JP2007503016A5 - - Google Patents

Download PDF

Info

Publication number
JP2007503016A5
JP2007503016A5 JP2006523840A JP2006523840A JP2007503016A5 JP 2007503016 A5 JP2007503016 A5 JP 2007503016A5 JP 2006523840 A JP2006523840 A JP 2006523840A JP 2006523840 A JP2006523840 A JP 2006523840A JP 2007503016 A5 JP2007503016 A5 JP 2007503016A5
Authority
JP
Japan
Prior art keywords
phosphonate
phototool
fluorinated phosphate
article
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2006523840A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007503016A (ja
Filing date
Publication date
Priority claimed from US10/645,020 external-priority patent/US7189479B2/en
Application filed filed Critical
Publication of JP2007503016A publication Critical patent/JP2007503016A/ja
Publication of JP2007503016A5 publication Critical patent/JP2007503016A5/ja
Withdrawn legal-status Critical Current

Links

JP2006523840A 2003-08-21 2004-06-30 フォトツールのコーティング Withdrawn JP2007503016A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/645,020 US7189479B2 (en) 2003-08-21 2003-08-21 Phototool coating
PCT/US2004/021017 WO2005024520A2 (en) 2003-08-21 2004-06-30 Phototool coating

Publications (2)

Publication Number Publication Date
JP2007503016A JP2007503016A (ja) 2007-02-15
JP2007503016A5 true JP2007503016A5 (https=) 2007-08-16

Family

ID=34194211

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006523840A Withdrawn JP2007503016A (ja) 2003-08-21 2004-06-30 フォトツールのコーティング

Country Status (6)

Country Link
US (2) US7189479B2 (https=)
EP (1) EP1656588A2 (https=)
JP (1) JP2007503016A (https=)
KR (1) KR20060080182A (https=)
CN (1) CN1839351A (https=)
WO (1) WO2005024520A2 (https=)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4718463B2 (ja) * 2003-08-21 2011-07-06 スリーエム イノベイティブ プロパティズ カンパニー パーフルオロポリエーテルアミド連結ホスホネート、ホスフェートおよびそれらの誘導体
ATE413632T1 (de) * 2004-05-28 2008-11-15 Obducat Ab Modifizierte metallform zur verwendung bei druckprozessen
EP1998833B1 (en) * 2006-03-24 2012-12-26 3M Innovative Properties Company Medicinal formulation container with a treated metal surface
US8337959B2 (en) * 2006-11-28 2012-12-25 Nanonex Corporation Method and apparatus to apply surface release coating for imprint mold
US20090041986A1 (en) * 2007-06-21 2009-02-12 3M Innovative Properties Company Method of making hierarchical articles
US20080315459A1 (en) * 2007-06-21 2008-12-25 3M Innovative Properties Company Articles and methods for replication of microstructures and nanofeatures
US20090114618A1 (en) * 2007-06-21 2009-05-07 3M Innovative Properties Company Method of making hierarchical articles
BRPI0819558A2 (pt) * 2007-12-31 2015-05-05 3M Innovative Properties Co "método para aplicação de um material revestidor"
TWI450043B (zh) 2008-03-11 2014-08-21 3M Innovative Properties Co 具備保護層之光工具
US20110027493A1 (en) * 2008-03-26 2011-02-03 Yapel Robert A Methods of slide coating fluids containing multi unit polymeric precursors
BRPI0910877A2 (pt) * 2008-03-26 2015-10-06 3M Innovative Proferties Company método para aplicar dois ou mais fluidos como um revestimento de deslizamento
EP2268417A1 (en) * 2008-03-26 2011-01-05 3M Innovative Properties Company Methods of slide coating two or more fluids
CN102333841B (zh) * 2008-12-18 2014-11-26 3M创新有限公司 使含烃地层与氟化磷酸酯和膦酸酯组合物接触的方法
WO2011011167A2 (en) * 2009-07-21 2011-01-27 3M Innovative Properties Company Curable composition, method of coating a phototool, and coated phototool
EP2478033A1 (en) 2009-09-16 2012-07-25 3M Innovative Properties Company Fluorinated coating and phototools made therewith
WO2011034845A1 (en) 2009-09-16 2011-03-24 3M Innovative Properties Company Fluorinated coating and phototools made therewith
US8420281B2 (en) 2009-09-16 2013-04-16 3M Innovative Properties Company Epoxy-functionalized perfluoropolyether polyurethanes
JP5617239B2 (ja) * 2009-12-25 2014-11-05 富士通株式会社 保護膜付きレジストパターン形成用部材とその製造方法、及びレジストパターンの製造方法
US8747092B2 (en) 2010-01-22 2014-06-10 Nanonex Corporation Fast nanoimprinting apparatus using deformale mold
WO2014145826A2 (en) 2013-03-15 2014-09-18 Nanonex Corporation System and methods of mold/substrate separation for imprint lithography
US10105883B2 (en) 2013-03-15 2018-10-23 Nanonex Corporation Imprint lithography system and method for manufacturing
US10054717B2 (en) * 2015-04-03 2018-08-21 Moxtek, Inc. Oxidation and moisture barrier layers for wire grid polarizer
US20160289458A1 (en) * 2015-04-03 2016-10-06 Moxtek, Inc. Hydrophobic Phosphonate and Silane Chemistry
US20160291227A1 (en) 2015-04-03 2016-10-06 Moxtek, Inc. Wire Grid Polarizer with Water-Soluble Materials
US10534120B2 (en) 2015-04-03 2020-01-14 Moxtek, Inc. Wire grid polarizer with protected wires
CN108351605B (zh) * 2016-01-27 2020-12-15 株式会社Lg化学 膜掩模、其制备方法、使用膜掩模的图案形成方法和由膜掩模形成的图案
US10969686B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
JP6690814B2 (ja) * 2016-01-27 2020-04-28 エルジー・ケム・リミテッド フィルムマスク、その製造方法およびこれを用いたパターンの形成方法
CN114326304B (zh) * 2021-12-30 2024-08-20 苏州瑞红电子化学品有限公司 一种耐刻蚀的正性光刻胶
JP7365086B1 (ja) 2023-04-04 2023-10-19 株式会社ハーベス パーフルオロポリエーテル基含有ホスホネート化合物、表面処理剤、及び該表面処理剤で処理された物品

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3492374A (en) * 1963-06-14 1970-01-27 Du Pont Polyfluoropolyoxa-alkyl phosphates
US3306855A (en) * 1966-03-24 1967-02-28 Du Pont Corrosion and rust inhibited poly (hexafluoropropylene oxide) oil compositions
US3810874A (en) * 1969-03-10 1974-05-14 Minnesota Mining & Mfg Polymers prepared from poly(perfluoro-alkylene oxide) compounds
JPS5950444A (ja) * 1982-09-16 1984-03-23 Tokyo Ohka Kogyo Co Ltd 微細加工用ホトマスク
US4514489A (en) * 1983-09-01 1985-04-30 Motorola, Inc. Photolithography process
JPH071390B2 (ja) 1985-08-19 1995-01-11 富士写真フイルム株式会社 複数の感光性平版印刷版の保管方法
JPH01268696A (ja) * 1988-04-19 1989-10-26 Daikin Ind Ltd 含フッ素リン酸エステル及びその製法並びに含フッ素防錆剤
JP2582893B2 (ja) * 1989-03-31 1997-02-19 日立マクセル株式会社 有機電解液電池
US5032279A (en) * 1989-09-21 1991-07-16 Occidental Chemical Corporation Separation of fluids using polyimidesiloxane membrane
US5256318A (en) * 1990-04-07 1993-10-26 Daikin Industries Ltd. Leather treatment and process for treating leather
JPH0473652A (ja) 1990-07-13 1992-03-09 Sumitomo Metal Mining Co Ltd 露光方法
JP3020320B2 (ja) * 1991-07-23 2000-03-15 信越化学工業株式会社 リソグラフィ−用ペリクル
JP3009010B2 (ja) 1992-05-08 2000-02-14 東洋紡績株式会社 感光性樹脂積層体
IT1256721B (it) 1992-12-16 1995-12-15 Ausimont Spa Processo per impartire oleo- ed idro-repellenza alla superficie di materiali ceramici porosi
IT1270654B (it) * 1994-10-13 1997-05-07 Ausimont Spa Processo per impartire oleo- ed idro-repellenza a fibre tessili, pelle cuoio e simili
US5550277A (en) * 1995-01-19 1996-08-27 Paciorek; Kazimiera J. L. Perfluoroalkyl and perfluoroalkylether substituted aromatic phosphates, phosphonates and related compositions
US5851674A (en) * 1997-07-30 1998-12-22 Minnesota Mining And Manufacturing Company Antisoiling coatings for antireflective surfaces and methods of preparation
JPH1180594A (ja) 1997-08-29 1999-03-26 Toagosei Co Ltd 被覆用樹脂組成物およびこれを被覆してなるフォトマスク
DE69910732T2 (de) * 1998-01-27 2004-06-17 Minnesota Mining & Manufacturing Company, St. Paul Fluorochemische benzotriazole
US6277485B1 (en) * 1998-01-27 2001-08-21 3M Innovative Properties Company Antisoiling coatings for antireflective surfaces and methods of preparation
US6184187B1 (en) * 1998-04-07 2001-02-06 E. I. Dupont De Nemours And Company Phosphorus compounds and their use as corrosion inhibitors for perfluoropolyethers
US6300042B1 (en) * 1998-11-24 2001-10-09 Motorola, Inc. Lithographic printing method using a low surface energy layer
US6177357B1 (en) * 1999-04-30 2001-01-23 3M Innovative Properties Company Method for making flexible circuits
US6387787B1 (en) * 2001-03-02 2002-05-14 Motorola, Inc. Lithographic template and method of formation and use
US6824882B2 (en) * 2002-05-31 2004-11-30 3M Innovative Properties Company Fluorinated phosphonic acids
US6762013B2 (en) * 2002-10-04 2004-07-13 Eastman Kodak Company Thermally developable materials containing fluorochemical conductive layers
JP4718463B2 (ja) * 2003-08-21 2011-07-06 スリーエム イノベイティブ プロパティズ カンパニー パーフルオロポリエーテルアミド連結ホスホネート、ホスフェートおよびそれらの誘導体

Similar Documents

Publication Publication Date Title
JP2007503016A5 (https=)
JP2009545878A5 (https=)
JP2007501708A5 (https=)
JP2008517743A5 (https=)
JP2004533514A5 (https=)
WO2006055844A3 (en) Method of contact coating a microneedle array
JP2008523618A5 (https=)
JP2006503732A5 (https=)
JP2005503947A5 (https=)
JP2005530636A5 (https=)
WO2005062908A3 (en) Methods of making a pattern of optical element shapes on a roll for use in making optical elements on or in substrates
NO992295D0 (no) FremgangsmÕter for m°nstring av polymerfilmer og anvendelse av fremgangsmÕtene
JP2004528205A5 (https=)
JP2004538130A5 (https=)
JP2006507160A (ja) 基材にデザインを適用するために使用される積層体および方法
DE60332218D1 (de) Vorrichtung zum prägen und beschichten mit klebstoff
JP2008248152A5 (https=)
WO2005063464A3 (en) Process of microstructuring of a surface of a multi-layered flexible substrate, and microstructured substrate
JP2003156667A5 (https=)
JP2005536602A5 (https=)
JP2009518124A5 (https=)
JP2008516821A5 (https=)
JP2008520082A5 (https=)
JP2007518578A5 (https=)
DE60134997D1 (de) Hydrophile oberfläche mit temporären schutzverkleidungen