DE602005027576D1 - Induktiv angesteuerte plasma-lichtquelle - Google Patents

Induktiv angesteuerte plasma-lichtquelle

Info

Publication number
DE602005027576D1
DE602005027576D1 DE602005027576T DE602005027576T DE602005027576D1 DE 602005027576 D1 DE602005027576 D1 DE 602005027576D1 DE 602005027576 T DE602005027576 T DE 602005027576T DE 602005027576 T DE602005027576 T DE 602005027576T DE 602005027576 D1 DE602005027576 D1 DE 602005027576D1
Authority
DE
Germany
Prior art keywords
light source
plasma light
controlled plasma
inductively controlled
inductively
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005027576T
Other languages
English (en)
Inventor
Donald K Smith
Stephen F Horne
Matthew M Besen
Paul A Blackborow
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Energetiq Technology Inc
Original Assignee
Energetiq Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/888,795 external-priority patent/US7307375B2/en
Priority claimed from US10/888,434 external-priority patent/US7183717B2/en
Priority claimed from US10/888,955 external-priority patent/US7199384B2/en
Application filed by Energetiq Technology Inc filed Critical Energetiq Technology Inc
Publication of DE602005027576D1 publication Critical patent/DE602005027576D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J63/00—Cathode-ray or electron-stream lamps
    • H01J63/08—Lamps with gas plasma excited by the ray or stream
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/62—Lamps with gaseous cathode, e.g. plasma cathode
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2229/00—Details of cathode ray tubes or electron beam tubes
    • H01J2229/70—Electron beam control outside the vessel
    • H01J2229/703—Electron beam control outside the vessel by magnetic fields
    • H01J2229/7031—Cores for field producing elements, e.g. ferrite

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Plasma Technology (AREA)
  • Discharge Lamps And Accessories Thereof (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE602005027576T 2004-07-09 2005-07-07 Induktiv angesteuerte plasma-lichtquelle Active DE602005027576D1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US10/888,795 US7307375B2 (en) 2004-07-09 2004-07-09 Inductively-driven plasma light source
US10/888,434 US7183717B2 (en) 2004-07-09 2004-07-09 Inductively-driven light source for microscopy
US10/888,955 US7199384B2 (en) 2004-07-09 2004-07-09 Inductively-driven light source for lithography
PCT/US2005/024095 WO2006017119A2 (en) 2004-07-09 2005-07-07 Inductively-driven plasma light source

Publications (1)

Publication Number Publication Date
DE602005027576D1 true DE602005027576D1 (de) 2011-06-01

Family

ID=35385412

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005027576T Active DE602005027576D1 (de) 2004-07-09 2005-07-07 Induktiv angesteuerte plasma-lichtquelle

Country Status (6)

Country Link
US (1) US20060017387A1 (de)
EP (2) EP2187711B1 (de)
JP (2) JP5179175B2 (de)
KR (1) KR101173324B1 (de)
DE (1) DE602005027576D1 (de)
WO (1) WO2006017119A2 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9277634B2 (en) 2013-01-17 2016-03-01 Kla-Tencor Corporation Apparatus and method for multiplexed multiple discharge plasma produced sources
DE102020206876B4 (de) 2020-06-03 2022-01-05 Carl Zeiss Smt Gmbh EUV-Strahlungsquelle, Einsatz für eine EUV-Strahlungsquelle und Einsatz für einen Einsatz für eine EUV-Strahlungsquelle

Family Cites Families (44)

* Cited by examiner, † Cited by third party
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US3500118A (en) * 1967-07-17 1970-03-10 Gen Electric Electrodeless gaseous electric discharge devices utilizing ferrite cores
US3535653A (en) * 1967-11-15 1970-10-20 Ibm Multiple loop excitation system for plasma
US4042848A (en) * 1974-05-17 1977-08-16 Ja Hyun Lee Hypocycloidal pinch device
JPS6013264B2 (ja) * 1975-12-18 1985-04-05 ゼネラル エレクトリツク コンパニー 螢光灯
JPS56125882A (en) * 1980-03-07 1981-10-02 Sumitomo Electric Ind Ltd Manufacture of silicon solar cell
NL8004175A (nl) * 1980-07-21 1982-02-16 Philips Nv Frequentie-omzetter voor het voeden van een elektrodeloze ontladingslamp.
JPS58152352A (ja) * 1982-03-05 1983-09-09 Seiko Epson Corp Ｘ線発生装置
JPS61106007U (de) * 1984-12-18 1986-07-05
JPS61163547A (ja) * 1985-01-14 1986-07-24 Nippon Telegr & Teleph Corp <Ntt> Ｘ線取り出し窓
JPS6348733A (ja) * 1986-08-14 1988-03-01 Nichicon Corp Ｘ線発生装置
JPH02256233A (ja) * 1989-03-29 1990-10-17 Hitachi Ltd プラズマ処理方法および装置
JPH02267896A (ja) * 1989-04-06 1990-11-01 Seiko Epson Corp Ｘ線発生装置
AU6068190A (en) * 1989-04-17 1990-11-16 Richard C. Auchterlonie Magnetic fusion reactor and ignition method
US5746875A (en) * 1994-09-16 1998-05-05 Applied Materials, Inc. Gas injection slit nozzle for a plasma process reactor
US5821705A (en) * 1996-06-25 1998-10-13 The United States Of America As Represented By The United States Department Of Energy Dielectric-wall linear accelerator with a high voltage fast rise time switch that includes a pair of electrodes between which are laminated alternating layers of isolated conductors and insulators
US5736021A (en) * 1996-07-10 1998-04-07 Applied Materials, Inc. Electrically floating shield in a plasma reactor
US6541786B1 (en) * 1997-05-12 2003-04-01 Cymer, Inc. Plasma pinch high energy with debris collector
US6744060B2 (en) * 1997-05-12 2004-06-01 Cymer, Inc. Pulse power system for extreme ultraviolet and x-ray sources
US6815700B2 (en) * 1997-05-12 2004-11-09 Cymer, Inc. Plasma focus light source with improved pulse power system
US6566668B2 (en) * 1997-05-12 2003-05-20 Cymer, Inc. Plasma focus light source with tandem ellipsoidal mirror units
US6150628A (en) * 1997-06-26 2000-11-21 Applied Science And Technology, Inc. Toroidal low-field reactive gas source
US6388226B1 (en) * 1997-06-26 2002-05-14 Applied Science And Technology, Inc. Toroidal low-field reactive gas source
US6313587B1 (en) * 1998-01-13 2001-11-06 Fusion Lighting, Inc. High frequency inductive lamp and power oscillator
NL1008352C2 (nl) * 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
US6129808A (en) * 1998-03-31 2000-10-10 Lam Research Corporation Low contamination high density plasma etch chambers and methods for making the same
US6380680B1 (en) * 1998-10-02 2002-04-30 Federal-Mogul World Wide, Inc. Electrodeless gas discharge lamp assembly with flux concentrator
US6421421B1 (en) * 2000-05-22 2002-07-16 Plex, Llc Extreme ultraviolet based on colliding neutral beams
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
TWI240151B (en) * 2000-10-10 2005-09-21 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
US6614505B2 (en) * 2001-01-10 2003-09-02 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, and device manufactured thereby
US6804327B2 (en) * 2001-04-03 2004-10-12 Lambda Physik Ag Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays
DE20109058U1 (de) * 2001-05-31 2002-10-10 Deltamed Gmbh Vorrichtung zur Behandlung mit magnetischen Feldern
CN1314300C (zh) * 2001-06-07 2007-05-02 普莱克斯有限责任公司 星形箍缩的x射线和远紫外线光子源
US6567499B2 (en) * 2001-06-07 2003-05-20 Plex Llc Star pinch X-ray and extreme ultraviolet photon source
US6642671B2 (en) * 2001-08-27 2003-11-04 Matsushita Electric Industrial Co., Ltd. Electrodeless discharge lamp
DE10151080C1 (de) * 2001-10-10 2002-12-05 Xtreme Tech Gmbh Einrichtung und Verfahren zum Erzeugen von extrem ultravioletter (EUV-)Strahlung auf Basis einer Gasentladung
DE10215469B4 (de) * 2002-04-05 2005-03-17 Xtreme Technologies Gmbh Anordnung zur Unterdrückung von Teilchenemission bei einer Strahlungserzeugung auf Basis eines heißen Plasmas
US6979940B2 (en) * 2002-05-28 2005-12-27 Matsushita Electric Industrial Co., Ltd. Electrodeless discharge lamp
US6826451B2 (en) * 2002-07-29 2004-11-30 Asml Holding N.V. Lithography tool having a vacuum reticle library coupled to a vacuum chamber
US6696802B1 (en) * 2002-08-22 2004-02-24 Fusion Uv Systems Inc. Radio frequency driven ultra-violet lamp
KR100748447B1 (ko) * 2002-08-23 2007-08-10 에이에스엠엘 네델란즈 비.브이. 리소그래피 투영장치 및 상기 장치에 사용하기 위한파티클 배리어
JP2004128105A (ja) * 2002-10-01 2004-04-22 Nikon Corp Ｘ線発生装置及び露光装置
US7307375B2 (en) * 2004-07-09 2007-12-11 Energetiq Technology Inc. Inductively-driven plasma light source

Also Published As

Publication number Publication date
EP2187711A3 (de) 2010-07-21
US20060017387A1 (en) 2006-01-26
KR20070056036A (ko) 2007-05-31
WO2006017119A2 (en) 2006-02-16
KR101173324B1 (ko) 2012-08-10
EP2187711B1 (de) 2012-01-18
EP1774838A2 (de) 2007-04-18
WO2006017119A3 (en) 2006-06-08
EP2187711A2 (de) 2010-05-19
JP5179175B2 (ja) 2013-04-10
JP2008506238A (ja) 2008-02-28
EP1774838B1 (de) 2011-04-20
JP2013012780A (ja) 2013-01-17

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