JP2008527683A5 - - Google Patents

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Publication number
JP2008527683A5
JP2008527683A5 JP2007544430A JP2007544430A JP2008527683A5 JP 2008527683 A5 JP2008527683 A5 JP 2008527683A5 JP 2007544430 A JP2007544430 A JP 2007544430A JP 2007544430 A JP2007544430 A JP 2007544430A JP 2008527683 A5 JP2008527683 A5 JP 2008527683A5
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JP
Japan
Prior art keywords
bandwidth
attenuation
functions
time constant
laser system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007544430A
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English (en)
Japanese (ja)
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JP2008527683A (ja
JP5265921B2 (ja
Filing date
Publication date
Priority claimed from US11/000,571 external-priority patent/US20060114956A1/en
Priority claimed from US11/254,282 external-priority patent/US7643522B2/en
Application filed filed Critical
Publication of JP2008527683A publication Critical patent/JP2008527683A/ja
Publication of JP2008527683A5 publication Critical patent/JP2008527683A5/ja
Application granted granted Critical
Publication of JP5265921B2 publication Critical patent/JP5265921B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2007544430A 2004-11-30 2005-11-28 ガス放電レーザ帯域幅及び中心波長制御の方法及び機器 Expired - Fee Related JP5265921B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US11/000,571 2004-11-30
US11/000,571 US20060114956A1 (en) 2004-11-30 2004-11-30 High power high pulse repetition rate gas discharge laser system bandwidth management
US11/254,282 2005-10-20
US11/254,282 US7643522B2 (en) 2004-11-30 2005-10-20 Method and apparatus for gas discharge laser bandwidth and center wavelength control
PCT/US2005/043059 WO2006060361A2 (en) 2004-11-30 2005-11-28 Method and apparatus for gas discharge laser bandwidth and center wavelength control

Publications (3)

Publication Number Publication Date
JP2008527683A JP2008527683A (ja) 2008-07-24
JP2008527683A5 true JP2008527683A5 (https=) 2009-01-22
JP5265921B2 JP5265921B2 (ja) 2013-08-14

Family

ID=36565614

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007544430A Expired - Fee Related JP5265921B2 (ja) 2004-11-30 2005-11-28 ガス放電レーザ帯域幅及び中心波長制御の方法及び機器

Country Status (4)

Country Link
US (1) US7643522B2 (https=)
JP (1) JP5265921B2 (https=)
TW (1) TWI283093B (https=)
WO (1) WO2006060361A2 (https=)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7778302B2 (en) * 2005-11-01 2010-08-17 Cymer, Inc. Laser system
US7746913B2 (en) 2005-11-01 2010-06-29 Cymer, Inc. Laser system
US7885309B2 (en) 2005-11-01 2011-02-08 Cymer, Inc. Laser system
US7630424B2 (en) * 2005-11-01 2009-12-08 Cymer, Inc. Laser system
KR101194231B1 (ko) * 2005-11-01 2012-10-29 사이머 인코포레이티드 레이저 시스템
US7920616B2 (en) * 2005-11-01 2011-04-05 Cymer, Inc. Laser system
US7643529B2 (en) 2005-11-01 2010-01-05 Cymer, Inc. Laser system
US7999915B2 (en) * 2005-11-01 2011-08-16 Cymer, Inc. Laser system
US7715459B2 (en) * 2005-11-01 2010-05-11 Cymer, Inc. Laser system
US20090296755A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US20090296758A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US7852889B2 (en) * 2006-02-17 2010-12-14 Cymer, Inc. Active spectral control of DUV light source
US7822084B2 (en) * 2006-02-17 2010-10-26 Cymer, Inc. Method and apparatus for stabilizing and tuning the bandwidth of laser light
US8259764B2 (en) 2006-06-21 2012-09-04 Cymer, Inc. Bandwidth control device
JP5114767B2 (ja) * 2006-10-10 2013-01-09 株式会社小松製作所 狭帯域化レーザのスペクトル幅調整装置
US7659529B2 (en) * 2007-04-13 2010-02-09 Cymer, Inc. Method and apparatus for vibration reduction in laser system line narrowing unit wavelength selection optical element
US8144739B2 (en) * 2008-10-24 2012-03-27 Cymer, Inc. System method and apparatus for selecting and controlling light source bandwidth
US8837536B2 (en) * 2010-04-07 2014-09-16 Cymer, Llc Method and apparatus for controlling light bandwidth
JP5755068B2 (ja) * 2011-07-27 2015-07-29 株式会社小松製作所 狭帯域化レーザのスペクトル幅調整装置
JP6113426B2 (ja) 2011-09-08 2017-04-12 ギガフォトン株式会社 マスタオシレータシステムおよびレーザ装置
JP5832581B2 (ja) * 2014-04-28 2015-12-16 株式会社小松製作所 狭帯域化レーザのスペクトル幅調整装置
US10816905B2 (en) * 2015-04-08 2020-10-27 Cymer, Llc Wavelength stabilization for an optical source
CN107851958B (zh) 2015-08-07 2021-01-12 极光先进雷射株式会社 窄带化激光装置
CN108475896B (zh) * 2016-02-02 2020-12-11 极光先进雷射株式会社 窄带化激光装置
JP7150711B2 (ja) * 2017-06-12 2022-10-11 ギガフォトン株式会社 レーザ装置、及びレーザ装置管理システム、並びにレーザ装置の管理方法
WO2020236648A1 (en) 2019-05-22 2020-11-26 Cymer, Llc Control system for a plurality of deep ultraviolet optical oscillators
CN115485625B (zh) * 2020-05-20 2025-12-16 极光先进雷射株式会社 窄带化气体激光装置、波长控制方法和电子器件的制造方法
KR102767748B1 (ko) * 2020-06-09 2025-02-13 사이머 엘엘씨 중심 파장 제어를 위한 시스템 및 방법
JP7841957B2 (ja) 2022-06-16 2026-04-07 ギガフォトン株式会社 Ｅｕｖ光生成システム、及び電子デバイスの製造方法

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5095492A (en) * 1990-07-17 1992-03-10 Cymer Laser Technologies Spectral narrowing technique
US5898725A (en) * 1997-01-21 1999-04-27 Cymer, Inc. Excimer laser with greater spectral bandwidth and beam stability
US5982800A (en) * 1997-04-23 1999-11-09 Cymer, Inc. Narrow band excimer laser
JP4102457B2 (ja) * 1997-05-09 2008-06-18 株式会社小松製作所 狭帯域化レーザ装置
US5852627A (en) * 1997-09-10 1998-12-22 Cymer, Inc. Laser with line narrowing output coupler
US6028879A (en) * 1997-06-04 2000-02-22 Cymer, Inc. Narrow band laser with etalon based output coupler
JP3717020B2 (ja) * 1997-06-30 2005-11-16 株式会社小松製作所 反射型波長選択素子の曲げ機構
US6094448A (en) * 1997-07-01 2000-07-25 Cymer, Inc. Grating assembly with bi-directional bandwidth control
US6212217B1 (en) * 1997-07-01 2001-04-03 Cymer, Inc. Smart laser with automated beam quality control
AU7821898A (en) * 1997-07-01 1999-01-25 Cymer, Inc. Very narrow band laser with unstable resonance cavity
US6192064B1 (en) * 1997-07-01 2001-02-20 Cymer, Inc. Narrow band laser with fine wavelength control
USRE38054E1 (en) * 1997-07-18 2003-04-01 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate F2 laser
US5978409A (en) * 1998-09-28 1999-11-02 Cymer, Inc. Line narrowing apparatus with high transparency prism beam expander
US6317447B1 (en) * 2000-01-25 2001-11-13 Cymer, Inc. Electric discharge laser with acoustic chirp correction
US6721340B1 (en) * 1997-07-22 2004-04-13 Cymer, Inc. Bandwidth control technique for a laser
US6671294B2 (en) * 1997-07-22 2003-12-30 Cymer, Inc. Laser spectral engineering for lithographic process
US6078599A (en) * 1997-07-22 2000-06-20 Cymer, Inc. Wavelength shift correction technique for a laser
US6621846B1 (en) * 1997-07-22 2003-09-16 Cymer, Inc. Electric discharge laser with active wavelength chirp correction
US6529531B1 (en) * 1997-07-22 2003-03-04 Cymer, Inc. Fast wavelength correction technique for a laser
US6853653B2 (en) * 1997-07-22 2005-02-08 Cymer, Inc. Laser spectral engineering for lithographic process
US6141081A (en) * 1997-08-08 2000-10-31 Cymer, Inc. Stepper or scanner having two energy monitors for a laser
US6163559A (en) * 1998-06-22 2000-12-19 Cymer, Inc. Beam expander for ultraviolet lasers
US6567450B2 (en) * 1999-12-10 2003-05-20 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6493374B1 (en) * 1999-09-03 2002-12-10 Cymer, Inc. Smart laser with fast deformable grating
US6965624B2 (en) * 1999-03-17 2005-11-15 Lambda Physik Ag Laser gas replenishment method
US6625191B2 (en) * 1999-12-10 2003-09-23 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6034978A (en) * 1999-05-12 2000-03-07 Cymer, Inc. Gas discharge laser with gas temperature control
US6496528B2 (en) * 1999-09-03 2002-12-17 Cymer, Inc. Line narrowing unit with flexural grating mount
US6532247B2 (en) * 2000-02-09 2003-03-11 Cymer, Inc. Laser wavelength control unit with piezoelectric driver
WO2001047074A1 (en) * 1999-12-22 2001-06-28 Cymer, Inc. Line narrowed laser with bidirection beam expansion
US6650666B2 (en) * 2000-02-09 2003-11-18 Cymer, Inc. Laser wavelength control unit with piezoelectric driver
US6408260B1 (en) * 2000-02-16 2002-06-18 Cymer, Inc. Laser lithography quality alarm system
US6738406B2 (en) * 2000-06-19 2004-05-18 Lambda Physik Ag Precision measurement of wavelengths emitted by a molecular fluorine laser at 157nm
US6690704B2 (en) * 2001-04-09 2004-02-10 Cymer, Inc. Control system for a two chamber gas discharge laser
US6760358B1 (en) * 2001-06-07 2004-07-06 Lambda Physik Ag Line-narrowing optics module having improved mechanical performance
US6735225B2 (en) * 2001-06-07 2004-05-11 Lambda Physik Ag Chirp compensation method and apparatus

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