JP5179175B2 - 誘導駆動プラズマ光源 - Google Patents

誘導駆動プラズマ光源 Download PDF

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Publication number
JP5179175B2
JP5179175B2 JP2007520498A JP2007520498A JP5179175B2 JP 5179175 B2 JP5179175 B2 JP 5179175B2 JP 2007520498 A JP2007520498 A JP 2007520498A JP 2007520498 A JP2007520498 A JP 2007520498A JP 5179175 B2 JP5179175 B2 JP 5179175B2
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JP
Japan
Prior art keywords
plasma
light source
magnetic core
light
insert
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2007520498A
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English (en)
Japanese (ja)
Other versions
JP2008506238A (ja
JP2008506238A5 (https=
Inventor
スミス，ドナルド・ケイ
ホーン，スティーブン・エフ
ベセン，マシュー・エム
ブラックボロウ，ポール・エイ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Energetiq Technology Inc
Original Assignee
Energetiq Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/888,955 external-priority patent/US7199384B2/en
Priority claimed from US10/888,795 external-priority patent/US7307375B2/en
Priority claimed from US10/888,434 external-priority patent/US7183717B2/en
Application filed by Energetiq Technology Inc filed Critical Energetiq Technology Inc
Publication of JP2008506238A publication Critical patent/JP2008506238A/ja
Publication of JP2008506238A5 publication Critical patent/JP2008506238A5/ja
Application granted granted Critical
Publication of JP5179175B2 publication Critical patent/JP5179175B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J63/00—Cathode-ray or electron-stream lamps
    • H01J63/08—Lamps with gas plasma excited by the ray or stream
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/007—Production of X-ray radiation generated from plasma involving electric or magnetic fields in the process of plasma generation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/62—Lamps with gaseous cathode, e.g. plasma cathode
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2229/00—Details of cathode ray tubes or electron beam tubes
    • H01J2229/70—Electron beam control outside the vessel
    • H01J2229/703—Electron beam control outside the vessel by magnetic fields
    • H01J2229/7031—Cores for field producing elements, e.g. ferrite

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • X-Ray Techniques (AREA)
  • Plasma Technology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Discharge Lamps And Accessories Thereof (AREA)
JP2007520498A 2004-07-09 2005-07-07 誘導駆動プラズマ光源 Expired - Lifetime JP5179175B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US10/888,955 US7199384B2 (en) 2004-07-09 2004-07-09 Inductively-driven light source for lithography
US10/888,795 US7307375B2 (en) 2004-07-09 2004-07-09 Inductively-driven plasma light source
US10/888,434 2004-07-09
US10/888,434 US7183717B2 (en) 2004-07-09 2004-07-09 Inductively-driven light source for microscopy
US10/888,955 2004-07-09
US10/888,795 2004-07-09
PCT/US2005/024095 WO2006017119A2 (en) 2004-07-09 2005-07-07 Inductively-driven plasma light source

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012222005A Division JP2013012780A (ja) 2004-07-09 2012-10-04 誘導駆動プラズマ光源

Publications (3)

Publication Number Publication Date
JP2008506238A JP2008506238A (ja) 2008-02-28
JP2008506238A5 JP2008506238A5 (https=) 2008-08-07
JP5179175B2 true JP5179175B2 (ja) 2013-04-10

Family

ID=35385412

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2007520498A Expired - Lifetime JP5179175B2 (ja) 2004-07-09 2005-07-07 誘導駆動プラズマ光源
JP2012222005A Withdrawn JP2013012780A (ja) 2004-07-09 2012-10-04 誘導駆動プラズマ光源

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2012222005A Withdrawn JP2013012780A (ja) 2004-07-09 2012-10-04 誘導駆動プラズマ光源

Country Status (6)

Country Link
US (1) US20060017387A1 (https=)
EP (2) EP2187711B1 (https=)
JP (2) JP5179175B2 (https=)
KR (1) KR101173324B1 (https=)
DE (1) DE602005027576D1 (https=)
WO (1) WO2006017119A2 (https=)

Families Citing this family (12)

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Publication number Priority date Publication date Assignee Title
US9277634B2 (en) 2013-01-17 2016-03-01 Kla-Tencor Corporation Apparatus and method for multiplexed multiple discharge plasma produced sources
DE102020206876B4 (de) 2020-06-03 2022-01-05 Carl Zeiss Smt Gmbh EUV-Strahlungsquelle, Einsatz für eine EUV-Strahlungsquelle und Einsatz für einen Einsatz für eine EUV-Strahlungsquelle
US11587781B2 (en) 2021-05-24 2023-02-21 Hamamatsu Photonics K.K. Laser-driven light source with electrodeless ignition
US20240194454A1 (en) * 2022-12-08 2024-06-13 Hamamatsu Photonics K.K. Inductively Coupled Plasma Light Source with Direct Gas Injection
US12156322B2 (en) * 2022-12-08 2024-11-26 Hamamatsu Photonics K.K. Inductively coupled plasma light source with switched power supply
US12578076B2 (en) 2023-06-05 2026-03-17 Hamamatsu Photonics K.K. Dual-output laser-driven light source
DE102024203896B3 (de) 2024-04-25 2025-10-30 Carl Zeiss Smt Gmbh Einsatz für eine Quellkammer einer EUV-Strahlungsquelle
TW202546557A (zh) 2024-04-25 2025-12-01 德商卡爾蔡司Ｓｍｔ有限公司 用於euv輻射源的源室的室壁的插入件
DE102024203895B3 (de) 2024-04-25 2025-10-16 Carl Zeiss Smt Gmbh Einsatz für einen äußeren Einsatz für eine EUV-Strahlungsquelle
DE102024203897B3 (de) * 2024-04-25 2025-10-23 Carl Zeiss Smt Gmbh Einsatz für eine Kammerwand einer Quellkammer einer EUV-Strahlungsquelle
DE102024206804B3 (de) * 2024-07-19 2025-11-06 Carl Zeiss Smt Gmbh Einsatz für eine Kammerwand einer Quellkammer einer EUV-Strahlungsquelle
DE102024128080A1 (de) 2024-09-27 2026-04-02 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer Entladungsplasmaquelle, sowie Entladungsplasmaquelle und optisches Metrologiesystem

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US4042848A (en) * 1974-05-17 1977-08-16 Ja Hyun Lee Hypocycloidal pinch device
JPS6013264B2 (ja) * 1975-12-18 1985-04-05 ゼネラル エレクトリツク コンパニー 螢光灯
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JPH02256233A (ja) * 1989-03-29 1990-10-17 Hitachi Ltd プラズマ処理方法および装置
JPH02267896A (ja) * 1989-04-06 1990-11-01 Seiko Epson Corp Ｘ線発生装置
AU6068190A (en) * 1989-04-17 1990-11-16 Richard C. Auchterlonie Magnetic fusion reactor and ignition method
US5746875A (en) * 1994-09-16 1998-05-05 Applied Materials, Inc. Gas injection slit nozzle for a plasma process reactor
US5821705A (en) * 1996-06-25 1998-10-13 The United States Of America As Represented By The United States Department Of Energy Dielectric-wall linear accelerator with a high voltage fast rise time switch that includes a pair of electrodes between which are laminated alternating layers of isolated conductors and insulators
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US6541786B1 (en) * 1997-05-12 2003-04-01 Cymer, Inc. Plasma pinch high energy with debris collector
US6815700B2 (en) * 1997-05-12 2004-11-09 Cymer, Inc. Plasma focus light source with improved pulse power system
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Also Published As

Publication number Publication date
EP2187711A3 (en) 2010-07-21
JP2008506238A (ja) 2008-02-28
EP2187711A2 (en) 2010-05-19
DE602005027576D1 (de) 2011-06-01
US20060017387A1 (en) 2006-01-26
WO2006017119A3 (en) 2006-06-08
EP1774838B1 (en) 2011-04-20
JP2013012780A (ja) 2013-01-17
EP1774838A2 (en) 2007-04-18
KR20070056036A (ko) 2007-05-31
EP2187711B1 (en) 2012-01-18
KR101173324B1 (ko) 2012-08-10
WO2006017119A2 (en) 2006-02-16

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