JP5530067B2 - 高出力高パルス繰り返し率ガス放電レーザシステムの帯域幅管理 - Google Patents

高出力高パルス繰り返し率ガス放電レーザシステムの帯域幅管理 Download PDF

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JP5530067B2
JP5530067B2 JP2007544428A JP2007544428A JP5530067B2 JP 5530067 B2 JP5530067 B2 JP 5530067B2 JP 2007544428 A JP2007544428 A JP 2007544428A JP 2007544428 A JP2007544428 A JP 2007544428A JP 5530067 B2 JP5530067 B2 JP 5530067B2
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curvature
dispersion
pulse
bandwidth
change
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JP2008522438A5 (https=
JP2008522438A (ja
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リチャード エル サンドストロム
ウィリアム エヌ パートロ
ダニエル ジェイ ダブリュー ブラウン
ジェイ マーティン アルゴッツ
フェドー ビー トリントチョーク
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サイマー インコーポレイテッド
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
    • H01S3/08009—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection using a diffraction grating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
    • H01S3/1055—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08018—Mode suppression
    • H01S3/08022—Longitudinal modes
    • H01S3/08031—Single-mode emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08059—Constructional details of the reflector, e.g. shape

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
JP2007544428A 2004-11-30 2005-11-28 高出力高パルス繰り返し率ガス放電レーザシステムの帯域幅管理 Expired - Fee Related JP5530067B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/000,571 US20060114956A1 (en) 2004-11-30 2004-11-30 High power high pulse repetition rate gas discharge laser system bandwidth management
US11/000,571 2004-11-30
PCT/US2005/043055 WO2006060359A2 (en) 2004-11-30 2005-11-28 High power high pulse repetition rate gas discharge laser system bandwidth management

Publications (3)

Publication Number Publication Date
JP2008522438A JP2008522438A (ja) 2008-06-26
JP2008522438A5 JP2008522438A5 (https=) 2012-01-26
JP5530067B2 true JP5530067B2 (ja) 2014-06-25

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Family Applications (1)

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JP2007544428A Expired - Fee Related JP5530067B2 (ja) 2004-11-30 2005-11-28 高出力高パルス繰り返し率ガス放電レーザシステムの帯域幅管理

Country Status (4)

Country Link
US (2) US20060114956A1 (https=)
JP (1) JP5530067B2 (https=)
TW (1) TWI271903B (https=)
WO (1) WO2006060359A2 (https=)

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US7852889B2 (en) * 2006-02-17 2010-12-14 Cymer, Inc. Active spectral control of DUV light source
US8259764B2 (en) 2006-06-21 2012-09-04 Cymer, Inc. Bandwidth control device
US7659529B2 (en) * 2007-04-13 2010-02-09 Cymer, Inc. Method and apparatus for vibration reduction in laser system line narrowing unit wavelength selection optical element
US8116341B2 (en) * 2007-05-31 2012-02-14 Electro Scientific Industries, Inc. Multiple laser wavelength and pulse width process drilling
US8144739B2 (en) * 2008-10-24 2012-03-27 Cymer, Inc. System method and apparatus for selecting and controlling light source bandwidth
US8138487B2 (en) * 2009-04-09 2012-03-20 Cymer, Inc. System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber
US8520186B2 (en) * 2009-08-25 2013-08-27 Cymer, Llc Active spectral control of optical source
US8837536B2 (en) * 2010-04-07 2014-09-16 Cymer, Llc Method and apparatus for controlling light bandwidth
DK2565994T3 (en) 2011-09-05 2014-03-10 Alltec Angewandte Laserlicht Technologie Gmbh Laser device and method for marking an object
DK2565996T3 (da) 2011-09-05 2014-01-13 Alltec Angewandte Laserlicht Technologie Gmbh Laserindretning med en laserenhed og en fluidbeholder til en køleindretning af laserenheden
DK2564973T3 (en) * 2011-09-05 2015-01-12 Alltec Angewandte Laserlicht Technologie Ges Mit Beschränkter Haftung Marking apparatus having a plurality of lasers and a kombineringsafbøjningsindretning
ES2544269T3 (es) * 2011-09-05 2015-08-28 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Aparato de marcado con una pluralidad de láseres de gas con tubos de resonancia y medios de deflexión ajustables individualmente
EP2564976B1 (en) 2011-09-05 2015-06-10 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Marking apparatus with at least one gas laser and heat dissipator
ES2438751T3 (es) 2011-09-05 2014-01-20 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Dispositivo y procedimiento para marcar un objeto por medio de un rayo láser
ES2530070T3 (es) * 2011-09-05 2015-02-26 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Aparato de marcado con una pluralidad de láseres y conjuntos ajustables individualmente de medios de desviación
EP2564972B1 (en) * 2011-09-05 2015-08-26 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Marking apparatus with a plurality of lasers, deflection means and telescopic means for each laser beam
US9207119B2 (en) * 2012-04-27 2015-12-08 Cymer, Llc Active spectral control during spectrum synthesis
US9715180B2 (en) 2013-06-11 2017-07-25 Cymer, Llc Wafer-based light source parameter control
US9785050B2 (en) 2015-06-26 2017-10-10 Cymer, Llc Pulsed light beam spectral feature control
US9835959B1 (en) 2016-10-17 2017-12-05 Cymer, Llc Controlling for wafer stage vibration
US9989866B2 (en) 2016-10-17 2018-06-05 Cymer, Llc Wafer-based light source parameter control
US10416471B2 (en) 2016-10-17 2019-09-17 Cymer, Llc Spectral feature control apparatus
US9997888B2 (en) 2016-10-17 2018-06-12 Cymer, Llc Control of a spectral feature of a pulsed light beam
WO2019190700A1 (en) * 2018-03-30 2019-10-03 Cymer, Llc Spectral feature selection and pulse timing control of a pulsed light beam
US11329722B2 (en) 2020-03-27 2022-05-10 Relative Dynamics Incorporated Optical terminals

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Also Published As

Publication number Publication date
WO2006060359A3 (en) 2009-04-16
JP2008522438A (ja) 2008-06-26
US20110122901A1 (en) 2011-05-26
TW200627737A (en) 2006-08-01
US20060114956A1 (en) 2006-06-01
WO2006060359A2 (en) 2006-06-08
TWI271903B (en) 2007-01-21

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