008522439A (ja
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Priority claimed from US11/000,684 external-priority patent/US7366219B2/en
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Publication of JP2008522439A publication Critical patent/JP2008522439A/ja
Publication of JP2008522439A5 publication Critical patent/JP2008522439A5/ja
Application granted granted Critical
Publication of JP5030786B2 publication Critical patent/JP5030786B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2007544429A 2004-11-30 2005-11-28 線狭帯域化モジュール Expired - Lifetime JP5030786B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/000,684 2004-11-30
US11/000,684 US7366219B2 (en) 2004-11-30 2004-11-30 Line narrowing module
PCT/US2005/043056 WO2006060360A2 (en) 2004-11-30 2005-11-28 Line narrowing module

Publications (3)

Publication Number Publication Date
JP2008522439A JP2008522439A (ja) 2008-06-26
JP2008522439A5 true JP2008522439A5 (https=) 2009-01-22
JP5030786B2 JP5030786B2 (ja) 2012-09-19

Family

ID=36565613

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007544429A Expired - Lifetime JP5030786B2 (ja) 2004-11-30 2005-11-28 線狭帯域化モジュール

Country Status (6)

Country Link
US (4) US7366219B2 (https=)
EP (2) EP1831974B1 (https=)
JP (1) JP5030786B2 (https=)
KR (2) KR101147316B1 (https=)
TW (1) TWI281296B (https=)
WO (1) WO2006060360A2 (https=)

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US9715180B2 (en) 2013-06-11 2017-07-25 Cymer, Llc Wafer-based light source parameter control
US9599510B2 (en) 2014-06-04 2017-03-21 Cymer, Llc Estimation of spectral feature of pulsed light beam
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WO2016189722A1 (ja) 2015-05-28 2016-12-01 ギガフォトン株式会社 レーザ装置及び狭帯域化光学系
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US10585215B2 (en) 2017-06-29 2020-03-10 Cymer, Llc Reducing optical damage on an optical element
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WO2020236648A1 (en) 2019-05-22 2020-11-26 Cymer, Llc Control system for a plurality of deep ultraviolet optical oscillators
WO2021091675A1 (en) * 2019-11-07 2021-05-14 Cymer, Llc Controlling a spectral property of an output light beam produced by an optical source
KR102774317B1 (ko) 2019-11-08 2025-02-26 사이머 엘엘씨 방사선의 펄스의 버스트를 제어하기 위한 방사선 시스템
CN114868312B (zh) 2019-12-20 2026-01-06 西默有限公司 用于减少准分子放电室窗口积尘的定向气体吹扫
KR102691181B1 (ko) 2019-12-23 2024-08-05 사이머 엘엘씨 Duv 레이저 정렬을 개선하기 위한 계측법
WO2021133568A1 (en) 2019-12-23 2021-07-01 Cymer, Llc Packed-bed filter for metal fluoride dust trapping in laser discharge chambers
CN115039031B (zh) * 2020-03-19 2025-07-22 极光先进雷射株式会社 窄带化装置和电子器件的制造方法
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KR102767748B1 (ko) * 2020-06-09 2025-02-13 사이머 엘엘씨 중심 파장 제어를 위한 시스템 및 방법
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WO2025133752A1 (en) * 2023-12-21 2025-06-26 Cymer, Llc Apparatus for and method of wavelength control for multifocal imaging

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