JP2008300841A - 抵抗性メモリ素子 - Google Patents
抵抗性メモリ素子 Download PDFInfo
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- JP2008300841A JP2008300841A JP2008141727A JP2008141727A JP2008300841A JP 2008300841 A JP2008300841 A JP 2008300841A JP 2008141727 A JP2008141727 A JP 2008141727A JP 2008141727 A JP2008141727 A JP 2008141727A JP 2008300841 A JP2008300841 A JP 2008300841A
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- 229910045601 alloy Inorganic materials 0.000 claims abstract description 34
- 239000000956 alloy Substances 0.000 claims abstract description 34
- 230000008859 change Effects 0.000 claims abstract description 32
- 229910000510 noble metal Inorganic materials 0.000 claims abstract description 11
- 239000010953 base metal Substances 0.000 claims abstract description 9
- 229910002845 Pt–Ni Inorganic materials 0.000 claims description 11
- 229910001069 Ti alloy Inorganic materials 0.000 claims description 10
- 229910052697 platinum Inorganic materials 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 229910052741 iridium Inorganic materials 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- 229910052707 ruthenium Inorganic materials 0.000 claims description 3
- 229910002056 binary alloy Inorganic materials 0.000 claims description 2
- 229910002058 ternary alloy Inorganic materials 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 229910052751 metal Inorganic materials 0.000 abstract description 3
- 239000002184 metal Substances 0.000 abstract description 3
- 230000001747 exhibiting effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 110
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 11
- 239000000463 material Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 7
- 230000001070 adhesive effect Effects 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 229910000314 transition metal oxide Inorganic materials 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 238000000879 optical micrograph Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 229910013716 LiNi Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910010380 TiNi Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
- H10B63/20—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having two electrodes, e.g. diodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
- H10B63/80—Arrangements comprising multiple bistable or multi-stable switching components of the same type on a plane parallel to the substrate, e.g. cross-point arrays
- H10B63/84—Arrangements comprising multiple bistable or multi-stable switching components of the same type on a plane parallel to the substrate, e.g. cross-point arrays arranged in a direction perpendicular to the substrate, e.g. 3D cell arrays
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/20—Multistable switching devices, e.g. memristors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/821—Device geometry
- H10N70/826—Device geometry adapted for essentially vertical current flow, e.g. sandwich or pillar type devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/841—Electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/881—Switching materials
- H10N70/883—Oxides or nitrides
- H10N70/8833—Binary metal oxides, e.g. TaOx
Landscapes
- Semiconductor Memories (AREA)
Abstract
【解決手段】少なくとも一つの第1電極E1と、第1電極E1と離隔された少なくとも一つの第2電極E2と、第1電極E1と第2電極E2との間に備えられ、第1抵抗変化層R1を備える第1構造体S1と、第1中間電極M1、及び、第1抵抗変化層R1と電気的に連結された第1スイッチング素子D1と、を備え、第1及び第2電極E1,E2のうち少なくとも一つは、貴金属と卑金属とを含む合金層を備える抵抗性メモリ素子である。貴金属は、p型酸化物と接触してスイッチング特性を表すか、またはダイオードのp型半導体層と接触してオーミック特性を表す金属であり、卑金属は、合金層の接着力を向上させる役割を持つ。
【選択図】図1
Description
E1 第1電極
E2 第2電極
E3 第3電極
M1 第1中間電極
R1 第1抵抗変化層
S1 第1構造物
S2 第2構造物
Claims (23)
- 少なくとも一つの第1電極と、
前記第1電極と離隔された少なくとも一つの第2電極と、
前記第1電極と第2電極との間に備えられ、第1抵抗変化層を備える第1構造体と、
前記第1抵抗変化層と電気的に連結された第1スイッチング素子と、を備え、
前記第1及び第2電極のうち少なくとも一つは、貴金属と卑金属とを含む合金層を備えることを特徴とする抵抗性メモリ素子。 - 前記合金層は、二元合金及び三元合金のうち少なくとも一つを含むことを特徴とする請求項1に記載の抵抗性メモリ素子。
- 前記貴金属は、Pt,Ir,Ru,Pd及びAuのうちいずれか一つであることを特徴とする請求項1に記載の抵抗性メモリ素子。
- 前記合金層は、Pt−Ti合金層またはPt−Ni合金層であることを特徴とする請求項3に記載の抵抗性メモリ素子。
- 前記Pt−Ti合金層で、Tiの含有量X(mol%)は、0<X≦40であることを特徴とする請求項4に記載の抵抗性メモリ素子。
- 前記Pt−Ni合金層で、Niの含有量Y(mol%)は、0<Y≦90であることを特徴とする請求項4に記載の抵抗性メモリ素子。
- 前記第1構造体は、前記第1スイッチング素子を備え、
前記第1抵抗変化層と前記第1スイッチング素子との間に第1中間電極をさらに備えることを特徴とする請求項1に記載の抵抗性メモリ素子。 - 前記第1中間電極は、前記合金層を備えることを特徴とする請求項7に記載の抵抗性メモリ素子。
- 前記第1スイッチング素子は、第1酸化物ダイオードであることを特徴とする請求項7に記載の抵抗性メモリ素子。
- 前記第1電極上に前記第1抵抗変化層、前記第1中間電極、前記第1スイッチング素子及び前記第2電極が順次に備えられたことを特徴とする請求項7に記載の抵抗性メモリ素子。
- 前記第1電極上に前記第1スイッチング素子、前記第1中間電極、前記第1抵抗変化層及び前記第2電極が順次に備えられたことを特徴とする請求項7に記載の抵抗性メモリ素子。
- 前記第1及び第2電極は、互いに交差する複数の配線であり、
前記第1及び第2電極の交差点に前記第1構造体が備えられたことを特徴とする請求項7に記載の抵抗性メモリ素子。 - 前記第2電極と離隔された少なくとも一つの第3電極と、
前記第2電極と前記第3電極との間に備えられ、第2抵抗変化層を備える第2構造体と、
前記第2抵抗変化層と電気的に連結された第2スイッチング素子と、をさらに備えることを特徴とする請求項1に記載の抵抗性メモリ素子。 - 前記第3電極は、前記合金層を備えることを特徴とする請求項13に記載の抵抗性メモリ素子。
- 前記第2構造体は、前記第2スイッチング素子を備え、
前記第2抵抗変化層と前記第2スイッチング素子との間に第2中間電極をさらに備えることを特徴とする請求項13に記載の抵抗性メモリ素子。 - 前記第2中間電極は、前記合金層を備えることを特徴とする請求項15に記載の抵抗性メモリ素子。
- 前記第2スイッチング素子は、第2酸化物ダイオードであることを特徴とする請求項15に記載の抵抗性メモリ素子。
- 前記第2電極上に前記第2抵抗変化層、前記第2中間電極、前記第2スイッチング素子及び前記第3電極が順次に備えられたことを特徴とする請求項15に記載の抵抗性メモリ素子。
- 前記第2電極上に前記第2スイッチング素子、前記第2中間電極、前記第2抵抗変化層及び前記第3電極が順次に備えられたことを特徴とする請求項15に記載の抵抗性メモリ素子。
- 前記第2及び第3電極は、互いに交差する複数の配線であり、
前記第2及び第3電極の交差点に前記第2構造体が備えられたことを特徴とする請求項15に記載の抵抗性メモリ素子。 - 前記抵抗性メモリ素子は、1D(Diode)−1R(Resistor)セル構造を有する多層交差点メモリ素子であることを特徴とする請求項20に記載の抵抗性メモリ素子。
- 前記第1抵抗変化層は、高抵抗状態から低抵抗状態に、または低抵抗状態から高抵抗状態に可逆的に変換する要素を備えることを特徴とする請求項1に記載の抵抗性メモリ素子。
- 前記第1抵抗変化層は、高抵抗状態から低抵抗状態に非可逆的に変換する要素を備えることを特徴とする請求項1に記載の抵抗性メモリ素子。
Applications Claiming Priority (4)
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KR20070052918 | 2007-05-30 | ||
KR10-2007-0052918 | 2007-05-30 | ||
KR10-2008-0020589 | 2008-03-05 | ||
KR1020080020589A KR20080105979A (ko) | 2007-05-30 | 2008-03-05 | 저항성 메모리 소자 |
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JP2008300841A true JP2008300841A (ja) | 2008-12-11 |
JP5441361B2 JP5441361B2 (ja) | 2014-03-12 |
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JP2008141727A Active JP5441361B2 (ja) | 2007-05-30 | 2008-05-29 | 抵抗性メモリ素子 |
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US (1) | US8173989B2 (ja) |
EP (1) | EP1998384B1 (ja) |
JP (1) | JP5441361B2 (ja) |
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US8173989B2 (en) | 2012-05-08 |
EP1998384B1 (en) | 2012-05-23 |
EP1998384A1 (en) | 2008-12-03 |
US20080296550A1 (en) | 2008-12-04 |
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