KR101147316B1 - 라인 내로우잉 모듈 - Google Patents

라인 내로우잉 모듈 Download PDF

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Publication number
KR101147316B1
KR101147316B1 KR1020077012317A KR20077012317A KR101147316B1 KR 101147316 B1 KR101147316 B1 KR 101147316B1 KR 1020077012317 A KR1020077012317 A KR 1020077012317A KR 20077012317 A KR20077012317 A KR 20077012317A KR 101147316 B1 KR101147316 B1 KR 101147316B1
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South Korea
Prior art keywords
delete delete
pulse
laser light
angle
center wavelength
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Expired - Lifetime
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KR1020077012317A
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English (en)
Korean (ko)
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KR20070084624A (ko
Inventor
마틴 제이. 알고트스
로버트 에이. 버그스테트
월터 디. 글레스피
블라디미르 에이. 쿨게이코
윌리엄 엔. 파틀로
게르만 이. 라일로프
리차드 엘. 샌드스트롬
브라이언 디. 스트레이트
디모티 에스. 다이어
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사이머 인코포레이티드
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
    • H01S3/1055—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08059—Constructional details of the reflector, e.g. shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H01S3/2251—ArF, i.e. argon fluoride is comprised for lasing around 193 nm

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
KR1020077012317A 2004-11-30 2005-11-28 라인 내로우잉 모듈 Expired - Lifetime KR101147316B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/000,684 2004-11-30
US11/000,684 US7366219B2 (en) 2004-11-30 2004-11-30 Line narrowing module
PCT/US2005/043056 WO2006060360A2 (en) 2004-11-30 2005-11-28 Line narrowing module

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020127002413A Division KR101235047B1 (ko) 2004-11-30 2005-11-28 라인 내로우잉 모듈

Publications (2)

Publication Number Publication Date
KR20070084624A KR20070084624A (ko) 2007-08-24
KR101147316B1 true KR101147316B1 (ko) 2012-05-18

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KR1020077012317A Expired - Lifetime KR101147316B1 (ko) 2004-11-30 2005-11-28 라인 내로우잉 모듈
KR1020127002413A Expired - Lifetime KR101235047B1 (ko) 2004-11-30 2005-11-28 라인 내로우잉 모듈

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Country Status (6)

Country Link
US (4) US7366219B2 (https=)
EP (2) EP2665141B1 (https=)
JP (1) JP5030786B2 (https=)
KR (2) KR101147316B1 (https=)
TW (1) TWI281296B (https=)
WO (1) WO2006060360A2 (https=)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8379687B2 (en) * 2005-06-30 2013-02-19 Cymer, Inc. Gas discharge laser line narrowing module
US8259764B2 (en) * 2006-06-21 2012-09-04 Cymer, Inc. Bandwidth control device
US7659529B2 (en) * 2007-04-13 2010-02-09 Cymer, Inc. Method and apparatus for vibration reduction in laser system line narrowing unit wavelength selection optical element
US8144739B2 (en) * 2008-10-24 2012-03-27 Cymer, Inc. System method and apparatus for selecting and controlling light source bandwidth
USRE45957E1 (en) 2009-03-27 2016-03-29 Cymer, Llc Regenerative ring resonator
US8014432B2 (en) * 2009-03-27 2011-09-06 Cymer, Inc. Regenerative ring resonator
US8520186B2 (en) * 2009-08-25 2013-08-27 Cymer, Llc Active spectral control of optical source
US8254420B2 (en) * 2009-11-18 2012-08-28 Cymer, Inc. Advanced laser wavelength control
US8837536B2 (en) 2010-04-07 2014-09-16 Cymer, Llc Method and apparatus for controlling light bandwidth
JP2013070029A (ja) * 2011-09-08 2013-04-18 Gigaphoton Inc マスタオシレータシステムおよびレーザ装置
US9207119B2 (en) 2012-04-27 2015-12-08 Cymer, Llc Active spectral control during spectrum synthesis
CN103091860B (zh) 2012-12-28 2014-12-17 中国科学院上海光学精密机械研究所 棱镜扩束器装调仪及装调方法
US9147995B2 (en) * 2013-03-15 2015-09-29 Daylight Solutions, Inc. Rapidly tunable laser source assembly with long stroke grating mover
US9715180B2 (en) 2013-06-11 2017-07-25 Cymer, Llc Wafer-based light source parameter control
US9599510B2 (en) 2014-06-04 2017-03-21 Cymer, Llc Estimation of spectral feature of pulsed light beam
WO2016075806A1 (ja) * 2014-11-14 2016-05-19 ギガフォトン株式会社 狭帯域化モジュール、狭帯域化レーザ装置、及び、狭帯域化モジュールを位置決めする方法
WO2016189722A1 (ja) 2015-05-28 2016-12-01 ギガフォトン株式会社 レーザ装置及び狭帯域化光学系
US9785050B2 (en) 2015-06-26 2017-10-10 Cymer, Llc Pulsed light beam spectral feature control
CN105186277B (zh) * 2015-07-16 2018-05-22 中国科学院光电研究院 一种光谱控制装置
US10416471B2 (en) 2016-10-17 2019-09-17 Cymer, Llc Spectral feature control apparatus
US9997888B2 (en) 2016-10-17 2018-06-12 Cymer, Llc Control of a spectral feature of a pulsed light beam
US9835959B1 (en) 2016-10-17 2017-12-05 Cymer, Llc Controlling for wafer stage vibration
US9989866B2 (en) 2016-10-17 2018-06-05 Cymer, Llc Wafer-based light source parameter control
WO2018198215A1 (ja) * 2017-04-26 2018-11-01 ギガフォトン株式会社 狭帯域化モジュール
WO2018229854A1 (ja) 2017-06-13 2018-12-20 ギガフォトン株式会社 レーザ装置及び光学素子の製造方法
US10585215B2 (en) 2017-06-29 2020-03-10 Cymer, Llc Reducing optical damage on an optical element
WO2020183644A1 (ja) 2019-03-13 2020-09-17 ギガフォトン株式会社 レーザ装置、及び電子デバイスの製造方法
US12374853B2 (en) 2019-05-22 2025-07-29 Cymer, Llc Control system for a plurality of deep ultraviolet optical oscillators
WO2021091675A1 (en) * 2019-11-07 2021-05-14 Cymer, Llc Controlling a spectral property of an output light beam produced by an optical source
US12130558B2 (en) 2019-11-08 2024-10-29 Cymer, Llc Radiation system for controlling bursts of pulses of radiation
WO2021126641A1 (en) 2019-12-20 2021-06-24 Cymer, Llc Directed gas purge to reduce dusting of excimer discharge chamber windows
US12332569B2 (en) 2019-12-23 2025-06-17 Cymer, Llc Metrology for improving DUV laser alignment
CN114868313A (zh) 2019-12-23 2022-08-05 西默有限公司 激光放电腔内金属氟化物粉尘捕集用填充床过滤器
CN115039031B (zh) * 2020-03-19 2025-07-22 极光先进雷射株式会社 窄带化装置和电子器件的制造方法
US11329722B2 (en) 2020-03-27 2022-05-10 Relative Dynamics Incorporated Optical terminals
WO2021252103A1 (en) 2020-06-09 2021-12-16 Cymer, Llc Systems and methods for controlling a center wavelength
WO2022125289A1 (en) * 2020-12-10 2022-06-16 Cymer, Llc Multifocal imaging with increased wavelength separation
US20240006838A1 (en) 2020-12-16 2024-01-04 Cymer, Llc Apparatus for and method of modulating a wavelength of an excimer laser as a function of its repetition frequency
WO2025133752A1 (en) * 2023-12-21 2025-06-26 Cymer, Llc Apparatus for and method of wavelength control for multifocal imaging

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000294864A (ja) 1999-02-11 2000-10-20 Cymer Inc 自動ビーム品質制御を備えたスマートレーザ
US20030107317A1 (en) 2001-12-11 2003-06-12 Honeywell International Inc. Restricted getter

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2631554B2 (ja) * 1989-05-23 1997-07-16 株式会社小松製作所 レーザの波長制御装置
US5095492A (en) 1990-07-17 1992-03-10 Cymer Laser Technologies Spectral narrowing technique
JPH05167163A (ja) * 1991-12-12 1993-07-02 Mitsubishi Electric Corp 狭帯域化レーザ装置
US5898725A (en) 1997-01-21 1999-04-27 Cymer, Inc. Excimer laser with greater spectral bandwidth and beam stability
US6128323A (en) * 1997-04-23 2000-10-03 Cymer, Inc. Reliable modular production quality narrow-band high REP rate excimer laser
US5852627A (en) * 1997-09-10 1998-12-22 Cymer, Inc. Laser with line narrowing output coupler
US6028879A (en) * 1997-06-04 2000-02-22 Cymer, Inc. Narrow band laser with etalon based output coupler
US6094448A (en) 1997-07-01 2000-07-25 Cymer, Inc. Grating assembly with bi-directional bandwidth control
US6192064B1 (en) * 1997-07-01 2001-02-20 Cymer, Inc. Narrow band laser with fine wavelength control
USRE38054E1 (en) 1997-07-18 2003-04-01 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate F2 laser
US5978409A (en) 1998-09-28 1999-11-02 Cymer, Inc. Line narrowing apparatus with high transparency prism beam expander
US6853653B2 (en) 1997-07-22 2005-02-08 Cymer, Inc. Laser spectral engineering for lithographic process
US6529531B1 (en) 1997-07-22 2003-03-04 Cymer, Inc. Fast wavelength correction technique for a laser
US6671294B2 (en) 1997-07-22 2003-12-30 Cymer, Inc. Laser spectral engineering for lithographic process
US6721340B1 (en) 1997-07-22 2004-04-13 Cymer, Inc. Bandwidth control technique for a laser
US6393037B1 (en) * 1999-02-03 2002-05-21 Lambda Physik Ag Wavelength selector for laser with adjustable angular dispersion
US6163559A (en) 1998-06-22 2000-12-19 Cymer, Inc. Beam expander for ultraviolet lasers
US6493374B1 (en) 1999-09-03 2002-12-10 Cymer, Inc. Smart laser with fast deformable grating
US6243406B1 (en) * 1999-03-12 2001-06-05 Peter Heist Gas performance control system for gas discharge lasers
US6496528B2 (en) 1999-09-03 2002-12-17 Cymer, Inc. Line narrowing unit with flexural grating mount
US6532247B2 (en) 2000-02-09 2003-03-11 Cymer, Inc. Laser wavelength control unit with piezoelectric driver
JP2003518757A (ja) 1999-12-22 2003-06-10 サイマー， インコーポレイテッド 二方向ビーム拡大を用いた狭線化レーザ
US7075963B2 (en) * 2000-01-27 2006-07-11 Lambda Physik Ag Tunable laser with stabilized grating
US6650666B2 (en) 2000-02-09 2003-11-18 Cymer, Inc. Laser wavelength control unit with piezoelectric driver
US6856638B2 (en) * 2000-10-23 2005-02-15 Lambda Physik Ag Resonator arrangement for bandwidth control
US6760358B1 (en) * 2001-06-07 2004-07-06 Lambda Physik Ag Line-narrowing optics module having improved mechanical performance
KR20030036254A (ko) * 2001-06-13 2003-05-09 가부시키가이샤 니콘 주사노광방법 및 주사형 노광장치 그리고 디바이스 제조방법
AU2002333762A1 (en) * 2002-08-30 2004-03-19 Agilent Technologies, Inc. Wavelength tunable resonator with a prism

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000294864A (ja) 1999-02-11 2000-10-20 Cymer Inc 自動ビーム品質制御を備えたスマートレーザ
US20030107317A1 (en) 2001-12-11 2003-06-12 Honeywell International Inc. Restricted getter

Also Published As

Publication number Publication date
US20080151944A1 (en) 2008-06-26
KR20120025004A (ko) 2012-03-14
TW200627736A (en) 2006-08-01
KR101235047B1 (ko) 2013-02-21
WO2006060360A2 (en) 2006-06-08
US7653112B2 (en) 2010-01-26
EP1831974A2 (en) 2007-09-12
US20100097704A1 (en) 2010-04-22
TWI281296B (en) 2007-05-11
US20110194580A1 (en) 2011-08-11
EP2665141B1 (en) 2019-04-03
US20060114957A1 (en) 2006-06-01
US8126027B2 (en) 2012-02-28
EP1831974B1 (en) 2017-02-08
EP2665141A1 (en) 2013-11-20
JP5030786B2 (ja) 2012-09-19
EP1831974A4 (en) 2010-11-24
KR20070084624A (ko) 2007-08-24
JP2008522439A (ja) 2008-06-26
WO2006060360A3 (en) 2006-10-26
US7366219B2 (en) 2008-04-29

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