JP2008506238A5 - - Google Patents

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Publication number
JP2008506238A5
JP2008506238A5 JP2007520498A JP2007520498A JP2008506238A5 JP 2008506238 A5 JP2008506238 A5 JP 2008506238A5 JP 2007520498 A JP2007520498 A JP 2007520498A JP 2007520498 A JP2007520498 A JP 2007520498A JP 2008506238 A5 JP2008506238 A5 JP 2008506238A5
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JP
Japan
Prior art keywords
plasma
light source
magnetic core
pulse
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007520498A
Other languages
English (en)
Japanese (ja)
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JP2008506238A (ja
JP5179175B2 (ja
Filing date
Publication date
Priority claimed from US10/888,955 external-priority patent/US7199384B2/en
Priority claimed from US10/888,795 external-priority patent/US7307375B2/en
Priority claimed from US10/888,434 external-priority patent/US7183717B2/en
Application filed filed Critical
Priority claimed from PCT/US2005/024095 external-priority patent/WO2006017119A2/en
Publication of JP2008506238A publication Critical patent/JP2008506238A/ja
Publication of JP2008506238A5 publication Critical patent/JP2008506238A5/ja
Application granted granted Critical
Publication of JP5179175B2 publication Critical patent/JP5179175B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2007520498A 2004-07-09 2005-07-07 誘導駆動プラズマ光源 Expired - Lifetime JP5179175B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US10/888,955 US7199384B2 (en) 2004-07-09 2004-07-09 Inductively-driven light source for lithography
US10/888,795 US7307375B2 (en) 2004-07-09 2004-07-09 Inductively-driven plasma light source
US10/888,434 2004-07-09
US10/888,434 US7183717B2 (en) 2004-07-09 2004-07-09 Inductively-driven light source for microscopy
US10/888,955 2004-07-09
US10/888,795 2004-07-09
PCT/US2005/024095 WO2006017119A2 (en) 2004-07-09 2005-07-07 Inductively-driven plasma light source

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012222005A Division JP2013012780A (ja) 2004-07-09 2012-10-04 誘導駆動プラズマ光源

Publications (3)

Publication Number Publication Date
JP2008506238A JP2008506238A (ja) 2008-02-28
JP2008506238A5 true JP2008506238A5 (https=) 2008-08-07
JP5179175B2 JP5179175B2 (ja) 2013-04-10

Family

ID=35385412

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2007520498A Expired - Lifetime JP5179175B2 (ja) 2004-07-09 2005-07-07 誘導駆動プラズマ光源
JP2012222005A Withdrawn JP2013012780A (ja) 2004-07-09 2012-10-04 誘導駆動プラズマ光源

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2012222005A Withdrawn JP2013012780A (ja) 2004-07-09 2012-10-04 誘導駆動プラズマ光源

Country Status (6)

Country Link
US (1) US20060017387A1 (https=)
EP (2) EP2187711B1 (https=)
JP (2) JP5179175B2 (https=)
KR (1) KR101173324B1 (https=)
DE (1) DE602005027576D1 (https=)
WO (1) WO2006017119A2 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9277634B2 (en) 2013-01-17 2016-03-01 Kla-Tencor Corporation Apparatus and method for multiplexed multiple discharge plasma produced sources
DE102020206876B4 (de) 2020-06-03 2022-01-05 Carl Zeiss Smt Gmbh EUV-Strahlungsquelle, Einsatz für eine EUV-Strahlungsquelle und Einsatz für einen Einsatz für eine EUV-Strahlungsquelle
US11587781B2 (en) 2021-05-24 2023-02-21 Hamamatsu Photonics K.K. Laser-driven light source with electrodeless ignition
US20240194454A1 (en) * 2022-12-08 2024-06-13 Hamamatsu Photonics K.K. Inductively Coupled Plasma Light Source with Direct Gas Injection
US12156322B2 (en) * 2022-12-08 2024-11-26 Hamamatsu Photonics K.K. Inductively coupled plasma light source with switched power supply
US12578076B2 (en) 2023-06-05 2026-03-17 Hamamatsu Photonics K.K. Dual-output laser-driven light source
DE102024203896B3 (de) 2024-04-25 2025-10-30 Carl Zeiss Smt Gmbh Einsatz für eine Quellkammer einer EUV-Strahlungsquelle
TW202546557A (zh) 2024-04-25 2025-12-01 德商卡爾蔡司Ｓｍｔ有限公司 用於euv輻射源的源室的室壁的插入件
DE102024203895B3 (de) 2024-04-25 2025-10-16 Carl Zeiss Smt Gmbh Einsatz für einen äußeren Einsatz für eine EUV-Strahlungsquelle
DE102024203897B3 (de) * 2024-04-25 2025-10-23 Carl Zeiss Smt Gmbh Einsatz für eine Kammerwand einer Quellkammer einer EUV-Strahlungsquelle
DE102024206804B3 (de) * 2024-07-19 2025-11-06 Carl Zeiss Smt Gmbh Einsatz für eine Kammerwand einer Quellkammer einer EUV-Strahlungsquelle
DE102024128080A1 (de) 2024-09-27 2026-04-02 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer Entladungsplasmaquelle, sowie Entladungsplasmaquelle und optisches Metrologiesystem

Family Cites Families (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3509490A (en) * 1967-04-26 1970-04-28 Ibm Inductive excitation system for plasma
US3500118A (en) * 1967-07-17 1970-03-10 Gen Electric Electrodeless gaseous electric discharge devices utilizing ferrite cores
US3535653A (en) * 1967-11-15 1970-10-20 Ibm Multiple loop excitation system for plasma
US4042848A (en) * 1974-05-17 1977-08-16 Ja Hyun Lee Hypocycloidal pinch device
JPS6013264B2 (ja) * 1975-12-18 1985-04-05 ゼネラル エレクトリツク コンパニー 螢光灯
JPS56125882A (en) * 1980-03-07 1981-10-02 Sumitomo Electric Ind Ltd Manufacture of silicon solar cell
NL8004175A (nl) * 1980-07-21 1982-02-16 Philips Nv Frequentie-omzetter voor het voeden van een elektrodeloze ontladingslamp.
JPS58152352A (ja) * 1982-03-05 1983-09-09 Seiko Epson Corp Ｘ線発生装置
JPS61106007U (https=) * 1984-12-18 1986-07-05
JPS61163547A (ja) * 1985-01-14 1986-07-24 Nippon Telegr & Teleph Corp <Ntt> Ｘ線取り出し窓
JPS6348733A (ja) * 1986-08-14 1988-03-01 Nichicon Corp Ｘ線発生装置
JPH02256233A (ja) * 1989-03-29 1990-10-17 Hitachi Ltd プラズマ処理方法および装置
JPH02267896A (ja) * 1989-04-06 1990-11-01 Seiko Epson Corp Ｘ線発生装置
AU6068190A (en) * 1989-04-17 1990-11-16 Richard C. Auchterlonie Magnetic fusion reactor and ignition method
US5746875A (en) * 1994-09-16 1998-05-05 Applied Materials, Inc. Gas injection slit nozzle for a plasma process reactor
US5821705A (en) * 1996-06-25 1998-10-13 The United States Of America As Represented By The United States Department Of Energy Dielectric-wall linear accelerator with a high voltage fast rise time switch that includes a pair of electrodes between which are laminated alternating layers of isolated conductors and insulators
US5736021A (en) * 1996-07-10 1998-04-07 Applied Materials, Inc. Electrically floating shield in a plasma reactor
US6541786B1 (en) * 1997-05-12 2003-04-01 Cymer, Inc. Plasma pinch high energy with debris collector
US6815700B2 (en) * 1997-05-12 2004-11-09 Cymer, Inc. Plasma focus light source with improved pulse power system
US6744060B2 (en) * 1997-05-12 2004-06-01 Cymer, Inc. Pulse power system for extreme ultraviolet and x-ray sources
US6566668B2 (en) * 1997-05-12 2003-05-20 Cymer, Inc. Plasma focus light source with tandem ellipsoidal mirror units
US6150628A (en) * 1997-06-26 2000-11-21 Applied Science And Technology, Inc. Toroidal low-field reactive gas source
US6388226B1 (en) * 1997-06-26 2002-05-14 Applied Science And Technology, Inc. Toroidal low-field reactive gas source
US6313587B1 (en) * 1998-01-13 2001-11-06 Fusion Lighting, Inc. High frequency inductive lamp and power oscillator
NL1008352C2 (nl) * 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
US6129808A (en) * 1998-03-31 2000-10-10 Lam Research Corporation Low contamination high density plasma etch chambers and methods for making the same
US6380680B1 (en) * 1998-10-02 2002-04-30 Federal-Mogul World Wide, Inc. Electrodeless gas discharge lamp assembly with flux concentrator
US6421421B1 (en) * 2000-05-22 2002-07-16 Plex, Llc Extreme ultraviolet based on colliding neutral beams
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
TWI240151B (en) * 2000-10-10 2005-09-21 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
US6614505B2 (en) * 2001-01-10 2003-09-02 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, and device manufactured thereby
US6804327B2 (en) * 2001-04-03 2004-10-12 Lambda Physik Ag Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays
DE20109058U1 (de) * 2001-05-31 2002-10-10 DeltaMed GmbH, 35578 Wetzlar Vorrichtung zur Behandlung mit magnetischen Feldern
US6567499B2 (en) * 2001-06-07 2003-05-20 Plex Llc Star pinch X-ray and extreme ultraviolet photon source
CN1314300C (zh) * 2001-06-07 2007-05-02 普莱克斯有限责任公司 星形箍缩的x射线和远紫外线光子源
US6642671B2 (en) * 2001-08-27 2003-11-04 Matsushita Electric Industrial Co., Ltd. Electrodeless discharge lamp
DE10151080C1 (de) * 2001-10-10 2002-12-05 Xtreme Tech Gmbh Einrichtung und Verfahren zum Erzeugen von extrem ultravioletter (EUV-)Strahlung auf Basis einer Gasentladung
DE10215469B4 (de) * 2002-04-05 2005-03-17 Xtreme Technologies Gmbh Anordnung zur Unterdrückung von Teilchenemission bei einer Strahlungserzeugung auf Basis eines heißen Plasmas
US6979940B2 (en) * 2002-05-28 2005-12-27 Matsushita Electric Industrial Co., Ltd. Electrodeless discharge lamp
US6826451B2 (en) * 2002-07-29 2004-11-30 Asml Holding N.V. Lithography tool having a vacuum reticle library coupled to a vacuum chamber
US6696802B1 (en) * 2002-08-22 2004-02-24 Fusion Uv Systems Inc. Radio frequency driven ultra-violet lamp
TWI229242B (en) * 2002-08-23 2005-03-11 Asml Netherlands Bv Lithographic projection apparatus and particle barrier for use in said apparatus
JP2004128105A (ja) * 2002-10-01 2004-04-22 Nikon Corp Ｘ線発生装置及び露光装置
US7307375B2 (en) * 2004-07-09 2007-12-11 Energetiq Technology Inc. Inductively-driven plasma light source

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