JP2008516418A5 - - Google Patents

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Publication number
JP2008516418A5
JP2008516418A5 JP2007532378A JP2007532378A JP2008516418A5 JP 2008516418 A5 JP2008516418 A5 JP 2008516418A5 JP 2007532378 A JP2007532378 A JP 2007532378A JP 2007532378 A JP2007532378 A JP 2007532378A JP 2008516418 A5 JP2008516418 A5 JP 2008516418A5
Authority
JP
Japan
Prior art keywords
substrate
removable
radiation
sensitive coating
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007532378A
Other languages
English (en)
Japanese (ja)
Other versions
JP4977610B2 (ja
JP2008516418A (ja
Filing date
Publication date
Priority claimed from US10/944,586 external-priority patent/US8796583B2/en
Application filed filed Critical
Publication of JP2008516418A publication Critical patent/JP2008516418A/ja
Publication of JP2008516418A5 publication Critical patent/JP2008516418A5/ja
Application granted granted Critical
Publication of JP4977610B2 publication Critical patent/JP4977610B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2007532378A 2004-09-17 2005-09-09 除去可能な放射線感光材料を用いた構造化表面 Expired - Fee Related JP4977610B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/944,586 US8796583B2 (en) 2004-09-17 2004-09-17 Method of forming a structured surface using ablatable radiation sensitive material
US10/944,586 2004-09-17
PCT/US2005/032101 WO2006033852A2 (en) 2004-09-17 2005-09-09 Structured surface using ablatable radiation sensitive material

Publications (3)

Publication Number Publication Date
JP2008516418A JP2008516418A (ja) 2008-05-15
JP2008516418A5 true JP2008516418A5 (https=) 2008-09-11
JP4977610B2 JP4977610B2 (ja) 2012-07-18

Family

ID=35478754

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007532378A Expired - Fee Related JP4977610B2 (ja) 2004-09-17 2005-09-09 除去可能な放射線感光材料を用いた構造化表面

Country Status (5)

Country Link
US (1) US8796583B2 (https=)
JP (1) JP4977610B2 (https=)
KR (1) KR101087924B1 (https=)
CN (1) CN101019474B (https=)
WO (1) WO2006033852A2 (https=)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3874003B2 (ja) * 2004-10-27 2007-01-31 セイコーエプソン株式会社 配線パターン形成方法、及び膜パターン形成方法
KR100690929B1 (ko) * 2006-05-03 2007-03-09 한국기계연구원 건식필름레지스트를 이용하여 원하는 패턴두께 또는 높은종횡비를 가지는 고해상도패턴 형성 방법
KR100690930B1 (ko) * 2006-05-03 2007-03-09 한국기계연구원 깊은 제거를 이용하여 원하는 패턴 두께 혹은 높은종횡비를 가지는 고해상도 패턴 형성 방법
DE102006026981A1 (de) * 2006-06-10 2007-12-13 Leonhard Kurz Gmbh & Co. Kg Verfahren zur Herstellung einer strukturierten Schicht auf einem Trägersubstrat
JP5459949B2 (ja) * 2007-11-21 2014-04-02 凸版印刷株式会社 着色組成物、カラーフィルタ及びその製造方法
US7696013B2 (en) * 2007-04-19 2010-04-13 Eastman Kodak Company Connecting microsized devices using ablative films
KR100922810B1 (ko) * 2007-12-11 2009-10-21 주식회사 잉크테크 흑화 전도성 패턴의 제조방법
US20090155963A1 (en) * 2007-12-12 2009-06-18 Hawkins Gilbert A Forming thin film transistors using ablative films
CN102385083B (zh) * 2010-09-03 2014-09-03 株式会社Lg化学 毯及其制造方法、和滤色器衬底及其制造装置和方法
US20130036929A1 (en) * 2011-08-09 2013-02-14 Moshe Nakash Method for offset media system
EP2955981A1 (en) * 2014-06-13 2015-12-16 Irepa Laser Method for manufacturing selective surface deposition using a pulsed radiation treatment
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DE102023127411B3 (de) 2023-10-09 2025-03-27 Petra Blohm Verfahren zum Gravieren eines Erzeugnisses, insbesondere eines Druckerzeugnisses

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JP4175079B2 (ja) * 2002-10-17 2008-11-05 日立化成工業株式会社 感光性樹脂組成物およびこれを用いた感光性エレメント

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