JP2008508737A - 多層構成素子およびその製造方法 - Google Patents
多層構成素子およびその製造方法 Download PDFInfo
- Publication number
- JP2008508737A JP2008508737A JP2007524175A JP2007524175A JP2008508737A JP 2008508737 A JP2008508737 A JP 2008508737A JP 2007524175 A JP2007524175 A JP 2007524175A JP 2007524175 A JP2007524175 A JP 2007524175A JP 2008508737 A JP2008508737 A JP 2008508737A
- Authority
- JP
- Japan
- Prior art keywords
- internal electrode
- multilayer
- multilayer component
- holes
- ceramic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000000919 ceramic Substances 0.000 claims abstract description 38
- 239000000758 substrate Substances 0.000 claims abstract description 19
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 22
- 238000005245 sintering Methods 0.000 claims description 20
- 239000007772 electrode material Substances 0.000 claims description 14
- 229910052763 palladium Inorganic materials 0.000 claims description 11
- 229910052709 silver Inorganic materials 0.000 claims description 11
- 239000004332 silver Substances 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 10
- 239000000203 mixture Substances 0.000 claims description 10
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 8
- 230000008602 contraction Effects 0.000 claims description 8
- 229910052802 copper Inorganic materials 0.000 claims description 8
- 239000010949 copper Substances 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 8
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 6
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 239000007788 liquid Substances 0.000 claims 1
- 238000006073 displacement reaction Methods 0.000 description 14
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 7
- 229910010293 ceramic material Inorganic materials 0.000 description 7
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 4
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 4
- 238000005259 measurement Methods 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000002485 combustion reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- XIKYYQJBTPYKSG-UHFFFAOYSA-N nickel Chemical compound [Ni].[Ni] XIKYYQJBTPYKSG-UHFFFAOYSA-N 0.000 description 1
- SWELZOZIOHGSPA-UHFFFAOYSA-N palladium silver Chemical compound [Pd].[Ag] SWELZOZIOHGSPA-UHFFFAOYSA-N 0.000 description 1
- BITYAPCSNKJESK-UHFFFAOYSA-N potassiosodium Chemical compound [Na].[K] BITYAPCSNKJESK-UHFFFAOYSA-N 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/05—Manufacture of multilayered piezoelectric or electrostrictive devices, or parts thereof, e.g. by stacking piezoelectric bodies and electrodes
- H10N30/053—Manufacture of multilayered piezoelectric or electrostrictive devices, or parts thereof, e.g. by stacking piezoelectric bodies and electrodes by integrally sintering piezoelectric or electrostrictive bodies and electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/06—Forming electrodes or interconnections, e.g. leads or terminals
- H10N30/067—Forming single-layered electrodes of multilayered piezoelectric or electrostrictive parts
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/87—Electrodes or interconnections, e.g. leads or terminals
- H10N30/871—Single-layered electrodes of multilayer piezoelectric or electrostrictive devices, e.g. internal electrodes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/42—Piezoelectric device making
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
- Fuel-Injection Apparatus (AREA)
- Ceramic Capacitors (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Abstract
Description
図1は、複数の孔が設けられている内部電極に接している圧電セラミック層を有する多層圧電アクチュエータを示し、
図2は複数の孔が設けられている電極の拡大図を示し、
図3は複数の孔が設けられている内部電極の2次元の写真を示し、
図4は、複数の孔によって生じる内部電極の中断度合い、多層アクチュエータに印加される電圧、多層アクチュエータの変位距離が好適で最適に調節されているグラフを示す。
Claims (12)
- 多層構成素子(P)において、
セラミック基体と、
該セラミック基体内に配置されている少なくとも1つの内部電極(2)とを有し、該内部電極が複数の孔(3)を有することを特徴とする、多層構成素子。 - 前記内部電極(2)は多層構成素子の横方向収縮により伸長する、請求項1記載の多層構成素子(P)。
- 多層構成素子(P)は多層圧電アクチュエータである、請求項1または2記載の多層構成素子。
- 前記セラミック基体は複数の内部電極(2)を有する、請求項1から3までのいずれか1項記載の多層構成素子。
- 前記内部電極(2)は銀とパラジウムの混合物を含有し、ここで銀の重量の割合は60〜95%であり、パラジウムの重量の割合は5〜40%である、請求項1から4までのいずれか1項記載の多層構成素子。
- 前記内部電極(2)は銅または銅合金を含有する、請求項1から5までのいずれか1項記載の多層構成素子。
- 少なくとも1つの内部電極(2)は、前記セラミック基体の焼結と、前記内部電極内の複数の孔の形成が同時に達成される程度で前記セラミック基体(P)の焼結温度と僅かに異なる液相線温度を有する材料を有する、請求項1から6までのいずれか1項記載の多層構成素子。
- 内部電極(2)およびセラミック基体を有する多層構成素子(P)の製造方法において、
前記セラミック基体が焼結され、同時に内部電極に複数の孔(3)が形成される程度で前記セラミック基体の焼結温度と僅かに異なる液相線温度を有する内部電極材料を使用することを特徴とする、製造方法。 - 前記内部電極材料として銀とパラジウムの混合物を使用し、ここで銀の重量の割合は60〜80%であり、パラジウムの重量の割合は20〜40%であり、多層構成素子を1178℃〜1278℃の温度で焼結する、請求項8記載の方法。
- 内部電極(2)およびセラミック基体を有する多層構成素子(P)の製造方法において、
内部電極材料をシルクスクリーン法を用いてセラミックフィルム(1)上に塗布し、複数の孔(3)が設けられている内部電極を生じさせるシルクスクリーンを使用することを特徴とする、製造方法。 - 内部電極材料として銅または銅合金を使用し、多層構成素子(P)を1000℃〜1100℃で焼結する、請求項10記載の方法。
- 多層構成素子(P)として多層圧電アクチュエータを形成する、請求項8から11までのいずれか1項記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102004038103.8 | 2004-08-05 | ||
DE102004038103A DE102004038103A1 (de) | 2004-08-05 | 2004-08-05 | Vielschichtbauelement und Verfahren zu dessen Herstellung |
PCT/DE2005/001389 WO2006012891A1 (de) | 2004-08-05 | 2005-08-05 | Vielschichtbauelement und verfahren zu dessen herstellung |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008508737A true JP2008508737A (ja) | 2008-03-21 |
JP5069112B2 JP5069112B2 (ja) | 2012-11-07 |
Family
ID=35044666
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007524175A Expired - Fee Related JP5069112B2 (ja) | 2004-08-05 | 2005-08-05 | 多層構成素子およびその製造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7692368B2 (ja) |
EP (2) | EP2256836B1 (ja) |
JP (1) | JP5069112B2 (ja) |
DE (1) | DE102004038103A1 (ja) |
WO (1) | WO2006012891A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011024948A1 (ja) * | 2009-08-27 | 2011-03-03 | 京セラ株式会社 | 積層型圧電素子およびこれを用いた噴射装置ならびに燃料噴射システム |
WO2013157293A1 (ja) * | 2012-04-19 | 2013-10-24 | 日本碍子株式会社 | 膜型圧電/電歪素子 |
JP2014072329A (ja) * | 2012-09-28 | 2014-04-21 | Taiheiyo Cement Corp | 圧電素子の製造方法 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004020329A1 (de) * | 2004-04-26 | 2005-11-10 | Epcos Ag | Elektrische Funktionseinheit und Verfahren zu deren Herstellung |
DE102005017108A1 (de) * | 2005-01-26 | 2006-07-27 | Epcos Ag | Piezoelektrisches Bauelement |
JP5256804B2 (ja) * | 2008-03-19 | 2013-08-07 | Tdk株式会社 | 圧電磁器及びそれを用いた圧電素子 |
DE102008029426A1 (de) | 2008-06-23 | 2010-01-07 | Epcos Ag | Verfahren zur Herstellung eines Vielschichtbauelements, Vielschichtbauelement und Schablone |
US9801590B2 (en) | 2011-05-17 | 2017-10-31 | University Health Network | Breathing disorder identification, characterization and diagnosis methods, devices and systems |
DE102011113496A1 (de) | 2011-09-15 | 2013-03-21 | Epcos Ag | Vielschichtbauelement und Verfahren zu dessen Herstellung |
CA2931662C (en) | 2015-11-03 | 2023-09-26 | University Health Network | Acoustic upper airway assessment system and method, and sleep apnea assessment system and method relying thereon |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63142875A (ja) * | 1986-12-05 | 1988-06-15 | Sumitomo Special Metals Co Ltd | 圧電積層アクチユエ−タ− |
JPH01157581A (ja) * | 1987-09-25 | 1989-06-20 | Hitachi Metals Ltd | 積層型変位素子 |
JPH0364979A (ja) * | 1989-08-02 | 1991-03-20 | Nec Corp | 電歪効果素子 |
JPH0855753A (ja) * | 1994-08-10 | 1996-02-27 | Taiyo Yuden Co Ltd | 積層セラミックコンデンサ及びその製造方法 |
JP2002198250A (ja) * | 2000-12-26 | 2002-07-12 | Kyocera Corp | 積層型電子部品 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3378393D1 (en) * | 1982-05-11 | 1988-12-08 | Nec Corp | Multilayer electrostrictive element which withstands repeated application of pulses |
US4803763A (en) * | 1986-08-28 | 1989-02-14 | Nippon Soken, Inc. | Method of making a laminated piezoelectric transducer |
JPH0352211A (ja) | 1989-07-20 | 1991-03-06 | Matsushita Electric Ind Co Ltd | 積層セラミックコンデンサ |
JP3043387B2 (ja) | 1990-10-01 | 2000-05-22 | 日立金属株式会社 | 積層型変位素子 |
JP2001515835A (ja) | 1997-09-05 | 2001-09-25 | セラムテック アクチエンゲゼルシャフト イノヴェイティヴ セラミック エンジニアリング | 高性能圧電セラミック |
DE19946836A1 (de) | 1999-09-30 | 2000-11-09 | Bosch Gmbh Robert | Piezoaktor und ein Verfahren zu dessen Herstellung |
DE10006352A1 (de) | 2000-02-12 | 2001-08-30 | Bosch Gmbh Robert | Piezoelektrischer Keramikkörper mit silberhaltigen Innenelektroden |
JP2002075774A (ja) | 2000-09-04 | 2002-03-15 | Furuya Kinzoku:Kk | 電子部品 |
JP2002208533A (ja) * | 2001-01-09 | 2002-07-26 | Matsushita Electric Ind Co Ltd | 積層セラミック電子部品とその製造方法 |
DE50310782D1 (de) | 2002-05-06 | 2008-12-24 | Epcos Ag | Piezoaktor und verfahren zu dessen herstellung |
EP2037511A3 (en) * | 2003-09-24 | 2009-04-22 | Kyocera Corporation | Multilayer piezoelectric element |
CN101694865B (zh) * | 2004-03-09 | 2013-03-20 | 京瓷株式会社 | 叠层型压电元件及其制造方法 |
-
2004
- 2004-08-05 DE DE102004038103A patent/DE102004038103A1/de not_active Ceased
-
2005
- 2005-08-05 EP EP10179362A patent/EP2256836B1/de not_active Ceased
- 2005-08-05 JP JP2007524175A patent/JP5069112B2/ja not_active Expired - Fee Related
- 2005-08-05 EP EP05774389A patent/EP1774603B1/de not_active Ceased
- 2005-08-05 WO PCT/DE2005/001389 patent/WO2006012891A1/de active Application Filing
- 2005-08-05 US US11/573,229 patent/US7692368B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63142875A (ja) * | 1986-12-05 | 1988-06-15 | Sumitomo Special Metals Co Ltd | 圧電積層アクチユエ−タ− |
JPH01157581A (ja) * | 1987-09-25 | 1989-06-20 | Hitachi Metals Ltd | 積層型変位素子 |
JPH0364979A (ja) * | 1989-08-02 | 1991-03-20 | Nec Corp | 電歪効果素子 |
JPH0855753A (ja) * | 1994-08-10 | 1996-02-27 | Taiyo Yuden Co Ltd | 積層セラミックコンデンサ及びその製造方法 |
JP2002198250A (ja) * | 2000-12-26 | 2002-07-12 | Kyocera Corp | 積層型電子部品 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011024948A1 (ja) * | 2009-08-27 | 2011-03-03 | 京セラ株式会社 | 積層型圧電素子およびこれを用いた噴射装置ならびに燃料噴射システム |
JP5496210B2 (ja) * | 2009-08-27 | 2014-05-21 | 京セラ株式会社 | 積層型圧電素子およびこれを用いた噴射装置ならびに燃料噴射システム |
WO2013157293A1 (ja) * | 2012-04-19 | 2013-10-24 | 日本碍子株式会社 | 膜型圧電/電歪素子 |
US9184368B2 (en) | 2012-04-19 | 2015-11-10 | Ngk Insulators, Ltd. | Film-type piezoelectric/electrostrictive element |
JPWO2013157293A1 (ja) * | 2012-04-19 | 2015-12-21 | 日本碍子株式会社 | 膜型圧電/電歪素子 |
JP2014072329A (ja) * | 2012-09-28 | 2014-04-21 | Taiheiyo Cement Corp | 圧電素子の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
EP1774603A1 (de) | 2007-04-18 |
US7692368B2 (en) | 2010-04-06 |
WO2006012891A1 (de) | 2006-02-09 |
EP2256836A2 (de) | 2010-12-01 |
EP2256836B1 (de) | 2012-10-10 |
US20080030105A1 (en) | 2008-02-07 |
EP1774603B1 (de) | 2013-03-20 |
DE102004038103A1 (de) | 2006-02-23 |
EP2256836A3 (de) | 2011-01-05 |
JP5069112B2 (ja) | 2012-11-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5069112B2 (ja) | 多層構成素子およびその製造方法 | |
US10224148B2 (en) | Multi-layer ceramic capacitor and method of producing the same | |
JP7167227B2 (ja) | 積層セラミックコンデンサ | |
JP7503253B2 (ja) | 積層セラミックコンデンサ及びその製造方法 | |
JP2018107239A (ja) | 積層セラミックコンデンサ及びその製造方法 | |
JP4885869B2 (ja) | 積層型圧電素子およびこれを用いた噴射装置 | |
KR102552423B1 (ko) | 유전체 파우더 및 이를 이용한 적층형 세라믹 전자부품 | |
JP4925825B2 (ja) | 積層型電子部品及びこれを用いた噴射装置 | |
JP2006203070A (ja) | 積層型圧電素子 | |
JP2002299710A (ja) | 積層型圧電素子及び噴射装置 | |
JP2012528475A (ja) | 圧電素子 | |
JP2013035746A (ja) | セラミック組成物及び該セラミック組成物を含む積層セラミック電子部品 | |
CN103227278A (zh) | 层叠型压电元件 | |
JP4635439B2 (ja) | 積層型圧電体素子及びその製造方法 | |
JP2009200359A (ja) | 積層型圧電素子 | |
JP4670260B2 (ja) | 積層型電子部品 | |
JP2010212503A (ja) | 積層セラミックコンデンサ | |
JP2971993B2 (ja) | 積層セラミックコンデンサ | |
JP2006196717A (ja) | 積層型圧電セラミックス素子およびその製造方法 | |
US20200313067A1 (en) | Multilayer piezoelectric element | |
JP2005268393A (ja) | 積層型圧電素子およびこれを用いた噴射装置 | |
JP7388177B2 (ja) | 圧電素子 | |
JP5855509B2 (ja) | 圧電/電歪膜型素子及び圧電/電歪膜型素子を製造する方法 | |
US20200313069A1 (en) | Multilayer piezoelectric element | |
JP2005203706A (ja) | 積層型圧電素子および噴射装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20080411 |
|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20101227 |
|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20101228 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20110922 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110930 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20111227 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20120801 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20120816 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20150824 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5069112 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |