JP2008522438A5 - - Google Patents

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Publication number
JP2008522438A5
JP2008522438A5 JP2007544428A JP2007544428A JP2008522438A5 JP 2008522438 A5 JP2008522438 A5 JP 2008522438A5 JP 2007544428 A JP2007544428 A JP 2007544428A JP 2007544428 A JP2007544428 A JP 2007544428A JP 2008522438 A5 JP2008522438 A5 JP 2008522438A5
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JP
Japan
Prior art keywords
curvature
dispersion
pulse
change
burst
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2007544428A
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English (en)
Japanese (ja)
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JP2008522438A (ja
JP5530067B2 (ja
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Publication date
Priority claimed from US11/000,571 external-priority patent/US20060114956A1/en
Application filed filed Critical
Publication of JP2008522438A publication Critical patent/JP2008522438A/ja
Publication of JP2008522438A5 publication Critical patent/JP2008522438A5/ja
Application granted granted Critical
Publication of JP5530067B2 publication Critical patent/JP5530067B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2007544428A 2004-11-30 2005-11-28 高出力高パルス繰り返し率ガス放電レーザシステムの帯域幅管理 Expired - Fee Related JP5530067B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/000,571 US20060114956A1 (en) 2004-11-30 2004-11-30 High power high pulse repetition rate gas discharge laser system bandwidth management
US11/000,571 2004-11-30
PCT/US2005/043055 WO2006060359A2 (en) 2004-11-30 2005-11-28 High power high pulse repetition rate gas discharge laser system bandwidth management

Publications (3)

Publication Number Publication Date
JP2008522438A JP2008522438A (ja) 2008-06-26
JP2008522438A5 true JP2008522438A5 (https=) 2012-01-26
JP5530067B2 JP5530067B2 (ja) 2014-06-25

Family

ID=36565612

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007544428A Expired - Fee Related JP5530067B2 (ja) 2004-11-30 2005-11-28 高出力高パルス繰り返し率ガス放電レーザシステムの帯域幅管理

Country Status (4)

Country Link
US (2) US20060114956A1 (https=)
JP (1) JP5530067B2 (https=)
TW (1) TWI271903B (https=)
WO (1) WO2006060359A2 (https=)

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US7852889B2 (en) * 2006-02-17 2010-12-14 Cymer, Inc. Active spectral control of DUV light source
US8259764B2 (en) 2006-06-21 2012-09-04 Cymer, Inc. Bandwidth control device
US7659529B2 (en) * 2007-04-13 2010-02-09 Cymer, Inc. Method and apparatus for vibration reduction in laser system line narrowing unit wavelength selection optical element
US8116341B2 (en) * 2007-05-31 2012-02-14 Electro Scientific Industries, Inc. Multiple laser wavelength and pulse width process drilling
US8144739B2 (en) * 2008-10-24 2012-03-27 Cymer, Inc. System method and apparatus for selecting and controlling light source bandwidth
US8138487B2 (en) * 2009-04-09 2012-03-20 Cymer, Inc. System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber
US8520186B2 (en) * 2009-08-25 2013-08-27 Cymer, Llc Active spectral control of optical source
US8837536B2 (en) * 2010-04-07 2014-09-16 Cymer, Llc Method and apparatus for controlling light bandwidth
DK2565994T3 (en) 2011-09-05 2014-03-10 Alltec Angewandte Laserlicht Technologie Gmbh Laser device and method for marking an object
DK2565996T3 (da) 2011-09-05 2014-01-13 Alltec Angewandte Laserlicht Technologie Gmbh Laserindretning med en laserenhed og en fluidbeholder til en køleindretning af laserenheden
DK2564973T3 (en) * 2011-09-05 2015-01-12 Alltec Angewandte Laserlicht Technologie Ges Mit Beschränkter Haftung Marking apparatus having a plurality of lasers and a kombineringsafbøjningsindretning
ES2544269T3 (es) * 2011-09-05 2015-08-28 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Aparato de marcado con una pluralidad de láseres de gas con tubos de resonancia y medios de deflexión ajustables individualmente
EP2564976B1 (en) 2011-09-05 2015-06-10 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Marking apparatus with at least one gas laser and heat dissipator
ES2438751T3 (es) 2011-09-05 2014-01-20 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Dispositivo y procedimiento para marcar un objeto por medio de un rayo láser
ES2530070T3 (es) * 2011-09-05 2015-02-26 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Aparato de marcado con una pluralidad de láseres y conjuntos ajustables individualmente de medios de desviación
EP2564972B1 (en) * 2011-09-05 2015-08-26 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Marking apparatus with a plurality of lasers, deflection means and telescopic means for each laser beam
US9207119B2 (en) * 2012-04-27 2015-12-08 Cymer, Llc Active spectral control during spectrum synthesis
US9715180B2 (en) 2013-06-11 2017-07-25 Cymer, Llc Wafer-based light source parameter control
US9785050B2 (en) 2015-06-26 2017-10-10 Cymer, Llc Pulsed light beam spectral feature control
US9835959B1 (en) 2016-10-17 2017-12-05 Cymer, Llc Controlling for wafer stage vibration
US9989866B2 (en) 2016-10-17 2018-06-05 Cymer, Llc Wafer-based light source parameter control
US10416471B2 (en) 2016-10-17 2019-09-17 Cymer, Llc Spectral feature control apparatus
US9997888B2 (en) 2016-10-17 2018-06-12 Cymer, Llc Control of a spectral feature of a pulsed light beam
WO2019190700A1 (en) * 2018-03-30 2019-10-03 Cymer, Llc Spectral feature selection and pulse timing control of a pulsed light beam
US11329722B2 (en) 2020-03-27 2022-05-10 Relative Dynamics Incorporated Optical terminals

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