KR101173324B1 - 유도성 구동 플라즈마 광원 - Google Patents

유도성 구동 플라즈마 광원 Download PDF

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Publication number
KR101173324B1
KR101173324B1 KR1020077000541A KR20077000541A KR101173324B1 KR 101173324 B1 KR101173324 B1 KR 101173324B1 KR 1020077000541 A KR1020077000541 A KR 1020077000541A KR 20077000541 A KR20077000541 A KR 20077000541A KR 101173324 B1 KR101173324 B1 KR 101173324B1
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South Korea
Prior art keywords
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plasma
region
light source
magnetic core
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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KR1020077000541A
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English (en)
Korean (ko)
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KR20070056036A (ko
Inventor
도날드 케이. 스미스
스테핀 에프. 혼
매튜 엠. 베센
폴 에이. 블랙보로우
Original Assignee
에너제틱 테크놀로지 아이엔씨.
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Publication date
Priority claimed from US10/888,955 external-priority patent/US7199384B2/en
Priority claimed from US10/888,795 external-priority patent/US7307375B2/en
Priority claimed from US10/888,434 external-priority patent/US7183717B2/en
Application filed by 에너제틱 테크놀로지 아이엔씨. filed Critical 에너제틱 테크놀로지 아이엔씨.
Publication of KR20070056036A publication Critical patent/KR20070056036A/ko
Application granted granted Critical
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Assigned to 하마마츠 포토닉스 가부시키가이샤 reassignment 하마마츠 포토닉스 가부시키가이샤 권리의 일부이전등록 Assignors: 에너제틱 테크놀로지 아이엔씨.
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J63/00—Cathode-ray or electron-stream lamps
    • H01J63/08—Lamps with gas plasma excited by the ray or stream
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/007—Production of X-ray radiation generated from plasma involving electric or magnetic fields in the process of plasma generation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/62—Lamps with gaseous cathode, e.g. plasma cathode
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2229/00—Details of cathode ray tubes or electron beam tubes
    • H01J2229/70—Electron beam control outside the vessel
    • H01J2229/703—Electron beam control outside the vessel by magnetic fields
    • H01J2229/7031—Cores for field producing elements, e.g. ferrite

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • X-Ray Techniques (AREA)
  • Plasma Technology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Discharge Lamps And Accessories Thereof (AREA)
KR1020077000541A 2004-07-09 2005-07-07 유도성 구동 플라즈마 광원 Expired - Lifetime KR101173324B1 (ko)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US10/888,955 US7199384B2 (en) 2004-07-09 2004-07-09 Inductively-driven light source for lithography
US10/888,795 US7307375B2 (en) 2004-07-09 2004-07-09 Inductively-driven plasma light source
US10/888,434 2004-07-09
US10/888,434 US7183717B2 (en) 2004-07-09 2004-07-09 Inductively-driven light source for microscopy
US10/888,955 2004-07-09
US10/888,795 2004-07-09
PCT/US2005/024095 WO2006017119A2 (en) 2004-07-09 2005-07-07 Inductively-driven plasma light source

Publications (2)

Publication Number Publication Date
KR20070056036A KR20070056036A (ko) 2007-05-31
KR101173324B1 true KR101173324B1 (ko) 2012-08-10

Family

ID=35385412

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020077000541A Expired - Lifetime KR101173324B1 (ko) 2004-07-09 2005-07-07 유도성 구동 플라즈마 광원

Country Status (6)

Country Link
US (1) US20060017387A1 (https=)
EP (2) EP2187711B1 (https=)
JP (2) JP5179175B2 (https=)
KR (1) KR101173324B1 (https=)
DE (1) DE602005027576D1 (https=)
WO (1) WO2006017119A2 (https=)

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US9277634B2 (en) 2013-01-17 2016-03-01 Kla-Tencor Corporation Apparatus and method for multiplexed multiple discharge plasma produced sources
DE102020206876B4 (de) 2020-06-03 2022-01-05 Carl Zeiss Smt Gmbh EUV-Strahlungsquelle, Einsatz für eine EUV-Strahlungsquelle und Einsatz für einen Einsatz für eine EUV-Strahlungsquelle
US11587781B2 (en) 2021-05-24 2023-02-21 Hamamatsu Photonics K.K. Laser-driven light source with electrodeless ignition
US20240194454A1 (en) * 2022-12-08 2024-06-13 Hamamatsu Photonics K.K. Inductively Coupled Plasma Light Source with Direct Gas Injection
US12156322B2 (en) * 2022-12-08 2024-11-26 Hamamatsu Photonics K.K. Inductively coupled plasma light source with switched power supply
US12578076B2 (en) 2023-06-05 2026-03-17 Hamamatsu Photonics K.K. Dual-output laser-driven light source
DE102024203896B3 (de) 2024-04-25 2025-10-30 Carl Zeiss Smt Gmbh Einsatz für eine Quellkammer einer EUV-Strahlungsquelle
TW202546557A (zh) 2024-04-25 2025-12-01 德商卡爾蔡司Ｓｍｔ有限公司 用於euv輻射源的源室的室壁的插入件
DE102024203895B3 (de) 2024-04-25 2025-10-16 Carl Zeiss Smt Gmbh Einsatz für einen äußeren Einsatz für eine EUV-Strahlungsquelle
DE102024203897B3 (de) * 2024-04-25 2025-10-23 Carl Zeiss Smt Gmbh Einsatz für eine Kammerwand einer Quellkammer einer EUV-Strahlungsquelle
DE102024206804B3 (de) * 2024-07-19 2025-11-06 Carl Zeiss Smt Gmbh Einsatz für eine Kammerwand einer Quellkammer einer EUV-Strahlungsquelle
DE102024128080A1 (de) 2024-09-27 2026-04-02 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer Entladungsplasmaquelle, sowie Entladungsplasmaquelle und optisches Metrologiesystem

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US3535653A (en) * 1967-11-15 1970-10-20 Ibm Multiple loop excitation system for plasma
US4042848A (en) * 1974-05-17 1977-08-16 Ja Hyun Lee Hypocycloidal pinch device
JPS6013264B2 (ja) * 1975-12-18 1985-04-05 ゼネラル エレクトリツク コンパニー 螢光灯
JPS56125882A (en) * 1980-03-07 1981-10-02 Sumitomo Electric Ind Ltd Manufacture of silicon solar cell
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JPS6348733A (ja) * 1986-08-14 1988-03-01 Nichicon Corp Ｘ線発生装置
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JPH02267896A (ja) * 1989-04-06 1990-11-01 Seiko Epson Corp Ｘ線発生装置
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Also Published As

Publication number Publication date
EP2187711A3 (en) 2010-07-21
JP2008506238A (ja) 2008-02-28
EP2187711A2 (en) 2010-05-19
DE602005027576D1 (de) 2011-06-01
US20060017387A1 (en) 2006-01-26
WO2006017119A3 (en) 2006-06-08
EP1774838B1 (en) 2011-04-20
JP5179175B2 (ja) 2013-04-10
JP2013012780A (ja) 2013-01-17
EP1774838A2 (en) 2007-04-18
KR20070056036A (ko) 2007-05-31
EP2187711B1 (en) 2012-01-18
WO2006017119A2 (en) 2006-02-16

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