JP2008510075A5 - - Google Patents

Download PDF

Info

Publication number
JP2008510075A5
JP2008510075A5 JP2007527909A JP2007527909A JP2008510075A5 JP 2008510075 A5 JP2008510075 A5 JP 2008510075A5 JP 2007527909 A JP2007527909 A JP 2007527909A JP 2007527909 A JP2007527909 A JP 2007527909A JP 2008510075 A5 JP2008510075 A5 JP 2008510075A5
Authority
JP
Japan
Prior art keywords
substrate
alternating
titanium
aluminum
density
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007527909A
Other languages
English (en)
Japanese (ja)
Other versions
JP4987717B2 (ja
JP2008510075A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2005/028956 external-priority patent/WO2007001337A2/en
Publication of JP2008510075A publication Critical patent/JP2008510075A/ja
Publication of JP2008510075A5 publication Critical patent/JP2008510075A5/ja
Application granted granted Critical
Publication of JP4987717B2 publication Critical patent/JP4987717B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2007527909A 2004-08-18 2005-08-12 コーティングを有する基板及びその調製方法 Expired - Fee Related JP4987717B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US60239404P 2004-08-18 2004-08-18
US60/602,394 2004-08-18
PCT/US2005/028956 WO2007001337A2 (en) 2004-08-18 2005-08-12 Coated substrates and methods for their preparation

Publications (3)

Publication Number Publication Date
JP2008510075A JP2008510075A (ja) 2008-04-03
JP2008510075A5 true JP2008510075A5 (https=) 2008-09-25
JP4987717B2 JP4987717B2 (ja) 2012-07-25

Family

ID=37595557

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007527909A Expired - Fee Related JP4987717B2 (ja) 2004-08-18 2005-08-12 コーティングを有する基板及びその調製方法

Country Status (6)

Country Link
US (1) US7736728B2 (https=)
EP (2) EP1799883A2 (https=)
JP (1) JP4987717B2 (https=)
KR (1) KR101210859B1 (https=)
CN (1) CN100558940C (https=)
WO (1) WO2007001337A2 (https=)

Families Citing this family (69)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2693248T3 (es) * 2004-12-24 2018-12-10 Hexacath Pieza mecánica con deformabilidad mejorada
KR101317695B1 (ko) * 2005-05-09 2013-10-15 나노 이프린트 리미티드 전자 소자
US9166197B2 (en) * 2005-08-29 2015-10-20 The Hong Kong University Of Science And Technology Metallic anode treated by carbon tetrafluoride plasma for organic light emitting device
CN101668879B (zh) * 2007-03-28 2012-05-09 陶氏康宁公司 含硅和碳的阻挡层的卷到卷等离子体增强化学气相沉积方法
EP2538248A1 (en) * 2007-08-16 2012-12-26 Dow Corning Corporation Dichroic filters formed using silicon carbide based layers
US20110146787A1 (en) * 2008-05-28 2011-06-23 Sebastien Allen Silicon carbide-based antireflective coating
PT2251454E (pt) 2009-05-13 2014-10-01 Sio2 Medical Products Inc Revestimento e inspeção de vaso
US7985188B2 (en) 2009-05-13 2011-07-26 Cv Holdings Llc Vessel, coating, inspection and processing apparatus
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
CN102373427A (zh) * 2010-08-18 2012-03-14 鸿富锦精密工业(深圳)有限公司 铝合金表面防腐处理方法及其制品
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
TWI477636B (zh) * 2010-12-30 2015-03-21 Hon Hai Prec Ind Co Ltd 鋁及鋁合金表面防腐處理方法及其鋁製品
JP5740179B2 (ja) * 2011-02-28 2015-06-24 日東電工株式会社 透明ガスバリアフィルム、透明ガスバリアフィルムの製造方法、有機エレクトロルミネッセンス素子、太陽電池および薄膜電池
US8574728B2 (en) 2011-03-15 2013-11-05 Kennametal Inc. Aluminum oxynitride coated article and method of making the same
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
BR112014000395A2 (pt) * 2011-07-11 2017-02-14 Lotus Applied Tech Llc películas de barreira de óxido de metal misto e método de deposição de camada atômica para preparar películas de barreira de óxido de metal misto
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
CA2855353C (en) 2011-11-11 2021-01-19 Sio2 Medical Products, Inc. Passivation, ph protective or lubricity coating for pharmaceutical package, coating process and apparatus
EP2797699B1 (en) * 2011-12-30 2019-05-01 Compagnie Générale des Etablissements Michelin Thin film diffusion barrier
EP2846755A1 (en) 2012-05-09 2015-03-18 SiO2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
US10325773B2 (en) 2012-06-12 2019-06-18 Novellus Systems, Inc. Conformal deposition of silicon carbide films
US9234276B2 (en) 2013-05-31 2016-01-12 Novellus Systems, Inc. Method to obtain SiC class of films of desired composition and film properties
US12334332B2 (en) 2012-06-12 2025-06-17 Lam Research Corporation Remote plasma based deposition of silicon carbide films using silicon-containing and carbon-containing precursors
US10832904B2 (en) 2012-06-12 2020-11-10 Lam Research Corporation Remote plasma based deposition of oxygen doped silicon carbide films
US20180347035A1 (en) 2012-06-12 2018-12-06 Lam Research Corporation Conformal deposition of silicon carbide films using heterogeneous precursor interaction
US10211310B2 (en) 2012-06-12 2019-02-19 Novellus Systems, Inc. Remote plasma based deposition of SiOC class of films
US20150297800A1 (en) 2012-07-03 2015-10-22 Sio2 Medical Products, Inc. SiOx BARRIER FOR PHARMACEUTICAL PACKAGE AND COATING PROCESS
US9664626B2 (en) 2012-11-01 2017-05-30 Sio2 Medical Products, Inc. Coating inspection method
WO2014078666A1 (en) 2012-11-16 2014-05-22 Sio2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
AU2013352436B2 (en) 2012-11-30 2018-10-25 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition on medical syringes, cartridges, and the like
EP2939806B1 (en) * 2012-12-28 2018-02-21 Kanefusa Kabushiki Kaisha Cutting tool
US9017809B2 (en) 2013-01-25 2015-04-28 Kennametal Inc. Coatings for cutting tools
US9138864B2 (en) 2013-01-25 2015-09-22 Kennametal Inc. Green colored refractory coatings for cutting tools
US9662450B2 (en) 2013-03-01 2017-05-30 Sio2 Medical Products, Inc. Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus
CN105392916B (zh) 2013-03-11 2019-03-08 Sio2医药产品公司 涂布包装材料
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
EP2971227B1 (en) 2013-03-15 2017-11-15 Si02 Medical Products, Inc. Coating method.
US9703011B2 (en) 2013-05-07 2017-07-11 Corning Incorporated Scratch-resistant articles with a gradient layer
US9359261B2 (en) 2013-05-07 2016-06-07 Corning Incorporated Low-color scratch-resistant articles with a multilayer optical film
US9110230B2 (en) 2013-05-07 2015-08-18 Corning Incorporated Scratch-resistant articles with retained optical properties
US9366784B2 (en) 2013-05-07 2016-06-14 Corning Incorporated Low-color scratch-resistant articles with a multilayer optical film
US9684097B2 (en) 2013-05-07 2017-06-20 Corning Incorporated Scratch-resistant articles with retained optical properties
US9831466B2 (en) 2013-06-29 2017-11-28 Aixtron Se Method for depositing a multi-layer moisture barrier on electronic devices and electronic devices protected by a multi-layer moisture barrier
US9427808B2 (en) 2013-08-30 2016-08-30 Kennametal Inc. Refractory coatings for cutting tools
US9371579B2 (en) 2013-10-24 2016-06-21 Lam Research Corporation Ground state hydrogen radical sources for chemical vapor deposition of silicon-carbon-containing films
WO2015148471A1 (en) 2014-03-28 2015-10-01 Sio2 Medical Products, Inc. Antistatic coatings for plastic vessels
US11267973B2 (en) 2014-05-12 2022-03-08 Corning Incorporated Durable anti-reflective articles
US9335444B2 (en) 2014-05-12 2016-05-10 Corning Incorporated Durable and scratch-resistant anti-reflective articles
US9790593B2 (en) 2014-08-01 2017-10-17 Corning Incorporated Scratch-resistant materials and articles including the same
KR101562966B1 (ko) * 2014-08-27 2015-10-23 코닝정밀소재 주식회사 디스플레이 장치용 기판
KR101606172B1 (ko) * 2014-09-05 2016-03-24 코닝정밀소재 주식회사 디스플레이 장치용 기판
JP6587384B2 (ja) * 2014-11-14 2019-10-09 東レエンジニアリング株式会社 封止膜の形成方法および封止膜
US20160314964A1 (en) 2015-04-21 2016-10-27 Lam Research Corporation Gap fill using carbon-based films
KR102786617B1 (ko) 2015-08-18 2025-03-26 에스아이오2 메디컬 프로덕츠, 엘엘씨 산소 전달률이 낮은, 의약품 및 다른 제품의 포장용기
CN105261681B (zh) * 2015-09-08 2019-02-22 安徽三安光电有限公司 一种半导体元件及其制备方法
JP2018536177A (ja) 2015-09-14 2018-12-06 コーニング インコーポレイテッド 高光線透過性かつ耐擦傷性反射防止物品
US9786491B2 (en) 2015-11-12 2017-10-10 Asm Ip Holding B.V. Formation of SiOCN thin films
KR102378021B1 (ko) 2016-05-06 2022-03-23 에이에스엠 아이피 홀딩 비.브이. SiOC 박막의 형성
US9837270B1 (en) 2016-12-16 2017-12-05 Lam Research Corporation Densification of silicon carbide film using remote plasma treatment
KR102627238B1 (ko) 2017-05-05 2024-01-19 에이에스엠 아이피 홀딩 비.브이. 산소 함유 박막의 형성을 제어하기 위한 플라즈마 강화 증착 공정
JP7183187B2 (ja) * 2017-05-16 2022-12-05 エーエスエム アイピー ホールディング ビー.ブイ. 誘電体上の酸化物の選択的peald
CN112996945B (zh) * 2018-07-10 2024-04-05 耐科思特生物识别集团股份公司 用于电子设备的热传导及保护涂覆件
US10840087B2 (en) 2018-07-20 2020-11-17 Lam Research Corporation Remote plasma based deposition of boron nitride, boron carbide, and boron carbonitride films
CN114085037B (zh) 2018-08-17 2023-11-10 康宁股份有限公司 具有薄的耐久性减反射结构的无机氧化物制品
US11848199B2 (en) 2018-10-19 2023-12-19 Lam Research Corporation Doped or undoped silicon carbide deposition and remote hydrogen plasma exposure for gapfill
US12386101B2 (en) 2020-07-09 2025-08-12 Corning Incorporated Textured region of a substrate to reduce specular reflectance incorporating surface features with an elliptical perimeter or segments thereof, and method of making the same
KR102675554B1 (ko) * 2022-06-29 2024-06-14 웨이브로드 주식회사 그룹3족 질화물 반도체 소자용 템플릿

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MX9303141A (es) 1992-05-28 1994-04-29 Polar Materials Inc Metodos y aparatos para depositar recubrimientos de barrera.
CN1080143C (zh) * 1994-12-28 2002-03-06 东丽株式会社 涂层方法与涂层设备
DE69628441T2 (de) 1995-10-13 2004-04-29 Dow Global Technologies, Inc., Midland Verfahren zur herstellung von beschichteten kunststoffoberflächen
AU749505B2 (en) 1997-10-27 2002-06-27 Dr. Reddy's Laboratories Limited Novel tricyclic compounds and their use in medicine; process for their preparation and pharmaceutical compositions containing them
US6627532B1 (en) * 1998-02-11 2003-09-30 Applied Materials, Inc. Method of decreasing the K value in SiOC layer deposited by chemical vapor deposition
US6159871A (en) * 1998-05-29 2000-12-12 Dow Corning Corporation Method for producing hydrogenated silicon oxycarbide films having low dielectric constant
US6667553B2 (en) * 1998-05-29 2003-12-23 Dow Corning Corporation H:SiOC coated substrates
EP0975207B1 (en) * 1998-07-23 2007-02-07 Konica Corporation Electromagnetic wave attenuating transparent member
US6531398B1 (en) * 2000-10-30 2003-03-11 Applied Materials, Inc. Method of depositing organosillicate layers
US20020137323A1 (en) 2001-01-03 2002-09-26 Loboda Mark Jon Metal ion diffusion barrier layers
WO2002077320A1 (en) * 2001-03-23 2002-10-03 Dow Corning Corporation Method for producing hydrogenated silicon oxycarbide films
US7074489B2 (en) * 2001-05-23 2006-07-11 Air Products And Chemicals, Inc. Low dielectric constant material and method of processing by CVD
JP4338495B2 (ja) * 2002-10-30 2009-10-07 富士通マイクロエレクトロニクス株式会社 シリコンオキシカーバイド、半導体装置、および半導体装置の製造方法
JP2004235548A (ja) * 2003-01-31 2004-08-19 Nec Electronics Corp 半導体装置およびその製造方法
JP4746829B2 (ja) * 2003-01-31 2011-08-10 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
US20040197474A1 (en) * 2003-04-01 2004-10-07 Vrtis Raymond Nicholas Method for enhancing deposition rate of chemical vapor deposition films
JP4864307B2 (ja) * 2003-09-30 2012-02-01 アイメック エアーギャップを選択的に形成する方法及び当該方法により得られる装置
US6878616B1 (en) * 2003-11-21 2005-04-12 International Business Machines Corporation Low-k dielectric material system for IC application
US7622193B2 (en) * 2004-08-18 2009-11-24 Dow Corning Corporation Coated substrates and methods for their preparation

Similar Documents

Publication Publication Date Title
JP2008510075A5 (https=)
ES2526084T3 (es) Herramienta de corte con revestimiento superficial que tiene capa de revestimiento duro con excelente resistencia al desportillado y resistencia a la fractura
ES2627198T3 (es) Sustrato que tiene revestimiento de gestión térmica para una unidad de vidrio aislante
WO2007001337A3 (en) Coated substrates and methods for their preparation
JP2009518183A5 (https=)
CL2011000770A1 (es) Recubrimiento absorbente solar que comprende un sustrato de material metalico, al menos una capa metalica reflectora, una estructura multicapas absorbente depositada sobre la capa metalica reflectora, compuesta por capas dielectricas y por capas metalicas que tienen igual o diferente espesor y/o composicion entre si, y donde dichas capas dielectricas estan depositadas mediante sputtering reactivo, mientras que las capas metalicas estan depositadas por sputtering dc.
JP2005503947A5 (https=)
JP2008515674A5 (https=)
JP2009519816A5 (https=)
JP2010502458A5 (https=)
JP2008513256A5 (https=)
JP2007512552A5 (https=)
JP2018002544A5 (https=)
JP2007520740A5 (https=)
JP2011508265A5 (https=)
JP2009503210A5 (https=)
TW200605289A (en) Semiconductor device
JP2003213455A5 (https=)
WO2010029369A3 (en) Multi-layer adhesive interfaces
ATE336027T1 (de) Projektionsschirm aus einem verbundglas
WO2009085683A3 (en) Fluoropolymer multi-layer articles
JP2003091872A5 (https=)
WO2008123553A1 (ja) 防汚性物品およびこれを用いる合わせガラス
JP2015116730A5 (https=)
JP2007518578A5 (https=)